公开(公告)号：US20240216940A1

公开(公告)日：2024-07-04

申请号：US18342797

申请日：2023-06-28

Applicant: SEMES CO., LTD.

Inventor： Jun Young CHOI ,  Gui Su PARK ,  Young Jin JANG ,  Eun Jung LEE ,  Jun Hyun LIM

IPC: B05C9/06 ,  B05C11/10 ,  B05C13/02 ,  B05D1/22

CPC classification number: B05C9/06 ,  B05C11/1042 ,  B05C13/02 ,  B05D1/22

Abstract: The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a liquid treating chamber; a support configured to support a substrate within the liquid treating chamber; a first treating liquid supply unit configured to supply a first treating liquid to the liquid treating chamber to treat the substrate with the first treating liquid; and a second treating liquid supply unit configured to supply a second treating liquid to the liquid treating chamber to treat the substrate with the second treating liquid, and wherein the second treating liquid supply unit includes a cooler for cooling the second treating liquid.

公开(公告)号：US12025921B2

公开(公告)日：2024-07-02

申请号：US17487170

申请日：2021-09-28

Applicant: SEMES CO., LTD.

Inventor： Jun Ho Kim ,  Sang Hoon Lee ,  Jong Seok Seo

IPC: G03F7/40

CPC classification number: G03F7/40

Abstract: The inventive concept provides a cooling unit. In an embodiment, the cooling unit comprises: a cooling plate with a seating surface; a pin member arranged at the cooling plate and supporting a substrate; a decompression hole formed on the seating surface; a decompression path formed within the cooling plate and connected to the decompression hole; a decompression member for decompressing the decompression path; and a controller for controlling the decompression member, wherein the controller controls the decompression member to decompress a space between the substrate and the seating surface of the cooling plate and thereby adjusting a distance between the substrate and the seating surface of the cooling plate.

公开(公告)号：US20240213069A1

公开(公告)日：2024-06-27

申请号：US18528362

申请日：2023-12-04

Applicant: SEMES CO., LTD. ,  Daekhon International Inc.

Inventor： Nahyun LEE ,  Myungjin LEE ,  Jongsuk CHOI ,  Eunsang YOON ,  Seungwhan SUH ,  Junghag CHA ,  Sungjin LIM ,  Jinkwan HEO

IPC: H01L21/677 ,  B65G49/06

CPC classification number: H01L21/67709 ,  B65G49/061 ,  H01L21/6773 ,  B65G2201/0297

Abstract: Provided is a tower lift including a frame extending in a vertical direction, a carriage configured to move along the frame, a first coil arranged on a first surface of the frame, the first surface facing the carriage, a second coil arranged on the first surface of the frame and separated from the first coil, a first magnet connected to the carriage and located between the first coil and the second coil, and a second magnet connected to the carriage, located between the first magnet and the second coil, and separated from the first magnet.

公开(公告)号：US20240213048A1

公开(公告)日：2024-06-27

申请号：US18391661

申请日：2023-12-21

Applicant: SEMES CO., LTD.

Inventor： Jongwha Kang ,  Sunwook Jung ,  Wooram Lee ,  Byoungdoo Choi ,  Arah Cho ,  Dongwoon Park

IPC: H01L21/67 ,  H01L21/677

CPC classification number: H01L21/67051 ,  H01L21/6719 ,  H01L21/67225 ,  H01L21/67742

Abstract: A substrate processing apparatus includes a processing unit including a processing vessel with an internal space and a support unit configured to support a substrate and rotate the substrate in a first rotation direction in the internal space, and an exhaust unit configured to exhaust a gas from the internal space, wherein the exhaust unit includes an exhaust pipe providing an exhaust path for the gas exhausted from the internal space, and one or more connectors connecting the processing vessel to the exhaust pipe, and one end of the exhaust pipe is closed, and an open outlet is formed at a remaining end of the exhaust pipe to discharge the gas.

公开(公告)号：US20240212995A1

公开(公告)日：2024-06-27

申请号：US18390078

申请日：2023-12-20

Applicant: SEMES CO., LTD.

Inventor： Yoon Seok CHOI ,  Yun Sang KIM ,  Sang Jeong LEE ,  Jae Won SHIN ,  Jong Won PARK

IPC: H01J37/32

CPC classification number: H01J37/32697 ,  H01J37/32522 ,  H01J37/32541 ,  H01J37/3255 ,  H01J37/32724 ,  H01J2237/2007

Abstract: The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a chamber having a treating space; a support unit configured to support a substrate in the treating space; a window plate positioned above the treating space; and a conductive layer formed on the window plate, and wherein a bottom surface of the window plate is exposed to the treating space, and the conductive layer is formed on a top surface among a top surface and a bottom surface of the window plate.

公开(公告)号：US20240210836A1

公开(公告)日：2024-06-27

申请号：US18501265

申请日：2023-11-03

Applicant: SEMES CO., LTD.

Inventor： Myung A JEON ,  Young Seop CHOI ,  Bok Kyu LEE ,  Joo Sung LEE ,  Je Myung CHA

IPC: G03F7/42

CPC classification number: G03F7/422 ,  H01L21/67051

Abstract: Provided is a substrate processing apparatus and method capable of improving photoresist removal efficiency by using two different types of chemical liquids. The substrate processing apparatus comprises a substrate support unit for supporting and rotating a substrate; and a spray unit for discharging a substrate processing liquid onto the substrate using a nozzle structure, wherein the nozzle structure comprises a first inlet pipe for providing a first chemical liquid; a second inlet pipe for providing a second chemical liquid;
a reaction space module where the first chemical liquid and the second chemical liquid are mixed; and a discharge pipe for discharging a mixture solution of the first chemical liquid and the second chemical liquid into the substrate processing liquid, wherein the first chemical liquid contains ozone gas, and the second chemical liquid contains an OH component.

公开(公告)号：US20240208240A1

公开(公告)日：2024-06-27

申请号：US18390705

申请日：2023-12-20

Applicant: SEMES CO., LTD.

Inventor： Yong-Deuk CHEONG

IPC: B41J2/21

CPC classification number: B41J2/2128 ,  B41J2/2132

Abstract: Disclosed is a droplet processing device which improves an operation of generating a droplet image during the conventional operation of generating a droplet image for forming a thin film on a substrate, thereby significantly reducing the generation time of the droplet image.
The droplet processing device includes: an inkjet system for receiving input of a droplet image and applying ink to cause the droplet image to be printed on a substrate; and a droplet image generating terminal for transmitting the droplet image to the inkjet system, in which the droplet image is generated by collecting a plurality of cell print data printed on the substrate and peripheral print data printed on a periphery of the cell into single polygonal information, and rasterising and halftoning the collected polygonal information.

公开(公告)号：US20240208211A1

公开(公告)日：2024-06-27

申请号：US18182577

申请日：2023-03-13

Applicant: SEMES CO., LTD.

Inventor： Dong Hwa LEE ,  Dai Geon YOON ,  Bong Man CHOI ,  Jong Suk WON ,  Hyeong Jun CHO

IPC: B41J2/045 ,  B41J2/14

CPC classification number: B41J2/04583 ,  B41J2/14451

Abstract: Provided is a pressure control device for stably controlling the internal air pressure of a reservoir. The pressure control device includes: an input terminal receiving source air pressure; an intake valve connected between the input terminal and an output terminal; an exhaust valve connected to the output terminal; a pressure sensor connected to the output terminal and generating a sensed value by sensing pressure at the output terminal; and a controller simultaneously operating the intake valve and the exhaust valve by simultaneously operating a first control loop for adjusting the degree of opening of the intake valve by comparing the sensed value with a first target value and a second control loop for adjusting the degree of opening of the exhaust valve by comparing the sensed value with a second target value.

公开(公告)号：US12017234B2

公开(公告)日：2024-06-25

申请号：US17225892

申请日：2021-04-08

Applicant: SEMES CO., LTD.

Inventor： Min Jung Park

IPC: B05B1/04 ,  B05B3/02 ,  B05C5/02

CPC classification number: B05B1/044 ,  B05B3/025 ,  B05C5/0254

Abstract: A nozzle apparatus may comprise a nozzle body having a nozzle tip with a discharge port for spraying a treatment fluid onto a substrate; a nozzle moving member for moving the nozzle body relative to the substrate; a rotating member for rotating the nozzle body or the nozzle tip so that a treatment fluid is sprayed onto the substrate during rotation; and a control unit configured to control an operation of the nozzle moving member and the rotating member.

公开(公告)号：US20240206027A1

公开(公告)日：2024-06-20

申请号：US18538765

申请日：2023-12-13

Applicant: SEMES CO., LTD.

Inventor： Han Lim KANG ,  Yoon Seok CHOI ,  Sung Suk WI

IPC: H05B6/64

CPC classification number: H05B6/6402

Abstract: A thermal processing apparatus using microwaves and a method of operating the same are proposed. Provided is the thermal processing apparatus and an operation method thereof capable of converting a mode of the microwaves emitted into a processing space without changing equipment design. The thermal processing apparatus using microwaves includes a chamber configured to form the thermal processing space for a substrate and have an inner wall to which an electrophoresis film attached, a substrate support unit positioned on a lower part of the thermal processing space and supporting the substrate, a microwave unit positioned on an upper part of the thermal processing space and forming an electromagnetic field generated by the microwaves in the thermal processing space, and a controller for controlling the electrophoretic film so as to control movement paths of the microwaves on the basis of a process condition and a size of the substrate.