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64 条记录 (耗时 0.022 秒)

    Multi-axis magnetic lens for focusing a plurality of charged particle beams
    42.
    发明授权
    Multi-axis magnetic lens for focusing a plurality of charged particle beams 有权
    用于聚焦多个带电粒子束的多轴磁性透镜

    公开(公告)号：US09202658B2

    公开(公告)日：2015-12-01

    申请号：US14572052

    申请日：2014-12-16

    申请人： Hermes-Microvision, Inc.

    发明人： Zhongwei Chen ,  Weiming Ren ,  Xuerang Hu ,  Xuedong Liu

    IPC分类号： H01J1/50 ,  H01J3/20

    CPC分类号： H01J3/20 ,  H01J37/141 ,  H01J37/143 ,  H01J2237/1405 ,  Y10T29/49075

    摘要： A multi-axis magnetic lens with stable performance in focusing a plurality of charged particle beams is provided. The multi-axis magnetic lens comprises a plurality of magnetic dub-lens modules. On the one hand, the multi-axis magnetic lens employs an annular permanent-magnet unit to provide a basic and stable magnetic flux to the plurality of magnetic sub-lens modules. One the other hand, the multi-axis magnetic lens uses a plurality of subsidiary coils to provide additional and adjustable magnetic flux to the plurality of magnetic sub-lens modules respectively. The invention also proposes a method to turn off or adjust the basic and stable magnetic flux for some applications. Hence, this invention will benefit the applications which need to execute in a long time period while keeping a high stabilization in performance.

    摘要翻译： 提供了一种在聚焦多个带电粒子束时具有稳定性能的多轴磁性透镜。 多轴磁性透镜包括多个磁性复数透镜模块。 一方面，多轴磁性透镜采用环形永磁体单元，以向多个磁性子透镜模块提供基本稳定的磁通量。 另一方面，多轴磁性透镜使用多个辅助线圈来分别向多个磁性子透镜模块提供附加和可调节的磁通量。 本发明还提出了在一些应用中关闭或调节基本和稳定磁通的方法。 因此，本发明将有益于需要在长时间内执行的应用，同时保持高性能稳定性。

    Charged Particle Beam Apparatus
    44.
    发明申请
    Charged Particle Beam Apparatus 有权
    带电粒子束装置

    公开(公告)号：US20150144788A1

    公开(公告)日：2015-05-28

    申请号：US14564921

    申请日：2014-12-09

    申请人： Hermes Microvision Inc.

    发明人： Zhongwei Chen ,  Jack Jau ,  Weiming Ren ,  Chiyan Kuan ,  Yixiang Wang ,  Xiaoli Guo ,  Feng Cao

    IPC分类号： H01J37/26 ,  H01J37/22 ,  H01J37/28

    CPC分类号： H01J37/261 ,  H01J37/226 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/063 ,  H01J2237/10 ,  H01J2237/24475 ,  H01J2237/24495 ,  H01J2237/24528 ,  H01J2237/2801 ,  H01J2237/2804 ,  H01J2237/2806 ,  H01J2237/2814

    摘要： The present invention provides a dual-beam apparatus which employs the dark-field e-beam inspection method to inspect small particles on a surface of a sample such as wafer and mask with high throughput. The dual beam apparatus comprises two single-beam dark-field units placed in a same vacuum chamber and in two different orientations. The two single-beam dark-field units can perform the particle inspection separately or almost simultaneously by means of the alternately-scanning way. The invention also proposes a triple-beam apparatus for both inspecting and reviewing particles on a sample surface within the same vacuum chamber. The triple-beam apparatus comprises one foregoing dual-beam apparatus performing the particle inspection and one high-resolution SEM performing the particle review.

    摘要翻译： 本发明提供一种双光束装置，其采用暗场电子束检查方法以高生产量检查诸如晶片和掩模的样品表面上的小颗粒。 双光束装置包括放置在相同真空室中并具有两个不同取向的两个单光束暗场单元。 两个单光束暗场单元可以通过交替扫描方式分别或几乎同时进行粒子检测。 本发明还提出了一种用于检查和检查在相同真空室内的样品表面上的颗粒的三光束装置。 三光束装置包括执行颗粒检查的一个前述双光束装置和执行颗粒检查的一个高分辨率SEM。

    Apparatus of plural charged-particle beams
    46.
    发明授权
    Apparatus of plural charged-particle beams 有权

    公开(公告)号：US10276347B2

    公开(公告)日：2019-04-30

    申请号：US16167429

    申请日：2018-10-22

    申请人： Hermes Microvision, Inc.

    发明人： Weiming Ren ,  Shuai Li ,  Xuedong Liu ,  Zhongwei Chen

    IPC分类号： H01J37/28 ,  H01J37/147 ,  H01J37/12

    摘要： A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit changes a single electron source into a virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means is on the upstream of the beamlet-limit means, and thereby generating less scattered electrons. The image-forming means not only forms the virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots.

    OBJECTIVE LENS SYSTEM FOR FAST SCANNING LARGE FOV
    47.
    发明申请
    OBJECTIVE LENS SYSTEM FOR FAST SCANNING LARGE FOV 审中-公开

    公开(公告)号：US20190096628A1

    公开(公告)日：2019-03-28

    申请号：US16018008

    申请日：2018-06-25

    申请人： Hermes Microvision, Inc.

    发明人： Shuai LI ,  Zhongwei Chen

    IPC分类号： H01J37/145 ,  H01J37/147 ,  H01J37/141

    摘要： The device includes a beam source for generating an electron beam, a beam guiding tube passed through an objective lens, an objective lens for generating a magnetic field in the vicinity of the specimen to focus the particles of the particle beam on the specimen, a control electrode having a potential for providing a retarding field to the particle beam near the specimen to reduce the energy of the particle beam when the beam collides with the specimen, a deflection system including a plurality of deflection units situated along the optical axis for deflecting the particle beam to allow scanning on the specimen with large area, at least one of the deflection units located in the retarding field of the beam, the remainder of the deflection units located within the central bore of the objective lens, and a detection unit to capture secondary electron (SE) and backscattered electrons (BSE).

    APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
    48.
    发明申请
    APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS 审中-公开

    公开(公告)号：US20190057837A1

    公开(公告)日：2019-02-21

    申请号：US16167429

    申请日：2018-10-22

    申请人： Hermes Microvision, Inc.

    发明人： Weiming REN ,  Shuai Li ,  Xuedong Liu ,  Zhongwei Chen

    IPC分类号： H01J37/28 ,  H01J37/147 ,  H01J37/12

    摘要： A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit changes a single electron source into a virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means is on the upstream of the beamlet-limit means, and thereby generating less scattered electrons. The image-forming means not only forms the virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots.