Laser system
    53.
    发明授权
    Laser system 有权
    激光系统

    公开(公告)号:US08908735B2

    公开(公告)日:2014-12-09

    申请号:US13231882

    申请日:2011-09-13

    摘要: A method and apparatus may comprise a line narrowed pulsed excimer or molecular fluorine gas discharge laser system which may comprise a seed laser oscillator producing an output comprising a laser output light beam of pulses which may comprise a first gas discharge excimer or molecular fluorine laser chamber; a line narrowing module within a first oscillator cavity; a laser amplification stage containing an amplifying gain medium in a second gas discharge excimer or molecular fluorine laser chamber receiving the output of the seed laser oscillator and amplifying the output of the seed laser oscillator to form a laser system output comprising a laser output light beam of pulses, which may comprise a ring power amplification stage.

    摘要翻译: 一种方法和装置可以包括线变窄的脉冲准分子或分子氟气放电激光系统,其可以包括种子激光振荡器,其产生包括可以包括第一气体放电准分子或分子氟激光室的脉冲的激光输出光束的输出; 第一振荡器腔内的线窄模块; 在第二气体放电准分子或分子氟激光室中包含放大增益介质的激光放大级,其接收种子激光振荡器的输出并放大种子激光振荡器的输出,以形成激光系统输出,其包括激光输出光束 脉冲,其可以包括环形功率放大级。

    Laser system
    58.
    发明申请
    Laser system 有权
    激光系统

    公开(公告)号:US20080267242A1

    公开(公告)日:2008-10-30

    申请号:US11981195

    申请日:2007-10-30

    IPC分类号: H01S3/225

    摘要: A method/apparatus may comprise operating a line narrowed pulsed excimer or molecular fluorine gas discharge laser system by using a seed laser oscillator to produce an output which may comprise a first gas discharge excimer or molecular fluorine laser chamber; a line narrowing module; a laser amplification stage which may comprise a ring power amplification stage; the method of operation may the steps of: selecting a differential timing between an electrical discharge between a pair of electrodes in the first laser chamber and in the second laser chamber which at the same time keeps ASE below a selected limit and the pulse energy of the laser system output light beam of pulses essentially constant.

    摘要翻译: 方法/装置可以包括通过使用种子激光振荡器来操作线窄的脉冲准分子或分子氟气体放电激光系统,以产生可包括第一气体放电准分子或分子氟激光室的输出; 线缩小模块; 可以包括环功率放大级的激光放大级; 操作方法可以是:选择第一激光室中的一对电极与第二激光室中的一对电极之间的放电之间的差分定时,同时使ASE保持在选定的极限以下,并且脉冲能量 激光系统输出光束的脉冲基本恒定。

    Laser system
    59.
    发明申请
    Laser system 有权
    激光系统

    公开(公告)号:US20080225908A1

    公开(公告)日:2008-09-18

    申请号:US11981449

    申请日:2007-10-30

    IPC分类号: H01S3/225

    摘要: An apparatus/method which may comprise a line narrowed pulsed excimer or molecular fluorine gas discharge laser system which may comprise a seed laser oscillator producing an output comprising a seed laser output light beam of pulses which may comprise a first gas discharge excimer or molecular fluorine laser chamber; a line narrowing module within a first oscillator cavity; a laser amplification stage containing an amplifying gain medium in a second gas discharge excimer or molecular fluorine laser chamber receiving the output of the seed laser oscillator and amplifying the output of the seed laser oscillator to form a laser system output comprising a laser system output light beam of pulses, which may comprise a ring power amplification stage; a seed injection mechanism.

    摘要翻译: 可以包括线变窄的脉冲准分子或分子氟气体放电激光系统的装置/方法,其可以包括种子激光振荡器,其产生包括种子激光输出的脉冲光束的输出,所述种子激光输出光束可以包括第一气体放电准分子或分子氟激光 房间 第一振荡器腔内的线窄模块; 在第二气体放电准分子或分子氟激光室中包含放大增益介质的激光放大级,其接收种子激光振荡器的输出并放大种子激光振荡器的输出,以形成激光系统输出,该激光系统输出包括激光系统输出光束 的脉冲,其可以包括环形功率放大级; 种子注射机制。

    EUV light source collector lifetime improvements
    60.
    发明授权
    EUV light source collector lifetime improvements 有权
    EUV光源收集器寿命改善

    公开(公告)号:US07365349B2

    公开(公告)日:2008-04-29

    申请号:US11168190

    申请日:2005-06-27

    IPC分类号: H01J35/20

    摘要: An apparatus and method for cleaning a plasma source material compound from a plasma produced EUV light source collector optic which may comprise reacting the plasma source material compound with hydrogen to form a hydride of the plasma source material from the plasma source material contained in the plasma source material compound on the collector optic. The method may further comprise initiating the reacting by introducing hydrogen into a plasma formation chamber containing the collector optic, and may further comprise removing the hydride from the collector optic, e.g., by cleaning plasma action and/or plasma source material sputtering, or other means as may be determined to be effective. An apparatus and method of extending the useful life of a plasma produced EUV light source collector coating layer may comprise in situ replacement of the material of the coating layer by deposition of the coating layer material onto the coating layer.

    摘要翻译: 一种用于从等离子体产生的EUV光源收集器光学元件清洗等离子体源材料化合物的装置和方法,其可以包括使等离子体源材料化合物与氢反应以从等离子体源中包含的等离子体源材料形成等离子体源材料的氢化物 收集器光学元件上的材料化合物。 该方法还可以包括通过将氢引入到包含收集器光学元件的等离子体形成室中来引发反应,并且还可以包括例如通过清洗等离子体作用和/或等离子体源材料溅射或其它方法从收集器光学元件中去除氢化物 可能被确定为有效。 延长等离子体产生的EUV光源集电器涂层的使用寿命的装置和方法可包括通过将涂层材料沉积到涂层上来原位置换涂层的材料。