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    ROTARY ATOMIZING HEAD TYPE COATING MACHINE
    3.
    发明申请
    ROTARY ATOMIZING HEAD TYPE COATING MACHINE 审中-公开

    公开(公告)号：US20170128969A1

    公开(公告)日：2017-05-11

    申请号：US15318569

    申请日：2016-03-02

    Applicant: ABB K.K.

    Inventor： Kuniharu YAMAUCHI

    IPC: B05B15/02 ,  B05B5/04 ,  B05B5/08 ,  B05B3/10

    CPC classification number: B05B3/1014 ,  B05B3/10 ,  B05B5/04 ,  B05B5/0407 ,  B05B5/0415 ,  B05B5/0426 ,  B05B5/043 ,  B05B5/08 ,  B05B15/555

    Abstract: A rotary atomizing head (7) is provided with an outer peripheral surface washing passage (14) open onto anatomizing head outer peripheral surface (13) for causing wash fluid supplied from a feed tube (6) to flow out into an annular clearance (20) between the rotary atomizing head (7) and a shaping air ring (15). An outflow opening (14C1) of an outflow passage (14C) constituting the outer peripheral surface washing passage (14) is provided in a position closer to the backside into the annular clearance (20) by a length dimension (L1) than a front end surface (17A) of a front ring section (17) constituting the shaping air ring (15). Further, the outflow opening (14C1) opens to the annular clearance (20) in an angle (α1) that is an acute angle to the atomizing head outer peripheral surface (13).

    Rotary atomizing head type coating machine
    4.
    发明授权
    Rotary atomizing head type coating machine 有权
    旋转雾化头式涂布机

    公开(公告)号：US09399231B2

    公开(公告)日：2016-07-26

    申请号：US14236244

    申请日：2012-11-14

    Applicant: ABB K.K.

    Inventor： Kuniharu Yamauchi

    IPC: B05B3/00 ,  B05B3/10 ,  B05B5/04 ,  B05B5/00

    CPC classification number: B05B3/1092 ,  B05B3/001 ,  B05B3/1014 ,  B05B3/1035 ,  B05B3/1064 ,  B05B5/001 ,  B05B5/0415 ,  B05B5/0426

    Abstract: A bearing air passage through which bearing air is supplied toward an air bearing of an air motor and a turbine air passage through which driving air is supplied toward a turbine are provided in a housing. An annular space surrounding the air motor is provided between the housing and a cover. A bearing air branch passage connecting the annular space and the bearing air passage to each other and a turbine air branch passage for connecting the annular space and the turbine air passage to each other are provided. The air branch passages lead a part of the compressed air to the annular space and keep the cover in a heated state.

    Abstract translation: 轴承空气通道，通过该轴承空气通道朝向气动马达的空气轴承供应轴承空气通道，并且在壳体中设置有向涡轮机供应驱动空气的涡轮空气通道。 围绕空气马达的环形空间设置在壳体和盖之间。 提供将环状空间与轴承空气通路相互连接的轴承空气支路，以及将环状空间与涡轮空气通路相互连接的涡轮空气支路。 空气分支通道将一部分压缩空气引导到环形空间并将盖保持在加热状态。

    Rotatable Shroud for Directional Control of Application Area
    6.
    发明申请
    Rotatable Shroud for Directional Control of Application Area 有权
    可旋转护罩用于应用领域的定向控制

    公开(公告)号：US20150258555A1

    公开(公告)日：2015-09-17

    申请号：US14431562

    申请日：2013-09-26

    Applicant: AGCO CORPORATION

    Inventor： John Peterson ,  Jeffrey Zimmerman ,  Justin Bak

    IPC: B05B3/10

    CPC classification number: A01M7/006 ,  A01M7/005 ,  B05B3/085 ,  B05B3/1014 ,  B05B3/1021 ,  B05B3/1064 ,  B05B12/34 ,  B05B13/005 ,  B05B15/652

    Abstract: A controlled droplet application (CDA) nozzle has a CDA nozzle cone having a first axis of rotation in a first position and, after adjustment, a second axis of rotation in a second position orthogonal to the first. A rotationally adjustable directional shroud surrounds at least a portion of the cone, the directional shroud blocking at least a portion of a lip of the cone regardless of whether the cone is positioned in the first or second axis of rotation.

    Abstract translation: 受控液滴施加（CDA）喷嘴具有在第一位置具有第一旋转轴线的CDA喷嘴锥体，并且在调节之后，在与第一位置正交的第二位置中的第二旋转轴线。 旋转可调节的定向护罩围绕锥体的至少一部分，定向护罩阻挡锥体的唇缘的至少一部分，而不管锥体是否位于第一或第二旋转轴线。

    Horizontally Rotating Controlled Droplet Application
    7.
    发明申请
    Horizontally Rotating Controlled Droplet Application 有权
    水平旋转控制液滴应用

    公开(公告)号：US20150251198A1

    公开(公告)日：2015-09-10

    申请号：US14432267

    申请日：2013-09-25

    Applicant: AGCO CORPORATION

    Inventor： Justin Bak ,  John Peterson

    IPC: B05B3/02

    CPC classification number: B05B3/02 ,  B05B3/085 ,  B05B3/1014 ,  B05B3/1021 ,  B05B3/1064 ,  B05B12/34

    Abstract: A controlled droplet application (CDA) nozzle including a cone having plural ridges disposed longitudinally on an interior surface of the cone; and a fin assembly connected to the interior surface, the fin assembly comprising a plurality of fins extending between a central portion of the cone and the interior surface, wherein adjacent pairs of the plurality of fins and the interior surface at least partially define a respective compartment for the collection of a defined volume of fluid.

    Abstract translation: 一种受控的液滴施加（CDA）喷嘴，包括一锥形体，该锥体具有纵向设置在锥体的内表面上的多个脊; 以及连接到所述内表面的翅片组件，所述翅片组件包括在所述锥体的中心部分和所述内表面之间延伸的多个翅片，其中所述多个翼片和所述内表面的相邻对至少部分地限定相应的隔室 用于收集定义体积的流体。

    IMPROVED WAFER COATING
    9.
    发明申请
    IMPROVED WAFER COATING 审中-公开
    改进的涂层

    公开(公告)号：US20150221505A1

    公开(公告)日：2015-08-06

    申请号：US14658102

    申请日：2015-03-13

    Applicant: Jungrae Park ,  Wei-Sheng Lei ,  Prabhat Kumar ,  James S. Papanu ,  Brad Eaton ,  Ajay Kumar

    Inventor： Jungrae Park ,  Wei-Sheng Lei ,  Prabhat Kumar ,  James S. Papanu ,  Brad Eaton ,  Ajay Kumar

    IPC: H01L21/02 ,  H01L21/683 ,  H01L21/308 ,  B05B3/10 ,  B05B1/00

    CPC classification number: H01L21/02282 ,  B05B1/00 ,  B05B3/1014 ,  B05B3/1035 ,  H01L21/3081 ,  H01L21/3086 ,  H01L21/6715 ,  H01L21/6835 ,  H01L21/78 ,  H01L2221/68327

    Abstract: Improved wafer coating processes, apparatuses, and systems are described. In one embodiment, an improved spin-coating process and system is used to form a mask for dicing a semiconductor wafer with a laser plasma dicing process. In one embodiment, a spin-coating apparatus for forming a film over a semiconductor wafer includes a rotatable stage configured to support the semiconductor wafer. The rotatable stage has a downward sloping region positioned beyond a perimeter of the semiconductor wafer. The apparatus includes a nozzle positioned above the rotatable stage and configured to dispense a liquid over the semiconductor wafer. The apparatus also includes a motor configured to rotate the rotatable stage.

    Abstract translation: 描述了改进的晶片涂布工艺，装置和系统。 在一个实施例中，改进的旋涂工艺和系统用于形成用激光等离子体切割工艺切割半导体晶片的掩模。 在一个实施例中，用于在半导体晶片上形成膜的旋涂装置包括被配置为支撑半导体晶片的可旋转台。 可旋转台具有位于半导体晶片周边之外的向下倾斜区域。 该设备包括位于可旋转台上方并被配置为在半导体晶片上分配液体的喷嘴。 该装置还包括构造成旋转可旋转台的马达。

    ROTARY ATOMIZING HEAD TYPE COATING MACHINE
    10.
    发明申请
    ROTARY ATOMIZING HEAD TYPE COATING MACHINE 有权
    旋转式头型涂布机

    公开(公告)号：US20150217306A1

    公开(公告)日：2015-08-06

    申请号：US14425181

    申请日：2014-04-15

    Applicant: ABB K.K.

    Inventor： Tomohiro Matsumoto

    IPC: B05B3/10

    CPC classification number: B05B3/1064 ,  B05B3/1007 ,  B05B3/1014 ,  B05B3/1035 ,  B05B3/1042 ,  B05B3/1092

    Abstract: An annular gap space (18), into which a part of turbine air for driving a turbine (6) and exhaust air discharged from a rear thrust air bearing (12) flow out, is provided between an inner peripheral surface (5B) of a rotational shaft (5) and an outer peripheral surface (17B) of a feed tube (17). Air outflow holes (25) are provided in the rotational shaft (5) to be positioned between a radial air bearing (8) and a rotary atomizing head (16) and to be radially bored through the rotational shaft (5). As a result, the exhaust air flowing in the annular gap space (18) flows out outside of the rotational shaft (5) from the air outflow holes (25) in a position behind the rotary atomizing head (16).

    Abstract translation: 一个环形间隙空间（18），一个用于驱动涡轮（6）的涡轮机空气的一部分和从后推力空气轴承（12）排出的废气流出的环形间隙空间（18）设置在 旋转轴（5）和进料管（17）的外周面（17B）。 空气流出孔（25）设置在旋转轴（5）中，以定位在径向空气轴承（8）和旋转雾化头（16）之间，并通过旋转轴（5）径向钻孔。 结果，在环形间隙空间18中流动的废气在旋转雾化头（16）的后方从空气流出孔（25）流出到旋转轴（5）的外侧。

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