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    Debris protection system having a magnetic field for an EUV light source
    62.
    发明申请
    Debris protection system having a magnetic field for an EUV light source 有权
    具有用于EUV光源的磁场的碎片保护系统

    公开(公告)号：US20100032590A1

    公开(公告)日：2010-02-11

    申请号：US12221822

    申请日：2008-08-06

    申请人： Alexander N. Bykanov ,  Alexander I. Ershov

    发明人： Alexander N. Bykanov ,  Alexander I. Ershov

    IPC分类号： G01J3/10

    CPC分类号： H05G2/003 ,  G03F7/70033 ,  G03F7/70858 ,  G03F7/70916 ,  G03F7/70983 ,  H05G2/005 ,  H05G2/008

    摘要： Devices are disclosed herein which may comprise a vessel; a material disposed in the vessel for creating an EUV light emitting plasma at a plasma site, the plasma generating debris; a near normal incidence EUV reflective optic disposed in the vessel; and a source of a magnetic field for deflecting debris in the vessel to protect the optic, the source positioned to interpose the optic between the source and the plasma site.

    摘要翻译： 本文公开的装置可以包括容器; 设置在容器中的用于在等离子体位置处产生EUV发光等离子体的材料，等离子体产生碎片; 设置在容器中的近似正常入射的EUV反射光学器件; 以及用于偏转容器中的碎屑以保护光学元件的磁场源，所述源被定位成将光学元件插入在源和等离子体位置之间。

    Laser produced plasma euv light source
    63.
    发明申请
    Laser produced plasma euv light source 审中-公开
    激光产生等离子euv光源

    公开(公告)号：US20100024980A1

    公开(公告)日：2010-02-04

    申请号：US12587258

    申请日：2009-10-05

    申请人： Alexander I. Ershov ,  William N. Partlo ,  Norbert Bowering ,  Bjorn Hansson

    发明人： Alexander I. Ershov ,  William N. Partlo ,  Norbert Bowering ,  Bjorn Hansson

    IPC分类号： C23F1/08

    CPC分类号： H05G2/003 ,  B82Y10/00 ,  G03F7/70033 ,  H05G2/005 ,  H05G2/008

    摘要： An EUV light source is disclosed that may include a laser source, e.g. CO2 laser, a plasma chamber, and a beam delivery system for passing a laser beam from the laser source into the plasma chamber. Embodiments are disclosed which may include one or more of the following; a bypass line may be provided to establish fluid communication between the plasma chamber and the auxiliary chamber, a focusing optic, e.g. mirror, for focusing the laser beam to a focal spot in the plasma chamber, a steering optic for steering the laser beam focal spot in the plasma chamber, and an optical arrangement for adjusting focal power.

    摘要翻译： 公开了一种EUV光源，其可以包括例如激光源。 CO2激光器，等离子体室和用于将激光束从激光源传递到等离子体室中的光束传送系统。 公开了可以包括以下中的一个或多个的实施例; 可以提供旁路管线以建立等离子体室和辅助室之间的流体连通，聚焦光学器件例如。 用于将激光束聚焦到等离子体室中的焦点的反射镜，用于转向等离子体室中的激光束焦斑的转向光学元件，以及用于调整焦度的光学装置。

    LPP EUV light source drive laser system
    64.
    发明申请
    LPP EUV light source drive laser system 有权
    LPP EUV光源驱动激光系统

    公开(公告)号：US20090095925A1

    公开(公告)日：2009-04-16

    申请号：US12288970

    申请日：2008-10-24

    申请人： Alexander I. Ershov ,  Alexander N. Bykanov ,  Oleh Khodykin ,  Igor V. Fomenkov

    发明人： Alexander I. Ershov ,  Alexander N. Bykanov ,  Oleh Khodykin ,  Igor V. Fomenkov

    IPC分类号： G01J3/10

    CPC分类号： H05G2/003 ,  H05G2/008

    摘要： An apparatus and method is disclosed which may comprise a laser produced plasma EUV system which may comprise a drive laser producing a drive laser beam; a drive laser beam first path having a first axis; a drive laser redirecting mechanism transferring the drive laser beam from the first path to a second path, the second path having a second axis; an EUV collector optical element having a centrally located aperture; and a focusing mirror in the second path and positioned within the aperture and focusing the drive laser beam onto a plasma initiation site located along the second axis. The apparatus and method may comprise the drive laser beam is produced by a drive laser having a wavelength such that focusing on an EUV target droplet of less than about 100 μm at an effective plasma producing energy is not practical in the constraints of the geometries involved utilizing a focusing lens. The drive laser may comprise a CO2 laser. The drive laser redirecting mechanism may comprise a mirror.

    摘要翻译： 公开了一种可以包括激光产生等离子体EUV系统的装置和方法，其可以包括产生驱动激光束的驱动激光器; 具有第一轴的驱动激光束第一路径; 驱动激光重定向机构，其将所述驱动激光束从所述第一路径传递到第二路径，所述第二路径具有第二轴线; 具有中心定位的孔的EUV收集器光学元件; 以及在第二路径中的聚焦反射镜并且定位在孔内并将驱动激光束聚焦到沿着第二轴线定位的等离子体起始位置。 该装置和方法可以包括驱动激光束由具有波长的驱动激光器产生，使得在有效的等离子体产生能量下聚焦在小于约100mum的EUV目标液滴在所涉及的几何形状的约束条件下是不切实际的 聚焦镜头。 驱动激光器可以包括CO2激光器。 驱动激光重定向机构可以包括镜子。

    Method and apparatus for EUV plasma source target delivery
    66.
    发明授权
    Method and apparatus for EUV plasma source target delivery 有权
    用于EUV等离子体源目标传递的方法和装置

    公开(公告)号：US07405416B2

    公开(公告)日：2008-07-29

    申请号：US11067124

    申请日：2005-02-25

    申请人： J. Martin Algots ,  Igor V. Fomenkov ,  Alexander I. Ershov ,  William N. Partlo ,  Richard L. Sandstrom ,  Oscar Hemberg ,  Alexander N. Bykanov ,  Dennis W. Cobb

    发明人： J. Martin Algots ,  Igor V. Fomenkov ,  Alexander I. Ershov ,  William N. Partlo ,  Richard L. Sandstrom ,  Oscar Hemberg ,  Alexander N. Bykanov ,  Dennis W. Cobb

    IPC分类号： H05G2/00

    CPC分类号： H05G2/003 ,  H05G2/005 ,  H05G2/006

    摘要： An EUV plasma formation target delivery system and method is disclosed which may comprise: a target droplet formation mechanism comprising a magneto-restrictive or electro-restrictive material, a liquid plasma source material passageway terminating in an output orifice; a charging mechanism applying charge to a droplet forming jet stream or to individual droplets exiting the passageway along a selected path; a droplet deflector intermediate the output orifice and a plasma initiation site periodically deflecting droplets from the selected path, a liquid target material delivery mechanism comprising a liquid target material delivery passage having an input opening and an output orifice; an electromotive disturbing force generating mechanism generating a disturbing force within the liquid target material, a liquid target delivery droplet formation mechanism having an output orifice; and/or a wetting barrier around the periphery of the output orifice.

    摘要翻译： 公开了一种EUV等离子体形成靶递送系统和方法，其可以包括：目标液滴形成机构，其包括磁阻或电子限制材料，终止于输出孔的液体等离子体源材料通道; 将电荷施加到液滴形成喷射流或沿着选定路径离开通道的各个液滴的充电机构; 在输出孔之间的液滴偏转器和等离子体引发位置周期性地偏转来自所选择的路径的液滴;液体靶材料输送机构，包括具有输入开口和输出孔的液体靶材料输送通道; 产生在液体目标材料内的干扰力的电动干扰力产生机构，具有输出孔的液体目标传送液滴形成机构; 和/或围绕输出孔周边的润湿屏障。

    EUV light source collector erosion mitigation
    67.
    发明授权
    EUV light source collector erosion mitigation 有权
    EUV光源收集器侵蚀减轻

    公开(公告)号：US07180083B2

    公开(公告)日：2007-02-20

    申请号：US11238828

    申请日：2005-09-28

    申请人： William N. Partlo ,  Alexander I. Ershov ,  Igor V. Fomenkov

    发明人： William N. Partlo ,  Alexander I. Ershov ,  Igor V. Fomenkov

    IPC分类号： A61N5/06 ,  G01J3/10 ,  H05G2/00

    CPC分类号： G03F7/70916 ,  B82Y10/00 ,  G01J1/429 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70983 ,  G21K1/062 ,  G21K2201/067 ,  H05G2/003

    摘要： An EUV light source collector erosion mitigation system and method is disclosed which may comprise a collector comprising a multilayered mirror collector comprising a collector outer surface composed of a capping material subject to removal due to a removing interaction with materials created in an EUV light-creating plasma; a replacement material generator positioned to deliver replacement material comprising the capping material to the collector outer surface at a rate sufficient to replace the capping material removed due to the removing interaction. The replacement material generator may comprise a plurality of replacement material generators positioned to respectively deliver replacement material to a selected portion of the collector outer surface, which may comprise a sputtering mechanism sputtering replacement capping material onto the collector outer surface.

    摘要翻译： 公开了一种EUV光源收集器侵蚀缓解系统和方法，其可以包括收集器，其包括多层反射镜收集器，该多层反射镜收集器包括由封装材料构成的收集器外表面，该封盖材料由于与EUV发光等离子体中产生的材料的去除相互作用而被去除 ; 替代材料发生器定位成将包含封盖材料的替换材料以足以代替由于去除相互作用而去除的封盖材料的速率传送到收集器外表面。 替代材料发生器可以包括多个替换材料发生器，其被定位成分别将替代材料递送到集电器外表面的选定部分，其可以包括溅射机构将溅射替换封盖材料涂覆到集电器外表面上。

    Laser output beam wavefront splitter for bandwidth spectrum control
    68.
    发明授权
    Laser output beam wavefront splitter for bandwidth spectrum control 有权
    激光输出光束波前分离器，用于带宽频谱控制

    公开(公告)号：US07154928B2

    公开(公告)日：2006-12-26

    申请号：US10875662

    申请日：2004-06-23

    申请人： Richard L. Sandstrom ,  Daniel J. W. Brown ,  Alexander I. Ershov ,  Igor V. Fomenkov ,  William N. Partlo

    发明人： Richard L. Sandstrom ,  Daniel J. W. Brown ,  Alexander I. Ershov ,  Igor V. Fomenkov ,  William N. Partlo

    IPC分类号： H01S3/22 ,  H01S3/223

    CPC分类号： H01S3/0812 ,  G03F7/70025 ,  G03F7/70575 ,  H01S3/08059 ,  H01S3/097 ,  H01S3/1055 ,  H01S3/1305

    摘要： Apparatus/method providing bandwidth control in narrow band short pulse duration gas discharge laser output light pulse beam producing systems, producing a beam comprising pulses at selected pulse repetition races, e.g., comprising a dispersive bandwidth selection optic selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the beam containing the respective pulse on the optic; a tuning mechanism operative to select at least one angle of incidence of the beam containing the respective pulse upon the optic; the tuning mechanism comprising a plurality of incidence angle selection elements each defining an angle of incidence for a different spatially separated but not temporally separated portion of the pulse to return from the optic a laser light pulse comprising a plurality of spatially separated but not temporally separated portions, each having one of at least two different selected center wavelengths.

    摘要翻译： 在窄带短脉冲持续时间气体放电激光输出光脉冲光束产生系统中提供带宽控制的装置/方法，产生包括选定的脉冲重复轨迹的脉冲的波束，例如包括色散带宽选择光学器件，用于为每个脉冲选择至少一个中心波长 至少部分地由在光学元件上包含相应脉冲的光束的入射角确定; 调谐机构，用于选择在光学元件上包含相应脉冲的光束的至少一个入射角; 所述调谐机构包括多个入射角选择元件，每个入射角选择元件限定所述脉冲的不同的空间分离但不是时间上分离的部分的入射角，以从所述光学器件返回包括多个空间分离但不时间分离的部分的激光脉冲 每个具有至少两个不同选择的中心波长中的一个。

    EUV light source collector erosion mitigation
    69.
    发明授权
    EUV light source collector erosion mitigation 有权
    EUV光源收集器侵蚀减轻

    公开(公告)号：US07141806B1

    公开(公告)日：2006-11-28

    申请号：US11237649

    申请日：2005-09-27

    申请人： William N. Partlo ,  Alexander I. Ershov ,  Igor V. Fomenkov ,  David W. Myers ,  William Oldham

    发明人： William N. Partlo ,  Alexander I. Ershov ,  Igor V. Fomenkov ,  David W. Myers ,  William Oldham

    IPC分类号： G01J1/00

    CPC分类号： G21K1/062 ,  B82Y10/00 ,  H05G2/003 ,  H05G2/005

    摘要： An EUV light source collector erosion mitigation method and apparatus for a collector comprising a multilayered mirror collector comprising a collector outer surface composed of a capping material subject to removal due to a removing interaction with materials created in an EUV light-creating plasma, is disclosed which may comprise including within an EUV plasma source material a replacement material. The replacement material may comprise the same material as the capping material of the multilayered mirror. The replacement material may comprise a material that is essentially transparent to light in a selected band of EUV light, e.g., a spectrum of EUV light generated in a plasma of a plasma source material. The replacement material may comprise a material not susceptible to being etched by an etching material used to remove deposited plasma source material from the collector, e.g., a halogen etchant.

    摘要翻译： 公开了一种用于收集器的EUV光源收集器侵蚀缓解方法和装置，其包括多层反射镜收集器，其包括由由与在EUV发光等离子体中产生的材料的去除相互作用而被去除的封盖材料组成的收集器外表面。 可以包括在EUV等离子体源材料内包括替换材料。 替代材料可以包括与多层反射镜的封盖材料相同的材料。 替代材料可以包括对EUV光的选定频带中的光基本上透明的材料，例如在等离子体源材料的等离子体中产生的EUV光的光谱。 替代材料可以包括不易被蚀刻材料蚀刻的材料，用于从集电体例如卤素蚀刻剂去除沉积的等离子体源材料。