Method for Immediately Terminating Radical Polymerizations, Inhibitor Solution, and Use Thereof
    56.
    发明申请
    Method for Immediately Terminating Radical Polymerizations, Inhibitor Solution, and Use Thereof 有权
    立即终止自由基聚合的方法,抑制剂溶液及其用途

    公开(公告)号:US20150337056A1

    公开(公告)日:2015-11-26

    申请号:US14758648

    申请日:2013-12-04

    申请人: Allessa GmbH

    IPC分类号: C08F2/42 C08F22/02 C08F22/10

    CPC分类号: C08F2/42 C08F22/02 C08F22/10

    摘要: A method is described for immediately terminating free radical polymerizations by adding an inhibitor solution comprising a phenothiazine compound and/or a monoalkyl ether of hydroquinone to the free radical polymerizing system. The method is characterized in that the solvent of the inhibitor solution comprises at least 50% by weight of said solvent of alkylene glycol and/or polyalkylene glycol and/or terminally etherified derivatives of alkylene glycol and/or of polyalkylene glycol. The method permits the use of nontoxic inhibitor solutions.Inhibitor solutions are also described which comprise a phenothiazine compound and/or a monoalkyl ether of hydroquinone and, as solvent, alkylene glycol and/or polyalkylene glycol and/or terminally etherified derivatives of these compounds.

    摘要翻译: 描述了通过向自由基聚合体系中加入包含吩噻嗪化合物和/或氢醌的单烷基醚的抑制剂溶液来立即终止自由基聚合的方法。 该方法的特征在于,抑制剂溶液的溶剂包含至少50重量%的所述亚烷基二醇和/或聚亚烷基二醇和/或亚烷基二醇和/或聚亚烷基二醇的末端醚化衍生物的溶剂。 该方法允许使用无毒性抑制剂溶液。 还描述了抑制剂溶液,其包含对苯二酚的吩噻嗪化合物和/或单烷基醚,以及作为溶剂的这些化合物的亚烷基二醇和/或聚亚烷基二醇和/或末端醚化的衍生物。

    Swell index of HIPS using additives
    57.
    发明授权
    Swell index of HIPS using additives 有权
    使用添加剂的HIPS溶胀指数

    公开(公告)号:US09090715B2

    公开(公告)日:2015-07-28

    申请号:US13075211

    申请日:2011-03-30

    摘要: A process for producing a high impact polystyrene having a high swell index including feeding at least one vinyl aromatic monomer and at least one elastomer to at least one polymerization reactor to form a reaction mixture, polymerizing the reaction mixture, combining a chain transfer agent to the reaction mixture leaving the at least one polymerization reactor to form a combined mixture, sending the combined mixture to a devolatilization zone and obtaining a HIPS product having a high swell index.

    摘要翻译: 一种制备具有高溶胀指数的高抗冲聚苯乙烯的方法,包括将至少一种乙烯基芳族单体和至少一种弹性体进料至至少一个聚合反应器以形成反应混合物,使反应混合物聚合,将链转移剂与 反应混合物离开至少一个聚合反应器以形成混合的混合物,将合并的混合物送至脱挥发分区并获得具有高溶胀指数的HIPS产物。

    Active energy ray-curable composition, and coated article
    59.
    发明授权
    Active energy ray-curable composition, and coated article 有权
    活性能量射线固化性组合物和涂布制品

    公开(公告)号:US08889759B2

    公开(公告)日:2014-11-18

    申请号:US13522127

    申请日:2011-01-05

    CPC分类号: C08G77/388 C08F2/44 C09D4/00

    摘要: An object to be attained by the present invention is to provide an active energy ray-curable composition that is capable of producing a cured coating film having high scratch resistance and excellent transparency. The present invention relates to an active energy ray-curable composition containing a reactive particle (A) obtained by reacting a silica fine particle (a-1) and a hydrolysable silane (a-2) having one or more (meth)acryloyloxy groups and one or more isocyanurate ring structures in a molecule. The present invention also provides the active energy ray-curable composition according to the above, containing a photopolymerization initiator (B).

    摘要翻译: 本发明要达到的目的在于提供能够制造耐擦伤性高,透明性优异的固化涂膜的活性能量射线固化性组合物。 本发明涉及含有通过二氧化硅微粒(a-1)和具有一个或多个(甲基)丙烯酰氧基的可水解硅烷(a-2)反应获得的反应性颗粒(A)的活性能量射线固化性组合物和 一个或多个分子中的异氰脲酸酯环结构。 本发明还提供了含有光聚合引发剂(B)的上述的活性能量射线固化性组合物。

    Photosensitive resin composition and photosensitive film
    60.
    发明授权
    Photosensitive resin composition and photosensitive film 有权
    感光树脂组合物和感光膜

    公开(公告)号:US08187788B2

    公开(公告)日:2012-05-29

    申请号:US12226227

    申请日:2007-04-24

    摘要: Disclosed is a photosensitive resin composition comprising an alkali-soluble resin, wherein the dissolution rate of the alkali-soluble resin in an aqueous sodium carbonate solution is not less than 0.04 μm/sec. When a photosensitive layer having a thickness of 30 μm is formed by applying the photosensitive resin composition onto a base and removing the solvent by heating, and thus-obtained photosensitive layer is irradiated with an active ray of 1000 mJ/cm2 or less, the dissolution rate of the portion irradiated with the active ray in the photosensitive layer made of the photosensitive resin composition is not less than 0.22 μm/sec and the film residual rate of the portion not irradiated with the active ray is not less than 90%.

    摘要翻译: 公开了一种包含碱溶性树脂的光敏树脂组合物,其中碱溶性树脂在碳酸钠水溶液中的溶解速率不小于0.04微米/秒。 当通过将感光性树脂组合物涂布在基材上并通过加热除去溶剂来形成厚度为30μm的感光层时,用1000mJ / cm 2以下的活性光线照射所得到的感光层, 由感光性树脂组合物制成的感光层中用活性射线照射的部分的比例不小于0.22μm/ sec,未用活性射线照射的部分的膜残留率不小于90%。