公开(公告)号：US20120162629A1

公开(公告)日：2012-06-28

申请号：US13416716

申请日：2012-03-09

申请人： Boris Kobrin

发明人： Boris Kobrin

IPC分类号： G03B27/08 ,  G03B27/12

CPC分类号： G03F7/703 ,  G03B27/42 ,  G03F7/70325 ,  G03F7/7035 ,  G03F7/70358 ,  G03F7/704

摘要： Embodiments of the invention relate to methods and apparatus useful in the nanopatterning of large area substrates, where a rotatable mask is used to image a radiation-sensitive material. Typically the rotatable mask comprises a cylinder. The nanopatterning technique makes use of Near-Field photolithography, where the mask used to pattern the substrate is in contact or close proximity with the substrate. The Near-Field photolithography may make use of an elastomeric phase-shifting mask, or may employ surface plasmon technology, where a rotating cylinder surface comprises metal nano holes or nanoparticles.

公开(公告)号：US20090305513A1

公开(公告)日：2009-12-10

申请号：US12455938

申请日：2009-06-08

申请人： Boris Kobrin

发明人： Boris Kobrin

IPC分类号： H01L21/30 ,  B05D5/06 ,  B05D1/32

CPC分类号： H05K3/1258 ,  H05K3/1275 ,  H05K2201/09045 ,  H05K2203/0143 ,  H05K2203/0522 ,  H05K2203/0568 ,  H05K2203/1173

摘要： Embodiments of the invention relate to a method of functional materials deposition using a polymer template fabricated on a substrate. Such template forms an exposed and masked areas of the substrate material, and can be fabricated using polymer resists or Self-assembled monolayers. Deposition is performed using an applicator, which is fabricated in the shape of cylinder or cone made of soft elastomeric materials or laminated with soft elastomeric film. Functional materials, for example, metals, semiconductors, sol-gels, colloids of particles are deposited on the surface of applicator using liquid immersion, soaking, contact with wetted surfaces, vapor deposition or other techniques. Then wetted applicator is contacted the surface of the polymer template and rolled over it's surface. During this dynamic contact functional material is transferred selectively to the areas of the template. Patterning of functional material is achieved by lift-off of polymeric template after deposition. According to another embodiment, where self-assembled monolayers are used as template, selective deposition of functional materials is achieved either due to low surface energy of SAM or reactivity of terminal groups.

摘要翻译： 本发明的实施方案涉及使用在基底上制造的聚合物模板进行功能材料沉积的方法。 这种模板形成基底材料的暴露和掩蔽的区域，并且可以使用聚合物抗蚀剂或自组装单层制造。 使用施用器进行沉积，该施加器被制造成由柔性弹性体材料制成的圆筒或圆锥体形状，或者与柔性弹性体膜层压。 功能材料，例如金属，半导体，溶胶凝胶，粒子的胶体沉积在施涂器的表面上，使用液浸，浸泡，接触湿润表面，气相沉积或其它技术。 然后湿润的涂抹器与聚合物模板的表面接触并在其表面上滚动。 在该动态接触期间，功能材料被选择性地转移到模板的区域。 功能材料的图案化是通过在沉积后剥离聚合物模板来实现的。 根据另一个实施方案，其中使用自组装单层作为模板，功能材料的选择性沉积由于SAM的低表面能或端基的反应性而实现。

公开(公告)号：US20080248263A1

公开(公告)日：2008-10-09

申请号：US12077261

申请日：2008-03-17

申请人： Boris Kobrin

发明人： Boris Kobrin

IPC分类号： B32B33/00 ,  C23C16/00 ,  C08J7/18 ,  C23C14/02

CPC分类号： C23C16/403 ,  C08J7/16 ,  C23C16/45514 ,  Y10T428/24802

摘要： The present invention is related to a chemical vapor deposition method of depositing layers of materials to provide super-hydrophilic surface properties, or super-hydrophobic surface properties, or combinations of such properties at various locations on a given surface. The invention also relates to various product applications which make use of super-hydrophobic surface properties, such as electronic devices, biological analytical and diagnostic tools, and optical devices, for example.

摘要翻译： 本发明涉及沉积材料层以提供超亲水表面性质或超疏水性表面性质的化学气相沉积方法，或者给定表面上各种位置处的这些性质的组合。 本发明还涉及使用超疏水表面性质的各种产品应用，例如电子设备，生物分析和诊断工具以及光学装置。

公开(公告)号：US20060049826A1

公开(公告)日：2006-03-09

申请号：US10469516

申请日：2002-03-01

申请人： Michael Daneman ,  Franklin Wall ,  Behrang Behin ,  Murali Chaparala ,  Mark Chang ,  Scott Dalton ,  Timothy Beerling ,  Stephen Panyko ,  Meng-Hsiung Kiang ,  Boris Kobrin ,  Chuang-Chia Lin

发明人： Michael Daneman ,  Franklin Wall ,  Behrang Behin ,  Murali Chaparala ,  Mark Chang ,  Scott Dalton ,  Timothy Beerling ,  Stephen Panyko ,  Meng-Hsiung Kiang ,  Boris Kobrin ,  Chuang-Chia Lin

IPC分类号： G01B7/14

CPC分类号： G02B6/3518 ,  G02B6/3546 ,  G02B6/356 ,  G02B6/357 ,  G02B6/3572 ,  G02B6/3584 ,  G02B26/0841

摘要： An optical cross-connect switch comprises a base (216), a flap (211) and one or more electrically conductive landing pads (222) connected to the flap (211). The flap (211) has a bottom portion that is movably coupled to the base (216) such that the flap (211) is movable with respect to a plane of the base (216) from a first orientation to a second orientation. The one or more landing pads (222) are electrically isolated from the flap (211) and electrically coupled to be equipotential with a landing surface.

摘要翻译： 光学交叉连接开关包括底座（216），翼片（211）和连接到翼片（211）的一个或多个导电着陆垫（222）。 翼片（211）具有可移动地联接到基部（216）的底部部分，使得翼片（211）能够相对于基部（216）的平面从第一方向移动到第二方向。 一个或多个着陆垫（222）与翼片（211）电隔离并且电耦合以与着陆表面等电位。

公开(公告)号：US10249520B2

公开(公告)日：2019-04-02

申请号：US15616918

申请日：2017-06-08

申请人： Boris Kobrin

发明人： Boris Kobrin

IPC分类号： H01L21/67 ,  H01L23/00 ,  H01L21/683 ,  H01L33/62 ,  H01L33/00 ,  H01L21/68 ,  B06B1/06

摘要： Embodiments of the invention pertain to methods useful in transfer printing of small objects, like micro-LEDs from one substrate to another using acoustic or ultrasonic energy. The pickup of objects from a substrate is performed by transfer head equipped with sticky polymer and an array of ultrasonic transducers, and the high efficiency and selectivity of pickup of selected objects is done using ultrasonic energy directed towards the object. The disposing of objects to another substrate from a transfer head is done by directing an ultrasonic energy toward an object, which enable effective and selective detachment of an object from a sticky polymer. Yet another embodiment also uses a UV light source, which directs the light to the UV curable liquid disposed around the object on receiving substrate, thus curing this liquid would attach an object to receiving substrate.

公开(公告)号：US20180358246A1

公开(公告)日：2018-12-13

申请号：US15616918

申请日：2017-06-08

申请人： Boris Kobrin

发明人： Boris Kobrin

IPC分类号： H01L21/67 ,  H01L33/00 ,  H01L21/68 ,  H01L33/62 ,  H01L23/00 ,  H01L21/683

CPC分类号： H01L21/67144 ,  B06B1/0607 ,  H01L21/681 ,  H01L21/6835 ,  H01L24/78 ,  H01L24/83 ,  H01L24/85 ,  H01L24/92 ,  H01L33/0079 ,  H01L33/62 ,  H01L2221/68363 ,  H01L2221/68381 ,  H01L2224/78347 ,  H01L2224/83005 ,  H01L2224/83205 ,  H01L2224/838 ,  H01L2224/83851 ,  H01L2224/83874 ,  H01L2224/85005 ,  H01L2224/85205 ,  H01L2224/92247 ,  H01L2933/0066

摘要： Embodiments of the invention pertain to methods useful in transfer printing of small objects, like micro-LEDs from one substrate to another using acoustic or ultrasonic energy. The pickup of objects from a substrate is performed by transfer head equipped with sticky polymer and an array of ultrasonic transducers, and the high efficiency and selectivity of pickup of selected objects is done using ultrasonic energy directed towards the object. The disposing of objects to another substrate from a transfer head is done by directing an ultrasonic energy toward an object, which enable effective and selective detachment of an object from a sticky polymer. Yet another embodiment also uses a UV light source, which directs the light to the UV curable liquid disposed around the object on receiving substrate, thus curing this liquid would attach an object to receiving substrate.

公开(公告)号：US09465296B2

公开(公告)日：2016-10-11

申请号：US13546436

申请日：2012-07-11

申请人： Boris Kobrin

发明人： Boris Kobrin

IPC分类号： G03F7/24 ,  G03F7/20 ,  G03F1/34 ,  G03F1/00 ,  G03F7/00 ,  G03F1/50 ,  G03F1/60 ,  B82Y40/00

CPC分类号： G03F7/2035 ,  B82Y40/00 ,  G03F1/0007 ,  G03F1/0084 ,  G03F1/34 ,  G03F1/50 ,  G03F1/60 ,  G03F7/0012 ,  G03F7/2014 ,  G03F7/2032

摘要： Embodiments of the invention relate to methods and apparatus useful in the nanopatterning of large area substrates, where a movable nanostructured film is used to image a radiation-sensitive material. The nanopatterning technique makes use of Near-Field photolithography, where the nanostructured film used to modulate light intensity reaching radiation-sensitive layer. The Near-Field photolithography may make use of an elastomeric phase-shifting mask, or may employ surface plasmon technology, where a movable film comprises metal nano holes or nanoparticles.

摘要翻译： 本发明的实施例涉及在大面积基板的纳米图案中有用的方法和装置，其中使用可移动的纳米结构膜来对辐射敏感材料成像。 纳米图案技术利用近场光刻技术，其中纳米结构膜用于调制到达辐射敏感层的光强度。 近场光刻可以使用弹性体相移掩模，或者可以采用表面等离子体激元技术，其中可移动膜包括金属纳米孔或纳米颗粒。

公开(公告)号：US09069244B2

公开(公告)日：2015-06-30

申请号：US13767639

申请日：2013-02-14

申请人： Boris Kobrin

发明人： Boris Kobrin

IPC分类号： G03F7/24 ,  G03F1/00 ,  G03F7/00 ,  G03F1/92 ,  B82Y10/00 ,  B82Y40/00

CPC分类号： G03F1/00 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/92 ,  G03F7/0002 ,  G03F7/24

摘要： Methods for fabricating nanopatterned cylindrical photomasks are disclosed. A master pattern having nanometer scale features may be formed on a master substrate. A layer of an elastomer material may be formed on a surface of a transparent cylinder. The master pattern may be transferred from the master to the layer of elastomer material on the surface of the transparent cylinder. Alternatively, a nanopatterned cylindrical photomask may be fabricated by forming a pattern having nanometer scale features on an elastomer substrate and laminating the patterned elastomer substrate to a surface of a cylinder. In another method, a layer of elastomer material may be formed on a surface of a transparent cylinder and a pattern having nanometer scale features may be formed on the elastomer material by a direct patterning process.

摘要翻译： 公开了制备纳米图案圆柱形光掩模的方法。 具有纳米尺度特征的主图案可以形成在母板上。 可以在透明圆筒的表面上形成弹性体材料层。 主图案可以从主体转移到透明圆柱体表面上的弹性体材料层。 或者，可以通过在弹性体基底上形成具有纳米尺度特征的图案并将图案化的弹性体基底层压到圆柱体的表面上来制造纳米图案化圆柱形光掩模。 在另一种方法中，可以在透明圆柱体的表面上形成弹性体材料层，并且可以通过直接图案化工艺在弹性体材料上形成具有纳米尺度特征的图案。

公开(公告)号：US20130224636A1

公开(公告)日：2013-08-29

申请号：US13767639

申请日：2013-02-14

申请人： Boris Kobrin

发明人： Boris Kobrin

IPC分类号： G03F1/00

CPC分类号： G03F1/00 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/92 ,  G03F7/0002 ,  G03F7/24

摘要： Methods for fabricating nanopatterned cylindrical photomasks are disclosed. A master pattern having nanometer scale features may be formed on a master substrate. A layer of an elastomer material may be formed on a surface of a transparent cylinder. The master pattern may be transferred from the master to the layer of elastomer material on the surface of the transparent cylinder. Alternatively, a nanopatterned cylindrical photomask may be fabricated by forming a pattern having nanometer scale features on an elastomer substrate and laminating the patterned elastomer substrate to a surface of a cylinder. In another method, a layer of elastomer material may be formed on a surface of a transparent cylinder and a pattern having nanometer scale features may be formed on the elastomer material by a direct patterning process.

摘要翻译： 公开了制备纳米图案圆柱形光掩模的方法。 具有纳米尺度特征的主图案可以形成在母板上。 可以在透明圆筒的表面上形成弹性体材料层。 主图案可以从主体转移到透明圆柱体表面上的弹性体材料层。 或者，可以通过在弹性体基底上形成具有纳米尺度特征的图案并将图案化的弹性体基底层压到圆柱体的表面上来制造纳米图案化圆柱形光掩模。 在另一种方法中，可以在透明圆柱体的表面上形成弹性体材料层，并且可以通过直接图案化工艺在弹性体材料上形成具有纳米尺度特征的图案。

公开(公告)号：US08518633B2

公开(公告)日：2013-08-27

申请号：US12384219

申请日：2009-04-01

申请人： Boris Kobrin ,  Boris Volf ,  Igor Landau

发明人： Boris Kobrin ,  Boris Volf ,  Igor Landau

IPC分类号： G03B27/42

CPC分类号： G03F7/703 ,  G03B27/42 ,  G03F7/70325 ,  G03F7/7035 ,  G03F7/70358 ,  G03F7/704

摘要： Embodiments of the invention relate to methods and apparatus useful in the nanopatterning of large area substrates, where a rotatable mask is used to image a radiation-sensitive material. Typically the rotatable mask comprises a cylinder. The nanopatterning technique makes use of Near-Field photolithography, where the mask used to pattern the substrate is in contact or close proximity with the substrate. The Near-Field photolithography may make use of an elastomeric phase-shifting mask, or may employ surface plasmon technology, where a rotating cylinder surface comprises metal nano holes or nanoparticles.

摘要翻译： 本发明的实施例涉及在大面积基板的纳米图案中有用的方法和装置，其中使用可旋转掩模来对辐射敏感材料成像。 通常，可旋转掩模包括圆筒。 纳米图案技术利用近场光刻技术，其中用于图案化衬底的掩模与衬底接触或接近。 近场光刻可以使用弹性体相移掩模，或者可以采用表面等离子体激元技术，其中旋转圆柱表面包括金属纳米孔或纳米颗粒。