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    Laser gas replenishment method
    5.
    发明授权
    Laser gas replenishment method 有权
    激光加气方式

    公开(公告)号：US06965624B2

    公开(公告)日：2005-11-15

    申请号：US10338779

    申请日：2003-01-06

    申请人： Hans-Stephan Albrecht ,  Klaus Wolfgang Vogler ,  Juergen Kleinschmidt ,  Thomas Schroeder ,  Igor Bragin ,  Vadim Berger ,  Uwe Stamm ,  Wolfgang Zschocke ,  Sergei Govorkov

    发明人： Hans-Stephan Albrecht ,  Klaus Wolfgang Vogler ,  Juergen Kleinschmidt ,  Thomas Schroeder ,  Igor Bragin ,  Vadim Berger ,  Uwe Stamm ,  Wolfgang Zschocke ,  Sergei Govorkov

    IPC分类号： G02B5/18 ,  G03F7/20 ,  H01S3/036 ,  H01S3/038 ,  H01S3/08 ,  H01S3/0971 ,  H01S3/1055 ,  H01S3/134 ,  H01S3/225 ,  H01S3/00 ,  H01S3/09 ,  H01S3/097 ,  H01S3/22

    CPC分类号： G03F7/70025 ,  G02B5/1814 ,  G02B5/1838 ,  G03F7/70575 ,  H01S3/02 ,  H01S3/036 ,  H01S3/038 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/08031 ,  H01S3/08045 ,  H01S3/0971 ,  H01S3/1055 ,  H01S3/134 ,  H01S3/225

    摘要： A method and apparatus is provided for stabilizing output beam parameters of a gas discharge laser by maintaining a molecular fluorine component of the laser gas mixture at a predetermined partial pressure using a gas supply unit and a processor. The molecular fluorine is provided at an initial partial pressure and is subject to depletion within the laser discharge chamber. Injections of gas including molecular fluorine are performed each to increase the partial pressure of molecular fluorine by a selected amount in the laser chamber preferably less than 0.2 mbar per injection, or 7% of an amount of F2 already within the laser chamber. A number of successive injections may be performed at selected intervals to maintain the constituent gas substantially at the initial partial pressure for maintaining stable output beam parameters. The amount per injection and/or the interval between injections may be varied based on the measured value of the driving voltage and/or a calculated amount of the molecular fluorine in the discharge chamber. The driving voltage is preferably determined to be in one of multiple driving voltage ranges that are adjusted based on the aging of the system. Within each range, gas injections and gas replacements are preferably performed based on total applied electrical energy to the discharge and/or alternatively, on time and/or pulse count.

    摘要翻译： 提供了一种用于通过使用气体供应单元和处理器将激光气体混合物的分子氟成分维持在预定分压来稳定气体放电激光器的输出光束参数的方法和装置。 分子氟以初始分压提供，并在激光放电室内耗尽。 每次喷射包括分子氟的气体，以在激光室中选择的量增加分子氟的分压，优选地每次注射小于0.2毫巴，或者已经在其中的2％的量的7％ 在激光室内。 可以以选定的间隔执行多次连续喷射，以维持构成气体基本处于初始分压，以维持稳定的输出光束参数。 每次注射量和/或注射间隔可以基于驱动电压的测量值和/或放电室中分子氟的计算量而变化。 驱动电压优选地被确定为基于系统的老化而被调整的多个驱动电压范围之一。 在每个范围内，气体注入和气体替换优选基于对放电的总施加电能和/或时间和/或脉冲计数进行。

    Molecular fluorine (F.sub.2) laser with narrow spectral linewidth
    6.
    发明授权
    Molecular fluorine (F.sub.2) laser with narrow spectral linewidth 失效
    具有窄光谱线宽的分子氟（F2）激光

    公开(公告)号：US6154470A

    公开(公告)日：2000-11-28

    申请号：US317527

    申请日：1999-05-24

    申请人： Dirk Basting ,  Sergei V. Govorkov ,  Uwe Stamm

    发明人： Dirk Basting ,  Sergei V. Govorkov ,  Uwe Stamm

    IPC分类号： H01S3/223 ,  H01S3/03 ,  H01S3/08 ,  H01S3/098 ,  H01S3/106 ,  H01S3/137 ,  H01S3/225

    CPC分类号： H01S3/225 ,  H01S3/08004 ,  H01S3/08036 ,  H01S3/1062 ,  H01S3/2258

    摘要： A molecular fluorine (F.sub.2) laser is provided wherein the gas mixture comprises molecular fluorine for generating a spectral emission including two or three closely spaced lines around 157 nm. An etalon provides line selection such that the output beam only includes one of these lines. The etalon may also serve to outcouple the beam and/or narrow the selected line. Alternatively, a prism provides the line selection and the etalon narrows the selected line. The etalon may be a resonator reflector which also selects a line, while another element outcouples the beam. The etalon plates, preferably uncoated, comprise a material that is transparent at 157 nm, such as CaF.sub.2, MgF.sub.2, LiF.sub.2, BaF.sub.2, SrF.sub.2, quartz and fluorine doped quartz. The etalon plates are separated by spacers comprising a material having a low thermal expansion constant, such as invar, zerodur.RTM., ultra low expansion glass, and quartz. A gas such as helium or a solid such as CaF.sub.2 that does not absorb radiation 157 nm fills the gap between the etalon plates, or the gap is evacuated. The gas mixture preferably further includes neon as a buffer gas. Another etalon may be used for line narrowing. One or more of a highly reflective mirror, a high finesse etalon or a prism with a highly reflective back surface may serve as a highly reflective resonator reflector. Any of one or more etalons, a prism, a brewster plate and a highly or partially reflective mirror may seal the laser discharge chamber.

    摘要翻译： 提供分子氟（F2）激光器，其中气体混合物包含用于产生包括在157nm附近的两个或三个紧密间隔的线的光谱发射的分子氟。 标准具提供线选择，使得输出光束仅包括这些线之一。 标准具还可用于将光束外耦合和/或使所选择的线变窄。 或者，棱镜提供线选择并且标准具缩小所选行。 标准具可以是也选择一条线的谐振器反射器，而另一个元件将光束耦合。 优选未涂覆的标准具板包括在157nm下透明的材料，例如CaF 2，MgF 2，LiF 2，BaF 2，SrF 2，石英和氟掺杂的石英。 标准具板由包括具有低热膨胀常数的材料的间隔物分离，例如invar，zerodur TM，超低膨胀玻璃和石英。 诸如氦气或诸如CaF 2的不吸收辐射的固体的气体157nm填充了标准具板之间的间隙，或间隙被排空。 气体混合物优选还包括作为缓冲气体的氖。 另一种标准具可用于线窄。 高反射镜，高精度标准具或具有高反射背面的棱镜中的一个或多个可以用作高反射谐振器反射器。 一个或多个标准具，棱镜，布鲁斯特板和高度或部分反射镜中的任何一个可以密封激光放电室。

    Preionization arrangement for a gas laser
    8.
    发明授权
    Preionization arrangement for a gas laser 失效
    气体激光器的预处理装置

    公开(公告)号：US06618422B2

    公开(公告)日：2003-09-09

    申请号：US09863931

    申请日：2001-05-22

    申请人： Igor Bragin ,  Ulrich Rebhan ,  Uwe Stamm ,  Dirk Basting

    发明人： Igor Bragin ,  Ulrich Rebhan ,  Uwe Stamm ,  Dirk Basting

    IPC分类号： H01S300

    CPC分类号： G03F7/70025 ,  H01S3/0384 ,  H01S3/0385

    摘要： A preionization device for a gas laser comprises an internal preionization electrode having a dielectric housing around it and an external preionization electrode displaced from the dielectric housing by a small gap. The dielectric housing includes two cylindrical regions of differing outer radii of curvature. An open end of the housing has a larger radius of curvature than the other end which is closed. The internal electrode connects to circuitry external to the discharge chamber via a conductive feedthrough which penetrates through the housing. The external circuitry prevents voltage oscillations caused by residual energy stored as capacitance in the dielectric housing. The external preionization electrode, which is connected electrically to one of the main discharge electrodes, is formed to shield the internal preionization electrode from the other main discharge electrode to prevent arcing therebetween. The external electrode is also formed to shield the outer gas volume and walls of the discharge chamber from the preionization unit. A semi-transparent external electrode prevents charged particles emanating from the main discharge area from settling on the housing and causing field distortion and discharge instabilities.

    摘要翻译： 用于气体激光器的预电离装置包括其周围具有介电壳体的内部预电离电极和通过小间隙从绝缘壳体移位的外部预电离电极。 介电壳体包括具有不同外部曲率半径的两个圆柱形区域。 外壳的开口端具有比封闭的另一端更大的曲率半径。 内部电极通过穿透壳体的导电馈通连接到放电室外部的电路。 外部电路防止由绝缘外壳中的电容存储的剩余能量引起的电压振荡。 与主放电电极之间电连接的外部预电离电极被形成为将内部预电离电极与另一个主放电电极屏蔽，以防止它们之间的电弧。 外部电极也形成为将外部气体体积和排出室的壁与预电离单元进行屏蔽。 半透明外部电极防止从主放电区域发出的带电粒子沉降在壳体上并导致场失真和放电不稳定。

    Molecular fluorine (F2) laser with narrow spectral linewidth
    9.
    发明授权
    Molecular fluorine (F2) laser with narrow spectral linewidth 失效
    具有窄光谱线宽的分子氟（F2）激光

    公开(公告)号：US06426966B1

    公开(公告)日：2002-07-30

    申请号：US09657396

    申请日：2000-09-08

    申请人： Dirk Basting ,  Sergei V. Govorkov ,  Uwe Stamm

    发明人： Dirk Basting ,  Sergei V. Govorkov ,  Uwe Stamm

    IPC分类号： H01S3098

    CPC分类号： H01S3/225 ,  H01S3/08004 ,  H01S3/08036 ,  H01S3/1062 ,  H01S3/2258

    摘要： A molecular fluorine (F2) laser is provided wherein the gas mixture comprises molecular fluorine for generating a spectral emission including two or three closely spaced lines around 157 nm. An etalon provides line selection such that the output beam only includes one of these lines. The etalon may also serve to outcouple the beam and/or narrow the selected line. Alternatively, a prism provides the line selection and the etalon narrows the selected line. The etalon may be a resonator reflector which also selects a line, while another element outcouples the beam. The etalon plates comprise a material that is substantially transparent at 157 nm, such as CaF2, MgF2, LiF2, BaF2, LiF, SrF2, quartz and fluorine doped quartz. The etalon plates are separated by spacers comprising a material having a low thermal expansion constant, such as invar, zerodur®, ultra low expansion glass, and quartz. A beam expander is preferably provided before the etalon for expanding the beam before the beam is incident on the etalon. The beam expander is preferably configured to reduce the divergence of the beam.

    摘要翻译： 提供分子氟（F2）激光器，其中气体混合物包含用于产生包括在157nm附近的两个或三个紧密间隔的线的光谱发射的分子氟。 标准具提供线选择，使得输出光束仅包括这些线之一。 标准具还可用于将光束外耦合和/或使所选择的线变窄。 或者，棱镜提供线选择并且标准具缩小所选行。 标准具可以是也选择一条线的谐振器反射器，而另一个元件将光束耦合。 标准普通板包括在157nm处基本上透明的材料，例如CaF 2，MgF 2，LiF 2，BaF 2，LiF，SrF 2，石英和氟掺杂的石英。 标准具板由包括具有低热膨胀常数的材料的间隔物分离，例如invar，zerodur，超低膨胀玻璃和石英。 优选地，在光束入射到标准具之前，在用于扩展光束的标准具之前提供光束扩展器。 光束扩展器优选地被配置为减小光束的发散度。

    Stabilization of angular and lateral laser beam position
    10.
    发明授权
    Stabilization of angular and lateral laser beam position 有权
    角度和横向激光束位置的稳定性

    公开(公告)号：US6014206A

    公开(公告)日：2000-01-11

    申请号：US162424

    申请日：1998-09-28

    申请人： Dirk Basting ,  Uwe Stamm ,  Klaus Mann ,  Jens Ohlenbusch

    发明人： Dirk Basting ,  Uwe Stamm ,  Klaus Mann ,  Jens Ohlenbusch

    IPC分类号： H01S3/139 ,  G01B11/26

    CPC分类号： G01B11/26

    摘要： The present invention is an apparatus and method for stabilization of laser output beam characteristics by automatically adjusting the angular and the lateral positions of the output beam. A component of the output beam is detected at a far field location and also at a near field location along an optical path of the component. Both the angular and the lateral positions of the output beam are determined, as well as characteristics of the output beam, after the component is detected at both the near and the far field locations. Both the angular position and the lateral position of the output beam are automatically adjusted to optimize the output beam. The adjustment of both the angular position and the lateral position are made possible by using a beam steering device preferably including two mirrors.

    摘要翻译： 本发明是通过自动调节输出光束的角度和横向位置来稳定激光输出光束特性的装置和方法。 输出光束的分量在远场位置以及沿着部件的光路的近场位置被检测。 在近场和远场位置都检测到组件之后，确定输出光束的角度和横向位置以及输出光束的特性。 自动调整输出光束的角位置和横向位置以优化输出光束。 通过使用优选地包括两个反射镜的光束转向装置，可以使得角位置和横向位置的调整成为可能。