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公开(公告)号：US10236164B2
公开(公告)日：2019-03-19
申请号：US15682605
申请日：2017-08-22
申请人： H.C. STARCK INC.
发明人： Peter R. Jepson , Dincer Bozkaya
摘要： A refractory metal plate is provided. The plate has a center, a thickness, an edge, a top surface and a bottom surface, and has a crystallographic texture (as characterized by through thickness gradient, banding severity; and variation across the plate, for each of the texture components 100//ND and 111//ND, which is substantially uniform throughout the plate.
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公开(公告)号：US20190066987A1
公开(公告)日：2019-02-28
申请号：US16115648
申请日：2018-08-29
申请人： H.C. STARCK INC.
发明人： Shuwei SUN , Gary Alan ROZAK , Qi ZHANG , Barbara COX , Yen-Te Lee
摘要： Sputtering targets including molybdenum, niobium and tantalum are found to be useful for sputtering films for electronic devices. Sputtering targets with about 88 to 97 weight percent molybdenum show improved performance, particularly with respect to etching, such as when simultaneously etching an alloy layer including the Mo, Nb, and Ta, and a metal layer (e.g., an aluminum layer). The targets are particularly useful in manufacturing touch screen devices.
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公开(公告)号：US10211035B2
公开(公告)日：2019-02-19
申请号：US15890463
申请日：2018-02-07
申请人： H.C. STARCK, INC.
发明人： Gary Alan Rozak , Mark E. Gaydos
摘要： A sputtering target that includes at least two consolidated blocks, each block including an alloy including molybdenum in an amount greater than about 30 percent by weight and at least one additional alloying ingredient; and a joint between the at least two consolidated blocks, the joint being free of any microstructure due to an added bonding agent (e.g., powder, foil or otherwise), and being essentially free of any visible joint line the target that is greater than about 200 μm width (e.g., less than about 50 μm width). A process for making the target includes hot isostatically pressing, below a temperature of 1080° C., consolidated perform blocks that may be surface prepared (e.g., roughened to a predetermined roughness value) prior to pressing.
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公开(公告)号：US20180190476A1
公开(公告)日：2018-07-05
申请号：US15890463
申请日：2018-02-07
申请人： H.C. STARCK, INC.
发明人： Gary Alan Rozak , Mark E. Gaydos
CPC分类号： H01J37/3429 , B22F1/0003 , B22F3/15 , B22F3/24 , B22F2003/153 , B22F2003/247 , B22F2301/20 , B22F2998/10 , C22C27/04 , C23C14/3407 , C23C14/3414 , H01J37/3491
摘要： A sputtering target that includes at least two consolidated blocks, each block including an alloy including molybdenum in an amount greater than about 30 percent by weight and at least one additional alloying ingredient; and a joint between the at least two consolidated blocks, the joint being free of any microstructure due to an added bonding agent (e.g., powder, foil or otherwise), and being essentially free of any visible joint line the target that is greater than about 200 μm width (e.g., less than about 50 μm width). A process for making the target includes hot isostatically pressing, below a temperature of 1080° C., consolidated perform blocks that may be surface prepared (e.g., roughened to a predetermined roughness value) prior to pressing.
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公开(公告)号：US20180076011A1
公开(公告)日：2018-03-15
申请号：US15804365
申请日：2017-11-06
申请人： H.C. STARCK INC.
CPC分类号： H01J37/3429 , B22F2998/10 , C03C17/40 , C22C1/045 , C22C27/04 , C23C14/0688 , C23C14/14 , C23C14/16 , C23C14/34 , C23C14/3407 , C23C14/3414 , C23C14/3492 , C23C14/35 , C23C14/548 , C23C14/5873 , C23G1/106 , C23G1/205 , G06F3/044 , G06F2203/04103 , Y10T428/12014 , Y10T428/12021 , Y10T428/12597 , Y10T428/31678 , B22F1/0003 , B22F3/02 , B22F3/18
摘要： The invention is directed at sputter targets including 50 atomic % or more molybdenum, a second metal element of titanium, and a third metal element of chromium or tantalum, and deposited films prepared by the sputter targets. In a preferred aspect of the invention, the sputter target includes a phase that is rich in molybdenum, a phase that is rich in titanium, and a phase that is rich in the third metal element.
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公开(公告)号：US20180040462A1
公开(公告)日：2018-02-08
申请号：US15682605
申请日：2017-08-22
申请人： H.C. STARCK INC.
发明人： Peter R. Jepson , Dincer Bozkaya
CPC分类号： H01J37/3426 , B21B1/227 , B21B39/04 , B21B2265/24 , B21B2267/065 , B21B2273/02 , B22F3/18 , C22F1/18 , C23C14/3414 , Y10T428/12 , Y10T428/12014 , Y10T428/12458
摘要： A refractory metal plate is provided. The plate has a center, a thickness, an edge, a top surface and a bottom surface, and has a crystallographic texture (as characterized by through thickness gradient, banding severity; and variation across the plate, for each of the texture components 100//ND and 111//ND, which is substantially uniform throughout the plate.
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公开(公告)号：US09783882B2
公开(公告)日：2017-10-10
申请号：US14482251
申请日：2014-09-10
申请人： H.C. Starck, Inc.
发明人： Steven A. Miller , Prabhat Kumar , Richard Wu , Shuwei Sun , Stefan Zimmermann , Olaf Schmidt-Park
CPC分类号： C23C14/3414 , B22F1/0014 , C22C1/045 , C23C4/134 , C23C14/0057 , C23C14/0089 , C23C14/0641 , C23C14/08 , C23C14/14 , C23C24/04 , H01J37/3426 , H01J2237/332
摘要： In various embodiments, a sputtering target initially formed by ingot metallurgy or powder metallurgy and rejuvenated by, e.g., cold spray, is utilized in sputtering processes to produce metallic thin films.
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公开(公告)号：US09767999B2
公开(公告)日：2017-09-19
申请号：US14751224
申请日：2015-06-26
申请人： H.C. STARCK INC.
发明人： Peter R. Jepson , Dincer Bozkaya
CPC分类号： H01J37/3426 , B21B1/227 , B21B39/04 , B21B2265/24 , B21B2267/065 , B21B2273/02 , B22F3/18 , C22F1/18 , C23C14/3414 , Y10T428/12 , Y10T428/12014 , Y10T428/12458
摘要： A refractory metal plate is provided. The plate has a center, a thickness, an edge, a top surface and a bottom surface, and has a crystallographic texture (as characterized by through thickness gradient, banding severity; and variation across the plate, for each of the texture components 100//ND and 111//ND, which is substantially uniform throughout the plate.
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69.发明申请公开(公告)号：US20160196962A1
公开(公告)日：2016-07-07
申请号：US15067652
申请日：2016-03-11
申请人： H.C. Starck, Inc.
CPC分类号： H01J37/3429 , B22F1/0003 , B22F3/15 , B22F3/24 , B22F7/064 , B22F2003/153 , B22F2003/247 , B22F2301/20 , B22F2998/10 , C22C1/045 , C22C27/04 , C23C14/3407 , C23C14/3414 , C23C24/04
摘要： A sputtering target that includes at least two consolidated blocks, each block including an alloy including a first metal (e.g., a refractory metal such as molybdenum in an amount greater than about 30 percent by weight) and at least one additional alloying ingredient; and a joint between the at least two consolidated blocks, the joint being prepared free of any microstructure derived from a diffusion bond of an added loose powder. A process for making the target includes hot isostatically pressing (e.g., below a temperature of 1080° C.), consolidated preform blocks that, prior to pressing, have interposed between the consolidated powder metal blocks at least one continuous solid interface portion. The at least one continuous solid interface portion may include a cold spray body, which may be a mass of cold spray deposited powders on a surface a block, a sintered preform, a compacted powder body (e.g., a tile), or any combination thereof.
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公开(公告)号：US20150332903A1
公开(公告)日：2015-11-19
申请号：US14813732
申请日：2015-07-30
申请人： H.C. Starck Inc.
CPC分类号： H01J37/3429 , B22F2998/10 , C03C17/40 , C22C1/045 , C22C27/04 , C23C14/0688 , C23C14/14 , C23C14/16 , C23C14/34 , C23C14/3407 , C23C14/3414 , C23C14/3492 , C23C14/35 , C23C14/548 , C23C14/5873 , C23G1/106 , C23G1/205 , G06F3/044 , G06F2203/04103 , Y10T428/12014 , Y10T428/12021 , Y10T428/12597 , Y10T428/31678 , B22F1/0003 , B22F3/02 , B22F3/18
摘要： The invention is directed at sputter targets including 50 atomic % or more molybdenum, a second metal element of titanium, and a third metal element of chromium or tantalum, and deposited films prepared by the sputter targets. In a preferred aspect of the invention, the sputter target includes a phase that is rich in molybdenum, a phase that is rich in titanium, and a phase that is rich in the third metal element.
摘要翻译： 本发明涉及包括50原子％或更多的钼，钛的第二金属元素和铬或钽的第三金属元素以及由溅射靶制备的沉积膜的溅射靶。 在本发明的优选方面，溅射靶包括富含钼的相，富含钛的相和富含第三金属元素的相。
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