公开(公告)号：US20180188633A1

公开(公告)日：2018-07-05

申请号：US15806953

申请日：2017-11-08

Applicant: KLA-Tencor Corporation

Inventor： Yung-Ho Alex Chuang ,  Xiaoxu Lu ,  Baigang Zhang ,  John Fielden ,  Vladimir Dribinski

IPC: G02F1/35 ,  G02F1/355

CPC classification number: G02F1/353 ,  G02F1/3501 ,  G02F1/3551 ,  G02F1/3558 ,  G02F2001/3503 ,  G02F2001/354

Abstract: A laser assembly generates continuous (CW) laser output light in the range of approximately 181 nm to approximately 185 nm by generating fourth harmonic light from first fundamental CW light having a first fundamental wavelength between 1 μm and 1.1 μm, generating fifth harmonic light by mixing the fourth harmonic light with the first fundamental CW light, and then mixing the fifth harmonic light with second fundamental or signal CW light having a second wavelength between 1.26 μm and 1.82 μm. The fifth harmonic light is generated using an external cavity that circulates first fundamental CW light through a first nonlinear crystal, and by directing the fourth harmonic light through the first nonlinear crystal. The laser output light is generated using a second cavity that passes circulated second fundamental or signal CW light through a second nonlinear crystal, and directing the fifth harmonic light through the second nonlinear crystal.

公开(公告)号：US09935421B2

公开(公告)日：2018-04-03

申请号：US15344383

申请日：2016-11-04

Applicant: KLA-Tencor Corporation

Inventor： Yung-Ho Chuang ,  J. Joseph Armstrong ,  Yujun Deng ,  Justin Dianhuan Liou ,  Vladimir Dribinski ,  John Fielden

IPC: H01S3/10 ,  H01S3/30 ,  G02B17/08 ,  H01S3/00 ,  G01N21/95 ,  H01S3/067 ,  H01S3/23 ,  H01S3/16 ,  H01S3/11 ,  G02F1/35 ,  G02F1/39

CPC classification number: H01S3/302 ,  G01N21/9501 ,  G02B17/0892 ,  G02F1/353 ,  G02F1/395 ,  G02F2001/354 ,  H01S3/005 ,  H01S3/0092 ,  H01S3/067 ,  H01S3/06754 ,  H01S3/10053 ,  H01S3/11 ,  H01S3/16 ,  H01S3/1643 ,  H01S3/1666 ,  H01S3/23 ,  H01S3/2308

Abstract: An improved solid-state laser for generating sub-200 nm light is described. This laser uses a fundamental wavelength between about 1030 nm and 1065 nm to generate the sub-200 nm light. The final frequency conversion stage of the laser creates the sub-200 nm light by mixing a wavelength of approximately 1109 nm with a wavelength of approximately 234 nm. By proper selection of non-linear media, such mixing can be achieved by nearly non-critical phase matching. This mixing results in high conversion efficiency, good stability, and high reliability.

公开(公告)号：US20170323716A1

公开(公告)日：2017-11-09

申请号：US15659981

申请日：2017-07-26

Applicant: KLA-Tencor Corporation

Inventor： Yung-Ho Alex Chuang ,  J. Joseph Armstrong ,  Yujun Deng ,  Vladimir Dribinski ,  John Fielden ,  Jidong Zhang

IPC: H01F17/00 ,  H01F27/29 ,  H01F17/04

CPC classification number: H01F17/0006 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/95676 ,  G02B21/10 ,  G02B21/16 ,  G02B21/361 ,  G02F1/353 ,  G02F2001/3507 ,  G02F2001/354 ,  H01F17/04 ,  H01F27/292 ,  H01S3/0092 ,  H01S3/10007 ,  H01S3/10084 ,  H01S3/1083 ,  H01S3/109 ,  H01S5/0071 ,  H01S5/0085 ,  H01S5/0604 ,  H01S5/4012

Abstract: A laser assembly for generating laser output light at an output wavelength of approximately 183 nm includes a fundamental laser, an optical parametric system (OPS), a fifth harmonic generator, and a frequency mixing module. The fundamental laser generates fundamental light at a fundamental frequency. The OPS generates a down-converted signal at a down-converted frequency. The fifth harmonic generator generates a fifth harmonic of the fundamental light. The frequency mixing module mixes the down-converted signal and the fifth harmonic to produce the laser output light at a frequency equal to a sum of the fifth harmonic frequency and the down-converted frequency. The OPS generates the down-converted signal by generating a down-converted seed signal at the down-converted frequency, and then mixing the down-converted seed signal with a portion of the fundamental light. At least one of the frequency mixing, frequency conversion or harmonic generation utilizes an annealed, deuterium-treated or hydrogen-treated CLBO crystal.

公开(公告)号：US09748729B2

公开(公告)日：2017-08-29

申请号：US14872890

申请日：2015-10-01

Applicant: KLA-Tencor Corporation

Inventor： Yung-Ho Alex Chuang ,  J. Joseph Armstrong ,  Yujun Deng ,  Vladimir Dribinski ,  John Fielden ,  Jidong Zhang

IPC: G02F1/39 ,  H01S3/109 ,  G02B21/10 ,  G02B21/16 ,  G02B21/36 ,  H01S3/10 ,  H01S3/108 ,  H01S5/00 ,  H01S5/06 ,  H01S5/40 ,  G01N21/95 ,  G01N21/956

CPC classification number: H01F17/0006 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/95676 ,  G02B21/10 ,  G02B21/16 ,  G02B21/361 ,  G02F1/353 ,  G02F2001/3507 ,  G02F2001/354 ,  H01F17/04 ,  H01F27/292 ,  H01S3/0092 ,  H01S3/10007 ,  H01S3/10084 ,  H01S3/1083 ,  H01S3/109 ,  H01S5/0071 ,  H01S5/0085 ,  H01S5/0604 ,  H01S5/4012

Abstract: A laser assembly for generating laser output light at an output wavelength of approximately 183 nm includes a fundamental laser, an optical parametric system (OPS), a fifth harmonic generator, and a frequency mixing module. The fundamental laser generates fundamental light at a fundamental frequency. The OPS generates a down-converted signal at a down-converted frequency. The fifth harmonic generator generates a fifth harmonic of the fundamental light. The frequency mixing module mixes the down-converted signal and the fifth harmonic to produce the laser output light at a frequency equal to a sum of the fifth harmonic frequency and the down-converted frequency. The OPS generates the down-converted signal by generating a down-converted seed signal at the down-converted frequency, and then mixing the down-converted seed signal with a portion of the fundamental light. At least one of the frequency mixing, frequency conversion or harmonic generation utilizes an annealed, deuterium-treated or hydrogen-treated CLBO crystal.

公开(公告)号：US20170229829A1

公开(公告)日：2017-08-10

申请号：US15495162

申请日：2017-04-24

Applicant: KLA-Tencor Corporation

Inventor： Yung-Ho Alex Chuang ,  J. Joseph Armstrong ,  Vladimir Dribinski ,  John Fielden

IPC: H01S3/00 ,  G02F1/37 ,  G02F1/39 ,  G01N21/956 ,  H01S3/23 ,  G02F1/355 ,  G01N21/88 ,  G02F1/35 ,  H01S3/16

Abstract: Laser and inspection systems that generate laser output light at sub-200 nm wavelengths using fundamental light at approximately 1064 nm. A second harmonic generator module generates second harmonic light directed to both an optical parametric (OP) module, which generates down-converted signal (idler light), and to a fifth harmonic generator module, which generates fifth harmonic light. The OP module includes an optical parametric oscillator that is configured to generate the idler signal at approximately 0.5 times the fundamental frequency. The idler light and fifth harmonic light are then mixed by a frequency mixing module to generate the laser output light having an output frequency equal to approximately 5.5 times the fundamental frequency.

公开(公告)号：US20170025281A1

公开(公告)日：2017-01-26

申请号：US15284231

申请日：2016-10-03

Applicant: KLA-Tencor Corporation

Inventor： Yung-Ho Chuang ,  Vladimir Dribinski

IPC: H01L21/30 ,  H01S3/109 ,  H01S3/02 ,  H01L21/322 ,  G01N21/88 ,  G01N21/3563 ,  G01N21/95 ,  H01S3/094 ,  H01S3/16

CPC classification number: H01L21/3003 ,  C30B29/10 ,  C30B33/00 ,  C30B33/02 ,  G01N21/3563 ,  G01N21/59 ,  G01N21/8806 ,  G01N21/9501 ,  G01N2021/3568 ,  G01N2021/3595 ,  G01N2021/8477 ,  G01N2021/8822 ,  G01N2201/06113 ,  H01L21/322 ,  H01S3/027 ,  H01S3/094 ,  H01S3/109 ,  H01S3/1666

Abstract: A laser system includes a nonlinear optical (NLO) crystal, wherein the NLO crystal is annealed within a selected temperature range. The NLO crystal is passivated with at least one of hydrogen, deuterium, a hydrogen-containing compound or a deuterium-containing compound to a selected passivation level. The system further includes at least one light source, wherein at least one light source is configured to generate light of a selected wavelength and at least one light source is configured to transmit light through the NLO crystal. The system further includes a crystal housing unit configured to house the NLO crystal.

Abstract translation: 激光系统包括非线性光学（NLO）晶体，其中NLO晶体在选定的温度范围内退火。 将NLO晶体与氢，氘，含氢化合物或含氘化合物中的至少一种钝化至所选择的钝化水平。 该系统还包括至少一个光源，其中至少一个光源被配置为产生所选波长的光，并且至少一个光源被配置为透射通过NLO晶体的光。 该系统还包括构造成容纳NLO晶体的晶体容纳单元。