SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
    51.
    发明申请
    SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME 有权
    半导体器件及其制造方法

    公开(公告)号:US20120298990A1

    公开(公告)日:2012-11-29

    申请号:US13567451

    申请日:2012-08-06

    IPC分类号: H01L29/12

    摘要: An object is to increase an aperture ratio of a semiconductor device. The semiconductor device includes a driver circuit portion and a display portion (also referred to as a pixel portion) over one substrate. The driver circuit portion includes a channel-etched thin film transistor for a driver circuit, in which a source electrode and a drain electrode are formed using metal and a channel layer is formed of an oxide semiconductor, and a driver circuit wiring formed using metal. The display portion includes a channel protection thin film transistor for a pixel, in which a source electrode layer and a drain electrode layer are formed using an oxide conductor and a semiconductor layer is formed of an oxide semiconductor, and a display portion wiring formed using an oxide conductor.

    摘要翻译: 目的是提高半导体器件的开口率。 半导体器件包括驱动器电路部分和在一个衬底上的显示部分(也称为像素部分)。 驱动器电路部分包括用于驱动电路的沟道蚀刻薄膜晶体管,其中使用金属形成源电极和漏电极,并且沟道层由氧化物半导体形成,并且使用金属形成驱动电路布线。 显示部分包括用于像素的沟道保护薄膜晶体管,其中使用氧化物导体形成源极电极层和漏极电极层,并且半导体层由氧化物半导体形成;以及显示部分布线,其使用 氧化物导体。

    SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
    52.
    发明申请
    SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF 审中-公开
    半导体器件及其制造方法

    公开(公告)号:US20110215319A1

    公开(公告)日:2011-09-08

    申请号:US13104546

    申请日:2011-05-10

    IPC分类号: H01L29/786 H01L33/08

    摘要: A semiconductor device which includes a thin film transistor having an oxide semiconductor layer and excellent electrical characteristics is provided. Further, a method for manufacturing a semiconductor device in which plural kinds of thin film transistors of different structures are formed over one substrate to form plural kinds of circuits and in which the number of steps is not greatly increased is provided. After a metal thin film is formed over an insulating surface, an oxide semiconductor layer is formed thereover. Then, oxidation treatment such as heat treatment is performed to oxidize the metal thin film partly or entirely. Further, structures of thin film transistors are different between a circuit in which emphasis is placed on the speed of operation, such as a logic circuit, and a matrix circuit.

    摘要翻译: 提供一种包括具有氧化物半导体层和优异的电特性的薄膜晶体管的半导体器件。 此外,提供了一种用于制造半导体器件的方法,其中在一个衬底上形成了多种不同结构的薄膜晶体管,以形成多种电路,并且其中步数没有大的增加。 在绝缘表面上形成金属薄膜之后,在其上形成氧化物半导体层。 然后,进行氧化处理如热处理以部分或全部氧化金属薄膜。 此外,在诸如逻辑电路和矩阵电路之类的重点放在诸如操作速度的电路之间,薄膜晶体管的结构是不同的。

    SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
    54.
    发明申请
    SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF 有权
    半导体器件及其制造方法

    公开(公告)号:US20110210325A1

    公开(公告)日:2011-09-01

    申请号:US12871148

    申请日:2010-08-30

    IPC分类号: H01L29/786 H01L21/336

    摘要: The semiconductor device includes a driver circuit portion including a driver circuit and a pixel portion including a pixel. The pixel includes a gate electrode layer having a light-transmitting property, a gate insulating layer, a source electrode layer and a drain electrode layer each having a light-transmitting property provided over the gate insulating layer, an oxide semiconductor layer covering top surfaces and side surfaces of the source electrode layer and the drain electrode layer and provided over the gate electrode layer with the gate insulating layer therebetween, a conductive layer provided over part of the oxide semiconductor layer and having a lower resistance than the source electrode layer and the drain electrode layer, and an oxide insulating layer in contact with part of the oxide semiconductor layer.

    摘要翻译: 半导体器件包括驱动器电路部分,其包括驱动器电路和包括像素的像素部分。 像素包括具有透光性的栅极电极层,栅极绝缘层,源极电极层和漏极电极层,其各自具有设置在栅极绝缘层上的透光性,覆盖顶表面的氧化物半导体层和 源极电极层和漏极电极层的侧面,并且在栅电极层之间设置有栅极绝缘层,导电层设置在氧化物半导体层的一部分上,并且具有比源电极层和漏极 电极层和与氧化物半导体层的一部分接触的氧化物绝缘层。

    LIGHT EMITTING ELEMENT, LIGHT EMITTING DEVICE, AND ELECTRONIC APPARATUS
    55.
    发明申请
    LIGHT EMITTING ELEMENT, LIGHT EMITTING DEVICE, AND ELECTRONIC APPARATUS 有权
    发光元件,发光装置和电子装置

    公开(公告)号:US20110198585A1

    公开(公告)日:2011-08-18

    申请号:US13096088

    申请日:2011-04-28

    IPC分类号: H01L33/02

    摘要: It is an object of the present invention to provide a light emitting element with a low driving voltage. In a light emitting element, a first electrode; and a first composite layer, a second composite layer, a light emitting layer, an electron transporting layer, an electron injecting layer, and a second electrode, which are stacked over the first electrode, are included. The first composite layer and the second composite layer each include metal oxide and an organic compound. A concentration of metal oxide in the first composite layer is higher than a concentration of metal oxide in the second composite layer, whereby a light emitting element with a low driving voltage can be obtained. Further, the composite layer is not limited to a two-layer structure. A multi-layer structure can be employed. However, a concentration of metal oxide in the composite layer is gradually higher from the light emitting layer to first electrode side.

    摘要翻译: 本发明的目的是提供一种具有低驱动电压的发光元件。 在发光元件中,第一电极; 并且包括层叠在第一电极上的第一复合层,第二复合层,发光层,电子传输层,电子注入层和第二电极。 第一复合层和第二复合层各自包括金属氧化物和有机化合物。 第一复合层中的金属氧化物的浓度高于第二复合层中的金属氧化物的浓度,由此可以获得具有低驱动电压的发光元件。 此外,复合层不限于两层结构。 可以采用多层结构。 然而,复合层中的金属氧化物的浓度从发光层逐渐变高到第一电极侧。

    TRANSISTOR AND DISPLAY DEVICE
    56.
    发明申请
    TRANSISTOR AND DISPLAY DEVICE 审中-公开
    晶体管和显示器件

    公开(公告)号:US20110062436A1

    公开(公告)日:2011-03-17

    申请号:US12880343

    申请日:2010-09-13

    IPC分类号: H01L29/12

    摘要: To provide a transistor having a favorable electric characteristics and high reliability and a display device including the transistor. The transistor is a bottom-gate transistor formed using an oxide semiconductor for a channel region. An oxide semiconductor layer subjected to dehydration or dehydrogenation through heat treatment is used as an active layer. The active layer includes a first region of a superficial portion microcrystallized and a second region of the rest portion. By using the oxide semiconductor layer having such a structure, a change to an n-type, which is attributed to entry of moisture to the superficial portion or elimination of oxygen from the superficial portion, and generation of a parasitic channel can be suppressed. In addition, contact resistance between the oxide semiconductor layer and source and drain electrodes can be reduced.

    摘要翻译: 提供具有良好的电特性和高可靠性的晶体管以及包括该晶体管的显示装置。 晶体管是使用用于沟道区的氧化物半导体形成的底栅晶体管。 使用通过热处理进行脱水或脱氢的氧化物半导体层作为活性层。 有源层包括微结晶的浅表部分的第一区域和其余部分的第二区域。 通过使用具有这种结构的氧化物半导体层,可以抑制归因于表层部分的水分进入或从表面部分的氧的消除导致的n型变化,以及寄生通道的产生。 此外,可以减小氧化物半导体层与源极和漏极之间的接触电阻。

    LIGHT EMITTING DEVICE AND METHOD FOR MANUFACTURING THE SAME
    59.
    发明申请
    LIGHT EMITTING DEVICE AND METHOD FOR MANUFACTURING THE SAME 有权
    发光装置及其制造方法

    公开(公告)号:US20110027920A1

    公开(公告)日:2011-02-03

    申请号:US12905568

    申请日:2010-10-15

    IPC分类号: H01L33/00

    摘要: An object of the present invention is to realize a light emitting device having low power consumption and high stability, in addition to improve extraction efficiency of light generated in a light emitting element. At least an interlayer insulating film (including a planarizing film), an anode, and a bank covering an edge portion of the anode contain chemically and physically stable silicon oxide, or are made of a material containing silicon oxide as its main component in order to accomplish a light emitting device having high stability. Generation of heat in a light emitting panel can be suppressed in addition to increase in efficiency (luminance/current) of a light emitting panel according to the structure of the present invention. Consequently, synergistic effect on reliability of a light emitting device is obtained.

    摘要翻译: 本发明的目的是提供一种具有低功耗和高稳定性的发光器件,同时提高了在发光元件中产生的光的提取效率。 至少层间绝缘膜(包括平坦化膜),阳极和覆盖阳极的边缘部分的堤包含化学和物理稳定的氧化硅,或由含有氧化硅作为其主要成分的材料制成,以便 实现了具有高稳定性的发光器件。 除了根据本发明的结构提高发光面板的效率(亮度/电流)之外,还可以抑制发光面板中的发热。 因此,获得了对发光器件的可靠性的协同效应。

    SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
    60.
    发明申请
    SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME 有权
    半导体器件及其制造方法

    公开(公告)号:US20110012105A1

    公开(公告)日:2011-01-20

    申请号:US12835117

    申请日:2010-07-13

    IPC分类号: H01L29/786 H01L21/44

    摘要: An object is to increase an aperture ratio of a semiconductor device. The semiconductor device includes a driver circuit portion and a display portion (also referred to as a pixel portion) over one substrate. The driver circuit portion includes a channel-etched thin film transistor for a driver circuit, in which a source electrode and a drain electrode are formed using metal and a channel layer is formed of an oxide semiconductor, and a driver circuit wiring formed using metal. The display portion includes a channel protection thin film transistor for a pixel, in which a source electrode layer and a drain electrode layer are formed using an oxide conductor and a semiconductor layer is formed of an oxide semiconductor, and a display portion wiring formed using an oxide conductor.

    摘要翻译: 目的是提高半导体器件的开口率。 半导体器件包括驱动器电路部分和在一个衬底上的显示部分(也称为像素部分)。 驱动器电路部分包括用于驱动电路的沟道蚀刻薄膜晶体管,其中使用金属形成源电极和漏电极,并且沟道层由氧化物半导体形成,以及使用金属形成的驱动电路布线。 显示部分包括用于像素的沟道保护薄膜晶体管,其中使用氧化物导体形成源极电极层和漏极电极层,并且半导体层由氧化物半导体形成;以及显示部分布线,其使用 氧化物导体。