摘要:
A semiconductor device (200) having a substrate routed power supply voltage is disclosed. The semiconductor device (200) includes a relatively highly doped substrate (302) and an epitaxial layer (304) formed over the substrate (302). In one embodiment (200), a surrounding conductive structure (202) is formed on the peripheral edges of the semiconductor device (200) die. The surrounding conductive structure (202) is coupled to the substrate (302). In another embodiment, the back side of the die (404) is coupled to the conductive portion (402) of an integrated circuit package. The conductive portion (402) is coupled to a power supply voltage. In another embodiment (700), the surrounding conductive structure (702) is coupled to a power supply voltage by one or more bond pads (710) formed on, or coupled to, the surrounding conductive structure (702).
摘要:
A circuit is designed with a decode circuit (313-315) having a first output terminal (319). The decode circuit is coupled to receive an address signal (81, 82, 85) having a first voltage range for producing a first output signal having one of a first and second logic levels. An output circuit (307, 309) is coupled to receive the first output signal and a power supply signal. The output circuit produces a second output signal having a second voltage range. A first latch transistor (301) is coupled to receive the second output signal. The first latch transistor is arranged to couple the first output terminal to a voltage terminal (209) in response to one of a first and second logic state of the second output signal. A second latch transistor (317) is coupled to receive the second output signal. The second latch transistor is arranged to couple the first output terminal to a reference terminal (318) in response to another of the first and second logic state of the second output signal.
摘要:
The quilting of rectangular comforter bags, mattress cover panels or other similar panels is provided without the need to premount the panel on a rectangular frame. A leading edge clamp is preattached along the leading edge of a panel and the clamp is fed from an operator station to the upstream end of a shuttle movably mounted on the frame of a programmed single needle quilting machine. Opposed belt conveyors on opposite sides of the shuttle advance the clamp and pull the panel onto the shuttle, with the belts gripping the side edges of the panel as it is pulled. A trailing edge clamp bar frictionally engages the panel to provide trailing edge securement to the panel, with the belts and leading edge clamp providing securement around the other edges to stretch the panel on the shuttle. The shuttle reciprocates longitudinally under a sewing head that moves transversely on the frame at a quilting station, while the sewing head operates to stitch a pattern in the panel. A pickup head then engages the clamp and directs it along a conveyor across an outfeed table at the top of the frame, pulling the quilted panel over the table where the clamp is released to drop the panel on the table, where it is folded and conveyed to a stacker. When a first quilted panel is free of the shuttle, another front edge clamp similarly pulls another panel onto the shuttle. When a clamp has released a panel at the outfeed table, it is returned by the conveyor to the operator station for reuse.
摘要:
Local reference voltage sub-circuits for ECL circuits are provided. The sub-circuits operate by a principal based on gating a current mirror. The sub-circuits described are superior to conventional approaches because less current is required during switching, better transfer characteristics are obtained and there exists, in some cases, less susceptibility to latch-up in comparison with conventional approaches.
摘要:
A differential emitter coupled logic circuit having an output and a compliment of the output, the circuit comprising: a first emitter coupled transistor pair (Q17 and Q18); a second emitter coupled transistor pair (Q19 and Q20); a third emitter coupled transistor pair (Q25 and Q26); a fourth emitter coupled transistor pair (Q33 and Q34); a filch emitter coupled transistor pair (Q37 and Q38); and a sixth emitter coupled transistor pair (Q35 and Q36).
摘要:
The described embodiments of the present invention provide a bipolar transistor using an integrated field effect load device with one end of the load device integrally formed with the base of the transistor. The gate of the load device is connected to the emitter of the transistor. This structure is particularly advantageous in bipolar-complementary metal oxide semiconductor (BiCMOS) integrated circuitry. The unconnected end of the load device may be connected to the emitter using standard metal interconnection techniques or local interconnection techniques. In an additional embodiment of the invention, the end of the load device not connected to the base may be left unisolated to the substrate and thus connected to ground. It often occurs that the emitter of the bipolar transistor will be connected to ground and thus an automatic connection of the load device between the base and the emitter can be realized. In addition, by removing the isolation, the integrated circuit area required for the isolation may be saved.
摘要:
The described embodiments of the present invention show a high voltage bipolar transistor integrated into a bipolar complementary metal oxide semiconductor integrated circuit. The high voltage transistor is fabricated using the available processing steps for fabricating other components in more standard BiCMOS processes. The collector of the transistor is formed using a buried N type region in a P substrate. A P well, rather than the conventional N well is formed above the buried N layer. The collector contact to the buried N layer is fabricated so as to surround the P well to provide a separate base region. A highly doped P type base region is formed with a P+ contact to this region. An N+ emitter is formed by out diffusion from a heavily doped polycrystalline silicon layer formed in contact with the base region. By providing the lightly doped P well as an interface between the collector and the base, the breakdown voltage of the collector/base junction is substantially raised and thus the breakdown voltage from the collector to the emitter is also raised. A transistor thus fabricated is appropriate for high voltage applications.
摘要:
CMOS source/drain regions of both conductivity types are formed using only a single masking step. One dopant is applied to both types of source/drain regions, and a second dopant is applied at a much higher dose and energy to only one type of source/drain region. Preferably, boron and arsenic are used as the dopants in silicon, since the cooperative diffusion effect causes the boron in the counterdoped source/drain regions to be entirely contained within the arsenic diffusion.To avoid the erratic etching characteristics of heavily-doped polysilicon under chloro-etch, the patterned photoresist used to pattern the gates and gate-level interconnects is left in place during the P+ source/drain implant. Thus, moderately doped N-type polysilicon may be used, since it is not exposed to compensation by the P+ implant. Since no P+ source/drain mask is required, no double-level photoresist structure is created, and there is consequently no obstacle to reworks. In addition, positive resists may be used in practicing the present invention.
摘要:
An elongate substantially rectangular abrading tool blade, which can be used either for smoothing or for heavy stock removal, is formed of sheet metal and has a multiplicity of ground and hardened cutting teeth distributed over a cutting face of the blade and a multiplicity of associated through-the-blade apertures. The cutting teeth and associated apertures extend in several parallel rows across the blade at an angle other than perpendicular to the longitudinal axis of the blade, with several cutting teeth and associated apertures in each row, all the said cutting teeth facing the same way, namely, perpendicular to the said rows. Each said aperture is directly in front of and adjacent its associated cutting tooth relative to the direction in which the teeth face. Two longitudinal side edge portions of the blade are bent back through an acute angle relative to the cutting face from a longitudinal, substantially flat, middle portion of the blade. The rows of cutting teeth and apertures extend across the full width of the middle portion of the blade and at least to the boundaries of said middle portion with the side edge portions, terminating short of both outside edges of the blade. One of said longitudinal side edge portions comprises edge teeth, which are not ground. The other one of said longitudinal side edge portions is smooth, devoid of edge teeth. The method of making the blade involves the bending back of said longitudinal side edge portions prior to hardening by heat of the blade. The bending back of said longitudinal side edge portions is effected by means of a pair of dies caused to close together and also at the same time to cut the blade from coil.