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274 条记录 (耗时 0.032 秒)

    Alignment and exposure apparatus and method for manufacture of integrated circuits
    51.
    发明授权
    Alignment and exposure apparatus and method for manufacture of integrated circuits 失效
    对准和曝光装置及集成电路的制造方法

    公开(公告)号：US5365342A

    公开(公告)日：1994-11-15

    申请号：US29363

    申请日：1993-03-10

    申请人： Naoki Ayata ,  Mitsugu Yamamura ,  Bunei Hamasaki ,  Masao Kosugi ,  Kazuo Takahashi ,  Mitsuaki Seki

    发明人： Naoki Ayata ,  Mitsugu Yamamura ,  Bunei Hamasaki ,  Masao Kosugi ,  Kazuo Takahashi ,  Mitsuaki Seki

    IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/30 ,  G01B11/00

    CPC分类号： G03F9/7088 ,  G03F7/70058 ,  G03F7/70725 ,  G03F9/7023 ,  G03F9/7057 ,  H01L21/30

    摘要： An alignment apparatus includes a first off-axis alignment optical system having a magnification, and a second off-axis alignment optical system having a magnification higher than that of the first off-axis alignment optical system, wherein the apparatus is operable in a global alignment mode using the second off-axis alignment optical system. In another aspect, an alignment apparatus which includes a first off-axis alignment optical system having a magnification, a second off-axis alignment optical system having a magnification higher than that of the first off-axis alignment optical system, and a TTL alignment optical system, wherein the alignment apparatus is operable in a global alignment mode using the second off-axis alignment optical system and is operable in another global alignment mode using the TTL optical alignment system.

    摘要翻译： 对准装置包括具有倍率的第一离轴对准光学系统和具有高于第一离轴对准光学系统的倍率的第二离轴对准光学系统，其中该装置可以全局对准 模式使用第二离轴对准光学系统。 在另一方面，一种对准装置，包括具有放大率的第一离轴对准光学系统，具有高于第一离轴对准光学系统的倍率的第二离轴对准光学系统，以及TTL对准光学 系统，其中所述对准装置可以使用所述第二离轴对准光学系统以全局对准模式操作，并且可以使用所述TTL光学对准系统在另一全局对准模式中操作。

    Method for operating a reduced-pressure multi-fryer system
    52.
    发明授权
    Method for operating a reduced-pressure multi-fryer system 失效
    操作减压多油炸炉系统的方法

    公开(公告)号：US5185168A

    公开(公告)日：1993-02-09

    申请号：US742020

    申请日：1991-08-08

    申请人： Kazuo Takahashi

    发明人： Kazuo Takahashi

    IPC分类号： A47J37/12 ,  A47J27/08

    CPC分类号： A47J27/0817

    摘要： A method for operating a plural number of batch type reduced-pressure fryer units, the method including: connecting the fryer units, through a switch means, with vacuum pump lines including an initial vacuum pump line serving to reduce the frying bath pressure of a selected one of the fryer units in the stage of an initial frying treatment and a finish vacuum pump line serving to maintaining the frying baths of a plural number of the frying units simultaneously in reduced pressure condition in the stage of a finish frying treatment; while holding the respective vacuum pump lines in operation, switching the vacuum pump lines to connect the initial vacuum pump line with a selected fryer unit to reduce the pressure of the frying bath thereof for the initial frying treatment; switching the vacuum pump line to connect the selected fryer unit with the finish vacuum pump line for the finish frying treatment upon completion of the initial frying treatment; switching the vacuum pump lines to disconnect the selected fryer unit from the vacuum pump lines upon completion of the finish frying treatment; and repeating the switching operation sequentially and cyclically for each one of the fryer units in a predetermined timing.

    摘要翻译： 一种操作多个分批式减压炸炉装置的方法，该方法包括：通过开关装置将油炸锅单元与包括初始真空泵管线的真空泵管线连接起来，该初始真空泵管线用于降低选定的 初步油炸处理阶段的油炸锅单元之一，以及用于在油炸处理阶段的减压条件下同时保持多个煎炸单元的油炸浴的完成真空泵管线; 同时保持相应的真空泵管线运行，切换真空泵管线以将初始真空泵管线与选择的油炸锅单元连接起来，以减小其初步油炸处理的煎炸液的压力; 在初次煎炸处理完成后，切换真空泵管线，将所选的油炸锅单元与完成真空泵管线连接，进行油炸处理; 在完成油炸处理完成后，切换真空泵管线以将选择的油炸锅单元与真空泵管路断开连接; 并且在预定的定时中对每一个油炸锅单元重复切换操作。

    Exposure apparatus with detecting means insertable into an exposure path
    53.
    发明授权
    Exposure apparatus with detecting means insertable into an exposure path 失效
    具有可插入曝光路径的检测装置的曝光装置

    公开(公告)号：US4617469A

    公开(公告)日：1986-10-14

    申请号：US552313

    申请日：1983-11-16

    申请人： Kazuo Takahashi ,  Hiroshi Sato ,  Masao Kosugi

    发明人： Kazuo Takahashi ,  Hiroshi Sato ,  Masao Kosugi

    IPC分类号： G03B27/32 ,  G03F7/20 ,  G03F9/00 ,  G05D3/12 ,  H01L21/027 ,  H01L21/30 ,  H01L21/68 ,  G01N21/86

    CPC分类号： G03F9/70 ,  H01L21/30

    摘要： An exposure apparatus for aligning an original, having at least one alignment mark thereon, and radiation sensitive member, having at least one alignment mark thereon and adapted to receive the image of the original, with each other includes a first detecting device including a sensor retractable from the optical path of a light for illuminating the original, the sensor being adapted to sense the original and radiation sensitive member to detect a relative displacement (degree of misalignment) between the original and radiation sensitive member when the sensor is in the optical path; a second detecting device including a sensor set out of the optical path and adapted to detect the position of one of the original and radiation sensitive member in the absolute coordinates of the apparatus; and a driving mechanism for moving one of the original and radiation sensitive member in response to the output of the second detecting device to correct the above mentioned displacement.

    摘要翻译： 用于对准在其上具有至少一个对准标记的原稿和其上具有至少一个对准标记并适于接收原稿的图像的辐射敏感元件的曝光设备包括：第一检测装置，包括可伸缩的传感器 从用于照射原稿的光的光路中，传感器适于感测原始和辐射敏感元件，以便在传感器处于光路时检测原始和辐射敏感元件之间的相对位移（未对准度）; 第二检测装置，其包括设置在所述光路中的传感器，并且适于检测所述原始和辐射敏感部件中的一个在所述装置的绝对坐标中的位置; 以及驱动机构，用于响应于第二检测装置的输出来移动原件和辐射敏感部件之一，以校正上述位移。

    Shot arranging method in a divisional printing apparatus
    54.
    发明授权
    Shot arranging method in a divisional printing apparatus 失效
    分割印刷装置中的拍摄布置方法

    公开(公告)号：US4488806A

    公开(公告)日：1984-12-18

    申请号：US449825

    申请日：1982-12-14

    申请人： Kazuo Takahashi ,  Hiroshi Sato ,  Masao Kosugi

    发明人： Kazuo Takahashi ,  Hiroshi Sato ,  Masao Kosugi

    IPC分类号： H01L21/30 ,  B41J2/44 ,  G03F7/20 ,  H01L21/027 ,  H01L27/02 ,  G03B27/32 ,  G03B27/44

    CPC分类号： G03F7/70425 ,  B41J2/44 ,  G03F7/70433 ,  H01L27/0207

    摘要： In a divisional printing apparatus wherein the pattern of a mask is reduced and projected for printing onto a wafer and the mask and the wafer are moved relative to each other at each shot so that the exposed areas thereof do not overlap each other, and whereby the same pattern as that for collective printing is printed onto the effective area of the wafer by a plurality of shots, a shot arranging method in which, in the case of a so-called multichip shot in which a plurality of chips are exposed at a time at each shot, the special chip area of the wafer is not exposed, but the wafer is effectively exposed so that the creation of unusable chips is minimized.

    摘要翻译： 在一种分割印刷装置中，其中掩模的图案被减小并投影以印刷到晶片上，并且掩模和晶片在每次拍摄时相对于彼此移动，使得其曝光区域彼此不重叠，并且由此 通过多次拍摄将与集体印刷相同的图案印刷在晶片的有效区域上，其中，在一次所谓的多芯片拍摄的情况下，其中多个芯片被曝光， 在每次拍摄时，晶片的特殊芯片面积都不会露出，但是晶片被有效地暴露，使得不可用的芯片的产生被最小化。

    Fire retardant resinous compositions
    58.
    发明授权
    Fire retardant resinous compositions 失效
    阻燃树脂组合物

    公开(公告)号：US4206290A

    公开(公告)日：1980-06-03

    申请号：US933040

    申请日：1978-08-11

    申请人： Haruhiko Yusa ,  Masanori Oota ,  Kazuo Takahashi ,  Humio Akutsu

    发明人： Haruhiko Yusa ,  Masanori Oota ,  Kazuo Takahashi ,  Humio Akutsu

    IPC分类号： C08L27/06 ,  C08L51/04 ,  C08L55/02 ,  C08L29/10

    CPC分类号： C08L27/06 ,  C08L55/02 ,  C08L2205/02 ,  C08L51/04 ,  Y10S260/24

    摘要： A resinous composition having fire retardance, impact resistance and easy workability is obtained by blending (1) about 80 to 30 parts by weight of an ABS resin with (2) about 20 to 70 parts by weight of (i) a vinyl chloride resin compound comprising 100 to 5 parts by weight of a copolymer resin consisting essentially of 0.5 to 40% by weight of a higher alkyl vinyl ether and 99.5 to 60% by weight of vinyl chloride and (ii) 0 to 95 parts by weight of a polyvinyl chloride resin.

    摘要翻译： 通过将（1）约80〜30重量份的ABS树脂与（2）约20〜70重量份的（i）氯乙烯树脂化合物（I）混合，得到具有阻燃性，耐冲击性和易加工性的树脂组合物 包含100至5重量份的基本上由0.5至40重量％的较高级烷基乙烯基醚和99.5至60重量％的氯乙烯组成的共聚物树脂，和（ii）0至95重量份的聚氯乙烯 树脂。

    Process of forming a high-contrast silver image
    59.
    发明授权
    Process of forming a high-contrast silver image 失效
    形成高对比度银色图像的过程

    公开(公告)号：US4192682A

    公开(公告)日：1980-03-11

    申请号：US869630

    申请日：1978-01-16

    申请人： Yoshio Nishina ,  Syunji Matsuo ,  Toshio Nagatani ,  Kazuo Takahashi ,  Takeshi Habu

    发明人： Yoshio Nishina ,  Syunji Matsuo ,  Toshio Nagatani ,  Kazuo Takahashi ,  Takeshi Habu

    IPC分类号： G03C5/29 ,  G03C1/06 ,  G03C5/30

    CPC分类号： G03C1/067 ,  Y10S430/15

    摘要： Process of forming a high-contrast silver image which process comprises treating a light-sensitive silver halide photographic material comprising a support, a silver halide emulsion layer coated thereon and another hydrophilic colloidal layer, at least one of which contains a substantially non-diffusible compound having oxidation power on a hydroquinone developing agent, with a developer containing no hydroquinone developing agent after exposed imagewise.

    摘要翻译： 形成高对比度银图像的方法包括处理包含支持体的感光卤化银照相材料，涂覆在其上的卤化银乳剂层和另一种亲水性胶体层，其中至少一种含有基本上不可扩散的化合物 在氢醌显影剂上具有氧化能力，在曝光成像后不含氢醌显影剂的显影剂。

    Quinolopyran-4-one-2-carboxylic acid derivatives and salts thereof as novel compounds and as medicines for treatment of allergic asthma
    60.
    发明授权
    Quinolopyran-4-one-2-carboxylic acid derivatives and salts thereof as novel compounds and as medicines for treatment of allergic asthma 失效
    喹诺酮-4-酮-2-羧酸衍生物及其盐作为新化合物和用作治疗过敏性哮喘的药物

    公开(公告)号：US4086349A

    公开(公告)日：1978-04-25

    申请号：US709779

    申请日：1976-07-29

    申请人： Yasuhiro Morinaka ,  Kazuo Takahashi

    发明人： Yasuhiro Morinaka ,  Kazuo Takahashi

    IPC分类号： C07D491/04 ,  C07D491/052 ,  A61K31/47

    CPC分类号： C07D491/04 ,  Y10S514/826

    摘要： Quinolopyran-4-one-2-carboxylic acid derivatives and salts thereof are provided as novel compounds and as medicines for treatment of allergic asthma, each of the derivatives being represented by the general formula ##STR1## wherein X designates a member selected from the group consisting of alkyl groups having 1 to 5 carbon atoms, alkoxy groups having 1 to 5 carbon atoms, halogen atoms, aryl-substituted alkoxy groups having 7 to 10 total carbon atoms, alkoxycarbonyl groups having 2 to 6 total carbon atoms, and aryl groups having 6 to 10 carbon atoms, and n is any one of the integers 1 through 4, X being the same group or different groups in the case where n is at least 2.

    摘要翻译： 提供了喹诺酮-4-酮-2-羧酸衍生物及其盐作为新化合物和用作治疗过敏性哮喘的药物，每种衍生物由通式“IMAGE”表示，其中X表示选自下组的成员 由具有1至5个碳原子的烷基，具有1至5个碳原子的烷氧基，卤素原子，具有7至10个总碳原子的芳基取代的烷氧基，具有2至6个总碳原子的烷氧基羰基组成的芳基和具有 6至10个碳原子，n为整数1至4中的任一个，X为相同基团或在n为至少2的情况下为不同基团。