摘要:
A semiconductor device having a random grained polysilicon layer and a method for its manufacture are provided. In one example, the device includes a semiconductor substrate and an insulator layer on the substrate. A first polysilicon layer having a random grained structure is positioned above the insulator layer, a semiconductor alloy layer is positioned above the first polysilicon layer, and a second polysilicon layer is positioned above the semiconductor alloy layer.
摘要:
A gas supply device, including: a first source of an inert carrier gas, communicated with a first pipeline; a second source of anhydrous reactive gas, communicated with a second pipeline; a third source of enabling chemical gas of an enabling chemical compound, communicated with a third pipeline; a main pipeline, communicated with the first, second, and third pipelines; and a temperature controller, located on the second pipeline.
摘要:
A method includes measuring a gate leakage current of at least one transistor. A single stress bias voltage is applied to the at least one transistor at a given temperature for a stress period t. The stress bias voltage causes a 10% degradation in a drive current of the transistor at the given temperature within the stress period t. A negative bias temperature instability (NBTI) lifetime τ of the transistor is estimated based on the measured gate leakage current and a relationship between drive current degradation and time observed during the applying step.
摘要:
A PMOS device less affected by negative bias time instability (NBTI) and a method for forming the same are provided. The PMOS device includes a barrier layer over at least a portion of a gate structure, a gate spacer, and source/drain regions of a PMOS device. A stressed layer is then formed over the barrier layer. The barrier layer is preferably an oxide layer and is preferably not formed for NMOS devices.
摘要:
The present disclosure provides a method is provided for fabricating a metal oxide semiconductor (MOS) gate stack on a semiconductor substrate. The method includes generating moisture on a surface of the semiconductor substrate to form an oxide layer less than 10 nanometers thin and performing a nitridation process on the thin oxide layer. After the nitridation process, the method includes performing a polysilicon deposition process on the surface of the semiconductor substrate, doping the polysilicon deposition to a level of 5×1015 at/cm3, and cleaning the doped polysilicon with a light ammonia solution.
摘要翻译:本公开提供了一种用于在半导体衬底上制造金属氧化物半导体(MOS)栅极堆叠的方法。 该方法包括在半导体衬底的表面上产生湿气以形成小于10纳米薄的氧化物层,并对薄氧化物层进行氮化处理。 在氮化处理之后,该方法包括在半导体衬底的表面上执行多晶硅沉积工艺,将多晶硅沉积掺杂至5×10 15 at / cm 3的水平,并用轻氨溶液清洗掺杂的多晶硅。
摘要:
A stacked and integrated electric power generating device for capturing multiple light sources for power generation has a first concentrating photovoltaic module and a second concentrating photovoltaic module. The first concentrating photovoltaic module 10 has a transparent solar concentrating panel and a thin film solar cell. The second concentrating photovoltaic module is positioned below the first concentrating photovoltaic module with an interval, such that the first and second concentrating photovoltaic modules are in the form of a stacked and integrated structure, and the second concentrating photovoltaic module can absorb the light concentrated by the transparent solar concentrating panel to generate electric power.
摘要:
A capacitor and methods for forming the same are provided. The method includes forming a bottom electrode; treating the bottom electrode in an oxygen-containing environment to convert a top layer of the bottom electrode into a buffer layer; forming an insulating layer on the buffer layer; and forming a top electrode over the insulating layer.
摘要:
A steering wheel locking device includes a lock rod, a lock base, a locking device and a fixing unit. The lock rod has a chamber, two pairs of first holes longitudinally aligned, a lock hole and a saddle. The lock base comprises a lock core to be inserted into the lock base through the lock hole. The top of the lock core is provided with a latch. The locking device has a pair of second holes in register with the pairs of first holes of the lock rod, and is engageable with the latch and moveable transversely along the lock rod between a locked position and an unlocked position. The fixing unit comprises a pair of fixing rods in register with the pairs of first holes of the lock rod and the pair of second holes of the locking device. The fixing rods are moveable longitudinally through the pairs of first holes and the pair of second holes to lock or unlock the locking device.
摘要:
Within a method for forming a silicon layer, there is employed at least one sub-layer formed of a higher crystalline silicon material and at least one sub-layer formed of a lower crystalline silicon material. The lower crystalline silicon material is formed employing a hydrogen treatment of the higher crystalline silicon material. The method is particularly useful for forming polysilicon based gate electrodes with enhanced dimensional control and enhanced performance.