METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
    52.
    发明申请
    METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE 有权
    制造半导体器件的方法

    公开(公告)号:US20150031169A1

    公开(公告)日:2015-01-29

    申请号:US14493748

    申请日:2014-09-23

    Abstract: An object is to manufacture a highly reliable semiconductor device including a thin film transistor with stable electric characteristics. In a method for manufacturing a semiconductor device including a thin film transistor in which an oxide semiconductor film is used for a semiconductor layer including a channel formation region, heat treatment (for dehydration or dehydrogenation) is performed to improve the purity of the oxide semiconductor film and reduce impurities including moisture or the like. After that, slow cooling is performed under an oxygen atmosphere. Besides impurities including moisture or the like exiting in the oxide semiconductor film, heat treatment causes reduction of impurities including moisture or the like exiting in a gate insulating layer and those in interfaces between the oxide semiconductor film and films which are provided over and below the oxide semiconductor and in contact therewith.

    Abstract translation: 本发明的目的是制造具有稳定电特性的薄膜晶体管的高度可靠的半导体器件。 在包括使用氧化物半导体膜用于包括沟道形成区域的半导体层的薄膜晶体管的半导体器件的制造方法中,进行热处理(脱水或脱氢)以提高氧化物半导体膜的纯度 并减少杂质,包括水分等。 之后,在氧气氛下进行缓慢冷却。 除了在氧化物半导体膜中排出的含有水分等的杂质以外,热处理会导致在栅极绝缘层中退出的杂质,包括氧化物半导体膜和膜之间的界面中的杂质,氧化物半导体膜和氧化物之间和之下的界面 半导体并与其接触。

    SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
    53.
    发明申请
    SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF 审中-公开
    半导体器件及其制造方法

    公开(公告)号:US20140231802A1

    公开(公告)日:2014-08-21

    申请号:US14264301

    申请日:2014-04-29

    Abstract: The semiconductor device includes a driver circuit portion including a driver circuit and a pixel portion including a pixel. The pixel includes a gate electrode layer having a light-transmitting property, a gate insulating layer, a source electrode layer and a drain electrode layer each having a light-transmitting property provided over the gate insulating layer, an oxide semiconductor layer covering top surfaces and side surfaces of the source electrode layer and the drain electrode layer and provided over the gate electrode layer with the gate insulating layer therebetween, a conductive layer provided over part of the oxide semiconductor layer and having a lower resistance than the source electrode layer and the drain electrode layer, and an oxide insulating layer in contact with part of the oxide semiconductor layer.

    Abstract translation: 半导体器件包括驱动器电路部分,其包括驱动器电路和包括像素的像素部分。 像素包括具有透光性的栅极电极层,栅极绝缘层,源极电极层和漏极电极层,其各自具有设置在栅极绝缘层上的透光性,覆盖顶表面的氧化物半导体层和 源极电极层和漏极电极层的侧面,并且在栅电极层之间设置有栅极绝缘层,导电层设置在氧化物半导体层的一部分上,并且具有比源极电极层和漏极 电极层和与氧化物半导体层的一部分接触的氧化物绝缘层。

    SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
    54.
    发明申请
    SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF 审中-公开
    半导体器件及其制造方法

    公开(公告)号:US20130330914A1

    公开(公告)日:2013-12-12

    申请号:US13945487

    申请日:2013-07-18

    Abstract: It is an object to provide a thin film transistor having favorable electric characteristics and high reliability and a semiconductor device which includes the thin film transistor as a switching element. An In—Ga—Zn—O-based film having an incubation state that shows an electron diffraction pattern, which is different from a conventionally known amorphous state where a halo shape pattern appears and from a conventionally known crystal state where a spot appears clearly, is formed. The In—Ga—Zn—O-based film having an incubation state is used for a channel formation region of a channel etched thin film transistor.

    Abstract translation: 本发明的目的是提供具有良好的电特性和高可靠性的薄膜晶体管,以及包括作为开关元件的薄膜晶体管的半导体器件。 具有显示电子衍射图案的温度状态的In-Ga-Zn-O系膜与常规已知的晕圈形状图案出现的非晶状态以及现有的已知的斑点出现明显的晶体状态不同, 形成了。 具有孵育状态的In-Ga-Zn-O系膜用于沟道蚀刻薄膜晶体管的沟道形成区域。

    SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
    55.
    发明申请
    SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF 有权
    半导体器件及其制造方法

    公开(公告)号:US20130302924A1

    公开(公告)日:2013-11-14

    申请号:US13937561

    申请日:2013-07-09

    Abstract: An object is to improve reliability of a semiconductor device. A semiconductor device including a driver circuit portion and a display portion (also referred to as a pixel portion) over the same substrate is provided. The driver circuit portion and the display portion include thin film transistors in which a semiconductor layer includes an oxide semiconductor; a first wiring; and a second wiring. The thin film transistors each include a source electrode layer and a drain electrode layer which each have a shape whose end portions are located on an inner side than end portions of the semiconductor layer. In the thin film transistor in the driver circuit portion, the semiconductor layer is provided between a gate electrode layer and a conductive layer. The first wiring and the second wiring are electrically connected in an opening provided in a gate insulating layer through an oxide conductive layer.

    Abstract translation: 目的是提高半导体器件的可靠性。 提供了包括驱动电路部分和在相同基板上的显示部分(也称为像素部分)的半导体器件。 驱动器电路部分和显示部分包括其中半导体层包括氧化物半导体的薄膜晶体管; 第一布线 和第二布线。 薄膜晶体管各自包括源极电极层和漏极电极层,每个源电极层和漏极电极层的端部位于比半导体层的端部更靠内侧的形状。 在驱动电路部分的薄膜晶体管中,半导体层设置在栅电极层和导电层之间。 第一布线和第二布线通过氧化物导电层在设置在栅极绝缘层中的开口中电连接。

    METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

    公开(公告)号:US20130178015A1

    公开(公告)日:2013-07-11

    申请号:US13783672

    申请日:2013-03-04

    Abstract: An object is to manufacture a highly reliable semiconductor device including a thin film transistor with stable electric characteristics. In a method for manufacturing a semiconductor device including a thin film transistor in which an oxide semiconductor film is used for a semiconductor layer including a channel formation region, heat treatment (for dehydration or dehydrogenation) is performed to improve the purity of the oxide semiconductor film and reduce impurities including moisture or the like. After that, slow cooling is performed under an oxygen atmosphere. Besides impurities including moisture or the like exiting in the oxide semiconductor film, heat treatment causes reduction of impurities including moisture or the like exiting in a gate insulating layer and those in interfaces between the oxide semiconductor film and films which are provided over and below the oxide semiconductor and in contact therewith.

    LIGHT EMITTING ELEMENT, LIGHT EMITTING DEVICE, AND ELECTRONIC APPARATUS
    59.
    发明申请
    LIGHT EMITTING ELEMENT, LIGHT EMITTING DEVICE, AND ELECTRONIC APPARATUS 有权
    发光元件,发光装置和电子装置

    公开(公告)号:US20130134408A1

    公开(公告)日:2013-05-30

    申请号:US13752589

    申请日:2013-01-29

    CPC classification number: H01L51/52 H01L51/5048 Y10S428/917

    Abstract: It is an object of the present invention to provide a light emitting element with a low driving voltage. In a light emitting element, a first electrode; and a first composite layer, a second composite layer, a light emitting layer, an electron transporting layer, an electron injecting layer, and a second electrode, which are stacked over the first electrode, are included. The first composite layer and the second composite layer each include metal oxide and an organic compound. A concentration of metal oxide in the first composite layer is higher than a concentration of metal oxide in the second composite layer, whereby a light emitting element with a low driving voltage can be obtained. Further, the composite layer is not limited to a two-layer structure. A multi-layer structure can be employed. However, a concentration of metal oxide in the composite layer is gradually higher from the light emitting layer to first electrode side.

    Abstract translation: 本发明的目的是提供一种具有低驱动电压的发光元件。 在发光元件中,第一电极; 并且包括层叠在第一电极上的第一复合层,第二复合层,发光层,电子传输层,电子注入层和第二电极。 第一复合层和第二复合层各自包括金属氧化物和有机化合物。 第一复合层中的金属氧化物的浓度高于第二复合层中的金属氧化物的浓度,由此可以获得具有低驱动电压的发光元件。 此外,复合层不限于两层结构。 可以采用多层结构。 然而,复合层中的金属氧化物的浓度从发光层逐渐变高到第一电极侧。

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