公开(公告)号：US20130136432A1

公开(公告)日：2013-05-30

申请号：US13750054

申请日：2013-01-25

Applicant: David Cheung

Inventor： David Cheung

IPC: A61L9/03

CPC classification number: A61L9/03 ,  A61L9/037 ,  A61L9/14

Abstract: A fragrance emitting apparatus includes a casing having an interior region, a USB connector attached to the casing and configured for connection to a USB port, and a heating element positioned in the interior region of the casing and electrically connected to the USB connector. The heating element generates heat when the USB connector is connected to a USB port. The fragrance emitting apparatus includes a fragrance cartridge slidably and removably attached to the casing. The fragrance cartridge has a fragrance member that provides a fragrance, scent or aroma when the fragrance member is heated. The fragrance member is positioned near the heating element when the fragrance cartridge is slidably attached to the casing.

Abstract translation: 香料发光装置包括具有内部区域的壳体，附接到壳体并被配置为连接到USB端口的USB连接器，以及定位在壳体的内部区域中并电连接到USB连接器的加热元件。 当USB连接器连接到USB端口时，加热元件会发热。 香味发射装置包括可滑动和可移除地附接到壳体的香味盒。 香味盒具有香味成分，当香料成分被加热时，香气成分提供香味，气味或香气。 当香料盒可滑动地附接到壳体时，香料构件定位在加热元件附近。

公开(公告)号：US20120254602A1

公开(公告)日：2012-10-04

申请号：US13410282

申请日：2012-03-01

Applicant: Apurva M. Bhansali ,  Mehul R. Patel ,  Kamal M. Dhanani ,  Rajnish S. Chauhan ,  David Cheung

Inventor： Apurva M. Bhansali ,  Mehul R. Patel ,  Kamal M. Dhanani ,  Rajnish S. Chauhan ,  David Cheung

IPC: G06F12/14 ,  G06F9/00

CPC classification number: G06F21/602 ,  G06F9/4406 ,  G06F21/31 ,  G06F21/575 ,  G06F2221/033

Abstract: Methods, systems, and apparatuses for a self-encrypting drive (SED) management system configured to be loaded in a pre-boot region of an SED-based computer, the SED of the SED-based computer having a nominal space, which may be encrypted when the SED-based computer is shut down, and the pre-boot region. The SED management system comprises a pre-boot operating system (OS); at least one pre-boot library configured to support the pre-boot OS; and an unlocking software program configured to work with the pre-boot OS to transfer control directly to an operating system of the nominal space upon a successful authentication. Other embodiments are described and claimed.

Abstract translation: 配置为加载到基于SED的计算机的预引导区域中的自加密驱动器（SED）管理系统的方法，系统和装置，基于SED的计算机的SED具有标称空间，其可以是 当基于SED的计算机关闭时加密，以及预引导区域。 SED管理系统包括一个预引导操作系统（OS）; 至少一个预引导库被配置为支持所述预引导OS; 以及解锁软件程序，被配置为与所述预引导OS一起工作，以便在成功认证时将控制直接传送到所述标称空间的操作系统。 描述和要求保护其他实施例。

公开(公告)号：US20120141707A1

公开(公告)日：2012-06-07

申请号：US13148261

申请日：2010-02-05

Applicant: David Cheung ,  William Knox ,  Jay Malmquist ,  Edwin Shors ,  Dennis Smiler

Inventor： David Cheung ,  William Knox ,  Jay Malmquist ,  Edwin Shors ,  Dennis Smiler

IPC: B32B1/08 ,  B32B7/02 ,  B29C35/16 ,  C07K14/78

CPC classification number: A61L27/24 ,  A61L27/36 ,  A61L27/3633 ,  A61L27/56 ,  A61L27/58 ,  A61L27/60 ,  A61L31/044 ,  A61L31/12 ,  A61L31/146 ,  A61L31/148 ,  B32B1/02 ,  B32B1/08 ,  B32B5/06 ,  B32B5/14 ,  B32B5/18 ,  C07K14/78 ,  Y10T428/1348 ,  Y10T428/1352 ,  Y10T428/1372 ,  Y10T428/1376 ,  Y10T428/139 ,  Y10T428/1397 ,  Y10T428/24942

Abstract: A biocompatible, resorbable biphasic collagen membrane having a first area of relatively higher tensile strength and stiffness and lower porosity and a second area of relatively lower tensile strength and stiffness and higher porosity, and a method of manufacturing the such a membrane.

Abstract translation: 具有相对较高拉伸强度和刚度以及较低孔隙率的第一区域和相对较低拉伸强度和刚度以及较高孔隙率的第二区域的生物相容性可再吸收的双相胶原膜以及制造这种膜的方法。

公开(公告)号：US20110139176A1

公开(公告)日：2011-06-16

申请号：US12636601

申请日：2009-12-11

Applicant: David Cheung ,  Ted Li ,  Anirban Guha ,  Kirk Ostrowski

Inventor： David Cheung ,  Ted Li ,  Anirban Guha ,  Kirk Ostrowski

IPC: B08B5/00 ,  B08B13/00 ,  C23F1/08

CPC classification number: H01L21/31058 ,  G03F7/427 ,  H01L21/67207

Abstract: Improved methods for stripping photoresist and removing etch-related residues from dielectric materials are provided. In one aspect of the invention, methods involve removing material from a dielectric layer using a hydrogen-based etch process employing a weak oxidizing agent and fluorine-containing compound. Substrate temperature is maintained at a level of about 160° C. or less, e.g., less than about 90° C.

Abstract translation: 提供了用于剥离光致抗蚀剂和从介电材料中去除蚀刻相关残留物的改进方法。 在本发明的一个方面，方法包括使用采用弱氧化剂和含氟化合物的氢基蚀刻方法从介电层去除材料。 底物温度保持在约160℃或更低，例如小于约90℃的水平。

公开(公告)号：US07936666B2

公开(公告)日：2011-05-03

申请号：US12106176

申请日：2008-04-18

Applicant: David Cheung ,  Xiaohong Pan

Inventor： David Cheung ,  Xiaohong Pan

IPC: G01R31/08

CPC classification number: H04Q3/66 ,  H04Q3/0087 ,  H04Q2213/1325 ,  H04Q2213/1338

Abstract: A virtual router spans a number of physical routing devices. A set of physical ports on one of the physical routing devices is logically represented as a trunk. A respective port priority value is associated with each of those ports, and a device priority value is associated with the physical routing device. If a port in the trunk is out-of-service, then the device priority value can be adjusted by the port priority value associated with the out-of-service port. A corrective action can be implemented if the device priority value fails to satisfy a condition. For example, the physical routing device may failover to another one of the physical routing devices spanned by the virtual router.

Abstract translation: 虚拟路由器跨越多个物理路由设备。 其中一个物理路由设备上的一组物理端口在逻辑上表示为中继。 相应的端口优先级值与这些端口中的每一个相关联，并且设备优先级值与物理路由设备相关联。 如果中继端口不工作，则可以通过与停止端口关联的端口优先级值来调整设备优先级。 如果设备优先级值不能满足条件，则可以执行纠正措施。 例如，物理路由设备可以故障切换到由虚拟路由器跨越的另一个物理路由设备。

公开(公告)号：US20100325280A1

公开(公告)日：2010-12-23

申请号：US12489366

申请日：2009-06-22

Applicant: Avinash Jindal ,  Deepak Bansal ,  Sam Htin Moy ,  David Cheung ,  Bing Wang ,  Mani Kancherla ,  Sridhar Devarapalli

Inventor： Avinash Jindal ,  Deepak Bansal ,  Sam Htin Moy ,  David Cheung ,  Bing Wang ,  Mani Kancherla ,  Sridhar Devarapalli

IPC: G06F15/173 ,  G06F9/46

CPC classification number: G06F9/5083

Abstract: A network device includes a plurality of blades, each having a plurality of CPU cores that process requests received by the network device. Each blade further includes an accumulator circuit. Each accumulator circuit periodically aggregates the local counter values of the CPU cores of the corresponding blade. One accumulator circuit is designated as a master, and the other accumulator circuit(s) are designated as slave(s). The slave accumulator circuits transmit their aggregated local counter values to the master accumulator circuit. The master accumulator circuit aggregates the sets of aggregated local counter values to create a set of global counter values. The master accumulator circuit transmits the global counter values to a management processor (for display), to the CPU cores located on its corresponding blade, and to each of the slave accumulator circuits. Each slave accumulator circuit then transmits the global counter values to the CPU cores located on its corresponding blade.

Abstract translation: 网络设备包括多个刀片，每个刀片具有处理由网络设备接收的请求的多个CPU内核。 每个叶片还包括一个蓄电池电路。 每个累加器电路周期性地聚集相应刀片的CPU内核的本地计数器值。 一个累加器电路被指定为主机，另一个累加器电路被指定为从机。 从累加器电路将其聚合的本地计数器值发送到主累加器电路。 主累加器电路聚合本地计数器值集合以创建一组全局计数器值。 主累加器电路将全局计数器值发送到管理处理器（用于显示），发送到位于其相应刀片上的CPU核心以及从属累加器电路中的每一个。 然后，每个从属累加器电路将全局计数器值发送到位于其相应刀片上的CPU核心。

公开(公告)号：US20090250334A1

公开(公告)日：2009-10-08

申请号：US12062052

申请日：2008-04-03

Applicant: Huatan Qiu ,  David Cheung ,  Prashanth Kothnur

Inventor： Huatan Qiu ,  David Cheung ,  Prashanth Kothnur

IPC: H01L21/306 ,  C23C16/452 ,  H05H1/46

CPC classification number: H05H1/46 ,  H01J37/321 ,  H01J37/3211 ,  H01J37/32119 ,  H01J37/32174 ,  H01J37/3244

Abstract: Systems and methods of forming plasma are provided. In an embodiment, a plasma generator system is provided including a container, a single coil disposed around the container, the single coil being a single member and having a first end, a second end, a first winding, and a second winding, wherein the first winding extends from the first end, and the second winding is integrally formed as part of the first winding and extends to the second end, an energy source electrically coupled directly to the first end of the single member, and a capacitor electrically coupled directly to the second end of the single member.

Abstract translation: 提供了形成等离子体的系统和方法。 在一个实施例中，提供了一种等离子体发生器系统，其包括容器，围绕容器设置的单个线圈，该单个线圈是单个构件并且具有第一端，第二端，第一绕组和第二绕组，其中， 第一绕组从第一端延伸，并且第二绕组一体地形成为第一绕组的一部分并且延伸到第二端，直接电耦合到单个构件的第一端的能量源，以及直接耦合到 单一成员的第二端。

公开(公告)号：US07560377B2

公开(公告)日：2009-07-14

申请号：US11087393

申请日：2005-03-22

Applicant: David Cheung ,  Wai-Fan Yau ,  Robert P. Mandal ,  Shin-Puu Jeng ,  Kuo-Wei Liu ,  Yung-Cheng Lu ,  Michael Barnes ,  Ralf B. Willecke ,  Farhad Moghadam ,  Tetsuya Ishikawa ,  Tze Wing Poon

Inventor： David Cheung ,  Wai-Fan Yau ,  Robert P. Mandal ,  Shin-Puu Jeng ,  Kuo-Wei Liu ,  Yung-Cheng Lu ,  Michael Barnes ,  Ralf B. Willecke ,  Farhad Moghadam ,  Tetsuya Ishikawa ,  Tze Wing Poon

IPC: H01L21/4763 ,  H01L21/461

CPC classification number: H01L21/76835 ,  C23C16/401 ,  H01L21/02126 ,  H01L21/02203 ,  H01L21/02208 ,  H01L21/02274 ,  H01L21/0228 ,  H01L21/02304 ,  H01L21/02362 ,  H01L21/31612 ,  H01L21/76801 ,  H01L21/76808 ,  H01L21/7681 ,  H01L21/76829 ,  H01L21/76832 ,  H01L21/76834 ,  H01L2221/1031 ,  Y10T428/24926 ,  Y10T428/31663

Abstract: A method and apparatus for depositing a low dielectric constant film by reaction of an organosilicon compound and an oxidizing gas comprising carbon at a constant RF power level. Dissociation of the oxidizing gas can be increased prior to mixing with the organosilicon compound, preferably within a separate microwave chamber, to assist in controlling the carbon content of the deposited film. The oxidized organosilane or organosiloxane film has good barrier properties for use as a liner or cap layer adjacent other dielectric layers. The oxidized organosilane or organosiloxane film may also be used as an etch stop and an intermetal dielectric layer for fabricating dual damascene structures. The oxidized organosilane or organosiloxane films also provide excellent adhesion between different dielectric layers.

Abstract translation: 一种通过有机硅化合物和包含碳的氧化气体以恒定的RF功率水平的反应沉积低介电常数膜的方法和装置。 在与有机硅化合物混合之前，优选在单独的微波室内可以提高氧化气体的离解，以帮助控制沉积膜的碳含量。 氧化的有机硅烷或有机硅氧烷膜具有良好的屏障性能，用作邻近其它介电层的衬垫层或盖层。 氧化的有机硅烷或有机硅氧烷膜也可以用作蚀刻停止层和用于制造双镶嵌结构的金属间介电层。 氧化的有机硅烷或有机硅氧烷膜也在不同的介电层之间提供优异的粘附性。

公开(公告)号：US20090053901A1

公开(公告)日：2009-02-26

申请号：US12251305

申请日：2008-10-14

Applicant: Haruhiro Harry Goto ,  David Cheung

Inventor： Haruhiro Harry Goto ,  David Cheung

IPC: H01L21/3065 ,  C23F1/00

CPC classification number: H01L21/02041 ,  C01B3/00 ,  C01B7/20 ,  H01J37/32357 ,  H01J2237/3342 ,  H01L21/31138 ,  H01L21/67017

Abstract: Plasma is generated using elemental hydrogen, a weak oxidizing agent, and a fluorine containing gas. An inert gas is introduced to the plasma downstream of the plasma source and upstream of a showerhead that directs gas mixture into the reaction chamber where the mixture reacts with the high-dose implant resist. The process removes both the crust and bulk resist layers at a high strip rate, and leaves the work piece surface substantially residue free with low silicon loss.

Abstract translation: 使用元素氢，弱氧化剂和含氟气体产生等离子体。 将惰性气体引入到等离子体源的下游等离子体源和喷淋头的上游，该喷头将气体混合物引导到反应室中，其中混合物与高剂量植入物抗蚀剂反应。 该方法以高剥离速率移除外壳和体抗蚀剂层，并且以低的硅损耗使工件表面基本上无残留物。

公开(公告)号：US20080156631A1

公开(公告)日：2008-07-03

申请号：US11616326

申请日：2006-12-27

Applicant: James A. Fair ,  Vincent Decaux ,  Anirban Guha ,  David Cheung ,  John Keller ,  Peter Jagusch

Inventor： James A. Fair ,  Vincent Decaux ,  Anirban Guha ,  David Cheung ,  John Keller ,  Peter Jagusch

IPC: H05H1/00

CPC classification number: H05H1/46 ,  H01J37/32357 ,  H01J37/32458

Abstract: Methods of using a plasma generator to ash a work piece is provided. In an exemplary embodiment, the method includes flowing gas that has a gaseous component able to form plasma under conditions of radio-frequency energy excitation into the container. A proportion of the gas is directed to a first region of the container to form a higher gas density in the first region of the container and a corresponding lower gas density in a second region of the container. Sufficient energy is applied to the gas in at least the first region to excite a proportion of the gaseous component able to form plasma.

Abstract translation: 提供了使用等离子体发生器来灰化工件的方法。 在示例性实施例中，该方法包括使气体具有能够在射频能量激发的条件下形成等离子体的气体成分进入容器。 气体的一部分被引导到容器的第一区域，以在容器的第一区域中形成更高的气体密度，并且在容器的第二区域中形成相应较低的气体密度。 在至少第一区域中对气体施加足够的能量以激发能够形成等离子体的一部分气态组分。