Abstract:
The invention relates to an electron gun for generating a flat electron beam, comprising a cathode with an emission surface which is curved about a central axis and which is designed to emit electrons. The electron gun further comprises an accelerating device for accelerating the electrons in a radial direction towards a target region on the central axis. Furthermore, the emission surface has a width in the azimuth direction and a height oriented perpendicularly to the width, said width being at least ten times greater than the height.
Abstract:
According to one embodiment, an X-ray tube includes an anode target, a cathode including a filament and a convergence electrode which includes a groove portion, and an envelope. The groove portion includes a pair of first bottom surfaces which are located in the same plane as the filament and between which the filament is interposed in a width direction of the groove portion, and a pair of second bottom surfaces between which the filament and the pair of first bottom surfaces are interposed in a length direction of the groove portion and which are located closer to an opening of the groove portion than the pair of first bottom surfaces.
Abstract:
A system includes an integrated circuit (IC) design data base having a feature, a source configured to generate a radiation beam, a pattern generator (PG) including a mirror array plate and an electrode plate disposed over the mirror array plate, wherein the electrode plate includes a lens let having a first dimension and a second dimension perpendicular to the first dimension with the first dimension larger than the second dimension so that the lens let modifies the radiation beam to form the long shaped radiation beam, and a stage configured secured the substrate. The system further includes an electric field generator connecting the minor array plate. The mirror array plate includes a mirror. The mirror absorbs or reflects the radiation beam. The radiation beam includes electron beam or ion beam. The second dimension is equal to a minimum dimension of the feature.
Abstract:
A hybrid electrostatic lens is used to shape and focus an ion beam. The hybrid electrostatic lens comprises an Einzel lens defined by an elongated tube having a first and second ends and a first electrode disposed at the first end and a second electrode disposed at the second end. The elongated tube is configured to receive a voltage bias to create an electric field within the Einzel lens as the ion beam travels through the hybrid electrostatic lens. The hybrid electrostatic lens further includes a quadrupole lens having a first stage and a second stage, where each of the stages is defined by a plurality of electrodes turned 90° with respect to each other to define a pathway in the Z direction through the elongated tube. The Einzel lens focuses the ion beam and the quadrupole lens shapes the ion beam.
Abstract:
A charged particle shaped beam column includes: an objective lens configured to form a charged particle shaped beam on the surface of a substrate, wherein the disk of least confusion of the objective lens does not coincide with the surface of the substrate; an optical element with 8N poles disposed radially symmetrically about the optic axis of the column, the optical element being positioned between a condenser lens and the objective lens, wherein integer N1; and a power supply applying excitations to the optical element's 8N poles to provide an octupole electromagnetic field. The octupole electromagnetic field induces azimuthally-varying third-order deflections to beam trajectories passing through the 8N-pole optical element. By controlling the excitation of the 8N poles a shaped beam, such as a square beam, can be formed at the surface of the substrate.
Abstract:
A hybrid electrostatic lens is used to shape and focus an ion beam. The hybrid electrostatic lens comprises an Einzel lens defined by an elongated tube having a first and second ends and a first electrode disposed at the first end and a second electrode disposed at the second end. The elongated tube is configured to receive a voltage bias to create an electric field within the Einzel lens as the ion beam travels through the hybrid electrostatic lens. The hybrid electrostatic lens further includes a quadrupole lens having a first stage and a second stage, where each of the stages is defined by a plurality of electrodes turned 90° with respect to each other to define a pathway in the Z direction through the elongated tube. The Einzel lens focuses the ion beam and the quadrupole lens shapes the ion beam.
Abstract:
An electrostatic lens includes multiple electrodes each having a through hole, and an insulating spacer that is provided between the electrodes and that fixes an interval between the electrodes. Both surfaces of the spacer are bonded with the electrodes opposing each other so that the spacer is integral with both the electrodes. A protective film is disposed on both surfaces of each of the electrodes. The protective film is present on the interior wall of the through hole and in a region around the through hole on the surface of the electrode. The region extends continuously from the interior wall to an end portion of the electrode. The protective film is not present at an interface between the electrode and the spacer.
Abstract:
An electrostatic lens includes multiple electrodes each having a through hole, and an insulating spacer that is provided between the electrodes and that fixes an interval between the electrodes. Both surfaces of the spacer are bonded with the electrodes opposing each other so that the spacer is integral with both the electrodes. A protective film is disposed on both surfaces of each of the electrodes. The protective film is present on the interior wall of the through hole and in a region around the through hole on the surface of the electrode. The region extends continuously from the interior wall to an end portion of the electrode. The protective film is not present at an interface between the electrode and the spacer.
Abstract:
System that focuses electron beams in an electro-static area to a laminar flow of electrons with uniform distribution of current density and extraordinary demagnification includes a housing having a first interior portion and a second interior portion electrically insulated from the first interior portion. The second interior portion has an electric field-free space. An electrode system is disposed in the first interior portion and includes a cathode assembly and at least one anode assembly. The cathode assembly generates an electron beam that passes through each anode assembly and then into the electric field-free space in the second interior portion. The system parameters may be calculated and created due to the CGMR conceptual method.
Abstract:
The present invention relates to an electron column including an electron emission source and lenses, and, more particularly, to an electron column having a structure that can facilitate the alignment and assembly of an electron emission source and lenses. The electron column having an electron emission source and a lens unit according to the present invention is characterized in that the lens unit includes two or more lens layers and performs both a source lens function and a focusing function. Furthermore, the electron column is characterized in that the lens unit includes one or more deflector-type lens layers and additionally performs a deflector function.