-
公开(公告)号：US10324384B2
公开(公告)日：2019-06-18
申请号：US15320300
申请日：2015-06-04
Applicant: ASML NETHERLANDS B.V.
Inventor： Gerben Pieterse , Theodorus Wilhelmus Polet , Johannes Jacobus Matheus Baselmans , Willem Jan Bouman , Theodorus Marinus Modderman , Cornelius Maria Rops , Bart Smeets , Koen Steffens , Ronald Van Der Ham
IPC: G03F7/20
Abstract: An immersion lithographic apparatus including: a liquid confinement structure configured to supply and confine immersion liquid to an immersion space between a final lens element of a projection system and a surface of the substrate and/or of a substrate table; and a passageway-former between the projection system and the liquid confinement structure, and a passageway between the passageway-former and an optically active part of the final lens element, the passageway being in liquid communication via an opening with the immersion space and extending radially outwardly, with respect to an optical axis of the projection system, at least to an edge of an exposed bottom surface of the final lens element and being constructed and configured such that in use it is filled with liquid from the immersion space by capillary action.
-
公开(公告)号：US10146142B2
公开(公告)日：2018-12-04
申请号：US15419769
申请日：2017-01-30
Applicant: ASML NETHERLANDS B.V.
Inventor： Erik Roelof Loopstra , Johannes Jacobus Matheus Baselmans , Marcel Mathijs Theodore Marie Dierichs , Johannes Christiaan Maria Jasper , Matthew Lipson , Hendricus Johannes Maria Meijer , Uwe Mickan , Johannes Catharinus Hubertus Mulkens , Tammo Uitterdijk
Abstract: A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.
-
公开(公告)号：US20180246418A1
公开(公告)日：2018-08-30
申请号：US15969847
申请日：2018-05-03
Applicant: ASML NETHERLANDS B.V.
Inventor： Aleksey Yurievich Kolesnychenko , Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Felix Godfried Peter Peeters , Bob Streefkerk , Franciscus Johannes Herman Maria Teunissen , Helmar Van Santen
IPC: G03F7/20
CPC classification number: G03F7/70341 , G03F7/70733 , G03F7/70866 , G03F7/70908
Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.
-
公开(公告)号：US09989861B2
公开(公告)日：2018-06-05
申请号：US15823188
申请日：2017-11-27
Applicant: ASML NETHERLANDS B.V.
Inventor： Aleksey Yurievich Kolesnychenko , Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Felix Godfried Peter Peeters , Bob Streefkerk , Franciscus Johannes Herman Maria Teunissen , Helmar Van Santen
IPC: G03F7/20
CPC classification number: G03F7/70341 , G03F7/70733 , G03F7/70866 , G03F7/70908
Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.
-
公开(公告)号：US09817320B2
公开(公告)日：2017-11-14
申请号：US15032245
申请日：2014-10-02
Applicant: ASML Netherlands B.V.
Inventor： Jaqueline Borges Nicolau , Hannah Noble , Johannes Jacobus Matheus Baselmans , Bart Smeets , Paulus Jacobus Maria Van Adrichem
CPC classification number: G03F7/70425 , G03F7/2026 , G03F7/70258 , G03F7/70433 , G03F7/705 , G03F7/70566 , G03F7/706 , G06T5/00
Abstract: A method of correcting an optical image formed by an optical system, the method including obtaining a map indicative of a polarization dependent property of the optical system across a pupil plane of the optical system for each spatial position in an image plane of the optical system, combining the map indicative of the polarization dependent property of the optical system with a radiation map of the intensity and polarization of an input radiation beam to form an image map, and using the image map to correct an optical image formed by directing the input radiation beam through the optical system.
-
Patent Agency Ranking
公开(公告)号：US09778575B2
公开(公告)日：2017-10-03
申请号：US14988944
申请日：2016-01-06
Applicant: ASML NETHERLANDS B.V.
Inventor： Heine Melle Mulder , Johannes Jacobus Matheus Baselmans , Adrianus Franciscus Petrus Engelen , Markus Franciscus Antonius Eurlings , Hendrikus Robertus Marie Van Greevenbroek , Paul Van Der Veen , Patricius Aloysius Jacobus Tinnemans , Wilfred Edward Endendijk
CPC classification number: G03F7/70058 , G03F7/70116 , G03F7/702 , G03F7/70216
Abstract: A device manufacturing method includes conditioning a beam of radiation using an illumination system. The conditioning includes controlling an array of individually controllable elements and associated optical components of the illumination system to convert the radiation beam into a desired illumination mode, the controlling including allocating different individually controllable elements to different parts of the illumination mode in accordance with an allocation scheme, the allocation scheme selected to provide a desired modification of one or more properties of the illumination mode, the radiation beam or both. The method also includes patterning the radiation beam having the desired illumination mode with a pattern in its cross-section to form a patterned beam of radiation, and projecting the patterned radiation beam onto a target portion of a substrate.
-
公开(公告)号：US09703210B2
公开(公告)日：2017-07-11
申请号：US14584826
申请日：2014-12-29
Applicant: ASML NETHERLANDS B.V.
Inventor： Hans Jansen , Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Marco Koert Stavenga , Bob Streefkerk , Jan Cornelis Van Der Hoeven , Cedric Desire Grouwstra
CPC classification number: G03F7/70341 , G03F7/70925
Abstract: A method and apparatus for cleaning the inside of an immersion lithographic apparatus is disclosed. In particular, a liquid supply system of the lithographic apparatus may be used to introduce a cleaning fluid into a space between the projection system and the substrate table of the lithographic apparatus. Additionally or alternatively, a cleaning device may be provided on the substrate table and an ultrasonic emitter may be provided to create an ultrasonic cleaning liquid.
-
公开(公告)号：US09477160B2
公开(公告)日：2016-10-25
申请号：US14624167
申请日：2015-02-17
Applicant: ASML NETHERLANDS B.V.
Inventor： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Henrikus Herman Marie Cox , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Johannes Catharinus Hubertus Mulkens , Gerardus Petrus Matthijs Van Nunen , Klaus Simon , Bernardus Antonius Slaghekke , Alexander Straaijer , Jan-Gerard Cornelis Van Der Toorn , Martijn Houkes
CPC classification number: G03F7/70341 , G03F7/70425 , G03F7/70525 , G03F7/709
Abstract: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.
-
公开(公告)号：US09304411B2
公开(公告)日：2016-04-05
申请号：US13767774
申请日：2013-02-14
Applicant: ASML Netherlands B.V.
IPC: G03F7/20
CPC classification number: G03F7/705 , G03F7/70058 , G03F7/70141 , G03F7/706 , G03F7/70891
Abstract: A method of patterning substrates using a lithographic apparatus. The method comprising providing a beam of radiation using an illumination system, using a patterning device to impart the radiation beam with a pattern in its cross-section, and using a projection system to project the patterned radiation beam onto target portions of a lot of substrates, wherein the method further comprises performing a radiation beam aberration measurement after projecting the patterned radiation beam onto a subset of the lot of substrates, performing an adjustment of the projection system using the results of the radiation beam aberration measurement, then projecting the patterned radiation beam onto a further subset of the lot of substrates.
Abstract translation: 使用光刻设备对衬底进行图案化的方法。 该方法包括使用照明系统提供辐射束，使用图案形成装置将辐射束赋予其横截面中的图案，以及使用投影系统将图案化的辐射束投影到许多基底的目标部分上 其中所述方法还包括在将所述图案化的辐射束投影到所述许多衬底的子集之后执行辐射束像差测量，使用所述辐射束像差测量的结果执行所述投影系统的调整，然后将所述图案化的辐射束 进入许多底物的另一个子集。
-
公开(公告)号：US09261402B2
公开(公告)日：2016-02-16
申请号：US13849333
申请日：2013-03-22
Applicant: ASML Netherlands B.V.
Inventor： Johannes Jacobus Matheus Baselmans
CPC classification number: G01J1/42 , G03F7/70591 , G03F7/7085 , G03F7/70941
Abstract: A method and apparatus are provided for determining apodization properties of a projection system in a lithographic apparatus. The method comprises allowing light from a given point in an illumination field to pass through the projection system along at least three different optical paths, and then determining the difference in the intensity of light received in a projection field from the two different optical paths, and calculating apodization properties of the projection system from the intensity difference. It is not necessary to know the intensity distribution in the illumination field. To provide the different optical paths a pinhole reticle provided with wedges of different orientations is used.
Abstract translation: 提供了一种用于确定光刻设备中的投影系统的变迹特性的方法和装置。 该方法包括允许来自照明场中的给定点的光沿着至少三个不同的光路穿过投影系统，然后确定在来自两个不同光路的投影场中接收的光的强度差，以及 从强度差计算投影系统的变迹特性。 不需要知道照明场中的强度分布。 为了提供不同的光路，使用具有不同取向楔形的针孔掩模版。
-
-
-
-
-
-
-
-
-
Search Results
62
records
(took 0.026 seconds)
