公开(公告)号：US08735798B2

公开(公告)日：2014-05-27

申请号：US13590739

申请日：2012-08-21

Applicant: James R. Kesler ,  Douglas M. Trout ,  Gary W. Scheer

Inventor： James R. Kesler ,  Douglas M. Trout ,  Gary W. Scheer

IPC: H01L31/00

CPC classification number: H02H1/0023 ,  H01J3/14

Abstract: An electro-optical (EO) radiation collector for collecting and/or transmitting EO radiation (which may include EO radiation in the visible wavelengths) for transmission to an EO sensor. The EO radiation collector may be used with an arc flash detection device or other protective system, such as an intelligent electronic device (IED). The arc flash detection device may detect an arc flash event based upon EO radiation collected by and/or transmitted from the EO radiation collector. The EO radiation collector may receive an EO conductor cable, an end of which may be configured to receive EO radiation. A portion of the EO radiation received by the EO radiation collector may be transmitted into the EO conductor cable and transmitted to the arc flash detection device. The EO radiation collector may be adapted to receive a second EO conductor cable, which may be used to provide redundant EO transmission and/or self-test capabilities.

Abstract translation: 用于收集和/或传输EO辐射（其可以包括可见波长中的EO辐射）的电光（EO）辐射收集器，用于传输到EO传感器。 EO辐射收集器可以与电弧闪光检测装置或诸如智能电子装置（IED）的其它保护系统一起使用。 电弧闪光检测装置可以基于由EO辐射收集器收集的和/或从其发射的EO辐射来检测电弧闪光事件。 EO辐射收集器可以接收EO导体电缆，其端部可被配置为接收EO辐射。 由EO辐射收集器接收的EO辐射的一部分可以传输到EO导体电缆中并传输到电弧闪光检测装置。 EO辐射收集器可以适于接收可用于提供冗余EO传输和/或自检能力的第二EO导体电缆。

公开(公告)号：US20140021366A1

公开(公告)日：2014-01-23

申请号：US13789434

申请日：2013-03-07

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Hideto Dohi ,  Akira Ikegami ,  Hideyuki Kazumi

IPC: H01J3/26 ,  H01J3/14

CPC classification number: H01J3/26 ,  H01J3/14 ,  H01J37/1478 ,  H01J37/153 ,  H01J37/28 ,  H01J2237/1501 ,  H01J2237/1508

Abstract: The present invention provides a charged particle beam apparatus which is provided with a tilting deflector which is disposed between a charged particle source and an objective lens and tilts a charged particle beam, wherein a first optical element includes an electromagnetic quadrupole which generates dispersion to suppress the dispersion which is generated by deflection by the tilting deflector, and a second optical element is composed of a deflector for deflecting the charged particle beam which enters the first optical element or an electromagnetic quadrupole which causes the charged particle beam to generate a dispersion different from the dispersion generated by the first optical element.

Abstract translation: 本发明提供一种具有倾斜偏转器的带电粒子束装置，该倾斜偏转器设置在带电粒子源和物镜之间并使带电粒子束倾斜，其中第一光学元件包括电磁四极杆，其产生分散体以抑制 由倾斜偏转器偏转产生的色散，第二光学元件由用于偏转进入第一光学元件的电荷粒子束或电磁四极杆的偏转器组成，导致带电粒子束产生不同于 由第一光学元件产生的色散。

公开(公告)号：US08592785B2

公开(公告)日：2013-11-26

申请号：US13240951

申请日：2011-09-22

Applicant: Nai-Han Cheng ,  Chin-Hsiang Lin ,  Chi-Ming Yang ,  Chun-Lin Chang ,  Chih-Hong Hwang

Inventor： Nai-Han Cheng ,  Chin-Hsiang Lin ,  Chi-Ming Yang ,  Chun-Lin Chang ,  Chih-Hong Hwang

IPC: H01J37/317

CPC classification number: H01J37/3171 ,  G21K5/00 ,  H01J3/14 ,  H01J37/05 ,  H01J37/147

Abstract: An multi-ion beam implantation apparatus and method are disclosed. An exemplary apparatus includes an ion beam source that emits at least two ion beams; an ion beam analyzer; and a multi-ion beam angle incidence control system. The ion beam analyzer and the multi-ion beam angle incidence control system are configured to direct the emitted at least two ion beams to a wafer.

Abstract translation: 公开了一种多离子束注入装置和方法。 示例性装置包括发射至少两个离子束的离子束源; 离子束分析仪; 和多离子束角度入射控制系统。 离子束分析仪和多离子束角入射控制系统被配置为将发射的至少两个离子束引导到晶片。

公开(公告)号：US20130240720A1

公开(公告)日：2013-09-19

申请号：US13839989

申请日：2013-03-15

Applicant: HITACHI HIGH-TECH SCIENCE CORPORTION

Inventor： Yasuhiko SUGIYAMA ,  Tatsuya ASAHATA ,  Toshio DOI ,  Hiroshi OBA

IPC: H01J3/14

CPC classification number: H01J3/14 ,  H01J37/304 ,  H01J2237/0458 ,  H01J2237/30433 ,  H01J2237/30472 ,  H01J2237/31749

Abstract: Provided is a focused ion beam apparatus including a control portion configured to: store in advance, in a condenser voltage table, a calculation value of a condenser voltage for obtaining a reference beam current for all each of a plurality of apertures; obtain an experimental value of the condenser voltage for obtaining the reference beam current for a reference aperture; obtain a correction value of the condenser voltage by subtracting the calculation value stored for the reference aperture from the experimental value for the reference aperture; obtain setting values of the condenser voltage by adding the correction value to the calculation values stored for each of the plurality of the apertures; and store the obtained setting value in the condenser voltage table.

Abstract translation: 提供了一种聚焦离子束装置，其包括控制部分，该控制部分被配置为：预先存储在聚光器电压表中的用于获得多个孔中的每一个的参考光束电流的聚光器电压的计算值; 获得用于获得参考光圈的参考光束电流的电容器电压的实验值; 通过从参考孔径的实验值中减去存储在参考孔径上的计算值来获得冷凝器电压的校正值; 通过将所述校正值与对于所述多个孔中的每一个存储的计算值相加来获得所述冷凝器电压的设定值; 并将获得的设定值存储在冷凝器电压表中。

公开(公告)号：US08445872B2

公开(公告)日：2013-05-21

申请号：US13224773

申请日：2011-09-02

Applicant: Uwe Behrens ,  Thomas Stephani

Inventor： Uwe Behrens ,  Thomas Stephani

IPC: H01J3/14

CPC classification number: H05H7/02 ,  A61N5/10 ,  A61N5/1077 ,  A61N2005/1087 ,  H01J3/14 ,  H05H13/005 ,  H05H2007/122 ,  H05H2277/11

Abstract: Systems and methods are provided to perform efficient, automatic adjustment of cyclotron beam currents within a wide range for multiple treatment layers within the same patient and treatment session. In one embodiment, efficient adjustment is achieved by using beam current attenuation by an electrostatic vertical deflector installed in the inner center of the cyclotron. The beam current may, for example, be adjusted by the high voltage applied to the electrostatic vertical deflector. In front of each treatment the attenuation curve of the vertical deflector is recorded. Based on this attenuation curve, the vertical deflector voltage for the needed beam current of each irradiation layer is interpolated. With this procedure the beam current could be automatically adjusted in minimal time over a wide range while maintaining a high level of precision.

公开(公告)号：US08440987B2

公开(公告)日：2013-05-14

申请号：US13225045

申请日：2011-09-02

Applicant: Thomas Stephani ,  Uwe Behrens ,  Heinrich Roecken ,  Jan Timmer ,  Christian Baumgarten

Inventor： Thomas Stephani ,  Uwe Behrens ,  Heinrich Roecken ,  Jan Timmer ,  Christian Baumgarten

IPC: A61N5/10 ,  H01J3/14 ,  G21K5/00

CPC classification number: H05H7/02 ,  A61N5/10 ,  A61N5/1077 ,  A61N2005/1087 ,  H01J3/14 ,  H05H13/005 ,  H05H2007/122 ,  H05H2277/11

Abstract: Systems and methods are provided to perform efficient, automatic cyclotron initialization, calibration, and beam adjustment. A process is provided that allows the automation of the initialization of a cyclotron after overnight or maintenance imposed shutdown. In one embodiment, five independent cyclotron system states are defined and the transition between one state to another may be automated, e.g., by the control system of the cyclotron. According to these embodiments, it is thereby possible to achieve beam operation after shutdown with minimal manual input. By applying an automatic procedure, all active devices of the cyclotron (e.g., RF system, extraction deflectors, ion source) are respectively ramped to predefined parameters.

公开(公告)号：US20130099131A1

公开(公告)日：2013-04-25

申请号：US13713251

申请日：2012-12-13

Applicant: Axcelis Technologies, Inc.

Inventor： Edward C. Eisner

IPC: H01J3/14 ,  G21K5/10

CPC classification number: H01J3/14 ,  G21K5/10 ,  H01J37/302 ,  H01J37/3171 ,  H01J2237/049 ,  H01J2237/30477 ,  H01J2237/30483

Abstract: The present invention relates to a method and apparatus for varying the cross-sectional shape of an ion beam, as the ion beam is scanned over the surface of a workpiece, to generate a time-averaged ion beam having an improved ion beam current profile uniformity. In one embodiment, the cross-sectional shape of an ion beam is varied as the ion beam moves across the surface of the workpiece. The different cross-sectional shapes of the ion beam respectively have different beam profiles (e.g., having peaks at different locations along the beam profile), so that rapidly changing the cross-sectional shape of the ion beam results in a smoothing of the beam current profile (e.g., reduction of peaks associated with individual beam profiles) that the workpiece is exposed to. The resulting smoothed beam current profile provides for improved uniformity of the beam current and improved workpiece dose uniformity.

Abstract translation: 本发明涉及一种用于在离子束在工件的表面上扫描时改变离子束截面形状的方法和装置，以产生具有改进的离子束电流分布均匀性的时间平均离子束 。 在一个实施例中，离子束的横截面形状随着离子束移动穿过工件表面而变化。 离子束的不同横截面形状分别具有不同的光束轮廓（例如，沿着光束轮廓在不同位置处具有峰值），使得快速改变离子束的横截面形状导致光束电流的平滑 工件暴露于的轮廓（例如，减小与各个梁轮廓相关联的峰）。 所得到的平滑光束电流分布提供了改进的束电流均匀性和改进的工件剂量均匀性。

公开(公告)号：US08421039B2

公开(公告)日：2013-04-16

申请号：US13077329

申请日：2011-03-31

Applicant: Edward C. Eisner

Inventor： Edward C. Eisner

IPC: G21K5/10 ,  H01J3/12

CPC classification number: H01J3/14 ,  G21K5/10 ,  H01J37/302 ,  H01J37/3171 ,  H01J2237/049 ,  H01J2237/30477 ,  H01J2237/30483

Abstract: The present invention relates to a method and apparatus for varying the cross-sectional shape of an ion beam, as the ion beam is scanned over the surface of a workpiece, to generate a time-averaged ion beam having an improved ion beam current profile uniformity. In one embodiment, the cross-sectional shape of an ion beam is varied as the ion beam moves across the surface of the workpiece. The different cross-sectional shapes of the ion beam respectively have different beam profiles (e.g., having peaks at different locations along the beam profile), so that rapidly changing the cross-sectional shape of the ion beam results in a smoothing of the beam current profile (e.g., reduction of peaks associated with individual beam profiles) that the workpiece is exposed to. The resulting smoothed beam current profile provides for improved uniformity of the beam current and improved workpiece dose uniformity.

Abstract translation: 本发明涉及一种用于在离子束在工件的表面上扫描时改变离子束截面形状的方法和装置，以产生具有改进的离子束电流分布均匀性的时间平均离子束 。 在一个实施例中，离子束的横截面形状随着离子束移动穿过工件表面而变化。 离子束的不同横截面形状分别具有不同的光束轮廓（例如，沿着光束轮廓在不同位置处具有峰值），使得快速改变离子束的横截面形状导致光束电流的平滑 工件暴露于的轮廓（例如，减小与各个梁轮廓相关联的峰）。 所得到的平滑光束电流分布提供了改进的束电流均匀性和改进的工件剂量均匀性。

公开(公告)号：US08345349B2

公开(公告)日：2013-01-01

申请号：US12472600

申请日：2009-05-27

Applicant: Jingjing Li

Inventor： Jingjing Li

IPC: G02F1/01 ,  G01N21/39 ,  H01S3/131 ,  H01S3/14

CPC classification number: G02B1/007 ,  G01N21/62 ,  G01N21/7746 ,  G02F1/21 ,  G02F2001/213 ,  G02F2202/30 ,  H01J3/14

Abstract: Various embodiments of the present invention are directed to compact, sub-wavelength optical resonators. In one aspect, an optical resonator comprises two approximately parallel reflective structures positioned and configured to form a resonant cavity. The resonator also includes a fishnet structure disposed within the cavity and oriented approximately parallel to the reflective structures. The resonant cavity is configured with a cavity length that can support resonance with electromagnetic radiation having a fundamental wavelength that is more than twice the cavity length.

Abstract translation: 本发明的各种实施例涉及致密的亚波长光学谐振器。 在一个方面，光学谐振器包括两个近似平行的反射结构，其被定位和配置成形成谐振腔。 谐振器还包括设置在空腔内并且大致平行于反射结构定向的鱼网结构。 谐振腔被配置为具有腔体长度，该腔体长度可以支持与具有大于腔长度的两倍的基本波长的电磁辐射的共振。

公开(公告)号：US08178859B2

公开(公告)日：2012-05-15

申请号：US12618718

申请日：2009-11-14

Applicant: Vladimir Balakin

Inventor： Vladimir Balakin

IPC: A61N5/00

CPC classification number: H05H7/10 ,  A61N5/1048 ,  A61N5/1067 ,  A61N2005/1087 ,  H01J3/04 ,  H01J3/14 ,  H05H13/04

Abstract: The invention comprises a proton beam positioning method and apparatus used in conjunction with multi-axis charged particle radiation therapy of cancerous tumors. The proton beam verification system allows for monitoring of the actual proton beam position in real-time without destruction of the proton beam. The system includes a coating or thin layer substantially in contact with a foil covering the end of an exit nozzle or is a layer located after the x- and y-axis proton beam scanning controllers and before the patient. The coating yields a measurable spectroscopic response, spatially viewable by the detector, as a result of transmission by the proton beam. The proton beam position is monitored by the detector and compared to the calibration and/or treatment plan to verify accurate proton delivery to the tumor and/or as a proton beam shutoff safety indicator.

Abstract translation: 本发明包括与癌肿瘤的多轴带电粒子放射治疗结合使用的质子束定位方法和装置。 质子束验证系统允许实时监测实际的质子束位置，而不破坏质子束。 该系统包括基本上与覆盖出口喷嘴的端部的箔接触的涂层或薄层，或者是位于x轴和y轴质子束扫描控制器之后且位于患者之前的层。 作为质子束传输的结果，涂层产生可测量的光谱响应，由检测器空间可见。 质子束位置由检测器监测，并与校准和/或治疗计划进行比较，以验证对肿瘤的精确质子传递和/或作为质子束截止安全指示剂。