公开(公告)号：US5059792A

公开(公告)日：1991-10-22

申请号：US593742

申请日：1990-10-05

Applicant: Hiroyasu Kaga

Inventor： Hiroyasu Kaga

IPC: H01J37/06 ,  G01Q30/10 ,  H01J1/30 ,  H01J1/304 ,  H01J37/07 ,  H01J37/073

CPC classification number: H01J37/073 ,  H01J2237/06316

Abstract: A thermal field emission electron gun having a Ti/W chip wherein the fore end of the chip is formed to have a radius of curvature of 2000 .ANG. or above, whereby the drift of the FE noise is small and a lithography apparatus of high serviceability ratio is obtained.

Abstract translation: 一种具有Ti / W芯片的热场发射电子枪，其中芯片的前端形成为具有2000或更大的曲率半径，由此FE噪声的漂移小，并且使用率高的光刻设备 获得。

公开(公告)号：US4701620A

公开(公告)日：1987-10-20

申请号：US893180

申请日：1986-08-05

Applicant: Masahide Okumura ,  Takashi Matsuzaka ,  Genya Matsuoka ,  Norio Saitou

Inventor： Masahide Okumura ,  Takashi Matsuzaka ,  Genya Matsuoka ,  Norio Saitou

IPC: H01L21/30 ,  H01J37/141 ,  H01J37/153 ,  H01J37/21 ,  H01J37/304 ,  H01L21/027 ,  G21K1/093 ,  H01J37/07

CPC classification number: H01J37/153 ,  H01J37/304

Abstract: Disclosed is an electron beam exposure apparatus which includes an objective lens focusing an electron beam, and a dynamic focus correction lens dynamically correcting the focusing by the objective lens. The apparatus comprises a control circuit which, in order to prevent a current variation induced in the objective lens by the dynamic focus correction lens, controls current supplied to the objective lens so as to cancel the current variation induced in the objective lens due to the coil current of the dynamic focus correction lens.

Abstract translation: 公开了一种电子束曝光装置，其包括聚焦电子束的物镜和动态校正透镜，动态校正物镜的聚焦。 该装置包括一个控制电路，为了防止物镜由动态聚焦校正透镜引起的电流变化，控制提供给物镜的电流，以消除由于线圈而引起的物镜中的电流变化 电流的动态聚焦校正镜头。

公开(公告)号：US3636346A

公开(公告)日：1972-01-18

申请号：US3636346D

申请日：1970-03-16

Applicant: HITACHI LTD

Inventor： AKAHORI HIROSHI ,  OHNUMA YOSHIRO ,  KUBOZOE MORIOKI

IPC: G01Q30/16 ,  H01J37/067 ,  H01J37/07 ,  H01J37/26

CPC classification number: H01J37/067 ,  H01J37/07

Abstract: An electron beam generator for electron microscopes or the like apparatus comprising an electron gun, an anode placed in a position opposite to the electron gun, and an electron gun chamber containing therein the electron gun and the anode, wherein either an electrical insulation layer is formed on the inner surface of the electron gun chamber or a cylinder of an electrically insulating material is provided to enclose the electron gun and the anode.

公开(公告)号：US3483423A

公开(公告)日：1969-12-09

申请号：US3483423D

申请日：1967-12-12

Applicant: AIR REDUCTION

Inventor： HANKS CHARLES W

IPC: H01J37/07 ,  H01J29/56 ,  H01J29/46

CPC classification number: H01J37/07

公开(公告)号：US3452241A

公开(公告)日：1969-06-24

申请号：US3452241D

申请日：1966-09-06

Applicant: RCA CORP

Inventor： COLEMAN JOHN W

IPC: H01J3/02 ,  H01J37/063 ,  H01J37/07 ,  H01J29/46 ,  H01J29/56

CPC classification number: H01J37/07 ,  H01J3/029 ,  H01J37/063

公开(公告)号：US3400243A

公开(公告)日：1968-09-03

申请号：US38848064

申请日：1964-08-10

Applicant: MECH TRONICS CORP

Inventor： MCNABB LOUIS A

IPC: B23K15/06 ,  H01J37/07

CPC classification number: B23K15/06 ,  H01J37/07

公开(公告)号：US3363961A

公开(公告)日：1968-01-16

申请号：US50080365

申请日：1965-10-22

Applicant: RCA CORP

Inventor： COLEMAN JOHN W ,  SCHULER JOSEPH J

IPC: H01J37/063 ,  H01J37/07

CPC classification number: H01J37/07 ,  H01J37/063

公开(公告)号：US3300676A

公开(公告)日：1967-01-24

申请号：US24993363

申请日：1963-01-07

Applicant: STAUFFER CHEMICAL CO

Inventor： STERZL CARL F

IPC: H01J37/07 ,  H01K3/04

CPC classification number: H01J37/07 ,  H01K3/04

公开(公告)号：US3286117A

公开(公告)日：1966-11-15

申请号：US24993463

申请日：1963-01-07

Applicant: STAUFFER CHEMICAL CO

Inventor： DONLEVY ALFRED L

IPC: H01J37/07

CPC classification number: H01J37/07

公开(公告)号：US12145006B2

公开(公告)日：2024-11-19

申请号：US17970410

申请日：2022-10-20

Applicant: Varian Medical Systems, Inc.

Inventor： Mark Everett Trail ,  James Edward Clayton

IPC: A61N5/10 ,  H01J3/10 ,  H01J35/06 ,  H01J35/14 ,  H01J37/07 ,  H01J37/073 ,  H01J37/075 ,  H05H9/00 ,  H01J3/02 ,  H01J37/147

Abstract: Presented systems and methods facilitate efficient and effective monitoring of particle beams. In some embodiments, a radiation gun system comprises: a particle beam gun that generates a particle beam, and a gun control component that controls the gun particle beam generation characteristics, including particle beam fidelity characteristics. The particle beam characteristics can be compatible with FLASH radiation therapy. Resolution control of the particle beam generation can enable dose delivery at an intra-pulse level and micro-bunch level. The micro-bunch can include individual bunches per each 3 GHz RF cycle within the 5 to 15 μsec pulse-width. The FLASH radiation therapy dose delivery can have a bunch level resolution of approximately 4.4×10{circumflex over ( )}-6 cGy/bunch.