公开(公告)号：US11742177B2

公开(公告)日：2023-08-29

申请号：US17500627

申请日：2021-10-13

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Ayana Muraki ,  Tatsuya Asahata ,  Atsushi Uemoto

IPC: H01J37/304 ,  H01J37/22 ,  H01J37/28

CPC classification number: H01J37/3045 ,  H01J37/222 ,  H01J37/28 ,  H01J2237/30405

Abstract: Automated processing is provided. A charged particle beam apparatus includes: an image identity degree determination unit determining whether an identity degree is equal to or greater than a predetermined value, the identity degree indicating a degree of identity between a processing cross-section image that is an SEM image obtained through observation of a cross section of the sample by a scanning electron microscope, and a criterion image that is the processing cross-section image previously registered; and a post-determination processing unit performing a predetermined processing operation according to a result of the determination by the image identity degree determination unit.

公开(公告)号：US11424100B2

公开(公告)日：2022-08-23

申请号：US17027312

申请日：2020-09-21

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Takuma Aso ,  Xin Man ,  Makoto Sato ,  Tatsuya Asahata

IPC: H01J37/26 ,  H01J37/28 ,  H01J37/244 ,  G01N23/2251 ,  G01N23/2206 ,  G01N23/2258

Abstract: The charged particle beam irradiation apparatus includes: a focused ion beam column; an electron beam column; an electron detector; an image forming unit configured to form an observation image based on a signal output from the electron detector; and a control unit configured to repeatedly perform exposure control in which the focused ion beam column is controlled to expose a cross section of a multilayered sample toward a stacking direction with the focused ion beam, the control unit being configured to perform, every time exposure of an observation target layer at a cross section of the multilayered sample is detected in a process of repeatedly performing the exposure control, observation control in which the electron beam column is controlled to radiate the electron beam, and the image forming unit is controlled to form an observation image of the cross section of the multilayered sample.

公开(公告)号：US11177113B2

公开(公告)日：2021-11-16

申请号：US16820852

申请日：2020-03-17

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Ayana Muraki ,  Tatsuya Asahata ,  Atsushi Uemoto

IPC: H01J37/304 ,  H01J37/22 ,  H01J37/28

Abstract: Automated processing is provided. A charged particle beam apparatus includes: an image identity degree determination unit determining whether an identity degree is equal to or greater than a predetermined value, the identity degree indicating a degree of identity between a processing cross-section image that is an SEM image obtained through observation of a cross section of the sample by a scanning electron microscope, and a criterion image that is the processing cross-section image previously registered; and a post-determination processing unit performing a predetermined processing operation according to a result of the determination by the image identity degree determination unit.

公开(公告)号：US10204759B2

公开(公告)日：2019-02-12

申请号：US15696445

申请日：2017-09-06

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Tatsuya Asahata

IPC: H01J37/02 ,  H01J37/305 ,  H01J37/141 ,  H01J37/29 ,  H05H3/00

Abstract: A composite beam apparatus includes an electron beam column for irradiating an electron beam onto a sample, a focused ion beam column for irradiating a focused ion beam onto the sample to form a cross section, and a neutral particle beam column having an acceleration voltage set lower than that of the focused ion beam column for irradiating a neutral particle beam onto the sample to perform finish processing of the cross section. The electron beam column, the focused ion beam column, and the neutral particle beam column are arranged such that the beams of the columns cross each other at an irradiation point. A controller controls the electron beam column to irradiate and scan the electron beam on the sample during cross section processing by the focused ion beam column and during finish processing by the neutral particle beam column. The composite beam apparatus is capable of suppressing the influence of charge build-up, or electric field or magnetic field leakage from an electron beam column, when subjecting a sample to cross-section processing with a focused ion beam and then performing finishing processing with another beam.

公开(公告)号：US09966226B2

公开(公告)日：2018-05-08

申请号：US14728004

申请日：2015-06-02

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Atsushi Uemoto ,  Xin Man ,  Tatsuya Asahata

IPC: G01N23/225 ,  H01J37/304 ,  H01J37/26 ,  H01J37/30 ,  G01N23/22 ,  G01N23/04 ,  G01T1/36 ,  H01J37/28 ,  G01N1/32

CPC classification number: H01J37/265 ,  G01N1/32 ,  G01N23/04 ,  G01N23/2208 ,  G01N23/225 ,  G01N23/2251 ,  G01N23/2255 ,  G01T1/36 ,  H01J37/28 ,  H01J37/3005 ,  H01J37/304 ,  H01J37/3045 ,  H01J2237/2611 ,  H01J2237/28 ,  H01J2237/2807 ,  H01J2237/2812 ,  H01J2237/30472 ,  H01J2237/30483 ,  H01J2237/31745 ,  H01J2237/31749

Abstract: A cross-section processing and observation method performed by a cross-section processing and observation apparatus comprises a cross-section processing step of forming a cross-section by irradiating a sample with an ion beam; a cross-section observation step of obtaining an observation image of the cross-section by irradiating the cross-section with an electron beam; and repeating the cross-section processing step and the cross-section observation step so as to obtain observation images of a plurality of cross-sections. In a case where Energy Dispersive X-ray Spectrometry (EDS) measurement of the cross-section is performed and an X-ray of a specified material or of a non-specified material that is different from a pre-specified material is detected, an irradiation condition of the ion beam is changed so as to obtain observation images of a plurality of cross-sections of the specified material, and the cross-section processing and observation of the specified material is performed.

公开(公告)号：US09934938B2

公开(公告)日：2018-04-03

申请号：US14224164

申请日：2014-03-25

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Atsushi Uemoto ,  Xin Man ,  Tatsuya Asahata

IPC: H01J37/04 ,  H01J37/28 ,  H01J37/22 ,  G01N23/225

CPC classification number: H01J37/28 ,  G01N23/2255 ,  G01N2223/045 ,  H01J37/222 ,  H01J2237/226 ,  H01J2237/24585 ,  H01J2237/2804 ,  H01J2237/2806 ,  H01J2237/2807

Abstract: A focused ion beam apparatus includes a focused ion beam irradiation mechanism that forms first and second cross-sections in a sample. A first image generation unit generates respective first images, either reflected electron images or secondary electron images, of the first and second cross-sections, and a second image generation unit generates a second image that is an EDS image of the first cross-section. A control section generates a three-dimensional image of a specific composition present in the sample based on the first images and the second image.

公开(公告)号：US09218939B2

公开(公告)日：2015-12-22

申请号：US14221548

申请日：2014-03-21

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Tatsuya Asahata ,  Shota Torikawa

IPC: H01J37/00 ,  H01J37/305 ,  H01J37/30

CPC classification number: H01J37/3056 ,  H01J37/3005 ,  H01J2237/30466 ,  H01J2237/31749

Abstract: A focused ion beam system includes a focused ion beam irradiation mechanism which irradiates a sample, on which a protective film is formed, with a focused ion beam from above the sample, a processing control unit which performs a removal process on both sides of a region to be a thin piece portion of the sample by the focused ion beam and sequentially forms observation surfaces parallel to an irradiation direction of the focused ion beam so as to achieve the thin piece portion, and an observation surface image generation unit which generates an observation surface image. The processing control unit terminates the removal process when a height of the protective film in the irradiation direction of the focused ion beam becomes a predetermined threshold value or less in the observation surface image.

Abstract translation: 聚焦离子束系统包括：聚焦离子束照射机构，其从形成有来自样品上方的聚焦离子束照射形成有保护膜的样品;处理控制单元，其对区域的两侧进行去除处理 通过聚焦离子束成为样品的薄片部分，并顺序地形成与聚焦离子束的照射方向平行的观察面，以实现薄片部分;以及观察表面图像生成单元，其生成观察表面 图片。 当聚焦离子束的照射方向上的保护膜的高度在观察表面图像中变为预定阈值以下时，处理控制单元终止去除处理。

公开(公告)号：US08637819B2

公开(公告)日：2014-01-28

申请号：US13842404

申请日：2013-03-15

Applicant: Hitachi High-Tech Science Corporation

Inventor： Makoto Sato ,  Tatsuya Asahata ,  Hidekazu Suzuki

IPC: H01J3/12 ,  H01J37/30 ,  H01J37/31

CPC classification number: H01J37/261 ,  H01J37/304 ,  H01J37/3056 ,  H01J2237/221 ,  H01J2237/30466

Abstract: Provided is a cross-section processing and observation apparatus, including a control portion for repeatedly executing a process including slice processing by an ion beam and acquisition of a SIM image by a secondary electron emitted from a cross-section formed by the slice processing, in which the control portion divides an observation image into a plurality of areas, and finishes the process when a change has occurred between an image in one area of the plurality of areas and an image in an area, which corresponds to the one area, of an observation image of another cross-section acquired by the process.

Abstract translation: 本发明提供一种横截面处理和观察装置，包括用于重复执行包括通过离子束进行切片处理的处理的控制部分和通过由切片处理形成的横截面发射的二次电子获取SIM图像的控制部分， 所述控制部将观察图像分割为多个区域，并且当在所述多个区域的一个区域中的图像与对应于所述一个区域的区域中的图像之间发生变化时，完成所述处理 通过该过程获得的另一横截面的观察图像。