A METHOD PERFORMED BY A CONTROL DEVICE FOR VERIFYING THE PERFORMANCE OF A UV-REACTOR, A CONTROL DEVICE, AND A UV-REACTOR

    公开(公告)号:US20230348296A1

    公开(公告)日:2023-11-02

    申请号:US18029528

    申请日:2021-10-11

    发明人: Peter SAHLÉN

    IPC分类号: C02F1/00 C02F1/32

    摘要: In a method performed by a control device for verifying the performance of a UV-reactor for treating ballast water in marine vessels, the UV-reactor includes at least one UV-light source; at least one UV-light sensor; an inlet and an outlet for liquid; and the control device. The method includes controlling a cleaning process of the UV-reactor; controlling a flow of fresh water into the UV-reactor for filling the UV-reactor with fresh water; recording a UV-intensity, value from the at least one UV-light source by the at least one UV-light sensor; comparing the recorded UV-intensity value with a setpoint UV-intensity value, the setpoint value being either a default value or is defined at commissioning of the UV-light source; and generating a user alert, if the recorded UV-intensity value is lower than the setpoint value. A control device and a UV-reactor are also disclosed.

    Direct water purifier
    46.
    发明授权

    公开(公告)号:US11802062B2

    公开(公告)日:2023-10-31

    申请号:US17252152

    申请日:2019-06-14

    摘要: A direct water purifier includes a first filter for filtering water introduced through a first flow path; a second filter for receiving the water supplied from the first filter through a second flow path and filtering the same; a first valve disposed in the second flow path to control water flow; a pump disposed in the second flow path to supply water having a predetermined hydraulic pressure or higher to the second filter; a third filter for receiving the water supplied from the second filter through a third flow path and filtering the same; a heating part for receiving the water supplied from the third filter and heating the same to a predetermined temperature; and a flushing valve disposed in a flushing flow path through which concentrated water is discharged from the second filter, wherein the flushing valve is opened during operation of the heating part.

    WAFER CLEANING WATER SUPPLY SYSTEM AND WAFER CLEANING WATER SUPPLY METHOD

    公开(公告)号:US20230335417A1

    公开(公告)日:2023-10-19

    申请号:US18026600

    申请日:2021-09-22

    发明人: Wataru SUGITA

    摘要: The wafer cleaning water supply system of the present invention has a wafer cleaning water production unit producing wafer cleaning water having a chemical agent, a replenishment pipe extending from the wafer cleaning water production unit, and a circulation-type cleaning water supply pipe connected to the replenishment pipe. The circulation-type cleaning water supply pipe feeds a liquid to a use point via a feeding pump and is provided with a supply-side flowmeter and a recovery-side flowmeter. The measurement results of the supply-side and recovery-side flowmeters and the water quality data obtained by a monitor of a sampling pipe for monitoring are transmitted to a control device, which controls the wafer cleaning water production unit. With such a configuration, the wafer cleaning water supply system involves a small amount of excess water, dissolved gas is less likely to be mixed with the wafer cleaning water, and space-saving is possible.