公开(公告)号：US08002946B2

公开(公告)日：2011-08-23

申请号：US11589337

申请日：2006-10-30

Applicant: Richard Lewington ,  Michael N. Grimbergen ,  Khiem K. Nguyen ,  Darin Bivens ,  Madhavi R. Chandrachood ,  Ajay Kumar

Inventor： Richard Lewington ,  Michael N. Grimbergen ,  Khiem K. Nguyen ,  Darin Bivens ,  Madhavi R. Chandrachood ,  Ajay Kumar

IPC: C23F1/00 ,  H01L21/306 ,  C23C16/00

CPC classification number: H01L21/67069 ,  H01J37/3255 ,  H01L21/67253 ,  H01L21/68742 ,  H01L21/68757 ,  H01L21/68785

Abstract: A plasma reactor for etching a workpiece such as a rectangular or square mask, includes a vacuum chamber having a ceiling and a sidewall and a workpiece support pedestal within the chamber including a cathode having a surface for supporting a workpiece, the surface comprising plural respective zones, the respective zones of the surface being formed of respective materials of different electrical characteristics. The zones can be arranged concentrically relative to an axis of symmetry of the wafer support pedestal.

Abstract translation: 用于蚀刻诸如矩形或正方形掩模的工件的等离子体反应器包括具有天花板和侧壁的真空室以及腔室内的工件支撑基座，其包括具有用于支撑工件的表面的阴极，该表面包括多个相应的区域 表面的各个区域由具有不同电特性的各种材料形成。 这些区域可以相对于晶片支撑基座的对称轴同心布置。

公开(公告)号：US20110199137A1

公开(公告)日：2011-08-18

申请号：US13028340

申请日：2011-02-16

Applicant: Krishnaswamy NAGARAJ ,  Ajay KUMAR ,  Xiao PU ,  Sreekiran SAMALA

Inventor： Krishnaswamy NAGARAJ ,  Ajay KUMAR ,  Xiao PU ,  Sreekiran SAMALA

IPC: H03L7/08

CPC classification number: H03L7/099 ,  H03L7/093

Abstract: A phase-locked loop includes a loop filter and a voltage controlled oscillator (VCO). The VCO includes multiple transistors, each transistor having a smaller transconductance (gm) than if a single transistor were used while maintaining the same loop bandwidth and drain-to-source current through the transistor. As a result of a smaller transconductance in the VCO, a larger resistor can be used in the loop filter without increasing the noise. With a larger resistor, a smaller capacitor can be used in the loop filter as well. Alternatively, the transconductance can be reduced by a certain factor and the resistance value can be increased by the same factor to maintain a constant loop bandwidth but with a reduction in the amplitude of the noise. Thus, a smaller loop filter capacitor can be achieved albeit with the same noise level, or a lower noise level with the same size capacitor for the loop filter.

Abstract translation: 锁相环包括环路滤波器和压控振荡器（VCO）。 VCO包括多个晶体管，每个晶体管具有比使用单个晶体管更小的跨导（gm），同时保持相同的环路带宽和通过晶体管的漏极 - 源极电流。 由于VCO中的跨导较小，因此可以在环路滤波器中使用较大的电阻，而不会增加噪声。 使用较大的电阻器，也可以在环路滤波器中使用较小的电容器。 或者，可以将跨导降低一定的因子，并且可以通过相同的因子来增加电阻值以保持恒定的环路带宽，但是噪声幅度的减小。 因此，尽管具有相同的噪声电平，但是对于环路滤波器，具有相同尺寸的电容器可以实现较小的环路滤波电容器。

公开(公告)号：US20110162797A1

公开(公告)日：2011-07-07

申请号：US13045239

申请日：2011-03-10

Applicant: Ajay Kumar ,  Madhavi R. Chandrachood ,  Richard Lewington ,  Darin Bivens ,  Amitabh Sabharwal ,  Sheeba J. Panayil ,  Alan Hiroshi Ouye

Inventor： Ajay Kumar ,  Madhavi R. Chandrachood ,  Richard Lewington ,  Darin Bivens ,  Amitabh Sabharwal ,  Sheeba J. Panayil ,  Alan Hiroshi Ouye

IPC: C23F1/08

CPC classification number: H01J37/32422 ,  H01J37/3244 ,  H01J37/32449

Abstract: A method and apparatus for etching photomasks is provided herein. In one embodiment, the apparatus comprises a process chamber having a support pedestal adapted for receiving a photomask. An ion-neutral shield is disposed above the pedestal and a deflector plate assembly is provided above the ion-neutral shield. The deflector plate assembly defines a gas flow direction for process gases towards the ion-neutral shield, while the ion-neutral shield is used to establish a desired distribution of ion and neutral species in a plasma for etching the photomask.

Abstract translation: 本文提供了蚀刻光掩模的方法和设备。 在一个实施例中，该装置包括具有适于接收光掩模的支撑基座的处理室。 离子中性屏蔽设置在基座上方，偏转板组件设置在离子中性屏蔽层上方。 导流板组件限定了朝向离子中性屏蔽的工艺气体的气体流动方向，而离子中性屏蔽用于建立用于蚀刻光掩模的等离子体中的离子和中性物质的期望分布。

公开(公告)号：US07967930B2

公开(公告)日：2011-06-28

申请号：US11589596

申请日：2006-10-30

Applicant: Richard Lewington ,  Michael N. Grimbergen ,  Khiem K. Nguyen ,  Darin Bivens ,  Madhavi R. Chandrachood ,  Ajay Kumar

Inventor： Richard Lewington ,  Michael N. Grimbergen ,  Khiem K. Nguyen ,  Darin Bivens ,  Madhavi R. Chandrachood ,  Ajay Kumar

IPC: C23F1/00 ,  H01L21/306 ,  C23C16/00

CPC classification number: H01J37/32082 ,  H01J37/32009 ,  H01J37/32568

Abstract: A plasma reactor is provided for processing a workpiece such as a transparent mask or a semiconductor wafer. The reactor includes a vacuum chamber having a ceiling and a sidewall. A workpiece support pedestal within the chamber includes a metal cathode having a support surface facing the ceiling and defining a support plane for supporting a workpiece. The cathode has a hollow space formed within its interior. The reactor further includes a movable metal element within the hollow space and a mechanism for controlling a distance between the metal element and the support plane.

Abstract translation: 提供等离子体反应器用于处理诸如透明掩模或半导体晶片的工件。 反应器包括具有天花板和侧壁的真空室。 腔室内的工件支撑基座包括金属阴极，金属阴极具有面向天花板的支撑表面并且限定用于支撑工件的支撑平面。 阴极在其内部形成有中空空间。 反应器还包括在中空空间内的可移动金属元件和用于控制金属元件和支撑平面之间的距离的机构。

公开(公告)号：US20110122764A1

公开(公告)日：2011-05-26

申请号：US12592371

申请日：2009-11-24

Applicant: Kadangode K. Ramakrishnan ,  Rakesh Kumar Sinha ,  Ajay Kumar Todimala

Inventor： Kadangode K. Ramakrishnan ,  Rakesh Kumar Sinha ,  Ajay Kumar Todimala

IPC: H04J3/14

CPC classification number: H04L41/0816 ,  H04L41/06

Abstract: A second link in a network is reconfigured after failure of a first link, so that multiple-link failures may be survived. After receipt of an OSPF link state advertisement (LSA) indicating use of a backup path bl after the failure of link l, new backup paths are determined for each impacted link (x,y) that has a backup path sharing one or more links with the backup path bl. The new backup paths are computed while ignoring the failed link l, the impacted link (x,y), and links common to the backup paths b(x,y) and bl. The LSA protocol is modified to accommodate information used in determining whether a link is an impacted link.

Abstract translation: 网络中的第二个链路在第一个链路发生故障后被重新配置，从而多链路故障可能会被存活。 在收到指示在链路l故障之后使用备份路径bl的OSPF链路状态通告（LSA）之后，为每个受影响的链路（x，y）确定新的备份路径，该备份路径具有共享一个或多个链路的备份路径 备份路径bl。 计算新的备份路径，同时忽略故障链路l，受影响的链路（x，y）和备份路径b（x，y）和bl共同的链路。 修改LSA协议以适应用于确定链路是否是受影响链路的信息。

公开(公告)号：US07950010B2

公开(公告)日：2011-05-24

申请号：US11040311

申请日：2005-01-21

Applicant: Karl Goger ,  Ankur Bhatt ,  Raghunandan S ,  Rajeev Ranjan ,  Ajay Kumar

Inventor： Karl Goger ,  Ankur Bhatt ,  Raghunandan S ,  Rajeev Ranjan ,  Ajay Kumar

IPC: G06F9/445 ,  G06F15/177

CPC classification number: G06F8/61

Abstract: The present invention provides a system and method for deploying software onto multiple heterogeneous systems at the same time. A generic software deployment manager may deploy software by communicating with client software deployment services residing on the systems that are receiving the software deployment. The software deployment manager can operate independent of the software and the operating system on which software is being deployed by communicating with the client software deployment service. To execute a software deployment, the software deployment manager may send software deployment messages containing generic commands that signify operations to be performed to deploy software. The client software deployment service provides an interface between the software deployment manager and the recipient system by translating these generic commands to commands that are compatible with the local operating system. The software deployment manager may transmit software deployment messages simultaneously to each of the systems within a system group or an environment so that software can be efficiently deployed without incompatibilities in the network. The software deployment manager may deploy software in Linux, Windows, Unix, Macatosh, Java, or any other operating system and may deploy any software.

Abstract translation: 本发明提供了一种用于在多个异构系统上同时部署软件的系统和方法。 通用软件部署经理可以通过与驻留在正在接收软件部署的系统上的客户端软件部署服务进行通信来部署软件。 软件部署管理器可以独立于通过与客户端软件部署服务通信来部署软件的软件和操作系统。 要执行软件部署，软件部署管理员可以发送包含通用命令的软件部署消息，该命令表示要执行的部署软件的操作。 客户端软件部署服务通过将这些通用命令转换为与本地操作系统兼容的命令来在软件部署管理器和接收方系统之间提供接口。 软件部署管理器可将软件部署消息同时发送到系统组或环境中的每个系统，使得可以有效地部署软件，而不会在网络中产生不兼容性。 软件部署经理可以在Linux，Windows，Unix，Macatosh，Java或任何其他操作系统中部署软件，并且可以部署任何软件。

公开(公告)号：US07924194B2

公开(公告)日：2011-04-12

申请号：US12549355

申请日：2009-08-27

Applicant: Ajay Kumar

Inventor： Ajay Kumar

IPC: H03M3/00

CPC classification number: H03M3/368 ,  H03M3/43 ,  H03M3/454

Abstract: A differential sigma delta modulator operates by modulating an input signal by intermittently coupling a reference signal to the input signal using one or more switches controlled by one or more feedback signals and a respective one or more non-overlapping clock signals. The modulated input signal is integrated using an integration capacitor to form an integrated value and the integrated value is compared to a threshold to form the one or more feedback signals. Parasitic capacitance of the one or more switches is initialized to an initial value prior to each intermittent coupling of the reference signal to the input signal using another non-overlapping clock signal.

Abstract translation: 差分Σ-Δ调制器通过使用由一个或多个反馈信号和相应的一个或多个非重叠时钟信号控制的一个或多个开关间歇性地将参考信号耦合到输入信号来调制输入信号来进行操作。 调制输入信号使用积分电容器积分以形成积分值，并将积分值与阈值进行比较以形成一个或多个反馈信号。 在使用另一个不重叠的时钟信号将参考信号与输入信号的每次间歇性耦合之前，将一个或多个开关的寄生电容初始化为初始值。

公开(公告)号：US20110073564A1

公开(公告)日：2011-03-31

申请号：US12878582

申请日：2010-09-09

Applicant: Roy C. Nangoy ,  Saravjeet Singh ,  Jon C. Farr ,  Sharma V. Pamarthy ,  Ajay Kumar

Inventor： Roy C. Nangoy ,  Saravjeet Singh ,  Jon C. Farr ,  Sharma V. Pamarthy ,  Ajay Kumar

IPC: H01L21/3065

CPC classification number: H01L21/3065 ,  C23C16/45508 ,  C23C16/45563 ,  C23C16/45574 ,  C23C16/45587 ,  C23C16/45591 ,  C23C16/505 ,  H01J37/321 ,  H01J37/3211 ,  H01J37/3222 ,  H01J37/3244 ,  H01J37/32449 ,  H01J37/32458 ,  H01L21/30655 ,  H01L21/67069

Abstract: Embodiments of the present invention relate to method and apparatus for providing processing gases to a process chamber with improved plasma dissociation efficiency. One embodiment of the present invention provides a baffle nozzle assembly comprising an outer body defining an extension volume connected to a processing chamber. A processing gas is flown to the processing chamber through the extension volume which is exposed to power source for plasma generation.

Abstract translation: 本发明的实施例涉及用于向具有改进的等离子体解离效率的处理室提供处理气体的方法和装置。 本发明的一个实施例提供了一种挡板喷嘴组件，其包括限定连接到处理室的延伸体的外部主体。 处理气体通过暴露于等离子体产生的电源的延伸体积流到处理室。

公开(公告)号：US20110072371A1

公开(公告)日：2011-03-24

申请号：US12562401

申请日：2009-09-18

Applicant: Todd Segal ,  Jeffrey Michael MacDuff ,  Michael Matteson ,  Ritwik Tewari ,  Brett Robinson ,  Prakash Ajay Kumar Suri ,  David Shoemaker ,  Xiangying Ma

Inventor： Todd Segal ,  Jeffrey Michael MacDuff ,  Michael Matteson ,  Ritwik Tewari ,  Brett Robinson ,  Prakash Ajay Kumar Suri ,  David Shoemaker ,  Xiangying Ma

IPC: G06F3/048

CPC classification number: G06F8/38

Abstract: Various embodiments related to an application programming interface for user interface creation are disclosed herein. For example, one disclosed embodiment provides an application programming interface, embodied on one or more data-holding subsystems, comprising user interface creation services for intermediately defining a user interface including one or more user interface elements as declarative extensible markup language data. The application programming interface further comprises compiler services for providing aspects of the declarative extensible markup language data to one or more compilers for compilation into two or more different machine code implementations, where each machine code implementation is natively executable without a virtual machine by a different hardware platform to present the user interface intermediately defined as declarative extensible markup language data.

Abstract translation: 本文公开了与用于创建用户界面的应用编程接口相关的各种实施例。 例如，一个公开的实施例提供了一种应用编程接口，其体现在一个或多个数据保持子系统上，包括用户接口创建服务，用于将包括一个或多个用户界面元素的用户界面定义为可声明可扩展标记语言数据。 应用编程接口还包括用于向一个或多个编译器提供声明性可扩展标记语言数据的方面以用于编译成两个或更多个不同机器代码实现的编译器服务，其中每个机器代码实现在本地可执行而不使用虚拟机由不同的硬件 平台来呈现用户界面，定义为声明式可扩展标记语言数据。

公开(公告)号：US07909961B2

公开(公告)日：2011-03-22

申请号：US11554495

申请日：2006-10-30

Applicant: Ajay Kumar ,  Madhavi R. Chandrachood ,  Richard Lewington ,  Darin Bivens ,  Amitabh Sabharwal ,  Sheeba J. Panayil ,  Alan Hiroshi Ouye

Inventor： Ajay Kumar ,  Madhavi R. Chandrachood ,  Richard Lewington ,  Darin Bivens ,  Amitabh Sabharwal ,  Sheeba J. Panayil ,  Alan Hiroshi Ouye

IPC: C23C16/00 ,  C23F1/00 ,  H01L21/00

CPC classification number: C23F4/00 ,  G03F1/80 ,  H01J37/321 ,  H01J37/32422

Abstract: A method and apparatus for etching photomasks are provided herein. The apparatus includes a process chamber with a shield above a substrate support. The shield comprises a plate with apertures, and the plate has two zones with at least one characteristic, such as material or potential bias, that is different from each other. The method provides for etching a photomask substrate with a distribution of ions and neutral species that pass through the shield.

Abstract translation: 本文提供了蚀刻光掩模的方法和设备。 该装置包括在衬底支架上方具有屏蔽的处理室。 屏蔽包括具有孔的板，并且该板具有两个彼此不同的至少一个特性，例如材料或电位偏置的区域。 该方法提供了通过穿过屏蔽的离子和中性物质的分布来蚀刻光掩模衬底。