公开(公告)号：US20070284246A1

公开(公告)日：2007-12-13

申请号：US11447946

申请日：2006-06-07

申请人： Douglas Keil ,  Eric Hudson ,  Chris Kimball ,  Andreas Fischer

发明人： Douglas Keil ,  Eric Hudson ,  Chris Kimball ,  Andreas Fischer

IPC分类号： C23C14/00

CPC分类号： C23C16/52 ,  C23C16/509 ,  H01J37/32935 ,  H01J37/3299

摘要： A method of fault detection for use in a plasma processing chamber is provided. The method comprises monitoring plasma parameters within a plasma chamber and analyzing the resulting information. Such analysis enables detection of failures and the diagnosis of failure modes in a plasma processing reactor during the course of wafer processing. The method comprises measuring the plasma parameters as a function of time and analyzing the resulting data. The data can be observed, characterized, compared with reference data, digitized, processed, or analyzed in any way to reveal a specific fault. Monitoring can be done with a detector such as a probe, which is preferably maintained within the plasma chamber substantively coplanar with a surface within the chamber, and directly measures net ion flux and other plasma parameters. The detector is preferably positioned at a grounded surface within the reactor such as a grounded showerhead electrode, and can be of a planar ion flux probe (PIF) type or a non-capacitive type. Chamber faults that can be detected include a build-up of process by-products in the process chamber, a helium leak, a match re-tuning event, a poor stabilization rate, and a loss of plasma confinement. If the detector is a probe, the probe can be embedded in a part of a plasma processing chamber and can comprises one or more gas feed-through holes.

摘要翻译： 提供了一种用于等离子体处理室的故障检测方法。 该方法包括监测等离子体室内的等离子体参数并分析所得到的信息。 这样的分析使得能够在晶片处理过程中检测等离子体处理反应器中的故障和故障模式的诊断。 该方法包括测量作为时间的函数的等离子体参数并分析所得到的数据。 数据可以观察，表征，与参考数据进行比较，数字化，处理或分析，以显示特定故障。 可以用诸如探针的检测器进行监测，该探针优选地保持在与腔室内的表面基本上共面的等离子体室内，并且直接测量净离子通量和其它等离子体参数。 检测器优选地位于反应器内的接地表面，例如接地喷头电极，并且可以是平面离子通量探针（PIF）型或非电容型。 可以检测到的室内故障包括处理室中的过程副产物的积聚，氦泄漏，匹配重新调谐事件，差的稳定化速率和等离子体约束的损失。 如果检测器是探针，则探针可以嵌入在等离子体处理室的一部分中，并且可以包括一个或多个气体馈通孔。

公开(公告)号：US07244336B2

公开(公告)日：2007-07-17

申请号：US10736666

申请日：2003-12-17

申请人： Andreas Fischer ,  Peter Loewenhardt

发明人： Andreas Fischer ,  Peter Loewenhardt

IPC分类号： C23F1/00

CPC分类号： H01L21/68735 ,  H01J37/32642 ,  H01L21/67069

摘要： A temperature-controlled hot edge ring assembly adapted to surround a substrate support in a plasma reaction chamber. The assembly includes a conductive lower ring, a ceramic intermediate ring, and an upper ring. The intermediate ring overlies the lower ring and is adapted to be attached via the lower ring to an RF electrode. The upper ring overlies the intermediate ring, and has an upper surface exposed to an interior of a plasma reaction chamber.

摘要翻译： 适于围绕等离子体反应室中的衬底支撑件的温度控制的热边缘环组件。 组件包括导电下环，陶瓷中间环和上环。 中间环覆盖在下环上并且适于经由下环连接到RF电极。 上环覆盖中间环，并且具有暴露于等离子体反应室内部的上表面。

公开(公告)号：US07193173B2

公开(公告)日：2007-03-20

申请号：US10883583

申请日：2004-06-30

申请人： Mark Wiepking ,  Bradford J. Lyndaker ,  Andras Kuthi ,  Andreas Fischer

发明人： Mark Wiepking ,  Bradford J. Lyndaker ,  Andras Kuthi ,  Andreas Fischer

IPC分类号： B23K10/00

CPC分类号： H01J37/32009 ,  H01J37/32082 ,  H01J37/32706

摘要： A method in a plasma processing system for processing a semiconductor substrate is disclosed. The plasma processing system includes a plasma processing chamber and an electrostatic chuck coupled to a bias compensation circuit. The method includes igniting a plasma in a plasma ignition step. Plasma ignition step is performed while a first bias compensation voltage provided by the bias compensation circuit to the chuck is substantially zero and while a first chamber pressure within the plasma processing chamber is below about 90 mTorr. The method further includes processing the substrate in a substrate-processing step after the plasma is ignited. The substrate-processing step employs a second bias compensation voltage provided by the bias compensation circuit that is higher than the first bias compensation voltage and a second chamber pressure substantially equal to the first chamber pressure.

摘要翻译： 公开了一种用于处理半导体衬底的等离子体处理系统中的方法。 等离子体处理系统包括等离子体处理室和耦合到偏置补偿电路的静电卡盘。 该方法包括在等离子体点火步骤中点燃等离子体。 当偏置补偿电路向卡盘提供的第一偏置补偿电压基本上为零并且等离子体处理室内的第一室压力低于约90mTorr时，执行等离子体点火步骤。 该方法还包括在等离子体点燃之后的衬底处理步骤中处理衬底。 基板处理步骤采用由偏置补偿电路提供的第二偏置补偿电压，该偏置补偿电压高于第一偏置补偿电压，第二室压力基本上等于第一室压力。

公开(公告)号：US20060278340A1

公开(公告)日：2006-12-14

申请号：US11152022

申请日：2005-06-13

申请人： Andreas Fischer

发明人： Andreas Fischer

IPC分类号： C23F1/00

CPC分类号： H01J37/32623 ,  H01J37/32642

摘要： A plasma reactor comprises a chamber, a bottom electrode, a top electrode, a first set of confinement rings, a second set of confinement rings, and a ground extension. The top and bottom electrodes, the first and second sets of confinement rings, and the ground extension are all enclosed within the chamber. The first set of confinement rings is substantially parallel to the bottom electrode and the top electrode and surrounds a first volume between the bottom electrode and the top electrode. The second set of confinement rings is substantially parallel to the bottom electrode and the top electrode and surrounds a second volume between the bottom electrode and the top electrode. The second volume is at least greater than the first volume. A ground extension is adjacent to and surrounds the bottom electrode. The first set of confinement rings and the second set of confinement rings are capable of being raised and lowered to extend into a region above the ground extension.

摘要翻译： 等离子体反应器包括腔室，底部电极，顶部电极，第一组约束环，第二组约束环和地面延伸部。 顶部和底部电极，第一组和第二组约束环和接地延伸部都被封闭在腔室内。 第一组限制环基本上平行于底部电极和顶部电极并围绕底部电极和顶部电极之间的第一容积。 第二组限制环基本上平行于底部电极和顶部电极并围绕底部电极和顶部电极之间的第二体积。 第二卷至少大于第一卷。 接地延伸部分邻近并包围底部电极。 第一组限制环和第二组限制环能够被升高和降低以延伸到地面延伸部上方的区域中。

公开(公告)号：US07138708B2

公开(公告)日：2006-11-21

申请号：US10495233

申请日：2002-10-15

申请人： Rainer Topp ,  Dirk Balszunat ,  Christoph Ruf ,  Andreas Fischer

发明人： Rainer Topp ,  Dirk Balszunat ,  Christoph Ruf ,  Andreas Fischer

IPC分类号： H01L25/07 ,  H01L23/48

CPC分类号： H01L25/162 ,  H01L23/13 ,  H01L23/49833 ,  H01L23/5385 ,  H01L2924/0002 ,  H01L2924/00

摘要： An electronic system having a sandwich design and including two carriers, each carrier having a printed circuit layer, the upper printed circuit layer being positioned on different planes.

摘要翻译： 具有夹层结构并包括两个载体的电子系统，每个载体具有印刷电路层，上部印刷电路层位于不同的平面上。

公开(公告)号：US07026174B2

公开(公告)日：2006-04-11

申请号：US10261403

申请日：2002-09-30

申请人： Andreas Fischer

发明人： Andreas Fischer

IPC分类号： H01L21/66 ,  H01L21/3065 ,  H02N13/00

CPC分类号： H01L21/67069 ,  H01J2237/0206 ,  H01L21/31116 ,  H01L21/6831

摘要： A method for reducing wafer damage during an etching process is provided. In one of the many embodiments, the method includes assigning a bias voltage to each of at least one etching process, and generating the assigned bias voltage before initiation of one of the at least one etching process. The method further includes applying the assigned bias voltage to an electrostatic chuck before initiation of one of the at least one etching processes. The assigned bias voltage level reduces wafer arcing.

摘要翻译： 提供了一种在蚀刻过程中减少晶片损伤的方法。 在许多实施例中的一个实施例中，该方法包括将偏压分配给至少一个蚀刻工艺中的每一个，以及在开始至少一个蚀刻工艺之一之前产生所分配的偏置电压。 该方法还包括在开始至少一个蚀刻工艺之一之前将所分配的偏置电压施加到静电卡盘。 分配的偏置电压电平可降低晶圆电弧。

公开(公告)号：US07017835B2

公开(公告)日：2006-03-28

申请号：US10606983

申请日：2003-06-26

申请人： Kurt Vetter ,  Rolf Schneider ,  Andreas Fischer ,  Robert F. Heldt

发明人： Kurt Vetter ,  Rolf Schneider ,  Andreas Fischer ,  Robert F. Heldt

IPC分类号： B05B1/34

CPC分类号： B05B3/1064 ,  B05B3/1014 ,  B05B3/1042 ,  B05B3/1092 ,  B05B5/0407 ,  B05B5/0426 ,  B05B13/0452

摘要： A rotary atomizer applies particulate paints with good color matching by reducing paint droplet size deviation and then optimizing the other paint spraying parameters. Paint droplet size parameters are reduced by using a bell cup having reduced flow deviations, including an overflow surface having a generally constant angle between a deflector and an atomizing edge.

公开(公告)号：US20050130620A1

公开(公告)日：2005-06-16

申请号：US10735881

申请日：2003-12-16

申请人： Andreas Fischer

发明人： Andreas Fischer

IPC分类号： H01J37/32 ,  H01L20060101 ,  H04B1/28

CPC分类号： H01J37/32082 ,  H01J37/32532

摘要： A segmented radio frequency (RF) powered electrode for use in plasma processing. The electrode includes a first electrode, a second electrode surrounding the first electrode, and a dielectric material interposed between the first electrode and the second electrode. The dielectric material electrically isolates the first electrode from the second electrode. At least one dual frequency radio frequency power source outputs RF power at a first frequency and a second frequency. The first frequency and the second frequency are different such that at least one radio frequency switch routes at least the first frequency or the second frequency from the at least one dual frequency source to the first electrode, the second electrode, or the first electrode and the second electrode.

摘要翻译： 用于等离子体处理的分段射频（RF）电源电极。 电极包括第一电极，围绕第一电极的第二电极和插在第一电极和第二电极之间的电介质材料。 电介质材料将第一电极与第二电极电隔离。 至少一个双频射频功率源以第一频率和第二频率输出RF功率。 第一频率和第二频率是不同的，使得至少一个射频开关至少将第一频率或第二频率从至少一个双频源引导到第一电极，第二电极或第一电极，以及 第二电极。

公开(公告)号：US20050062315A1

公开(公告)日：2005-03-24

申请号：US10504991

申请日：2003-02-18

申请人： Dirk Andritter ,  Stefan Schmidgall ,  Hans Schlingmann ,  Ralf Schmidt ,  Reinhold Bruckner ,  Dirk Kersting ,  Andreas Fischer ,  Martin Gehring ,  Horst Winkelmann

发明人： Dirk Andritter ,  Stefan Schmidgall ,  Hans Schlingmann ,  Ralf Schmidt ,  Reinhold Bruckner ,  Dirk Kersting ,  Andreas Fischer ,  Martin Gehring ,  Horst Winkelmann

IPC分类号： B60K11/04 ,  B62D25/08 ,  B60N2/00

CPC分类号： B62D25/084 ,  B60K11/04

摘要： A assembly support (33) of a front end of a motor vehicle is proposed, having at least one cooling module (1) which is detachably fixed to the assembly support (33) by means of at least two connecting points (9, 15; 11, 13). The assembly support (33) is characterized in that one of the connecting points (9; 11) is embodied as a pivot bearing (17; 19), and in that the other of the connecting points (13; 15) is embodied as a clip connection (21; 23). In addition, a method for detachably fixing a cooling module (1) to a assembly support (33) of a front end of a motor vehicle is proposed.

摘要翻译： 提出了一种机动车辆前端的组件支撑件（33），其具有至少一个冷却模块（1），其通过至少两个连接点（9,15; 15）可拆卸地固定到组件支撑件（33）上。 11，13）。 组件支撑件（33）的特征在于，连接点（9; 11）中的一个被实施为枢转轴承（17; 19），并且连接点（13; 15）中的另一个被实施为 夹子连接件（21; 23）。 此外，提出了一种用于将冷却模块（1）可拆卸地固定到机动车辆的前端的组装支撑件（33）的方法。

公开(公告)号：US06578423B2

公开(公告)日：2003-06-17

申请号：US10150022

申请日：2002-05-20

申请人： Andreas Fischer

发明人： Andreas Fischer

IPC分类号： G01N2900

CPC分类号： G03F7/707 ,  G01N29/12 ,  G01N2291/02827 ,  G01N2291/2698 ,  H01L21/67259 ,  H01L21/6831

摘要： In a vacuum processing chamber, a monitoring arrangement for detecting when a substrate is sufficiently dechucked by an electrostatic clamp to allow safe movement thereof by a transfer mechanism such as a pin lifter. The monitoring arrangement includes an acoustic generator which outputs a sound wave at the resonant frequency of the substrate and the dechucking condition is detected when the sound wave is adsorbed by the substrate. The arrangement can be used during processing of wafers such as plasma etching or chemical vapor deposition.