公开(公告)号：US20080178803A1

公开(公告)日：2008-07-31

申请号：US11733913

申请日：2007-04-11

Applicant: KENNETH S. COLLINS ,  Hiroji Hanawa ,  Kartik Ramaswamy ,  Douglas A. Buchberger ,  Shahid Rauf ,  Kallol Bera ,  Lawrence Wong ,  Walter R. Merry ,  Matthew L. Miller ,  Steven C. Shannon ,  Andrew Nguyen ,  James P. Cruse ,  James Carducci ,  Troy S. Detrick ,  Subhash Deshmukh ,  Jennifer Y. Sun

Inventor： KENNETH S. COLLINS ,  Hiroji Hanawa ,  Kartik Ramaswamy ,  Douglas A. Buchberger ,  Shahid Rauf ,  Kallol Bera ,  Lawrence Wong ,  Walter R. Merry ,  Matthew L. Miller ,  Steven C. Shannon ,  Andrew Nguyen ,  James P. Cruse ,  James Carducci ,  Troy S. Detrick ,  Subhash Deshmukh ,  Jennifer Y. Sun

IPC: B05C11/00

CPC classification number: H01J37/32174 ,  H01J37/32091 ,  H01J37/32165 ,  H01J37/32935

Abstract: A plasma reactor includes a ceiling electrode facing a workpiece support pedestal and a pedestal electrode in the pedestal and first and second VHF power sources of different frequencies coupled to the same or to different ones of the ceiling electrode and the pedestal electrode. The first and second VHF power sources are of sufficiently high and sufficiently low frequencies, respectively, to produce center-high and center-low plasma distribution non-uniformities, respectively, in the chamber. The reactor further includes a controller programmed to change the relative output power levels of the first and second VHF power sources to: (a) increase the relative output power level of the first VHF power source whenever plasma ion distribution has a predominantly edge-high non-uniformity, and (b) increase the relative output power level of the second VHF power source whenever plasma ion distribution has a predominantly center-high non-uniformity.

Abstract translation: 等离子体反应器包括面对工件支撑基座的顶板电极和基座中的基座电极以及耦合到天花板电极和基座电极中相同或不同的不同频率的第一和第二VHF电源。 第一和第二VHF电源分别具有足够高和足够低的频率，以分别在腔室中产生中心高和中心低等离子体分布不均匀性。 电抗器还包括被编程为将第一和第二VHF电源的相对输出功率电平改变为：（a）只要等离子体离子分布具有主要为边缘高的非高电平的第一VHF电源的相对输出功率电平， （b）当等离子体离子分布主要是中心高的不均匀性时，增加第二VHF电源的相对输出功率电平。

公开(公告)号：US20070294043A1

公开(公告)日：2007-12-20

申请号：US11617802

申请日：2006-12-29

Applicant: STEVEN C. SHANNON ,  Daniel J. Hoffman ,  Jeremiah T.P. Pender ,  Tarreg Mawari

Inventor： STEVEN C. SHANNON ,  Daniel J. Hoffman ,  Jeremiah T.P. Pender ,  Tarreg Mawari

IPC: G06F19/00

CPC classification number: H05H1/0081 ,  H01J37/32174 ,  H01J37/32935 ,  H01L21/67005

Abstract: Methods for determining characteristics of a plasma are provided. In one embodiment, a method for determining characteristics of a plasma includes obtaining metrics of a plasma at two different frequencies, and determining at least one characteristic of the plasma utilizing the metrics. In another embodiment, a method for determining characteristics of a plasma includes obtaining metrics of current and voltage information for first and second waveforms coupled to a plasma at different frequencies, determining at least one characteristic of the plasma using the metrics obtained from each different frequency waveform. In another embodiment, the method includes providing a plasma impedance model of a plasma as a function of frequency, and determining at least one characteristic of a plasma using model.

Abstract translation: 提供了确定等离子体特性的方法。 在一个实施例中，用于确定等离子体特性的方法包括以两个不同的频率获得等离子体的度量，以及使用该度量来确定等离子体的至少一个特性。 在另一个实施例中，一种用于确定等离子体特性的方法包括获得与不同频率耦合到等离子体的第一波形和第二波形的电流和电压信息的度量，使用从每个不同频率波形获得的度量来确定等离子体的至少一个特性 。 在另一个实施例中，该方法包括提供作为频率的函数的等离子体的等离子体阻抗模型，以及使用模型确定等离子体的至少一个特性。

公开(公告)号：US07812278B2

公开(公告)日：2010-10-12

申请号：US11778055

申请日：2007-07-15

Applicant: Steven C. Shannon

Inventor： Steven C. Shannon

IPC: B23K10/00

CPC classification number: H01P5/08

Abstract: In one implementation, a method is provided for testing a plasma reactor multi-frequency matching network comprised of multiple matching networks, each of the multiple matching networks having an associated RF power source and being tunable within a tunespace. The method includes providing a multi-frequency dynamic dummy load having a frequency response within the tunespace of each of the multiple matching networks at an operating frequency of its associated RF power source. The method further includes characterizing a performance of the multi-frequency matching network based on a response of the multi-frequency matching network while simultaneously operating at multiple frequencies.

Abstract translation: 在一个实现中，提供了一种用于测试由多个匹配网络组成的等离子体反应器多频匹配网络的方法，所述多个匹配网络中的每一个具有相关联的RF功率源并且可在调谐空间内调节。 该方法包括在其相关RF功率源的工作频率下提供在多个匹配网络中的每一个的调谐空间内具有频率响应的多频动态虚拟负载。 该方法还包括基于多频匹配网络的响应来表征多频匹配网络的性能，同时在多个频率下操作。

公开(公告)号：US07754997B2

公开(公告)日：2010-07-13

申请号：US11924086

申请日：2007-10-25

Applicant: Kallol Bera ,  Yan Ye ,  James D. Carducci ,  Daniel J. Hoffman ,  Steven C. Shannon ,  Douglas A. Buchberger, Jr.

Inventor： Kallol Bera ,  Yan Ye ,  James D. Carducci ,  Daniel J. Hoffman ,  Steven C. Shannon ,  Douglas A. Buchberger, Jr.

IPC: B23K9/00

CPC classification number: H01J37/321 ,  H01J37/32633 ,  H01J37/3266

Abstract: An apparatus configured to confine a plasma within a processing region in a plasma processing chamber. In one embodiment, the apparatus includes a ring that has a baffle having a plurality of slots and a plurality of fingers. Each slot is configured to have a width less than the thickness of a plasma sheath contained in the processing region.

Abstract translation: 一种被配置为将等离子体限制在等离子体处理室中的处理区域内的装置。 在一个实施例中，该装置包括具有挡板的环，该挡板具有多个槽和多个指状物。 每个槽被构造成具有小于包含在处理区域中的等离子体护套的厚度的宽度。

公开(公告)号：US20090294062A1

公开(公告)日：2009-12-03

申请号：US12128963

申请日：2008-05-29

Applicant: Steven C. Shannon ,  Kartik Ramaswamy ,  Daniel J. Hoffman ,  Matthew L. Miller ,  Kenneth S. Collins

Inventor： Steven C. Shannon ,  Kartik Ramaswamy ,  Daniel J. Hoffman ,  Matthew L. Miller ,  Kenneth S. Collins

IPC: C23C16/505 ,  C23F1/02

CPC classification number: H01J37/32935 ,  H01J37/32091 ,  H01J37/32183

Abstract: In a plasma reactor employing source and bias RF power generators, plasma is stabilized against an engineered transient in the output of either the source or bias power generator by a compensating modulation in the other generator.

Abstract translation: 在采用源和偏压射频功率发生器的等离子体反应器中，等离子体通过在另一发生器中的补偿调制而在源极或偏置功率发生器的输出中的设计瞬态稳定。

公开(公告)号：US07585384B2

公开(公告)日：2009-09-08

申请号：US12201156

申请日：2008-08-29

Applicant: Kallol Bera ,  Yan Ye ,  James D. Carducci ,  Daniel J. Hoffman ,  Steven C. Shannon ,  Douglas A. Buchberger, Jr.

Inventor： Kallol Bera ,  Yan Ye ,  James D. Carducci ,  Daniel J. Hoffman ,  Steven C. Shannon ,  Douglas A. Buchberger, Jr.

IPC: C23C1/00 ,  H01L21/306 ,  C23C16/00

CPC classification number: H01J37/321 ,  H01J37/32633 ,  H01J37/3266

Abstract: An apparatus configured to confine a plasma within a processing region in a plasma processing chamber. In one embodiment, the apparatus includes a ring that has a baffle having a plurality of slots and a plurality of fingers. Each slot is configured to have a width less than the thickness of a plasma sheath contained in the processing region.

Abstract translation: 一种被配置为将等离子体限制在等离子体处理室中的处理区域内的装置。 在一个实施例中，该装置包括具有挡板的环，该挡板具有多个槽和多个指状物。 每个槽被构造成具有小于包含在处理区域中的等离子体护套的厚度的宽度。

公开(公告)号：US20090097185A1

公开(公告)日：2009-04-16

申请号：US11974502

申请日：2007-10-11

Applicant: Steven C. Shannon ,  Michael G. Chafin ,  Dennis S. Grimard

Inventor： Steven C. Shannon ,  Michael G. Chafin ,  Dennis S. Grimard

IPC: H02N13/00

CPC classification number: H02N13/00 ,  H01J37/32091 ,  H01J37/32174 ,  H01L21/6833 ,  H01L21/68742

Abstract: An electrostatic chuck in a reactor chamber has a cathode electrode insulated from ground, a chucking electrode insulated from the cathode electrode and a dielectric layer overlying the chucking electrode that provides a workpiece support surface. A D.C. chucking voltage supply is coupled to the chucking electrode. An RF power generator is coupled to the cathode electrode. A voltage sensing apparatus is coupled to the chucking electrode and to the cathode electrode to monitor the voltage difference between them during discharge after removal of RF and DC power at the conclusion of processing. The reactor includes a controller programmed to raise the lift pins during electrode discharge as soon as the voltage sensing apparatus detects equal voltages simultaneously on the chucking and cathode electrodes.

Abstract translation: 反应器室中的静电卡盘具有与地绝缘的阴极电极，与阴极绝缘的夹持电极和覆盖夹持电极的提供工件支撑表面的电介质层。 夹紧电压供应装置连接到夹持电极。 RF发生器耦合到阴极电极。 电压感测装置耦合到夹持电极和阴极电极，以在处理结束时去除RF和DC电力之后，在放电期间监测它们之间的电压差。 电抗器包括一个控制器，其被编程为一旦电压感测装置同时在夹紧和阴极电极上检测相同的电压，就可以在电极放电期间升高升降管脚。

公开(公告)号：US20090025878A1

公开(公告)日：2009-01-29

申请号：US11828568

申请日：2007-07-26

Applicant: Shahid Rauf ,  Kenneth S. Collins ,  Kallol Bera ,  Kartik Ramaswamy ,  Andrew Nguyen ,  Steven C. Shannon ,  Lawrence Wong ,  Satoru Kobayashi ,  Troy S. Detrick ,  James P. Cruse

Inventor： Shahid Rauf ,  Kenneth S. Collins ,  Kallol Bera ,  Kartik Ramaswamy ,  Andrew Nguyen ,  Steven C. Shannon ,  Lawrence Wong ,  Satoru Kobayashi ,  Troy S. Detrick ,  James P. Cruse

IPC: H01L21/306

CPC classification number: H01J37/16 ,  H01J37/20 ,  H01J37/32082 ,  H01J37/32623 ,  H01J37/32697 ,  H01J37/32834

Abstract: RF ground return current flow is diverted away from asymmetrical features of the reactor chamber by providing bypass current flow paths. One bypass current flow path avoids the pumping port in the chamber floor, and comprises a conductive symmetrical grill extending from the side wall to the grounded pedestal base. Another bypass current flow path avoids the wafer slit valve, and comprises an array of conductive straps bridging the section of the sidewall occupied by the slit valve.

Abstract translation: 通过提供旁路电流流动路径，RF接地回流电流从反应室的不对称特征转向。 一个旁路电流流动路径避免了室底部中的泵送端口，并且包括从侧壁延伸到接地基座的导电对称格栅。 另一个旁路电流流动路径避免了晶片狭缝阀，并且包括桥接由狭缝阀占据的侧壁部分的导电带阵列。

公开(公告)号：US20080276958A1

公开(公告)日：2008-11-13

申请号：US11745451

申请日：2007-05-08

Applicant: Vineet Mehta ,  Karl Brown ,  John A. Pipitone ,  Daniel J. Hoffman ,  Steven C. Shannon ,  Keith A. Miller ,  Vijay D. Parkhe

Inventor： Vineet Mehta ,  Karl Brown ,  John A. Pipitone ,  Daniel J. Hoffman ,  Steven C. Shannon ,  Keith A. Miller ,  Vijay D. Parkhe

IPC: C25F3/12 ,  C25F7/00

CPC classification number: B08B7/0035 ,  C25F7/00 ,  H01J37/32009 ,  H01J37/32541 ,  H01L21/02046 ,  H01L21/0206

Abstract: A substrate cleaning chamber includes a contoured ceiling electrode having an arcuate surface that faces a substrate support and has a variable cross-sectional thickness to vary the gap size between the arcuate surface and the substrate support to provide a varying plasma density across the substrate support. A dielectric ring for the cleaning chamber comprises a base, a ridge, and a radially inward ledge that covers the peripheral lip of the substrate support. A base shield comprises a circular disc having at least one perimeter wall. Cleaning and conditioning processes for the cleaning chamber are also described.

Abstract translation: 衬底清洁室包括具有面向衬底支撑件的弓形表面的轮廓天花板电极，并且具有可变的横截面厚度以改变弧形表面和衬底支撑件之间的间隙尺寸，以在衬底支撑件上提供变化的等离子体密度。 用于清洁室的介电环包括覆盖基板支撑件的周缘的基部，脊和径向向内的凸缘。 底座包括具有至少一个周边壁的圆盘。 还描述了清洁室的清洁和调节过程。

公开(公告)号：US07440859B2

公开(公告)日：2008-10-21

申请号：US11617802

申请日：2006-12-29

Applicant: Steven C. Shannon ,  Daniel J. Hoffman ,  Jeremiah T. P. Pender ,  Tarreg Mawari

Inventor： Steven C. Shannon ,  Daniel J. Hoffman ,  Jeremiah T. P. Pender ,  Tarreg Mawari

IPC: G01R23/16

CPC classification number: H05H1/0081 ,  H01J37/32174 ,  H01J37/32935 ,  H01L21/67005

Abstract: Methods for determining characteristics of a plasma are provided. In one embodiment, a method for determining characteristics of a plasma includes obtaining metrics of a plasma at two different frequencies, and determining at least one characteristic of the plasma utilizing the metrics. In another embodiment, a method for determining characteristics of a plasma includes obtaining metrics of current and voltage information for first and second waveforms coupled to a plasma at different frequencies, determining at least one characteristic of the plasma using the metrics obtained from each different frequency waveform. In another embodiment, the method includes providing a plasma impedance model of a plasma as a function of frequency, and determining at least one characteristic of a plasma using model.

Abstract translation: 提供了确定等离子体特性的方法。 在一个实施例中，用于确定等离子体特性的方法包括以两个不同的频率获得等离子体的度量，以及使用该度量来确定等离子体的至少一个特性。 在另一个实施例中，一种用于确定等离子体特性的方法包括获得与不同频率耦合到等离子体的第一波形和第二波形的电流和电压信息的度量，使用从每个不同频率波形获得的度量来确定等离子体的至少一个特性 。 在另一个实施例中，该方法包括提供作为频率的函数的等离子体的等离子体阻抗模型，以及使用模型确定等离子体的至少一个特性。