公开(公告)号：US5377342A

公开(公告)日：1994-12-27

申请号：US715580

申请日：1991-06-14

申请人： Masanori Sakai ,  Toshihiko Kai ,  Osamu Akiba

发明人： Masanori Sakai ,  Toshihiko Kai ,  Osamu Akiba

IPC分类号： G06F11/16 ,  G06F3/06 ,  G06F11/20 ,  G06F13/00 ,  G06F13/12 ,  G06F12/00 ,  G06F12/16

CPC分类号： G06F11/2087 ,  G06F11/2076 ,  G06F13/126 ,  G06F3/0601 ,  G06F2003/0691

摘要： A processor module generates a data write request and sends data specified thereby to each of two data buffers respectively provided in two data storage units, each having a data storage device, such as a magnetic disc device. When the data has been completely written into each of the data buffers, a write completion response is sent back to the processor module from each of the data storage units. When the processor module has received the write completion responses from the data storage units, it recognizes that the data write request has been completed.

摘要翻译： 处理器模块生成数据写入请求，并将由此指定的数据发送到分别设置在两个数据存储单元中的两个数据缓冲器中的每一个，每个数据存储单元具有数据存储装置，例如磁盘装置。 当数据被完全写入每个数据缓冲器时，写入完成响应从每个数据存储单元发送回处理器模块。 当处理器模块已经从数据存储单元接收到写入完成响应时，它识别出数据写入请求已经完成。

公开(公告)号：US5316633A

公开(公告)日：1994-05-31

申请号：US916692

申请日：1992-07-22

申请人： Masanori Sakai ,  Noriyuki Ohnaka ,  Masakiyo Izumiya ,  Shigeo Hattori

发明人： Masanori Sakai ,  Noriyuki Ohnaka ,  Masakiyo Izumiya ,  Shigeo Hattori

IPC分类号： G01N17/02 ,  G21C17/00 ,  G21C17/022 ,  G01N27/26

CPC分类号： G01N17/02 ,  G21C17/00 ,  G21C17/022 ,  G21Y2002/201 ,  G21Y2002/50 ,  G21Y2004/30 ,  G21Y2004/40 ,  Y02E30/39

摘要： A method and system for electrochemically measuring the sensitization to stress corrosion cracking of small pipes of plant structural members in a very short period of time. A micro electrochemical cell for measuring the sensitization is movably disposed within a BWR plant ICM housing or an instrumentation pipe. An electrochemical instrumentation system for performing the electrochemical potential variation such as pulse voltammetry and a remote control system for remotely controlling the electrochemical cell are provided.

摘要翻译： 一种在很短的时间内电化学测量工厂结构构件小管应力腐蚀开裂敏化的方法和系统。 用于测量敏化的微电化学电池可移动地设置在BWR工厂ICM外壳或仪表管内。 提供用于执行电化学电位变化的电化学仪器系统，例如脉冲伏安法和用于远程控制电化学电池的遥控系统。

公开(公告)号：US5072320A

公开(公告)日：1991-12-10

申请号：US316318

申请日：1989-02-27

申请人： Joichiro Ezaki ,  Kazumasa Fukuda ,  Masanori Sakai

发明人： Joichiro Ezaki ,  Kazumasa Fukuda ,  Masanori Sakai

IPC分类号： G11B5/012 ,  G11B5/72 ,  G11B5/73 ,  G11B5/82

CPC分类号： G11B5/7315 ,  G11B5/012 ,  G11B5/72 ,  G11B5/82

摘要： In a magnetic recording and reproducing apparatus of a type wherein a magnetic disk having a magnetic recording layer formed on a rigid substrate is rotated at a high speed and magnetic recording and reproduction are conducted by the magnetic head disposed on the surface of the disk, the magnetic recording and reproducing apparatus being characterized in that the magnetic recording layer constitutes an oxide layer, a nitride layer or an oxidized coating film at at least its surface layer, and the magnetic recording and reproducing are conducted by the magnetic head which is caused to be substantially in contact with the surface of magnetic disk at at least the innermost cylinder of the magnetic disk.

摘要翻译： 在其中具有形成在刚性基板上的磁记录层的磁盘以高速旋转并且通过设置在盘表面上的磁头进行磁记录和再现的类型的磁记录和再现装置中， 磁记录和再现装置的特征在于，磁记录层至少在其表面层上形成氧化物层，氮化物层或氧化涂膜，磁记录和再现由磁头进行 在磁盘的至少最内圆筒处基本上与磁盘表面接触。

公开(公告)号：US09045825B2

公开(公告)日：2015-06-02

申请号：US13398523

申请日：2012-02-16

申请人： Yukinao Kaga ,  Tatsuyuki Saito ,  Masanori Sakai ,  Takashi Yokogawa

发明人： Yukinao Kaga ,  Tatsuyuki Saito ,  Masanori Sakai ,  Takashi Yokogawa

IPC分类号： C23C16/34 ,  C23C16/40 ,  C23C16/455 ,  H01L21/02 ,  C23C16/30 ,  C23C16/54 ,  H01L21/285

CPC分类号： C23C16/45544 ,  C23C16/308 ,  C23C16/34 ,  C23C16/40 ,  C23C16/405 ,  C23C16/45523 ,  C23C16/45527 ,  C23C16/45531 ,  C23C16/45561 ,  C23C16/45578 ,  C23C16/52 ,  C23C16/54 ,  H01L21/02172 ,  H01L21/0228 ,  H01L21/02697 ,  H01L21/28562

摘要： Provided are a semiconductor device manufacturing method and a substrate processing apparatus that are capable of increasing a work function of a film to be formed, in comparison with a related art. A cycle including (a) supplying a metal-containing gas into a processing chamber where a substrate is accommodated (b) supplying a nitrogen-containing gas into the processing chamber; and (c) supplying one of an oxygen-containing gas, a halogen-containing gas and a combination thereof into the processing chamber, is performed a plurality of times to form a metal-containing film on the substrate.

摘要翻译： 提供了与现有技术相比能够增加要形成的膜的功函数的半导体器件制造方法和衬底处理装置。 一种循环，包括（a）将含金属的气体供给到容纳基板的处理室中（b）向处理室供应含氮气体; 和（c）向处理室供给含氧气体，含卤素气体及其组合中的一种，进行多次以在基板上形成含金属膜。

公开(公告)号：US20150050540A1

公开(公告)日：2015-02-19

申请号：US14117106

申请日：2012-02-28

申请人： Masatoshi Toduka ,  Masanori Sakai ,  Shinsuke Kobayashi ,  Koji Kogure ,  Satoshi Minoura

发明人： Masatoshi Toduka ,  Masanori Sakai ,  Shinsuke Kobayashi ,  Koji Kogure ,  Satoshi Minoura

IPC分类号： H01M2/16 ,  H01M10/42 ,  H01M10/06

CPC分类号： H01M2/162 ,  H01M2/1606 ,  H01M4/14 ,  H01M4/621 ,  H01M4/685 ,  H01M10/06 ,  H01M10/128 ,  H01M10/4235 ,  H01M2220/20 ,  H01M2300/0011 ,  Y02E60/126

摘要： On each negative plate (1), a non-woven fabric (2) composed of fibers of at least one material selected from a group of materials comprising glass, pulp and polyolefins comes into contact with the entire surface of the plate without being integrated with the plate. Each negative plate (1), which is in contact with the non-woven fabric (2), is contained in an envelope separator (3) comprising a microporous synthetic resin sheet, and is laminated with a positive plate (4). The non-woven fabric is manufactured through papermaking process in which glass fibers, pulp and silica powder are preferably used and dispersed in water as the main components.

摘要翻译： 在每个负极板（1）上，由选自玻璃，纸浆和聚烯烃的材料组中的至少一种材料的纤维构成的无纺布（2）与板的整个表面接触而不与 碟子。 与无纺布（2）接触的负极板（1）包含在包含微孔合成树脂片材的包层隔板（3）中，并与正极板（4）层叠。 通过造纸方法制造无纺布，其中优选使用玻璃纤维，纸浆和二氧化硅粉末并分散在水中作为主要成分。

公开(公告)号：US08691708B2

公开(公告)日：2014-04-08

申请号：US13012320

申请日：2011-01-24

申请人： Yukinao Kaga ,  Tatsuyuki Saito ,  Masanori Sakai ,  Takashi Yokogawa

发明人： Yukinao Kaga ,  Tatsuyuki Saito ,  Masanori Sakai ,  Takashi Yokogawa

IPC分类号： H01L21/31

CPC分类号： H01L21/32051 ,  C23C16/34 ,  C23C16/45523 ,  C23C16/45574 ,  H01L21/28556 ,  H01L21/28562

摘要： A method of manufacturing a semiconductor device and a substrate processing apparatus capable of providing a TiN film at a higher film-forming rate. The method includes loading a substrate into a processing chamber; simultaneously starting a supply of a first processing gas and a second processing gas to form a film on the substrate, simultaneously stopping the supply of the first and second processing gas; removing the remaining first and second processing gas from the processing chamber; supplying the second processing gas into the processing chamber without supplying the first processing gas; removing the second processing gas starting and then stopping a supply of the first processing gas into the processing chamber without supplying the second processing gas; removing the first processing gas; and unloading the substrate from the processing chamber.

摘要翻译： 一种制造半导体器件的方法和能够以更高的成膜速度提供TiN膜的衬底处理设备。 该方法包括将衬底加载到处理室中; 同时开始供应第一处理气体和第二处理气体以在基板上形成膜，同时停止供应第一和第二处理气体; 从处理室中除去剩余的第一和第二处理气体; 在不提供第一处理气体的情况下将第二处理气体供应到处理室中; 除去所述第二处理气体，然后停止将所述第一处理气体供给到所述处理室中，而不供给所述第二处理气体; 去除第一处理气体; 并从处理室卸载基板。

公开(公告)号：US08598047B2

公开(公告)日：2013-12-03

申请号：US13270811

申请日：2011-10-11

申请人： Masanori Sakai ,  Toru Kagaya ,  Hirohisa Yamazaki

发明人： Masanori Sakai ,  Toru Kagaya ,  Hirohisa Yamazaki

IPC分类号： H01L21/31

CPC分类号： H01L21/3162 ,  C23C16/403 ,  C23C16/45546 ,  C23C16/4557 ,  C23C16/45578 ,  C23C16/46 ,  H01L21/02164 ,  H01L21/02178 ,  H01L21/02181 ,  H01L21/0228 ,  H01L21/3141 ,  H01L21/67109

摘要： A substrate treatment apparatus includes a reaction tube and a heater heating a silicon wafer. Trimethyl aluminum (TMA) and ozone (O3) are alternately fed into the reaction tubeto generate Al2O3 film on the surface of the wafer. The apparatus also includes supply tubes and for flowing the ozone and TMA and a nozzle supplying gas into the reaction tube. The two supply tubes are connected to the nozzle disposed inside the heater in a zone inside the reaction tube where a temperature is lower than a temperature near the wafer, and the ozone and TMA are supplied into the reaction tube through the nozzle.

摘要翻译： 基板处理装置包括反应管和加热硅晶片的加热器。 将三甲基铝（TMA）和臭氧（O3）交替地进料到反应管中，以在晶片的表面上产生Al 2 O 3膜。 该设备还包括供应管和用于使臭氧和TMA流动的喷嘴和向反应管供应气体的喷嘴。 两个供应管连接到设置在加热器内部的喷嘴内的温度低于晶片温度的反应管内的区域，臭氧和TMA通过喷嘴供应到反应管中。

公开(公告)号：US20130029210A1

公开(公告)日：2013-01-31

申请号：US13581664

申请日：2011-01-07

申请人： Satoshi Minoura ,  Masanori Sakai ,  Shinsuke Kobayashi ,  Koji Kogure

发明人： Satoshi Minoura ,  Masanori Sakai ,  Shinsuke Kobayashi ,  Koji Kogure

IPC分类号： H01M2/02

CPC分类号： H01M2/1633 ,  H01M4/14 ,  H01M4/621 ,  H01M4/622 ,  H01M4/625 ,  H01M4/627 ,  H01M10/06 ,  Y02E60/126 ,  Y02T10/7016

摘要： In a liquid-type lead acid storage battery in which charging is performed for a short time intermittently and high-rate discharging to load is performed in a partially charged state, there are used a positive electrode plate in which the utilization rate of a positive electrode activation substance is set to a range of 50% to 65%, and a negative electrode plate in which a carbonaceous electroconductive material and a bisphenol/aminobenzenesulfonic acid/formaldehyde condensate are added to the negative electrode activation substance, thereby improving the charge acceptance and the lifespan performance; and a separator whose surface disposed opposite the negative electrode plate is formed from a nonwoven fabric made of a material selected from glass, pulp, and polyolefin, is used as a separator; whereby the charge acceptance and the lifespan performance under PSOC are improved.

摘要翻译： 在部分充电状态下，在短时间内进行充电且负荷高速放电的液体型铅酸蓄电池中，使用正极板，其中正极 将活化物质设定为50〜65％的范围，在负极活性物质中添加碳质导电性物质和双酚/氨基苯磺酸/甲醛缩合物的负极板，从而提高电荷接受性， 寿命表现; 并且使用由选自玻璃，纸浆和聚烯烃的材料制成的无纺布形成的与负极板相对的表面的隔板用作隔膜; 从而提高了PSOC下的充电接受度和使用寿命。

公开(公告)号：US20120240348A1

公开(公告)日：2012-09-27

申请号：US13489018

申请日：2012-06-05

申请人： Kazuyuki OKUDA ,  Toru Kagaya ,  Masanori Sakai

发明人： Kazuyuki OKUDA ,  Toru Kagaya ,  Masanori Sakai

IPC分类号： B08B7/04 ,  B08B5/02

CPC分类号： B08B5/00 ,  C23C16/4405 ,  C23C16/4412 ,  H01L21/02057 ,  H01L21/67253

摘要： A substrate processing apparatus cleaning method that includes: containing a cleaning gas in a reaction tube without generating a gas flow of the cleaning gas in the reaction tube by supplying the cleaning gas into the reaction tube and by completely stopping exhaustion of the cleaning gas from the reaction tube or by exhausting the cleaning gas at an exhausting rate which substantially does not affect uniform diffusion of the cleaning gas in the reaction tube from at a point of time of a period from a predetermined point of time before the cleaning gas is supplied into the reaction tube to a point of time when several seconds are elapsed after starting of supply of the cleaning gas into the reaction tube; and thereafter exhausting the cleaning gas from the reaction tube.

摘要翻译： 一种基板处理装置的清洗方法，其特征在于，包括：在反应管内容纳清洗气体，在反应管内不产生清洗气体的气流，将清洗气体供给反应管， 反应管或通过以排气速率排出清洁气体，其排气速率基本上不影响清洁气体在反应管中的均匀扩散从在清洁气体被供给到预定时间之前的预定时间点的时间点 反应管到开始向反应管供给清洁气体后经过几秒钟的时间点; 然后从反应管中排出清洗气体。

公开(公告)号：US08030429B2

公开(公告)日：2011-10-04

申请号：US12521057

申请日：2007-12-27

申请人： Yasushi Sugiura ,  Masanori Sakai

发明人： Yasushi Sugiura ,  Masanori Sakai

IPC分类号： C08G77/08

CPC分类号： B01J31/0239 ,  B01J2231/76 ,  C07F7/0836 ,  C07F7/0874 ,  C07F7/0876 ,  C08G77/08

摘要： In the present invention, when an organopolysiloxane is produced by a dealcoholization condensation reaction between a silicon atom-bonded hydroxy group and a silicon atom-bonded alkoxy group, a quaternary ammonium ion-containing compound such as an alkylammonium hydroxide compound or a silanolate thereof is used as a catalyst. The catalyst for the dealcoholization condensation reaction of the present invention is easily removed after use and is stable. For this reason, when an organopolysiloxane is produced using the aforementioned catalyst, it is not necessary to use complicated production steps or a large amount of the catalyst.

摘要翻译： 在本发明中，当通过与硅原子键合的羟基与硅原子键合的烷氧基之间的脱醇缩合反应生产有机聚硅氧烷时，含季铵离子的化合物如烷基氢氧化铵化合物或其硅烷醇盐是 用作催化剂。 本发明的脱醇缩合反应用催化剂在使用后容易除去，稳定。 因此，使用上述催化剂制造有机聚硅氧烷时，不需要复杂的制造工序或大量的催化剂。