摘要:
The base zones of MOSFETs and IGBTs are generated by implanting dopants of the second conductivity type into the surface of a first layer of the first conductivity type, and a second layer of the first conductivity type is deposited thereon. During the deposition, the dopants diffuse up to the surface of the second layer and form base zones. The base zones are thereby provided with a laterally expanded region of high conductivity under the surface through which the minority carriers can flow off to the source electrode with low voltage drop.
摘要:
A MOSFET protection circuit includes a switch element which is thermally coupled to the MOSFET and switches the MOSFET off by establishing a connection between the gate and source electrodes thereof when a critical temperature is reached. The switch element also generates a temperature-dependent signal which controls a voltage reducing element connected between the gate and source electrodes of the MOSFET. The voltage reducing element is activated at a temperature which is lower than the critical temperature so that the gate-source voltage of the MOSFET and the current flowing therethrough is reduced as a result at the second temperature. The temperature rise is thereby slowed.
摘要:
A bipolar transistor is disclosed including a semiconductor body having a cathode-side surface and an anode-side surface, and at least one insulated gate electrode. The semiconductor body has a central region with a predetermined doping concentration and of a first conductivity type. The central region borders on the cathode-side surface of the semiconductor body. Bordering on the cathode-side surface, at least one gate region is provided which borders on the central region. The gate region is of the second conductivity type and has a higher doping concentration than the central region. In the gate region, a source region is provided which borders on the cathode-side surface. The gate electrode is seated on an insulating layer applied on the cathode-side surface and covers the gate region. Between the anode-side surface and the central region is provided an anode region of the second conductivity type which has a higher doping concentration than the central region. Between gate region and source region, a shunt is provided. The anode region is a recrystallized region of a metal silicon alloy doped with a doping substance.
摘要:
The voltage (U.sub.DS) on a power MOSFET (1) is compared with a voltage (U.sub.V) derived from the sum of the voltages of a Zener diode (3) and the threshold voltage (U.sub.T) of a second MOSFET (5) to detect a short circuit in a load (2) in series with the power MOSFET (1). When this total voltage is exceeded, the second MOSFET conducts. Its load current is then evaluated as the short circuit signal.
摘要:
On the semiconductor body of a MOSFET (1), the semiconductor body of a thyristor (5) (or of a bipolar transistor) is located for thermal conduction purposes. The anode and cathode terminals (A, K) (emitter and collector terminal) are connected to the gate terminal (G) and to the source terminal (S) of the MOSFET (1), respectively. The thyristor (bipolar transistor) is rated so that it turns on before a temperature of 150.degree. to 180.degree. is obtained which is critical for the MOSFET. Thus the gate-source capacitance of the MOSFET is effectively shortcircuited and the MOSFET turns off.
摘要:
A dynamic semiconductor memory cell has a field effect transistor and a memory capacitor formed on a semiconductor body. In addition to a first zone, doped oppositely with respect to the doping of the semiconductor body, further zones are formed parallel to the boundary surface of the body and doped with the same conductivity of the semiconductor body, but to a higher degree. The further zones lie below regions at the boundary surface which are doped opposite to the semiconductor body. The further zones include edge portions which extend up to the boundary surface and which limit the regions thereabove in the lateral direction. A gate is provided and in an area of the semiconductor body beneath the gate and adjacent to the boundary surface a region is provided, doped opposite to the semiconductor body and connecting the edge portions. The edge portions, at the boundary surface, form a two-part channel area of the field effect transistor.
摘要:
An arrangement for use in a semiconductor component includes a semiconductor body and an edge structure. The semiconductor body having a first face, a second face, a first semiconductor zone of a first conductance type, at least one second semiconductor zone of a second conductance type, and a semiconductor junction formed therebetween running substantially parallel to the first face. The edge structure is laterally adjacent to the second semiconductor zone and includes at least a first trench. The first trench extends in a vertical direction into the semiconductor body and is filled with a dielectric material. The edge structure further includes a third semiconductor zone of the second conductance type, which, at least partially, is adjacent to a face of the at least one trench which faces away from the first face. The edge structure further includes a fourth semiconductor zone of the first conductance type, which is more heavily doped than the first semiconductor zone, and is proximate to the first face.
摘要:
A circuit arrangement configured to drive a load is disclosed herein. The circuit arrangement comprises a first and a second supply potential terminal for application of a first supply potential and a second supply potential. A load terminal is provided between the first and second supply potential for connection of the load. The circuit arrangement further comprises a first transistor component of a first conduction type. The first transistor component includes a load path and a control terminal, with the load path connected between the first supply potential terminal and the load terminal. The circuit arrangement also comprises a freewheeling element. The freewheeling element is provided as a second transistor of a second conduction type connected up as a diode. The second transistor is connected between the load terminal and the second supply potential terminal. The first transistor component and the freewheeling element are integrated in a common semiconductor body.
摘要:
The present invention relates to a metal-semiconductor contact comprising a semiconductor layer and comprising a metallization applied to the semiconductor layer, a high dopant concentration being introduced into the semiconductor layer such that a non-reactive metal-semiconductor contact is formed between the metallization and the semiconductor layer. The metallization and/or the semiconductor layer are formed in such a way that only a fraction of the introduced doping concentration is electrically active, and a semiconductor layer doped only with this fraction of the doping concentration only forms a Schottky contact when contact is made with the metallization. Furthermore, the invention relates to a semiconductor component comprising a drain zone, body zones embedded therein and source zones again embedded therein. The semiconductor component has metal-semiconductor contacts in which the contacts made contact only with the source zones but not with the body zones.
摘要:
The invention relates to a MOSFET circuit having reduced output voltage oscillations, in which a smaller CoolMOS transistor (T2) with a zener diode (Z1) connected upstream of its gate is located in parallel with a larger CoolMOS transistor (T1), so that, during a switch-off operation, after the larger transistor has been switched off, the smaller transistor (T2) carries a tail current on account of the zener voltage still present, which tail current attenuates output oscillations of the voltage.