公开(公告)号：US20070114946A1

公开(公告)日：2007-05-24

申请号：US11560118

申请日：2006-11-15

申请人： SVEN GOETZE ,  Harald Ebel ,  Juergen Kleinschmidt ,  Imtiaz Ahmad

发明人： SVEN GOETZE ,  Harald Ebel ,  Juergen Kleinschmidt ,  Imtiaz Ahmad

IPC分类号： H01J7/24

CPC分类号： H01J17/28 ,  H01J7/26 ,  H05G2/003

摘要： The invention is directed to an arrangement for the generation of short-wavelength radiation based on a hot plasma generated by gas discharge and to a method for the production of coolant-carrying electrode housings. It is the object of the invention to find a novel possibility for gas discharge based short-wavelength radiation sources with high average radiation output in quasi-continuous discharge operation by which efficient cooling principles can be implemented using inexpensive and simple means in order to prevent a temporary melting of the electrode surfaces and, therefore, to ensure a long lifetime of the electrodes. According to the invention, this object is met in that special cooling channels for circulating coolant are integrated in electrode collars of the electrode housings. The cooling channels are advanced radially up to within a few millimeters of the highly thermally stressed surface regions and are connected by necked-down channel portions which are arranged coaxial to the axis of symmetry and which are provided with channel structures for increasing the inner surface and for increasing the flow rate of the coolant.

摘要翻译： 本发明涉及一种用于产生基于由气体放电产生的热等离子体的短波长辐射的装置以及用于制造承载冷却剂的电极壳体的方法。 本发明的目的是在准连续放电操作中找到具有高平均辐射输出的基于气体放电的短波长辐射源的新颖可能性，通过该方法可以使用廉价和简单的方法来实现有效的冷却原理，以便防止 暂时熔化电极表面，因此确保电极寿命长。 根据本发明，由于用于循环冷却剂的特殊冷却通道集成在电极壳体的电极环中，所以满足了该目的。 冷却通道从高度受热应力的表面区域径向推进到几毫米以内，并且通过与对称轴线同轴设置的颈缩通道部分连接，并且设置有用于增加内表面的通道结构， 以增加冷却剂的流量。

公开(公告)号：US20070085044A1

公开(公告)日：2007-04-19

申请号：US11426086

申请日：2006-06-23

申请人： Guido Hergenhan ,  Christian Ziener ,  Juergen Kleinschmidt

发明人： Guido Hergenhan ,  Christian Ziener ,  Juergen Kleinschmidt

IPC分类号： G01J3/10

CPC分类号： H05G2/003 ,  H05G2/005

摘要： The object of an arrangement and a method for the generation of extreme ultraviolet radiation is to construct the radiation source with an increased lifetime of the electrodes for using various emitters, wherein deposits inside the discharge chamber are reduced considerably when using metal emitters. The starting material is supplied as a continuous series of individual volumes which are introduced successively by directed injection and are pre-ionized by a pulsed energy beam. At least the electrode that is thermally loaded to a comparatively greater degree is constructed as a rotating electrode.

摘要翻译： 用于产生极紫外线辐射的装置和方法的目的是构建具有增加的电极使用寿命的辐射源，以使用各种发射器，其中当使用金属发射体时，放电室内的沉积物显着减少。 起始材料作为连续系列的单独体积供应，其通过定向注射连续引入并且通过脉冲能量束预电离。 至少将热负载到较大程度的电极构成为旋转电极。

公开(公告)号：US20070080307A1

公开(公告)日：2007-04-12

申请号：US11539342

申请日：2006-10-06

申请人： RENE BRUIJN ,  Chinh Duc Tran ,  Bjoern Mader ,  Jesko Brudermann ,  Juergen Kleinschmidt

发明人： RENE BRUIJN ,  Chinh Duc Tran ,  Bjoern Mader ,  Jesko Brudermann ,  Juergen Kleinschmidt

IPC分类号： G01J3/10

CPC分类号： G03F7/70933 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70191 ,  G03F7/70575 ,  G03F7/70908 ,  G03F7/70916 ,  G03F7/70991 ,  G21K1/10 ,  H05G2/001

摘要： The invention is directed to an arrangement for the suppression of unwanted spectral components (‘out-of-band’ radiation, as it is called) in a plasma-based radiation source. The object of the invention is to find a novel possibility for the suppression of unwanted spectral components in radiation exiting from a plasma-based EUV radiation source which permits a simple suppression of out-of-band radiation outside the desired EUV range without requiring costly manufacturing and adjustment of diffraction gratings. This object is met according to the invention in that a filter unit is provided between the plasma and an application location of the EUV radiation, which filter unit has at least one gas curtain comprising at least one rapidly flowing gas whose molecules have no absorption maxima for the desired EUV radiation and intensive absorption maxima for other, unwanted wavelengths that are emitted, at least in the IR region. For the purpose of generating the gas curtain, at least one slit nozzle and an efficient gas sink are arranged laterally opposite one another with respect to an optical axis of the beam bundle in order to limit the gas curtain in a spatially defined manner and to remove it again from the vacuum chambers as completely as possible.

摘要翻译： 本发明涉及一种用于在基于等离子体的辐射源中抑制不想要的光谱分量（如所谓的“带外”辐射）的布置。 本发明的目的是找到一种新颖的可能性，用于抑制从基于等离子体的EUV辐射源射出的辐射中的不需要的光谱分量，其允许在期望的EUV范围之外简单地抑制带外辐射，而不需要昂贵的制造 和衍射光栅的调整。 根据本发明满足本发明的目的在于，在等离子体和EUV辐射的施加位置之间提供过滤器单元，该过滤器单元具有至少一个气幕，其包括至少一个快速流动的气体，其分子对于 至少在IR区域发射的其他不需要的波长的期望的EUV辐射和强吸收最大值。 为了产生气幕，至少有一个狭缝喷嘴和有效的气体槽相对于束束的光轴横向相对布置，以便以空间限定的方式限制气幕并且移除 再次从真空室中尽可能完全地完成。

公开(公告)号：US07075963B2

公开(公告)日：2006-07-11

申请号：US09771366

申请日：2001-01-25

申请人： Dirk Basting ,  Wolfgang Zschocke ,  Thomas Schröeder ,  Juergen Kleinschmidt ,  Matthias Kramer ,  Uwe Stamm

发明人： Dirk Basting ,  Wolfgang Zschocke ,  Thomas Schröeder ,  Juergen Kleinschmidt ,  Matthias Kramer ,  Uwe Stamm

IPC分类号： H01S3/22

CPC分类号： H01S3/08009 ,  H01S3/08004 ,  H01S3/1055 ,  H01S3/106 ,  H01S3/1062 ,  H01S3/225

摘要： A line-narrowing module for a laser includes a prism beam expander and a grating preferably attached to a heat sink. A pressure-controlled enclosure filled with an inert gas seals the grating and/or other elements of the line-narrowing module. The pressure in the enclosure is adjusted for tuning the wavelength. Preferably, the pressure is controlled by controlling the flow of an inert gas through the enclosure. A pump may be used, or an overpressure flow may be used. Alternatively, a prism of the beam expander or an etalon may be rotatable for tuning the wavelength.

公开(公告)号：US07006541B2

公开(公告)日：2006-02-28

申请号：US10354945

申请日：2003-01-29

申请人： Peter Lokai ,  Thomas Schroeder ,  Juergen Kleinschmidt ,  Uwe Stamm ,  Klaus Wolfgang Vogler

发明人： Peter Lokai ,  Thomas Schroeder ,  Juergen Kleinschmidt ,  Uwe Stamm ,  Klaus Wolfgang Vogler

IPC分类号： H01S3/13

CPC分类号： H01S3/225 ,  H01S3/1392

摘要： A tunable laser system includes a gain medium and an optical resonator for generating a laser beam, and a spectral narrowing and tuning unit within the resonator. A detection and control unit controls a relative wavelength of the laser system. A wavelength calibration module calibrates the detection and control unit. The module contains more than one species each having an optical transition line within the tuning spectrum of the laser. A beam portion of the narrowed emission from the laser is directed through the wavelength calibration module and a beam portion is directed through the detection and control unit when the laser beam is scanned through the optical transition line of each of the species within the module. The detection and control unit is monitored and calibrated during the scanning.

公开(公告)号：US06856638B2

公开(公告)日：2005-02-15

申请号：US10035351

申请日：2001-10-19

申请人： Konstantin Aab ,  Juergen Kleinschmidt ,  Peter Lokai ,  Matthias Ulrich

发明人： Konstantin Aab ,  Juergen Kleinschmidt ,  Peter Lokai ,  Matthias Ulrich

IPC分类号： H01S3/081 ,  H01S3/106 ,  H01S3/13 ,  H01S3/134 ,  H01S3/136 ,  H01S3/137 ,  H01S3/223 ,  H01S3/225 ,  H01S3/22

CPC分类号： H01S3/0811 ,  H01S3/106 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/136 ,  H01S3/137 ,  H01S3/223 ,  H01S3/225

摘要： A line-narrowed excimer or molecular fluorine laser system includes a discharge chamber filled with a gas mixture at least including molecular fluorine and a buffer gas, multiple electrodes within the discharge chamber connected to a discharge circuit for energizing the gas mixture, a resonator including a pair of resonator reflecting surfaces disposed on either side of the discharge chamber for generating a laser beam, and a line-narrowing/selection unit within the resonator for narrowing the bandwidth of the laser beam. The resonator further includes a third reflecting surface which is deformable and disposed between the pair of resonator reflecting surfaces. The line-narrowing/selection unit preferably includes a beam expander and a dispersive element, wherein the deformable third reflecting surface is disposed between the beam expander and the dispersive element.

摘要翻译： 线狭窄的准分子或分子氟激光系统包括填充有至少包括分子氟和缓冲气体的气体混合物的放电室，放电室内的多个电极连接到用于激励气体混合物的放电电路，包括 一对谐振器反射表面，设置在用于产生激光束的放电室的任一侧上;以及在谐振器内的线窄选择单元，用于使激光束的带宽变窄。 谐振器还包括可变形并设置在该对谐振器反射表面之间的第三反射表面。 线条变窄/选择单元优选地包括光束扩展器和分散元件，其中可变形的第三反射表面设置在光束扩展器和色散元件之间。

公开(公告)号：US06829261B2

公开(公告)日：2004-12-07

申请号：US10425301

申请日：2003-04-29

申请人： Juergen Kleinschmidt

发明人： Juergen Kleinschmidt

IPC分类号： H01S310

CPC分类号： H05G2/003 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70041 ,  H05B41/34

摘要： A method is disclosed for stabilization of the radiation output of a gas discharge-coupled radiation source in pulsed operation, particularly of an EUV source based on a gas discharge. The object of the disclosed invention is to find a novel possibility for stabilizing the radiation output of a gas discharge-coupled radiation source in pulsed operation which allows the pulse energy to be regulated on the basis of pulse energy fluctuations of the radiation emission detected through measurements without requiring regular calibration measurements of the E(U) curve in the stationary operating regime with continuous pulse sequences. According to the invention, this object is met in that continuous measurements of the pulse energy and at least one influencing variable are carried out for every radiation pulse of the EUV source, time averages of the pulse energy and influencing variable are formed, and the deviation of the actual measurement values from the average values are determined, so that a proportionality factor dE/dU determined by statistical analysis is available for PI regulation in the operating point of the averaged pulse energy.

摘要翻译： 公开了一种用于在脉冲操作中稳定气体放电耦合辐射源的辐射输出的方法，特别是基于气体放电的EUV源。 所公开的发明的目的是找到在脉冲操作中稳定气体放电耦合辐射源的辐射输出的新颖可能性，其允许基于通过测量检测到的辐射发射的脉冲能量波动来调节脉冲能量 而不需要在具有连续脉冲序列的固定操作状态下对E（U）曲线进行常规校准测量。 根据本发明，满足这个目的在于对EUV源的每个辐射脉冲执行脉冲能量和至少一个影响变量的连续测量，形成脉冲能量和影响变量的时间平均值，并且偏差 确定来自平均值的实际测量值，使得通过统计分析确定的比例因子dE / dU可用于平均脉冲能量的操作点中的PI调节。

公开(公告)号：US06815900B2

公开(公告)日：2004-11-09

申请号：US10741882

申请日：2003-12-19

申请人： Imtiaz Ahmad ,  Juergen Kleinschmidt ,  Guido Schriever ,  Uwe Stamm ,  Sven Goetze

发明人： Imtiaz Ahmad ,  Juergen Kleinschmidt ,  Guido Schriever ,  Uwe Stamm ,  Sven Goetze

IPC分类号： H05H100

CPC分类号： H05G2/003

摘要： The invention is directed to a radiation source for generating extreme ultraviolet (EUV) radiation based on a hot, dense plasma generated by gas discharge. The object of the invention, to find a novel possibility for the realization of an EUV radiation source which achieves a high average radiation output in the EUV region and sufficiently long life and long-term stability, is met according to the invention in that a first electrode housing and a second electrode housing which are electrically separated from one another so as to be resistant to breakdown form parts of a vacuum chamber for a gas discharge for plasma generation, and the second electrode housing has an electrode collar which is enclosed concentrically by the first electrode housing so that the gas discharge is oriented substantially only parallel to the axis of symmetry of the electrode housings, and the electrode collar is stepped radially relative to the concentric insulator layer in such a way that at least one end region of the electrode collar is at a distance from the concentric insulator layer such that a concentric gap is formed. A substantially longer operating duration is achieved by the optimized electrode geometry in conjunction with material selection and effective heat dissipation.

摘要翻译： 本发明涉及一种用于基于由气体放电产生的热的致密等离子体产生极紫外（EUV）辐射的辐射源。 本发明的目的是为了发现实现EUV辐射源的新型可能性，其实现了EUV区域中的高平均辐射输出并且具有足够长的寿命和长期稳定性，根据本发明，满足第一 电极壳体和第二电极壳体，其彼此电分离，以便抵抗用于等离子体产生的气体放电的真空室的部件的分解，并且第二电极壳体具有电极套环，该电极套筒同心地包围 第一电极壳体，使得气体放电基本上仅平行于电极壳体的对称轴线定向，并且电极套环相对于同心绝缘体层级径向地延伸，使得电极套环的至少一个端部区域 距离同心绝缘体层一定距离，从而形成同心间隙。 通过优化的电极几何结构与材料选择和有效散热来实现更长的操作持续时间。

公开(公告)号：US06795473B1

公开(公告)日：2004-09-21

申请号：US09602184

申请日：2000-06-22

申请人： Juergen Kleinschmidt ,  Thomas Schroeder

发明人： Juergen Kleinschmidt ,  Thomas Schroeder

IPC分类号： H01S322

CPC分类号： G02B5/1838 ,  G02B5/1814 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/081 ,  H01S3/0812 ,  H01S3/1055 ,  H01S3/225

摘要： An excimer or molecular fluorine laser system includes a laser chamber filled with a gas mixture at least including a halogen-containing species and a buffer gas, and multiple electrodes with the laser chamber connected to a discharge circuit energizing the gas mixture. The laser chamber is within a laser resonator generating an output beam. The resonator includes a line-narrowing package for reducing a bandwidth of the output beam. The line-narrowing package includes a grating or grism element for use with a highly reflective (HR) and/or an anti-reflective (AR) dielectric coating. The grating may serve as a resonator reflector having a dielectric HR coating. The grating may be disposed before a HR mirror and thus have a dielectric AR or HR coating when the grating is configured in transmission or reflection mode, respectively. The grating may be used as an output coupler, and may be partially reflective with or without a coating. The grism may have a dielectric AR coating on any transmissive surface and a dielectric HR coating on any reflective surface.

摘要翻译： 准分子或分子氟激光系统包括填充有至少包含含卤物质和缓冲气体的气体混合物的激光室，以及激光室连接到对气体混合物通电的放电回路的多个电极。 激光室在产生输出光束的激光谐振器内。 谐振器包括用于减小输出光束的带宽的线窄化封装。 线条窄化包装包括用于高反射（HR）和/或抗反射（AR）电介质涂层的光栅或棱镜元件。 光栅可以用作具有介电HR涂层的谐振器反射器。 光栅可以设置在HR反射镜之前，并且因此在光栅被配置为透射或反射模式时分别具有介电AR或HR涂层。 光栅可以用作输出耦合器，并且可以是部分反射的，具有或不具有涂层。 棱镜可以在任何反射表面上的任何透射表面上具有介电AR涂层和介电HR涂层。

公开(公告)号：US06747741B1

公开(公告)日：2004-06-08

申请号：US09975091

申请日：2001-10-09

申请人： Juergen Kleinschmidt

发明人： Juergen Kleinschmidt

IPC分类号： G02B902

CPC分类号： G01J3/26

摘要： An apparatus measures a spectral distribution of a narrow-band laser beam generated by a line-narrowed excimer laser or a molecular fluorine laser system. The apparatus includes an an interferometric device disposed along an optical path of an output beam of the laser system such that the beam traverses the interferometric device on a first pass, a retro-reflector disposed after the interferometric device along the optical path for retro-reflecting the beam back through the interferometric device on a second pass, and a detector for detecting an intensity of the beam after the second pass through the interferometric device. Preferably, spectral information is determined when the free spectral range of the interferometric device is tuned and the detector measures the intensity of the beam at a plurality of free spectral ranges or when the wavelength of the output beam is tuned.

摘要翻译： 一种装置测量由窄线准分子激光器或分子氟激光系统产生的窄带激光束的光谱分布。 该装置包括沿着激光系统的输出光束的光路布置的干涉仪，使得光束在第一遍上穿过干涉测量装置，设置在沿着光路的干涉测量装置之后的回射反射器用于回射 在第二次通过时，光束通过干涉测量装置返回，以及检测器，用于在第二次通过干涉仪之后检测光束的强度。 优选地，当干涉测量装置的自由光谱范围被调谐并且检测器在多个自由光谱范围内测量光束的强度时，或当输出光束的波长被调谐时确定光谱信息。