公开(公告)号：US4748646A

公开(公告)日：1988-05-31

申请号：US27553

申请日：1987-03-18

申请人： Toshihiko Osada ,  Ichiro Honjo ,  Kenji Sugishima

发明人： Toshihiko Osada ,  Ichiro Honjo ,  Kenji Sugishima

IPC分类号： G01N23/00 ,  G03F7/20 ,  G21K1/06 ,  G21K5/00 ,  G21K5/02 ,  H01J35/00 ,  H01L21/027 ,  H05G1/00 ,  G21K5/10

CPC分类号： G03F7/70075 ,  G03F7/70808

摘要： An X-ray lithography system, in which an X-ray beam is separated from synchrotron radiation beams and reflected by a scanning mirror which vertically scans the reflected X-ray beam. The X-ray is irradiated into an exposure chamber via a beryllium window, which is vertically oscillated in such a manner that the beryllium window is shifted up and down in synchronization with the scanning operation of the X-ray beam.

摘要翻译： 一种X射线光刻系统，其中X射线束与同步加速器辐射束分离并由扫描反射镜反射，该扫描镜垂直扫描反射的X射线束。 X射线通过铍窗被照射到曝光室中，铍窗垂直振荡，使得铍窗与X射线束的扫描操作同步地上下移动。

公开(公告)号：US4678919A

公开(公告)日：1987-07-07

申请号：US883425

申请日：1986-07-14

申请人： Kenji Sugishima ,  Kenji Nakagawa

发明人： Kenji Sugishima ,  Kenji Nakagawa

IPC分类号： G03F7/20 ,  H01J37/304 ,  H01L21/027 ,  H01L21/30 ,  H01J37/24

CPC分类号： H01L21/30 ,  H01J37/304

摘要： An electron beam exposure system for producing a desired pattern on a workpiece. The pattern is specified by predetermined pattern data. The pattern data is modified with correction data. The correction data is obtained from information indicating variations on the level of the surface of the workpiece due to an elastic deformation thereof during the exposure process. With the use of the correction data, the desired pattern is correctly reproduced as intended when the workpiece is fully supported and the surface thereof recovers its flatness.

摘要翻译： 一种用于在工件上产生所需图案的电子束曝光系统。 该图案由预定图案数据指定。 模式数据用修正数据修改。 从曝光过程中由于其弹性变形引起的工件表面的水平变化的信息获得校正数据。 通过使用校正数据，当工件被完全支撑并且其表面恢复其平坦度时，期望的图案被正确地再现。

公开(公告)号：US5557105A

公开(公告)日：1996-09-17

申请号：US320377

申请日：1994-10-11

申请人： Ichiro Honjo ,  Kenji Sugishima ,  Masaki Yamabe

发明人： Ichiro Honjo ,  Kenji Sugishima ,  Masaki Yamabe

IPC分类号： H01J37/30 ,  H01J37/06 ,  H01J37/244

CPC分类号： H01J37/04 ,  H01J37/244 ,  H01J37/28 ,  H01J37/3007 ,  H01J2237/04924 ,  H01J2237/062 ,  H01J2237/0635 ,  H01J2237/1205 ,  H01J2237/1504 ,  H01J2237/1516 ,  H01J2237/153 ,  H01J2237/24455 ,  H01J2237/2447 ,  H01J2237/2448 ,  H01J2237/24495 ,  H01J2237/2817

摘要： A pattern inspection apparatus is designed to quickly and accurately perform an inspection of an inspection sample, such as a mask or a wafer or the like by irradiating electron beams onto the inspection sample and detecting secondary or backscattered electrons reflected from the surface of the inspection sample and/or transmitted electrons passing through the inspection sample. The pattern inspection apparatus includes an electron beam generator including at least one electron gun for generating at least one electron beam irradiating onto the surface of the inspection sample. A movable support is provided for supporting the inspection sample. The apparatus also includes a detector unit having a plurality of electron detecting elements for detecting electrons containing information related to the construction of the inspection sample and a detection signal processor for processing simultaneously or in parallel formation the outputs of the electron detecting elements of the detector. Also, when a plurality of electron beams are used for simultaneous irradiation of the inspection sample, the pattern inspection apparatus includes a mechanism for avoiding interference between the reflected electrons of the adjacent electron beams.

摘要翻译： 图案检查装置被设计为通过将电子束照射到检查样品上并检测从检查样品的表面反射的次级或反向散射电子来快速且准确地执行诸如掩模或晶片等的检查样本的检查 和/或穿过检查样品的透射电子。 图案检查装置包括电子束发生器，其包括至少一个电子枪，用于产生照射到检查样品表面上的至少一个电子束。 提供用于支撑检查样品的可移动支撑件。 该装置还包括具有多个电子检测元件的检测器单元，用于检测包含与检查样本的结构有关的信息的电子;以及检测信号处理器，用于同时或并行地形成检测器的电子检测元件的输出。 此外，当使用多个电子束同时照射检查样本时，图案检查装置包括用于避免相邻电子束的反射电子之间的干涉的机构。

公开(公告)号：US4377031A

公开(公告)日：1983-03-22

申请号：US249833

申请日：1981-04-01

申请人： Hiroshi Goto ,  Kenji Sugishima

发明人： Hiroshi Goto ,  Kenji Sugishima

IPC分类号： H01L29/73 ,  H01L21/263 ,  H01L21/268 ,  H01L21/28 ,  H01L21/285 ,  H01L21/331 ,  H01L29/47 ,  H01L29/72 ,  H01L29/872 ,  H01L21/26

CPC分类号： H01L21/2636 ,  H01L21/268 ,  H01L21/28537 ,  H01L29/72 ,  Y10S117/904 ,  Y10S148/046 ,  Y10S148/092 ,  Y10S148/093

摘要： Generally, a complicated process is required in manufacturing a semiconductor device containing a Schottky barrier diode and a polycrystalline silicon layer which prevents excessive reaction of the aluminum electrode and silicon material involved. Because of the inability of the aluminum electrode to provide a good Schottky barrier by its contact with the polycrystalline silicon layer, it is required to directly contact the electrode with a monocrystalline silicon semiconductor layer or substrate. According to the present invention, this process is simplified by monocrystallizing the polycrystalline silicon layer at least in the region in which a Schottky barrier diode is to be formed by annealing the silicon layer in said region by laser beam irradiation and applying an aluminum electrode thereto.

摘要翻译： 通常，制造含有肖特基势垒二极管和多晶硅层的半导体器件需要复杂的工艺，其防止铝电极和硅材料过度反应。 由于铝电极通过与多晶硅层的接触不能提供良好的肖特基势垒，因此需要用单晶硅半导体层或衬底直接接触电极。 根据本发明，通过使激光束照射使所述区域内的硅层退火，并在其上涂敷铝电极，至少在要形成肖特基势垒二极管的区域中使多晶硅层单晶化，从而简化了该工序。

公开(公告)号：US5541023A

公开(公告)日：1996-07-30

申请号：US67623

申请日：1993-05-28

申请人： Kazuaki Kondo ,  Kenji Sugishima

发明人： Kazuaki Kondo ,  Kenji Sugishima

IPC分类号： G03F1/22 ,  G03F7/20 ,  H01L21/027 ,  G03F9/00

CPC分类号： G03F1/22

摘要： An X-ray absorbing film including an X-ray absorbing pattern of an X-ray mask uses .beta.-crystalline tantalum having the plane orientation of (002). The .beta.-crystalline tantalum film is formed by depositing tantalum on an amorphous layer. Because the film stress change due to heat is small, the strain of the X-ray absorbing pattern formed through a thermal treatment process is decreased.When heating the X-ray absorbing film before implanting ions into the film, the stress change of the film after implanted with ions decreases and the X-ray absorbing pattern strain also decreases.

摘要翻译： 包括X射线掩模的X射线吸收图案的X射线吸收膜使用平面取向为（002）的β晶体钽。 通过在非晶层上沉积钽来形成β晶体钽膜。 由于由于热引起的膜应力变化小，所以通过热处理工艺形成的X射线吸收图案的应变减小。 在将离子注入膜内之前加热X射线吸收膜时，注入离子后的膜的应力变化减小，X射线吸收图案应变也降低。

公开(公告)号：US4684315A

公开(公告)日：1987-08-04

申请号：US824930

申请日：1986-01-31

申请人： Kenji Sugishima ,  Hiroshi Yasuda

发明人： Kenji Sugishima ,  Hiroshi Yasuda

IPC分类号： H01J37/305 ,  F16C39/06 ,  G03F7/20 ,  H01J37/20 ,  H01L21/027 ,  H01L21/30 ,  B23Q1/26 ,  G21K5/10

CPC分类号： H01L21/30 ,  F16C32/0423 ,  F16C32/0434 ,  H01J37/20

摘要： A frictionless supporting apparatus comprising a horizontally plane working table having magnet portions on its peripheries. Pairs of stationary magnets define therebetween a vertical space into which the working table is inserted. Magnetic repulsion between the magnet portions of the working table and the pairs of stationary magnets frictionlessly hold the working table between the pairs of stationary magnets. The working table also has vertical guide portions made of magnets extending along a predetermined one horizontal direction. A plane auxiliary table is arranged substantially in parallel to the working table. A motor is mounted on the auxiliary table for moving the working table in the predetermined one horizontal direction with respect to the auxiliary table. Pairs of guide magnets are provided on the auxiliary table, defining therebetween a horizontal space into which the guide portions of the working table are inserted. Magnetic repulsion between the vertical guide portions of the working table and the pairs of magnets of the auxiliary table frictionlessly guide the working table along the pairs of guide magnets, when the working table is moved in the predetermined one horizontal direction with respect to the auxiliary table. The auxiliary table is also frictionlessly supported and guided in a horizontal direction perpendicular to the predetermined direction with respect to the stationary base.

摘要翻译： 一种无摩擦支撑装置，包括在其周边上具有磁铁部分的水平平面工作台。 成对的固定磁体在其间限定了工作台插入其中的垂直空间。 工作台的磁体部分与固定磁体对之间的磁性斥力将工作台无阻挡地保持在固定磁体对之间。 工作台还具有沿着预定的一个水平方向延伸的磁体制成的垂直导向部。 平面辅助工作台基本上平行于工作台布置。 电动机安装在辅助工作台上，用于相对于辅助工作台在预定的一个水平方向上移动工作台。 导向磁铁对设置在辅助工作台上，在其间限定了工作台的引导部分插入其中的水平空间。 当工作台相对于辅助工作台在预定的一个水平方向上移动时，工作台的垂直引导部分和辅助工作台的磁体对之间的磁性斥力沿着成对的导向磁体无摩擦地引导工作台 。 辅助工作台也在与固定基座垂直于预定方向的水平方向上无摩擦地支撑和引导。