公开(公告)号：US09275827B2

公开(公告)日：2016-03-01

申请号：US14617259

申请日：2015-02-09

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Atsushi Uemoto ,  Tatsuya Asahata ,  Hidekazu Suzuki ,  Yo Yamamoto

IPC: H01J37/20 ,  G01N1/32 ,  H01J37/18 ,  H01J37/28 ,  H01J37/22

CPC classification number: H01J37/20 ,  H01J37/023 ,  H01J37/18 ,  H01J37/222 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/063 ,  H01J2237/14 ,  H01J2237/182 ,  H01J2237/206 ,  H01J2237/208 ,  H01J2237/2448 ,  H01J2237/2806 ,  H01J2237/2813 ,  H01J2237/31749

Abstract: A charged particle beam apparatus includes: a charged particle beam column; a detector configured to detect secondary charged particles; an image processor; a display device; a needle arranged in an irradiation area of charged particle beam; a needle actuator; a user interface; and a controller configured to control the needle actuator to actuate the needle in accordance with a target position that is set by the user interface. The controller controls the needle actuator to move the needle to track a change of the target position that is set by the user interface.

Abstract translation: 带电粒子束装置包括：带电粒子束柱; 检测器，被配置为检测次级带电粒子; 图像处理器; 显示装置; 布置在带电粒子束的照射区域中的针; 针式致动器; 用户界面; 以及控制器，其被配置为根据由用户界面设置的目标位置来控制针致动器致动针。 控制器控制针致动器移动针以跟踪由用户界面设置的目标位置的变化。

公开(公告)号：US09190243B2

公开(公告)日：2015-11-17

申请号：US14012019

申请日：2013-08-28

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Tatsuya Asahata ,  Hidekazu Suzuki ,  Shota Torikawa

IPC: H01J37/30 ,  H01J37/02 ,  H01J37/20 ,  H01J37/28

CPC classification number: H01J37/3005 ,  H01J37/02 ,  H01J37/20 ,  H01J37/28 ,  H01J2237/20207 ,  H01J2237/28 ,  H01J2237/3174 ,  H01J2237/31745 ,  H01J2237/31749

Abstract: A composite charged particle beam apparatus includes a FIB column for irradiating a thin sample with a FIB and a GIB column for irradiating the thin sample with a GIB. The thin sample is placed on a sample stage, and a tilt unit tilts the thin sample about a tilt axis of the sample stage, the tilt axis being orthogonal to the FIB irradiation axis and being located inside a plane formed by the FIB irradiation axis and the GIB irradiation axis. A tilt sample holder is mounted on the sample stage and fixes the thin sample such that a cross-sectional surface of the thin sample is tilted at a constant angle with respect to the GIB irradiation axis and the azimuth angle of the GIB column can be changed by rotation of the sample stage.

Abstract translation: 复合带电粒子束装置包括用于用FIB照射薄样品的FIB柱和用于用GIB照射薄样品的GIB柱。 薄样品被放置在样品台上，并且倾斜单元围绕样品台的倾斜轴倾斜薄样品，倾斜轴正交于FIB照射轴并位于由FIB照射轴形成的平面内， GIB辐照轴。 将倾斜样品保持器安装在样品台上并固定薄样品，使得薄样品的横截面相对于GIB照射轴线以一定角度倾斜，并且可以改变GIB柱的方位角 通过样品台的旋转。

公开(公告)号：US10446370B2

公开(公告)日：2019-10-15

申请号：US15850647

申请日：2017-12-21

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Hidekazu Suzuki

IPC: H01J37/304 ,  H01J37/244 ,  H01J37/26 ,  H01J37/28

Abstract: A charged particle beam apparatus includes: an irradiation unit that irradiates a sample with a charged particle beam; an image formation section that detects a charged particle generated from the sample due to the irradiation with the charged particle beam and forms an image based on a signal obtained by detecting the charged particle; an input reception unit that receives an observation condition; a derivation section that derives second observation parameters proper for the observation condition based on the received observation condition and first observation parameters stored in a storage unit; and a control unit that controls the irradiation unit based on the second observation parameters.

公开(公告)号：US09548185B2

公开(公告)日：2017-01-17

申请号：US14520595

申请日：2014-10-22

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Hidekazu Suzuki ,  Tatsuya Asahata ,  Atsushi Uemoto

IPC: H01J37/26 ,  H01J37/305 ,  G01N1/32 ,  H01J37/304

CPC classification number: H01J37/3056 ,  G01N1/32 ,  H01J37/304 ,  H01J2237/31745

Abstract: A cross section processing method and a cross section processing apparatus are provided in which it is possible to form a flat cross section in a sample composed of a plurality of substances having different hardness by a focused ion beam. The etching of a processing area is performed while variably controlling the irradiation interval, the irradiation time, or the like of a focused ion beam based on cross section information of an SEM image obtained by the observation of a cross section. In this way, even if a sample is composed of a plurality of substances having different hardness, it is possible to form a flat observation surface with a uniform etching rate.

Abstract translation: 提供一种横截面加工方法和横截面加工装置，其中可以在通过聚焦离子束由具有不同硬度的多种物质组成的样品中形成平坦的横截面。 基于通过观察截面获得的SEM图像的横截面信息，可以可变地控制聚焦离子束的照射间隔，照射时间等进行处理区域的蚀刻。 以这种方式，即使样品由具有不同硬度的多种物质组成，也可以形成具有均匀蚀刻速率的平坦观察面。

公开(公告)号：US11282672B2

公开(公告)日：2022-03-22

申请号：US16573668

申请日：2019-09-17

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Hidekazu Suzuki ,  Tatsuya Asahata

IPC: H01J37/28 ,  H01J37/21 ,  H01J37/12

Abstract: Disclosed are a charged particle beam apparatus and a sample processing observation method, the method including: a sample piece formation process in which a sample is irradiated with a focused ion beam such that a sample piece is cut out from the sample; a cross-section processing process in which the sample piece support holds the sample piece and a cross section thereof is irradiated with the ion beam to process the cross section; a sample piece approach movement process in which the sample piece support holds the sample piece and the sample piece is moved to a position that is closer to an electron beam column than an intersection point of beam optical axes of the ion beam and an electron beam is; and a SEM image acquisition process in which the cross section is irradiated with the electron beam to acquire the SEM image of the cross section.

公开(公告)号：US09315898B2

公开(公告)日：2016-04-19

申请号：US13761332

申请日：2013-02-07

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Hidekazu Suzuki ,  Ikuko Nakatani

IPC: B44C1/22 ,  C23C16/48 ,  G01N1/28 ,  G01N1/32

CPC classification number: C23C16/486 ,  G01N1/28 ,  G01N1/32 ,  H01J2237/31745

Abstract: A TEM sample preparation method including: placing a thin sample on a sample holder so that a first side surface of the thin sample which is closer to a desired observation target is opposed to a focused ion beam column; setting a processing region, which is to be subjected to etching processing by a focused ion beam so as to form a thin film portion including the observation target and having a thickness direction substantially parallel to a thickness direction of the thin sample, to a region of the first side surface that is adjacent to the thin film portion; and performing the etching processing to a portion of the thin sample extending from the first side surface thereof to a front surface thereof by irradiating the processing region with the focused ion beam from the focused ion beam column.

Abstract translation: 一种TEM样品制备方法，包括：将薄样品放置在样品保持器上，使得更靠近所需观察目标的薄样品的第一侧表面与聚焦离子束柱相对; 设置要通过聚焦离子束进行蚀刻处理的处理区域，以形成包括观察对象的薄膜部分，并且具有基本上平行于薄样品的厚度方向的厚度方向到 与薄膜部分相邻的第一侧表面; 并且通过用来自聚焦离子束柱的聚焦离子束照射处理区域，对从其第一侧表面延伸到其前表面的薄样品的一部分进行蚀刻处理。

公开(公告)号：US09218937B2

公开(公告)日：2015-12-22

申请号：US14617273

申请日：2015-02-09

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Atsushi Uemoto ,  Tatsuya Asahata ,  Hidekazu Suzuki ,  Yo Yamamoto

IPC: H01J37/20 ,  H01J37/28 ,  H01J37/26

CPC classification number: H01J37/20 ,  H01J37/261 ,  H01J37/3023 ,  H01J2237/063 ,  H01J2237/08 ,  H01J2237/2007 ,  H01J2237/202 ,  H01J2237/208 ,  H01J2237/2448 ,  H01J2237/2482 ,  H01J2237/2602

Abstract: A charged particle beam apparatus includes: a charged particle beam column configured to irradiate an irradiation target with a charged particle beam; a detector configured to detect secondary charged particles emitted from the irradiation target by the irradiation of the charged particle beam; a needle arranged in an irradiation area of the charged particle beam; a needle actuator configured to actuate the needle; and a controller configured to control the needle actuator to actuate the needle along a movement route that is configured by a preset target position and preset way points. The controller controls the needle actuator to set an actuating direction of the needle for each of the way points.

Abstract translation: 带电粒子束装置包括：带电粒子束柱，被配置为用照射目标的带电粒子束; 检测器，被配置为通过照射带电粒子束来检测从照射目标物发射的二次带电粒子; 布置在带电粒子束的照射区域中的针; 针致动器，其构造成致动所述针; 以及控制器，被配置为控制针致动器沿着由预设目标位置和预设路线点构成的移动路线致动针。 控制器控制针致动器以为每个路点设置针的致动方向。

公开(公告)号：US08916839B2

公开(公告)日：2014-12-23

申请号：US13771386

申请日：2013-02-20

Applicant: Hitachi High-Tech Science Corporation

Inventor： Hidekazu Suzuki

IPC: G21K5/04 ,  H01J37/26 ,  H01J37/305 ,  G01N1/32

CPC classification number: H01J37/3053 ,  G01N1/32 ,  H01J2237/30455 ,  H01J2237/30488 ,  H01J2237/31745

Abstract: A sample preparation method is carried out using a focused ion beam and an electron beam. While displaying a SEM image of a first cross-section of a sample on a display screen, the first cross-section is subjected to etching processing by scanning and irradiation of the focused ion beam, thereby exposing a second cross-section, and while displaying a SEM image of the second cross-section on the display screen, the scanning direction of the focused ion beam is changed while performing scanning and irradiation of the focused ion beam and subjecting the second cross-section to etching processing, thereby exposing a desired cross-section of the sample.

Abstract translation: 使用聚焦离子束和电子束进行样品制备方法。 在显示屏幕上显示样品的第一横截面的SEM图像时，通过扫描和照射聚焦离子束对第一横截面进行蚀刻处理，从而暴露第二横截面，并且在显示 在显示屏幕上的第二横截面的SEM图像，聚焦离子束的扫描方向在进行聚焦离子束的扫描和照射并对第二横截面进行蚀刻处理时改变，从而暴露期望的交叉 样品的切片。

公开(公告)号：US08637819B2

公开(公告)日：2014-01-28

申请号：US13842404

申请日：2013-03-15

Applicant: Hitachi High-Tech Science Corporation

Inventor： Makoto Sato ,  Tatsuya Asahata ,  Hidekazu Suzuki

IPC: H01J3/12 ,  H01J37/30 ,  H01J37/31

CPC classification number: H01J37/261 ,  H01J37/304 ,  H01J37/3056 ,  H01J2237/221 ,  H01J2237/30466

Abstract: Provided is a cross-section processing and observation apparatus, including a control portion for repeatedly executing a process including slice processing by an ion beam and acquisition of a SIM image by a secondary electron emitted from a cross-section formed by the slice processing, in which the control portion divides an observation image into a plurality of areas, and finishes the process when a change has occurred between an image in one area of the plurality of areas and an image in an area, which corresponds to the one area, of an observation image of another cross-section acquired by the process.

Abstract translation: 本发明提供一种横截面处理和观察装置，包括用于重复执行包括通过离子束进行切片处理的处理的控制部分和通过由切片处理形成的横截面发射的二次电子获取SIM图像的控制部分， 所述控制部将观察图像分割为多个区域，并且当在所述多个区域的一个区域中的图像与对应于所述一个区域的区域中的图像之间发生变化时，完成所述处理 通过该过程获得的另一横截面的观察图像。

公开(公告)号：US09269539B2

公开(公告)日：2016-02-23

申请号：US14665410

申请日：2015-03-23

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Tatsuya Asahata ,  Hidekazu Suzuki ,  Makoto Sato

IPC: H01J37/00 ,  H01J37/317 ,  H01J37/244 ,  H01J37/22

CPC classification number: H01J37/317 ,  H01J37/222 ,  H01J37/244 ,  H01J37/28 ,  H01J37/3005 ,  H01J2237/221 ,  H01J2237/2448 ,  H01J2237/30466 ,  H01J2237/31745 ,  H01J2237/31749

Abstract: A focused ion beam apparatus includes: a focused ion beam tube configured to irradiate a focused ion beam onto a sample; a detector configured to detect secondary particles generated from the sample due to the irradiation and to output detection information regarding detected secondary particles; an image forming unit configured to form an observation image of the sample based on the detection information; a storage unit configured to store positional relation between a first processing area set on an observation image of a first sample and a cross-section surface of the first sample; and a processing area setting unit configured to automatically set a second processing area on an observation image of a second sample based on the positional relation stored in the storage unit and a position of a cross-section surface of the second sample on the observation image of the second sample.

Abstract translation: 聚焦离子束装置包括：聚焦离子束管，被配置为将聚焦的离子束照射到样品上; 检测器，其被配置为检测由于所述照射而从所述样品产生的二次粒子，并输出关于检测到的二次粒子的检测信息; 图像形成单元，被配置为基于所述检测信息形成所述样本的观察图像; 存储单元，被配置为存储设置在第一样本的观察图像上的第一处理区域和第一样本的截面之间的位置关系; 以及处理区域设定单元，被配置为基于存储在存储单元中的位置关系和第二样本的横截表面的位置来自动设置第二样本的观察图像上的第二处理区域， 第二个样本。