摘要:
A charged particle beam instrument is offered which has a specimen pre-evacuation chamber. An outflow flow rate adjusting valve (70) adjusts the flow rate of gas exhausted from the specimen pre-evacuation chamber (20) under control of controller (82). The controller (82) for making a decision as to whether the difference between a first pressure in the pre-evacuation chamber (20) before the adjusting valve (70) is controlled to the first degree of opening and a second pressure in the pre-evacuation chamber (20) after the adjusting valve (70) has been controlled to the first degree of opening is greater than a first reference value.
摘要:
The invention relates to an environmental cell for use in e.g. an electron microscope. The environmental cell shows an aperture (15) for passing the beam produced by the electron microscope to a sample (6) placed inside the environmental cell. The environmental cell according to the invention is characterized in that a part of the environmental cell (14) is transparent to secondary radiation such as back-scattered electrons or X-rays. This enables the detection of this radiation by a detector placed outside the environmental cell and thus a much simpler construction of the cell.
摘要:
A charged particle lithography system for transferring a pattern onto the surface of a target, comprising a main vacuum chamber, a source chamber and an intermediate chamber, both located in the main vacuum chamber, a beam generator for generating a charged particle beam, the beam generator located in the source chamber, and a first aperture array element for generating a plurality of charged particle beamlets from the beam, the first aperture array element located in the intermediate chamber. The system is adapted for maintaining a first pressure in the main vacuum chamber, a second pressure in the intermediate chamber, and a third pressure in the source chamber, and wherein the first pressure is lower than an ambient pressure, the second pressure is lower than the first pressure, and the third pressure is lower than the second pressure.
摘要:
A particle beam device includes a particle beam generator, an objective lens, and first and second deflection systems for deflecting the particle beam in an object plane defined by the objective lens. In a first operating mode, the first deflection system generates a first deflection field and the second deflection system generates a second deflection field. In a second operating mode, the first deflection system generates a third deflection field and the second deflection system generates a fourth deflection field.
摘要:
A drawing apparatus which performs drawing on a substrate with a plurality of charged particle beams includes: a blanking deflector located in a vacuum chamber and configured to blank each of the plurality of charged particle beams; a device located in an external chamber in which a gas pressure is higher than a gas pressure in the vacuum chamber, and configured to control the blanking deflector; and a first substrate facing the blanking deflector. The first substrate constitutes a partition which separates the vacuum chamber and the external chamber in a region, of the first substrate, facing the blanking deflector, and includes an electrode which fills a via formed in the region. The device is electrically connected to the blanking deflector via the electrode.
摘要:
The invention relates to an environmental cell for use in e.g. an electron microscope. The environmental cell shows an aperture (15) for passing the beam produced by the electron microscope to a sample (6) placed inside the environmental cell. The environmental cell according to the invention is characterized in that a part of the environmental cell (14) is transparent to secondary radiation such as back-scattered electrons or X-rays. This enables the detection of this radiation by a detector placed outside the environmental cell and thus a much simpler construction of the cell.
摘要:
In a charged particle beam device, such as an electron microscope, a beam generating apparatus generates a focussed charged particle beam e—that is incident on a specimen in a specimen chamber which holds the specimen in a gaseous environment. A pressure limiting aperture provides partial gaseous isolation of the specimen chamber from the beam generating means, and is located in a lens of the latter. The device includes a conduit, such as an intermediate chamber in the lens, through which, in use, gas is supplied to set up a flow of gas from the region of the lens towards the specimen, thereby to prevent material released from the specimen from impinging on the pressure limiting aperture, to prevent contamination of the latter. The device can be used in a method of scanning a specimen with a charged particle beam, for example in a method of electron microscopy.
摘要:
The invention relates to an environmental cell for use in e.g. an electron microscope. The environmental cell shows an aperture (15) for passing the beam produced by the electron microscope to a sample (6) placed inside the environmental cell. The environmental cell according to the invention is characterized in that a part of the environmental cell (14) is transparent to secondary radiation such as back-scattered electrons or X-rays. This enables the detection of this radiation by a detector placed outside the environmental cell and thus a much simpler construction of the cell.
摘要:
An apparatus which permits high-angle annular dark-field (HAADF) imaging comprises an electron gun, a specimen chamber in which a specimen is set, a gas cylinder for supplying environmental gas around the surface of the specimen through both a gas flow rate controller and a gas nozzle, a vacuum pump for evacuating the inside of the specimen chamber, an objective lens including upper and lower polepieces, a detector for detecting electrons transmitted through the specimen, a display device for displaying a transmission image of the specimen, orifice plates having minute holes, holders supporting the orifice plates, a drive mechanism for driving the holders, and a motion controller. The orifice plates can be moved in a direction crossing the optical axis of the beam on the upper and lower surfaces of the upper and lower polepieces of the objective lens.
摘要:
Gas is supplied from positive pressure (105 Pa or more) to an analysis device of high vacuum (10−2 Pa or less) precisely and stably, while keeping conditions constant and replicating the conditions, and performing switching to a desired gas within a short time. According to a gas introducing device and a method, a plurality of types of gases are synthesized in a mixing chamber, the synthesized gas is introduced and the pressure of the gas is reduced by a pressure reducing pump to a pressure ranging from 0.1 Pa to 0.1 MPa, and the depressurized gas is introduced to a gas analysis device through a switching operation using a gas switching valve.