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公开(公告)号：US09892225B2
公开(公告)日：2018-02-13
申请号：US15088581
申请日：2016-04-01
Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
Inventor： Jaione Tirapu Azpiroz , Peter W. Bryant , Rodrigo N. B. Ferreira , Bruno D. C. Flach , Ronaldo Giro , Ricardo L. Ohta
CPC classification number: G06F17/5068 , B01L3/502707 , B01L3/502761 , B01L2200/0652 , B01L2200/0668 , B01L2300/0816 , B01L2400/0424 , G06F17/5009 , G06F2217/06 , G06F2217/08 , G06F2217/12
Abstract: Described herein is a method of designing micro-fluidic devices. A target cost function based on device design parameters is chosen. The performance of one or more design candidates is run in a simulation model. A design candidate with a cost function closest to the target cost function is chosen and modified in an optimization routine to provide a modified design candidate having modified device design parameters. The cost function for the modified initial design candidate is computed, and when the modified design candidate has a computed cost function that meets the target cost function, optimized device design parameters of an optimized device design are obtained. Additional optimization iterations may be performed as needed to arrive at an optimized device design. A micro-fluidic device based on the optimized device design is manufactured.
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42.发明申请公开(公告)号：US20170292934A1
公开(公告)日：2017-10-12
申请号：US15093816
申请日：2016-04-08
Applicant: International Business Machines Corporation
Inventor： Jaione Tirapu Azpiroz , Michael Engel , Mathias B. Steiner
IPC: G01N27/447 , G01N35/00 , B01L3/00
CPC classification number: G01N27/44773 , B01L3/502715 , B01L3/50273 , B01L3/502761 , B01L2200/0652 , B01L2200/0668 , B01L2300/023 , B01L2300/04 , B01L2300/0627 , B01L2300/0816 , B01L2300/0864 , B01L2300/12 , B01L2400/0424 , G01N15/00 , G01N27/44704 , G01N27/4473 , G01N27/44791 , G01N35/00029 , G01N35/00871 , G01N2015/0053
Abstract: Method, apparatus, and computer program product for a microfluidic channel having a cover opposite its bottom and having electrodes with patterned two-dimensional conducting materials, such as graphene sheets integrated into the top of its bottom. Using the two-dimensional conducting materials, once a fluid sample is applied into the channel, highly localized modulated electric field distributions are generated inside the channel and the fluid sample. This generated field causes the inducing of dielectrophoretic (DEP) forces. These DEP forces are the same or greater than DEP forces that would result using metallic electrodes because of the sharp edges enabled by the two-dimension geometry of the two-dimensional conducting materials. Because of the induced forces, micro/nano-particles in the fluid sample are separated into particles that respond to a negative DEP force and particles that respond to a positive DEP. Microfluidic chips with microfluidic channels can be made using standard semiconductor manufacturing technology.
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43.发明申请MICROCHANNEL, MICROFLUIDIC CHIP AND METHOD FOR PROCESSING MICROPARTICLES IN A FLUID FLOW 有权微流通道，微流控芯片和流体流中微生物处理方法公开(公告)号：US20170008009A1
公开(公告)日：2017-01-12
申请号：US14797168
申请日：2015-07-12
Applicant: International Business Machines Corporation
Inventor： Jaione Tirapu Azpiroz , Emmanuel Delamarche , Claudius Feger , Yuksel Temiz
CPC classification number: B03C5/005 , B01L3/502746 , B01L3/502761 , B01L2200/0652 , B01L2200/0668 , B01L2200/0684 , B01L2400/0424 , B01L2400/084 , B03C5/026 , B03C2201/18 , B03C2201/26
Abstract: A microchannel for processing microparticles in a fluid flow comprises a first and second pairs of electrodes. The first pair of electrodes is configured for generating an asymmetric first electric field and for sorting the microparticles to provide sorted microparticles. The second pair of electrodes is configured for generating an asymmetric second electric field and for trapping at least some of the sorted microparticles.
Abstract translation: 用于处理流体流中的微粒的微通道包括第一和第二对电极。 第一对电极被配置用于产生不对称的第一电场并用于分选微粒以提供分选的微粒。 第二对电极被配置用于产生不对称的第二电场并且用于捕获至少一些分选的微粒。
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公开(公告)号：US20170007996A1
公开(公告)日：2017-01-12
申请号：US14797170
申请日：2015-07-12
Applicant: International Business Machines Corporation
Inventor： Jaione Tirapu Azpiroz , Emmanuel Delamarche , Claudius Feger , Yuksel Temiz
CPC classification number: B01L3/502761 , B01L2200/0668 , B01L2200/0684 , B01L2300/0883 , B01L2400/0424 , B03C5/005 , B03C5/026 , B03C2201/18 , B03C2201/26
Abstract: A device for trapping at least one microparticle in a fluid flow is suggested. The device comprises a trapping element and an electrode. The trapping element is configured for trapping the at least one microparticle and has at least one recess for receiving the at least one microparticle. The electrode is configured for generating an asymmetric electric field. In operation, at least one microparticle of a plurality of microparticles passing through the asymmetric electric field is forced into the at least one recess of the trapping element.
Abstract translation: 提出了一种用于在流体流中捕获至少一个微粒的装置。 该装置包括捕获元件和电极。 捕获元件构造成用于捕获至少一个微粒并且具有用于接收至少一个微粒的至少一个凹部。 电极被配置用于产生不对称电场。 在操作中，通过非对称电场的多个微粒中的至少一个微粒被强制进入捕获元件的至少一个凹部。
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公开(公告)号：US20160231274A1
公开(公告)日：2016-08-11
申请号：US14615169
申请日：2015-02-05
Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
Inventor： Jaione Tirapu Azpiroz
IPC: G01N27/447 , B01L3/00
CPC classification number: B01L3/502761 , B01L3/502715 , B01L3/50273 , B01L2200/028 , B01L2200/0647 , B01L2200/143 , B01L2300/0627 , B01L2300/0645 , B01L2300/0816 , B01L2300/0864 , B01L2300/0877 , B01L2400/0424 , B03C5/005 , B03C5/02 , B03C5/022 , G01N27/44713 , G01N27/44791
Abstract: A particle manipulation device includes a substrate and a microchannel included in the substrate and configured to receive a fluid including particles therein. A biasing structure is formed on the substrate adjacent to, but outside the microchannel. The biasing structure is configured to dispense radiation at a frequency to bias movement of the particles within the microchannel from outside the microchannel.
Abstract translation: 粒子处理装置包括衬底和包括在衬底中的微通道，并被配置为接收包括其中的颗粒的流体。 偏压结构形成在与微通道相邻但在微通道外部的衬底上。 偏置结构被配置为以一定的频率分配辐射以偏置来自微通道外部的微通道内的颗粒的移动。
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Patent Agency Ranking
公开(公告)号：US09310674B2
公开(公告)日：2016-04-12
申请号：US14185440
申请日：2014-02-20
Applicant: International Business Machines Corporation
Inventor： Jaione Tirapu Azpiroz , Alan E. Rosenbluth , Timothy A Brunner
IPC: G03F1/76
CPC classification number: G03F1/76
Abstract: A method includes selecting a mask blank for lithographically forming a desired pattern of main features to be printed onto a wafer by projection lithography. First locations are identified in the desired pattern, the first locations being those which would produce on the wafer images impacted by phase distortions of actinic light through openings in the desired pattern. Second locations in the desired pattern are identified for the insertion of orthoedges. The orthoedges are provided to contribute an additional amplitude of actinic light to the images impacted by phase distortions when the actinic light is projected onto the wafer. The orthoedges are then inserted into the desired pattern at the second locations at orientations such that the orthoedges provide a quadrature component to the additional amplitude of actinic light having an opposite sign to the quadrature component of the actinic light producing the phase distortions. Finally, the mask blank is formed lithographically with the desired pattern modified through the insertion of the orthoedges.
Abstract translation: 一种方法包括选择掩模坯料，用于通过投影光刻在光刻形成要印刷到晶片上的主要特征的期望图案。 以期望的图案识别第一位置，第一位置是在晶片上产生的图像的位置，该图像受到通过所需图案的开口的光化光的相位变形的影响。 识别所需图案中的第二位置用于插入骨架。 被提供的焦距用于在将光化光投射到晶片上时，对由相位失真影响的图像贡献额外的光化幅度幅度。 然后，在第二位置处将取向插入到期望的图案中，使得所述重心与所述光化学光的正交分量具有相反符号的附加振幅提供正交分量，以产生相位变形。 最后，掩模坯料通过插入重心被修改的所需图案光刻地形成。
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公开(公告)号：US20150234269A1
公开(公告)日：2015-08-20
申请号：US14185440
申请日：2014-02-20
Applicant: International Business Machines Corporation
Inventor： Jaione Tirapu Azpiroz , Alan E. Rosenbluth , Timothy A. Brunner
IPC: G03F1/76
CPC classification number: G03F1/76
Abstract: A method includes selecting a mask blank for lithographically forming a desired pattern of main features to be printed onto a wafer by projection lithography. First locations are identified in the desired pattern, the first locations being those which would produce on the wafer images impacted by phase distortions of actinic light through openings in the desired pattern. Second locations in the desired pattern are identified for the insertion of orthoedges. The orthoedges are provided to contribute an additional amplitude of actinic light to the images impacted by phase distortions when the actinic light is projected onto the wafer. The orthoedges are then inserted into the desired pattern at the second locations at orientations such that the orthoedges provide a quadrature component to the additional amplitude of actinic light having an opposite sign to the quadrature component of the actinic light producing the phase distortions. Finally, the mask blank is formed lithographically with the desired pattern modified through the insertion of the orthoedges.
Abstract translation: 一种方法包括选择掩模坯料，用于通过投影光刻在光刻形成要印刷到晶片上的主要特征的期望图案。 以期望的图案识别第一位置，第一位置是在晶片上产生的图像的位置，该图像受到通过所需图案的开口的光化光的相位变形的影响。 识别所需图案中的第二位置用于插入骨架。 被提供的焦距用于在将光化光投射到晶片上时，对由相位失真影响的图像贡献额外的光化幅度幅度。 然后，在第二位置处将取向插入到期望的图案中，使得所述重心与所述光化学光的正交分量具有相反符号的附加振幅提供正交分量，以产生相位变形。 最后，掩模坯料通过插入重心被修改的所需图案光刻地形成。
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公开(公告)号：US20230315956A1
公开(公告)日：2023-10-05
申请号：US17708319
申请日：2022-03-30
Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
Inventor： Rodrigo Neumann Barros Ferreira , Jaione Tirapu Azpiroz , Ronaldo Giro , Mathias B Steiner
CPC classification number: G06F30/28 , G06F30/27 , G06N3/08 , G06F2113/08
Abstract: Systems and methods for predicting fluid flow of porous media are provided. In implementations, a method includes: accessing, by a computing device, a capillary network representation of a porous medium sample; generating, by the computing device, a set of simplified network representations from the capillary network representation; determining, by the computing device, simulated fluid flow properties of each of the simplified network representations using a simulator to perform fluid flow simulations; and training, by the computing device, a neural network (NN) model utilizing the set of simplified network representations as inputs and the simulated fluid flow properties as model targets, thereby generating a trained NN model for predicting fluid flow properties of the porous medium.
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公开(公告)号：US11252202B2
公开(公告)日：2022-02-15
申请号：US16841958
申请日：2020-04-07
Applicant: International Business Machines Corporation
Inventor： Heloisa Caroline De Souza Pereira Candello , Marisa Affonso Vasconcelos , Jaione Tirapu Azpiroz , Marco Aurelio Stelmar Netto
Abstract: Aspects discussed herein include a computer-implemented method comprising receiving a support request from a user, and during a current support session responsive to the support request, performing textual analysis of one or more inputs provided by the user during one or both of: (i) the current support session and (ii) one or more previous support sessions. The method further comprises applying one or more features determined by the textual analysis to a model to classify the user into a first class of a predefined plurality of classes that describe a pace of conversation during the current support session. The method further comprises, based on the classification of the user, assigning the support request to be fulfilled by a first operator of a predefined plurality of support operators.
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公开(公告)号：US11150187B2
公开(公告)日：2021-10-19
申请号：US16515968
申请日：2019-07-18
Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
Inventor： Michael Engel , Jeannette M. Garcia , Ricardo L. Ohta , Ademir F. Silva , Mathias B. Steiner , Jaione Tirapu Azpiroz , Thomas G. Zimmerman
Abstract: A system is provided for performing metal trace analysis on a liquid sample. A sample holder holds an analysis substrate that includes a reference region and at least one test region. An ultraviolet (UV) light source emits ultraviolet light illuminating the liquid sample. An optical sensor detects radiation emanating from the liquid sample and converting the detected radiation into an electrical signal. A microcontroller processes the electrical signal. An external interface transmits the processed electrical signal to an external device. The analysis substrate is configured for manual movement by a user. A tracking system detects a sample scanning location for the metal trace analysis, and includes a light source, other than the UV light source, and another optical sensor. The other optical sensor detects light emitted by the light source.
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