公开(公告)号：US09851300B1

公开(公告)日：2017-12-26

申请号：US14678411

申请日：2015-04-03

Applicant: KLA-Tencor Corporation

Inventor： Barak Bringoltz ,  Ofer Zaharan ,  Amnon Manassen ,  Nadav Carmel ,  Victoria Naipak ,  Alexander Svizher ,  Tzahi Grunzweig ,  Daniel Kandel

IPC: G01N21/55

CPC classification number: G03F7/70633

Abstract: Methods and metrology modules and tools are provided, which minimize an estimated overlay variation measure at misalignment vector values obtained from a derived functional form of an overlay linear response to non-periodic effects. Provided methods further quantifying target noise due to the non-periodic effects using multiple repeated overlay measurements of the target cells, calculating an ensemble of overlay measurements between the cells over the multiple measurement repeats and expressing the target noise as a statistical derivative of the calculated overlay measurements. Sub-ensembles may be selected to further characterize the target noise. Various outputs include optimized scanning patterns, target noise metrics and recipe and target optimization.

公开(公告)号：US20170146915A1

公开(公告)日：2017-05-25

申请号：US15114175

申请日：2016-05-19

Applicant: KLA-Tencor Corporation

Inventor： Vladimir Levinski ,  Yuri Paskover ,  Amnon Manassen ,  Yoni Shalibo

IPC: G03F7/20 ,  H04N5/232 ,  G06T7/80 ,  G02B7/38 ,  G02B27/32

Abstract: Metrology tools and methods are provided, which estimate the effect of topographic phases corresponding to different diffraction orders, which result from light scattering on periodic targets, and adjust the measurement conditions to improve measurement accuracy. In imaging, overlay error magnification may be reduced by choosing appropriate measurement conditions based on analysis of contrast function behavior, changing illumination conditions (reducing spectrum width and illumination NA), using polarizing targets and/or optical systems, using multiple defocusing positions etc. On-the-fly calibration of measurement results may be carried out in imaging or scatterometry using additional measurements or additional target cells.

公开(公告)号：US09341769B2

公开(公告)日：2016-05-17

申请号：US13945352

申请日：2013-07-18

Applicant: KLA-Tencor Corporation

Inventor： Amnon Manassen ,  Andrew V. Hill ,  Ohad Bachar ,  Avi Abramov ,  Daria Negri

IPC: G02B27/10 ,  G02B6/42 ,  G02B6/02 ,  G01N21/55 ,  G02B26/00 ,  G02B27/14 ,  G02B26/02 ,  G02B6/35

CPC classification number: G01B11/02 ,  F21V5/02 ,  F21V5/04 ,  F21V9/40 ,  F21V14/08 ,  G01N21/55 ,  G02B5/18 ,  G02B5/205 ,  G02B6/0005 ,  G02B6/02 ,  G02B6/3512 ,  G02B6/4215 ,  G02B26/008 ,  G02B26/023 ,  G02B26/04 ,  G02B26/0816 ,  G02B27/1026 ,  G02B27/141 ,  G02B27/146

Abstract: The disclosure is directed to a system and method of controlling spectral attributes of illumination. According to various embodiments, a portion of illumination including an excluded selection of illumination spectra is blocked, while another portion of the illumination including a transmitted selection of illumination spectra is directed along an illumination path. In some embodiments, optical metrology is performed utilizing the spectrally controlled illumination to enhance measurement capability. For instance, the spectral attributes of illumination utilized to analyze different portions of a sample, such as different semiconductor layers, may be selected according to certain measurement characteristics associated with the analyzed portions of the sample.

Abstract translation: 本公开涉及一种控制照明的光谱属性的系统和方法。 根据各种实施例，包括排除的照明光谱选择的照明部分被阻挡，而包括发射的照明光谱选择的照明的另一部分沿着照明路径被引导。 在一些实施例中，利用光谱控制的照明来执行光学测量以增强测量能力。 例如，可以根据与样本的分析部分相关联的某些测量特性来选择用于分析样本的不同部分（例如不同半导体层）的照明的光谱属性。

公开(公告)号：US20160084758A1

公开(公告)日：2016-03-24

申请号：US14928514

申请日：2015-10-30

Applicant: KLA-Tencor Corporation

Inventor： Amnon Manassen ,  Yuri Paskover ,  Barry Loevsky ,  Daria Negri

IPC: G01N21/47 ,  G06F17/50

CPC classification number: G01N21/4785 ,  G03F7/70683 ,  G06F17/5072

Abstract: Metrology targets, design files, and design and production methods thereof are provided. Metrology targets comprising at least one reflection-symmetric pair of reflection-asymmetric structures are disclosed. The structures may or may not be periodic, may comprise a plurality of unevenly-spaced target elements, which may or may not be segmented. The asymmetry may be with respect to target element segmentation or structural dimensions. Also, target design files and metrology measurements of the various metrology targets are disclosed.

Abstract translation: 提供了计量目标，设计文件及其设计和制作方法。 公开了包括至少一个反射对称对的反射不对称结构的计量目标。 结构可以是或可以不是周期性的，可以包括多个不均匀间隔的目标元件，其可以被分割或者不被分割。 不对称性可能与目标元素分割或结构尺寸有关。 此外，还公开了各种度量目标的目标设计文件和度量测量。

公开(公告)号：US09091650B2

公开(公告)日：2015-07-28

申请号：US13936529

申请日：2013-07-08

Applicant: KLA-Tencor Corporation

Inventor： Andrew V. Hill ,  Amnon Manassen ,  Barak Bringoltz ,  Ohad Bachar ,  Mark Ghinovker ,  Zeev Bomzon ,  Daniel Kandel

IPC: G01B11/14 ,  G01N21/55 ,  G03F7/20

CPC classification number: G02B27/58 ,  G01B11/00 ,  G01N21/47 ,  G01N21/55 ,  G01N2201/06113 ,  G01N2201/068 ,  G03F7/70625 ,  G03F7/70633

Abstract: The disclosure is directed to various apodization schemes for pupil imaging scatterometry. In some embodiments, the system includes an apodizer disposed within a pupil plane of the illumination path. In some embodiments, the system further includes an illumination scanner configured to scan a surface of the sample with at least a portion of apodized illumination. In some embodiments, the system includes an apodized pupil configured to provide a quadrupole illumination function. In some embodiments, the system further includes an apodized collection field stop. The various embodiments described herein may be combined to achieve certain advantages.

Abstract translation: 本公开涉及用于瞳孔成像散射测量的各种变迹方案。 在一些实施例中，该系统包括设置在照明路径的光瞳平面内的变迹器。 在一些实施例中，系统还包括照明扫描器，其构造成用至少一部分变迹照明来扫描样品的表面。 在一些实施例中，系统包括配置成提供四极照明功能的变迹瞳孔。 在一些实施例中，系统还包括变迹集合区域停止。 可以组合这里描述的各种实施例以实现某些优点。

公开(公告)号：US20150036142A1

公开(公告)日：2015-02-05

申请号：US14516540

申请日：2014-10-16

Applicant: KLA-Tencor Corporation

Inventor： Daniel Kandel ,  Vladimir Levinski ,  Alexander Svizher ,  Joel Seligson ,  Andrew Hill ,  Ohad Bachar ,  Amnon Manassen ,  Yung-Ho Alex Chuang ,  Ilan Sela ,  Moshe Markowitz ,  Daria Negri ,  Efraim Rotem

IPC: G01N21/47 ,  G01N21/956 ,  G01N21/95 ,  G01B11/02

CPC classification number: G01N21/47 ,  G01B11/02 ,  G01B11/0641 ,  G01B2210/56 ,  G01N21/211 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/4792 ,  G01N2201/06113 ,  G01N2201/105 ,  G03F7/70625 ,  G03F7/70633

Abstract: Various metrology systems and methods are provided. One metrology system includes a light source configured to produce a diffraction-limited light beam, an apodizer configured to shape the light beam in the entrance pupil of illumination optics, and optical elements configured to direct the diffraction-limited light beam from the apodizer to an illumination spot on a grating target on a wafer and to collect scattered light from the grating target. The metrology system further includes a field stop and a detector configured to detect the scattered light that passes through the field stop. In addition, the metrology system includes a computer system configured to determine a characteristic of the grating target using output of the detector.

Abstract translation: 提供了各种计量系统和方法。 一个计量系统包括被配置为产生衍射受限光束的光源，被配置为使照明光学器件的入射光瞳中的光束成形的变迹器，以及被配置为将来自变迹器的衍射受限光束引导到 在晶片上的光栅目标上的照明点并且收集来自光栅目标的散射光。 测量系统还包括场停止器和检测器，其被配置为检测通过场停止器的散射光。 此外，计量系统包括被配置为使用检测器的输出来确定光栅目标的特性的计算机系统。

公开(公告)号：US20140240951A1

公开(公告)日：2014-08-28

申请号：US13774025

申请日：2013-02-22

Applicant: KLA-Tencor Corporation

Inventor： Gregory R. Brady ,  Andrei V. Shchegrov ,  Lawrence D. Rotter ,  Derrick Shaughnessy ,  Anatoly Shchemelinin ,  Ilya Bezel ,  Muzammil A. Arain ,  Anatoly A. Vasiliev ,  James Andrew Allen ,  Oleg Shulepov ,  Andrew V. Hill ,  Ohad Bachar ,  Moshe Markowitz ,  Yaron Ish-Shalom ,  Ilan Sela ,  Amnon Manassen ,  Alexander Svizher ,  Maxim Khokhlov ,  Avi Abramov ,  Oleg Tsibulevsky ,  Daniel Kandel ,  Mark Ghinovker

IPC: F21V13/08 ,  F21V13/00 ,  F21V8/00 ,  F21V13/12

CPC classification number: G01J3/10 ,  F21V13/00 ,  F21V13/08 ,  F21V13/12 ,  G01J3/0218 ,  G01J3/12 ,  G02B6/29332 ,  G02B6/29362 ,  G02B6/29388 ,  G02B6/29395 ,  G02B6/3508 ,  G02B6/353 ,  H01J65/04

Abstract: The disclosure is directed to systems for providing illumination to a measurement head for optical metrology. In some embodiments of the disclosure, illumination beams from a plurality of illumination sources are combined to deliver illumination at one or more selected wavelengths to the measurement head. In some embodiments of the disclosure, intensity and/or spatial coherence of illumination delivered to the measurement head is controlled. In some embodiments of the disclosure, illumination at one or more selected wavelengths is delivered from a broadband illumination source configured for providing illumination at a continuous range of wavelengths.

Abstract translation: 本公开涉及用于向用于光学测量的测量头提供照明的系统。 在本公开的一些实施例中，来自多个照明源的照明光束被组合以将一个或多个所选波长的照明传送到测量头。 在本公开的一些实施例中，控制传送到测量头的照明的强度和/或空间相干性。 在本公开的一些实施例中，一个或多个所选波长的照明从配置成在连续波长范围内提供照明的宽带照明源传送。

公开(公告)号：US11119417B2

公开(公告)日：2021-09-14

申请号：US16491963

申请日：2019-08-05

Applicant: KLA-TENCOR CORPORATION

Inventor： Amnon Manassen ,  Yuri Paskover ,  Eran Amit

IPC: G01B11/02 ,  G03F7/20 ,  G01B9/02 ,  G01B11/27

Abstract: Scatterometry overlay (SCOL) measurement methods, systems and targets are provided to enable efficient SCOL metrology with in-die targets. Methods comprise generating a signal matrix by: illuminating a SCOL target at multiple values of at least one illumination parameter, and at multiple spot locations on the target, wherein the illumination is at a NA (numerical aperture) >⅓ yielding a spot diameter

公开(公告)号：US10824079B2

公开(公告)日：2020-11-03

申请号：US16122495

申请日：2018-09-05

Applicant: KLA-TENCOR CORPORATION

Inventor： Yuval Lubashevsky ,  Yuri Paskover ,  Vladimir Levinski ,  Amnon Manassen

IPC: G03F7/20 ,  G01N21/95 ,  G02B27/42 ,  G01N21/47

Abstract: A method of monitoring overlay is used in a manufacturing process in which successive layers are deposited one over another to form a stack. Each layer may include a periodic structure such as a diffraction grating to be aligned with a periodic structure in another layer. The stacked periodic structures may be illuminated to form + and − first order diffraction patterns from the periodic structures. An image of the stacked periodic structures may be captured including + and − diffraction patterns. The + and − diffraction patterns may be compared to calculate the overlay between successive layers.

公开(公告)号：US20200333612A1

公开(公告)日：2020-10-22

申请号：US16430861

申请日：2019-06-04

Applicant: KLA-Tencor Corporation

Inventor： Amnon Manassen ,  Andrew V. Hill ,  Ohad Bachar ,  Avi Abramov

IPC: G02B27/09 ,  G02B27/48 ,  G01N21/47

Abstract: An illumination source may include two or more input light sources, a collector, and any combination of a beam uniformizer, a speckle reducer, or any number of output fibers to provide a selected illumination etendue. The collector may include one or more lenses to combine illumination from the two or more input light sources into an illumination beam, where the illumination from the two or more input light sources occupy different portions of an input aperture of the collector. The beam uniformizer may include a first noncircular-core fiber to receive the illumination beam, a second noncircular-core fiber, and one or more coupling lenses to relay a far-field distribution of the illumination beam from the first noncircular-core fiber to an input face of the second noncircular-core fiber to provide output light with uniform near-field and far-field distributions.