公开(公告)号：US11862491B2

公开(公告)日：2024-01-02

申请号：US16925449

申请日：2020-07-10

Applicant: SEMES CO., LTD.

Inventor： Dohyeon Yoon ,  Joo Jib Park ,  Jin Se Park

IPC: H01L21/67 ,  B08B7/00 ,  H01L21/02 ,  H01L21/677

CPC classification number: H01L21/67115 ,  B08B7/0021 ,  H01L21/02101 ,  H01L21/67034 ,  H01L21/67742

Abstract: An apparatus for treating a substrate includes a light treatment chamber having an interior space, a support unit that supports the substrate in the interior space, and an irradiation unit that irradiates light to the substrate in the interior space to remove organic matter remaining on the substrate, in which the irradiation unit includes a first light source that irradiates first light to the substrate and a second light source that irradiates, to the substrate, second light having a different wavelength range from the first light.

公开(公告)号：US11858264B2

公开(公告)日：2024-01-02

申请号：US17391383

申请日：2021-08-02

Applicant: SEMES CO., LTD

Inventor： Yeonsu Jung ,  Yeonchul Song ,  Myeongjun Lim ,  Chulwoo Kim

IPC: B41J2/045 ,  H10K71/13 ,  B41J11/00

CPC classification number: B41J2/04535 ,  B41J2/04581 ,  B41J11/0085 ,  H10K71/135 ,  B41J2202/09

Abstract: An apparatus for dispensing droplet may include a droplet discharging member, a stage and a control member. The droplet discharging member may include a plurality of nozzles arranged in a first direction by a constant interval. The stage may receive a substrate including a plurality of regions for forming a plurality of pixels of a same size disposed in the first direction and a second direction substantially perpendicular to the first direction. The control member may control the droplet discharging member such that amounts of droplets may be substantially identical in the regions of the substrate for the pixels if the numbers of the nozzles of the droplet discharging member with respect to sides of the regions of the substrate for the pixels are different in the first direction. The control member may identify patterns of discharged droplets in the regions of the substrate for the pixels and adjusts the amounts of the droplets form the nozzles of the droplet discharging member by controlling operation of each of nozzles of the droplet discharging member.

公开(公告)号：US20230415191A1

公开(公告)日：2023-12-28

申请号：US18097408

申请日：2023-01-16

Applicant: SEMES CO., LTD.

Inventor： JUN YOUNG CHOI ,  GUI SU PARK ,  YOUNG HUN LEE ,  YOUNG JIN JANG ,  JUN HYUN LIM

IPC: B05C3/10 ,  B08B3/04 ,  B08B3/10 ,  B08B3/08

CPC classification number: B05C3/10 ,  B08B3/041 ,  B08B3/10 ,  B08B3/08

Abstract: The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a batch-type treating bath for treating a substrate in a batch-type manner; a single-type treating chamber for treating the substrate in a single-type manner; and a buffer chamber positioned on a transfer path of the substrate transferred between the batch-type treating bath and the single-type treating chamber, and supplying a liquid for maintaining a wetting state of the substrate.

公开(公告)号：US20230411196A1

公开(公告)日：2023-12-21

申请号：US18126974

申请日：2023-03-27

Applicant: SEMES CO., LTD.

Inventor： Jae Won SHIN

IPC: H01L21/677 ,  H01L21/67 ,  H01L21/683

CPC classification number: H01L21/67766 ,  H01L21/6719 ,  H01L21/67769 ,  H01L21/6831

Abstract: Proposed is a component carrier for semiconductor manufacturing and component transport system using the same and, more particularly, to a component carrier for semiconductor manufacturing and component transport system using the same with an improved structure to prevent a ring from being separated from the component carrier for semiconductor manufacturing during a ring transport process by temporarily fixing the ring using vacuum adsorption. The carrier transports components while a lower surface thereof is in contact with a transport hand and an upper surface thereof is in contact with a component for semiconductor manufacturing. The carrier includes a first vacuum hole formed through the upper surface, a second vacuum hole formed through the lower surface, and an air passage provided between the first vacuum hole and the second vacuum hole.

公开(公告)号：US20230409042A1

公开(公告)日：2023-12-21

申请号：US18099926

申请日：2023-01-21

Applicant: SEMES CO., LTD.

Inventor： Jung Woo KIM ,  Jong Won Jung ,  Yoon Je Oh ,  Hyo Joo Jeoun

IPC: G05D1/02 ,  B65G43/00

CPC classification number: G05D1/0274 ,  G05D1/0248 ,  G05D1/0214 ,  G05D1/0238 ,  B65G43/00 ,  B65G2203/0283 ,  B65G2203/044 ,  B65G2203/045

Abstract: A rail environment monitoring device using a traveling vehicle, the rail environment monitoring device includes a sensing unit connected to a traveling vehicle transporting a conveyed object along a travel rail, the sensing unit configured to sense a travel rail positioned on a path of travel of the traveling vehicle and a travel rail peripheral portion, and a map production unit configured to generate a map for the travel rail or the travel rail peripheral portion using data acquired by the sensing unit according to the path of travel of the traveling vehicle.

公开(公告)号：US20230407177A1

公开(公告)日：2023-12-21

申请号：US18332233

申请日：2023-06-09

Applicant: SEMES CO., LTD.

Inventor： Kyungseok MIN ,  Hyunjong SHIM ,  Sangmin MUN ,  Sunjoo PARK ,  Hwan JUNG ,  Nayeon LEE

IPC: C09K13/00

CPC classification number: C09K13/00

Abstract: An etching gas composition includes at least two C3 or C4 organic fluorine compounds and molybdenum fluoride, and the at least two C3 or C4 organic fluorine compounds are isomers.

公开(公告)号：US20230400097A1

公开(公告)日：2023-12-14

申请号：US18099942

申请日：2023-01-21

Applicant: SEMES CO., LTD.

Inventor： Sung Hun EOM ,  Nam Ki HONG

IPC: F16J1/09 ,  F16J1/08 ,  F16J9/12

CPC classification number: F16J1/09 ,  F16J9/12 ,  F16J1/08

Abstract: The present disclosure is to provide a piston assembly in which a particle does not leak out of a cylinder, and including, in an embodiment, a piston body; a piston rod connected to the piston body; a first groove formed in an outer surface of the piston body; and a particle discharge flow path extending from an internal space of the piston body to the outer surface of the piston body.

公开(公告)号：US11840089B2

公开(公告)日：2023-12-12

申请号：US17394803

申请日：2021-08-05

Applicant: SEMES CO., LTD.

Inventor： Jae Hyun You ,  Hun Sub Lim

IPC: B41J2/165

CPC classification number: B41J2/16552 ,  B41J2/1652 ,  B41J2002/16558

Abstract: An inkjet head cleaning device includes a body; an ejection part formed in the body, and configured to eject a cleaning liquid to a nozzle surface of a head; and a suction part formed in the body, and configured to suck the cleaning liquid ejected from the ejection part and used for cleaning the nozzle surface of the head, and foreign substances separated from the nozzle surface of the head; and the ejection part includes a vertical passage through which the cleaning liquid flows and a discharge end at the end of the vertical passage and configured to guide the cleaning liquid to eject toward the suction part.

公开(公告)号：US20230382660A1

公开(公告)日：2023-11-30

申请号：US18323709

申请日：2023-05-25

Applicant: SEMES CO., LTD.

Inventor： Ji Keun SONG ,  Yoon Whoi KIm

IPC: B65G47/90

CPC classification number: B65G47/905

Abstract: An apparatus for mounting a component includes an articulated robot mounting a component on a replacement target where the component is provided at a mounting position, a first sensor unit provided in the articulated robot and sensing the mounting position or whether or not the component is provided, a second sensor unit provided in the articulated robot and sensing spaced distances between the articulated robot and the mounting position at a plurality of points, and a control unit controlling the articulated robot to mount the component on the replacement target and controlling a position of the articulated robot so that a difference between spaced distance values between the articulated robot and the plurality of points sensed by the second sensor unit converges to zero, when the component is not sensed or a surface of the mounting position is sensed by the first sensor unit.

公开(公告)号：US11829070B2

公开(公告)日：2023-11-28

申请号：US17557230

申请日：2021-12-21

Applicant: SEMES CO., LTD.

Inventor： Ju Won Kim ,  Jun Ho Seo ,  Dong Woon Park ,  Sang Pil Yoon

IPC: G03F7/16 ,  B05C11/02

CPC classification number: G03F7/162 ,  B05C11/02

Abstract: An apparatus for treating a substrate, the apparatus comprising: a treating container having an inner space; a support unit supporting and rotating the substrate in the inner space; and an exhaust unit exhausting an air flow in the inner space, wherein the treating container includes an outer cup providing the inner space; and an inner cup disposed at the inner space and spaced apart from the outer cup, and wherein the outer cup has a protrusion at a side wall thereof.