Split-gate, 2-bit non-volatile memory cell with erase gate disposed over word line gate, and method of making same

    公开(公告)号:US11315635B2

    公开(公告)日:2022-04-26

    申请号:US17152696

    申请日:2021-01-19

    Abstract: A memory device includes a semiconductor substrate, first and second regions in the substrate having a conductivity type different than that of the substrate, with a channel region in the substrate extending between the first and second regions. The channel region is continuous between the first and second regions. A first floating gate is disposed over and insulated from a first portion of the channel region. A second floating gate is disposed over and insulated from a second portion of the channel region. A first coupling gate is disposed over and insulated from the first floating gate. A second coupling gate is disposed over and insulated from the second floating gate. A word line gate is disposed over and insulated from a third portion of the channel region between the first and second channel region portions. An erase gate is disposed over and insulated from the word line gate.

    CONCURRENT WRITE AND VERIFY OPERATIONS IN AN ANALOG NEURAL MEMORY

    公开(公告)号:US20220067499A1

    公开(公告)日:2022-03-03

    申请号:US17190376

    申请日:2021-03-02

    Inventor: Hieu Van Tran

    Abstract: Numerous embodiments of analog neural memory systems that enable concurrent write and verify operations are disclosed. In some embodiments, concurrent operations occur among different banks of memory. In other embodiments, concurrent operations occur among different blocks of memory, where each block comprises two or more banks of memory. The embodiments substantially reduce the timing overhead for weight writing and verifying operations in analog neural memory systems.

    Wear leveling in EEPROM emulator formed of flash memory cells

    公开(公告)号:US11257555B2

    公开(公告)日:2022-02-22

    申请号:US17006550

    申请日:2020-08-28

    Abstract: The present invention relates to systems and methods for implementing wear leveling in a flash memory device that emulates an EEPROM. The embodiments utilize an index array, which stores an index word for each logical address in the emulated EEPROM. Each bit in each index word is associated with a physical address for a physical word in the emulated EEPROM, and the index word keeps track of which physical word is the current word for a particular logical address. The use of the index word enables a wear leveling algorithm that allows for a programming command to a logical address to result in: (i) skipping the programming operation if the data stored in the current word does not contain a “1” that corresponds to a “0” in the data to be stored, (ii) reprogramming one or more bits of the current word in certain situations, or (iii) shifting to and programming the next physical word in certain situations.

    Method Of Forming Split Gate Memory Cells With Thinner Tunnel Oxide

    公开(公告)号:US20220013531A1

    公开(公告)日:2022-01-13

    申请号:US17179057

    申请日:2021-02-18

    Abstract: A method of forming a memory cell includes forming a first polysilicon block over an upper surface of a semiconductor substrate and having top surface and a side surface meeting at a sharp edge, forming an oxide layer with a first portion over the upper surface, a second portion directly on the side surface, and a third portion directly on the sharp edge, performing an etch that thins the oxide layer in a non-uniform manner such that the third portion is thinner than the first and second portions, performing an oxide deposition that thickens the first, second and third portions of the oxide layer, wherein after the oxide deposition, the third portion is thinner than the first and second portions, and forming a second polysilicon block having one portion directly on the first portion of the oxide layer and another portion directly on the third portion of the oxide layer.

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