Abstract:
A drawing apparatus includes a first aperture array configured to split a diverging charged particle beam, a converging lens array configured to form a plurality of first crossovers of a plurality of charged particle beams from the first aperture array, a collimator lens having a principal plane where the plurality of first crossovers are to be formed, a correcting system configured to correct angles of a plurality of charged particle beams from the collimator lens and to form a plurality of second crossovers, and an element having a plurality of apertures respectively corresponding to the plurality of second crossovers. The first aperture array and the converging lens array have apertures such that an arrangement of the plurality of first crossovers is different from an arrangement of the plurality of apertures, and that the plurality of second crossovers are aligned with the plurality of apertures on the element.
Abstract:
An ion transfer arrangement for transporting ions between higher and lower pressure regions of the mass spectrometer comprises an ion transfer conduit 60. The conduit 60 has an inlet opening towards a relatively high pressure chamber 40 and an outlet 70 opening towards a relatively low pressure chamber. The conduit 60 also has at least one side wall surrounding an ion transfer channel 115. The side wall includes a plurality of apertures 140 formed in the longitudinal direction of the side wall so as to permit a flow of gas from within the ion transfer channel 115 to a lower pressure region outside of the side wall of the conduit 60.
Abstract:
The invention relates to a charged particle based lithography system for projecting an image on a target using a plurality of charged particle beamlets for transferring said image to said target, said system comprising a charged particle column comprising:an electron optical subassembly comprising a charged particle source, a collimator lens, an aperture array, a blanking means and a beamstop for generating a plurality of charged particle beamlets; anda projector for projecting said plurality of charged particle beamlets on said target;said projector being moveably included in the system by means of at least one projector actuator for moving said projector relative to said electron optical subassembly;said projector actuator being included for mechanically actuating said projector and providing said projector with at least one degree of freedom of movement;wherein said degree of freedom relates to a movement around an optical axis of the system.
Abstract:
An electron emission device includes: a plate; first and second electrodes insulated from each other and arranged having a predetermined shape; an electron emitter connected to one of the first and second electrodes; and a third electrode formed with a hole through which electrons emitted from the electron emitter pass. The ratio of the a hole width of the third electrode to a width of the electron emitter is equal to or more than about 0.5 and equal to or less than about 1.0. With this configuration, there is no twisting or sagging, thereby satisfying predetermined standards for brightness and color purity.
Abstract:
A field emission device (FED) and a method for fabricating the FED are provided. The FED includes micro-tips with nano-sized surface features, and a focus gate electrode over a gate electrode, wherein one or more gates of the gate electrode is exposed through a single opening of the focus gate electrode. In the FED, occurrence of arcing is suppressed. Although an arcing occurs in the FED, damage of a cathode and a resistor layer is prevented, so that a higher working voltage can be applied to the anode. Also, due to the micro-tips with nano-sized surface features, the emission current density of the FED increases, so that a high-brightness display can be achieved with the FED. The gate turn-on voltage can be lowered due to the micro-tip as a collection of nano-sized tips, thereby reducing power consumption.
Abstract:
An optical unit having an electrostatic lens for influencing a particle beam wherein the lens has at least one first and one second electrode downstream of one another in the direction of the particle beam, each of the electrodes being chargeable with a potential and in electrical contact with a high-resistance body having a channel therethrough for the particle beam. A further component is provided for influencing the particle beam in the region of the electrostatic lens.
Abstract:
A field-emission cathode comprises a substrate having a conductive surface, a gate electrode and a focusing electrode overlying the substrate with insulation layers interposed therebetween, a plurality of cavities formed by penetrating the gate electrode, focusing electrode and insulation layers, and an emitter formed in each of the cavities on the substrate for emission of an electron beam. The emitter has tip located at a level between the gate electrode and the focusing electrode, which receive therebetween a signal for modulating the electron beam at a high frequency.
Abstract:
A field emission cathode includes a first electron-emitting structure having a first cathode electrode (3), a first gate electrode (5), a first insulating layer (4) separating the first cathode electrode (3) from the first gate electrode (5), and at least one first emitter tip (9) disposed in a hole formed in the first gate electrode (5) and the first insulating layer (4) to expose a portion of the first cathode electrode (3); and a second electron-emitting structure surrounding and insulated from the first electron-emitting structure wherein the second electron-emitting structure has a second cathode electrode (6), a second gate electrode (8), a second insulating layer (7) separating the second cathode electrode (6) from the second gate electrode (8), and at least one second emitter tip (10) disposed in a hole formed in the second gate electrode (8) and the second insulating layer (7) to expose a portion of the second cathode electrode (6).
Abstract:
In a cold cathode electron beam device, groups of electron emission cones emit electrons which are extracted from the cones by respective extraction electrodes. The emitted electrons are focussed into a beam by an electron lens so as to strike a fluorescent screen. In order to minimize the size of the beam spot where the beam strikes the screen, a structure is included which compensates for a spherical aberration property which is inherent to the electron lens. The spherical aberration is compensated for by placing a focus electrode for each group of electron emission cones on a common substrate along with the extraction electrode, such that the focus electrode surrounds the extraction electrode.
Abstract:
Apparatus and methods of focusing and to steering a group of electrons emitted from an electron source to a shield. In a preferred embodiment, the apparatus includes an electron source controlled by one or more voltages to emit electrons, a first electrode adjacent to one side of the source, and a second electrode, insulated from the first electrode, adjacent to an opposite side of the source. The shield has a shield voltage. The first and the second electrode have a first and a second voltage respectively to focus and steer a substantial portion of the emitted electrons towards the shield. One application of the present invention is in the area of flat panel displays with the shield being a screen.