公开(公告)号：US20080100819A1

公开(公告)日：2008-05-01

申请号：US11589300

申请日：2006-10-30

申请人： Johannes Onvlee ,  Erik Roelof Loopstra

发明人： Johannes Onvlee ,  Erik Roelof Loopstra

IPC分类号： G03B27/62

CPC分类号： G03F7/70775 ,  G03F1/42 ,  G03F1/44 ,  G03F7/707 ,  G03F9/7011

摘要： In a lithographic apparatus, a slip of a patterning device relative to a support, the support being constructed to support the patterning device, may be provided by: measuring a position of the support relative to a structure of the lithographic apparatus; measuring a position of the patterning device relative to the structure of the lithographic apparatus; determining a correlation between the position of the patterning device and the position of the support; and deriving from the correlation a slip of the patterning device relative to the support. The structure may include a projection system to project a radiation beam patterned by the patterning device onto a target portion of the substrate. The projection system may be connected to a frame, such as a metrology frame of the lithographic apparatus.

摘要翻译： 在光刻设备中，图案形成装置相对于支撑件的滑动可以通过以下方式来提供：测量支撑件相对于光刻设备的结构的位置; 测量所述图案形成装置相对于所述光刻设备的结构的位置; 确定图案形成装置的位置与支撑件的位置之间的相关性; 并且从相关性导出图案形成装置相对于支撑件的滑移。 该结构可以包括投影系统，以将由图案形成装置图案化的辐射束投影到基板的目标部分上。 投影系统可以连接到诸如光刻设备的计量框架的框架。

公开(公告)号：US07292312B2

公开(公告)日：2007-11-06

申请号：US11179665

申请日：2005-07-13

申请人： Erik Roelof Loopstra ,  Leon Martin Levasier ,  Rene Oesterholt

发明人： Erik Roelof Loopstra ,  Leon Martin Levasier ,  Rene Oesterholt

IPC分类号： G03B27/42 ,  G03B27/58 ,  G03B27/62

CPC分类号： G03F7/70775 ,  G03F7/70458 ,  G03F7/70516 ,  G03F9/7011 ,  G03F9/7019

摘要： Lithographic apparatus includes a substrate table and a motion control system for controlling a movement of the substrate table. The motion control system includes at least 3 position detectors constructed for detecting a position of the substrate table. For measuring a position and orientation of the substrate table, each position detector comprises an optical encoder of a single dimensional or multi dimensional type, the optical encoders being arranged for providing together at least 6 position values, at least one position value being provided for each of the 3 dimensions. Some of the optical encoders may be connected to the substrate table at different locations in the 3 dimensional coordinate system. The motion control system is arranged to calculate the position of the substrate table in the 3 dimensional coordinate system from a subset of at least 3 of the 6 position values and to calculate an orientation of the substrate table with respect to the coordinate system from another subset of at least 3 of the 6 position values. Further, a method for calibrating the position detectors is presented.

摘要翻译： 光刻设备包括用于控制衬底台的移动的衬底台和运动控制系统。 运动控制系统包括构造用于检测衬底台的位置的至少3个位置检测器。 为了测量衬底台的位置和取向，每个位置检测器包括一维或多维类型的光学编码器，光学编码器被布置为一起提供至少6个位置值，为每个位置值提供至少一个位置值 的三维。 一些光学编码器可以在三维坐标系中的不同位置处连接到基板台。 运动控制系统被布置为从6个位置值中的至少3个的子集计算三维坐标系中的衬底台的位置，并且从另一个子集计算相对于坐标系的衬底台的取向 至少6个位置值中的3个。 此外，提出了一种用于校准位置检测器的方法。

公开(公告)号：US07256871B2

公开(公告)日：2007-08-14

申请号：US10899295

申请日：2004-07-27

申请人： Erik Roelof Loopstra ,  Leon Martin Levasier ,  Rene Oesterholt

发明人： Erik Roelof Loopstra ,  Leon Martin Levasier ,  Rene Oesterholt

IPC分类号： G03B27/58 ,  G03B27/42 ,  G03B27/52 ,  G03B27/32

CPC分类号： G03F7/70775 ,  G03F7/70458 ,  G03F7/70516 ,  G03F9/7011 ,  G03F9/7019

摘要： Lithographic apparatus includes a substrate table and a motion control system for controlling a movement of the substrate table. The motion control system includes at least 3 position detectors constructed for detecting a position of the substrate table. For measuring a position and orientation of the substrate table, each position detector comprises an optical encoder of a single dimensional or multi dimensional type, the optical encoders being arranged for providing together at least 6 position values, at least one position value being provided for each of the 3 dimensions. 3 or more of the at least 3 optical encoders being connected to the substrate table at different locations in the 3 dimensional coordinate system. The motion control system is arranged to calculate the position of the substrate table in the 3 dimensional coordinate system from a subset of at least 3 of the 6 position values and to calculate an orientation of the substrate table with respect to the coordinate system from another subset of at least 3 of the 6 position values. Further, a method for calibrating the position detectors is described.

公开(公告)号：US07193681B2

公开(公告)日：2007-03-20

申请号：US10946344

申请日：2004-09-22

申请人： Christiaan Alexander Hoogendam ,  Erik Theodorus Maria Bijlaart ,  Erik Roelof Loopstra ,  Johannes Catharinus Hubertus Mulkens ,  Bob Streefkerk

发明人： Christiaan Alexander Hoogendam ,  Erik Theodorus Maria Bijlaart ,  Erik Roelof Loopstra ,  Johannes Catharinus Hubertus Mulkens ,  Bob Streefkerk

IPC分类号： G03B27/52 ,  G03B27/42 ,  G03B27/58 ,  G03B27/32

CPC分类号： G03F7/70341

摘要： A lithographic projection apparatus is disclosed in which a liquid confinement system, which at least partly confines liquid to a space between the projection system and the substrate, is restricted in its movement in the direction of the optical axis of the apparatus by a stopper.

摘要翻译： 公开了一种光刻投影装置，其中至少部分地将液体限制在投影系统和基板之间的空间的液体限制系统通过止动器限制其在装置的光轴方向上的运动。

公开(公告)号：US07170586B2

公开(公告)日：2007-01-30

申请号：US11335681

申请日：2006-01-20

申请人： Vadim Yevgenyevich Banine ,  Levinus Pieter Bakker ,  Jeroen Jonkers ,  Erik Roelof Loopstra

发明人： Vadim Yevgenyevich Banine ,  Levinus Pieter Bakker ,  Jeroen Jonkers ,  Erik Roelof Loopstra

IPC分类号： G03B24/54

CPC分类号： G03F7/70008 ,  G03F7/7005

摘要： A lithographic apparatus includes an illumination system configured to provide a beam of radiation, a support configured to support a patterning device, a substrate table and a projection system. Furthermore, the lithographic apparatus includes a plurality of EUV sources for providing EUV radiation to the illumination system and a distributor which is arranged to convert the EUV radiation from each of the EUV sources into an intermediate beam of radiation. The intermediate beam of radiation is directed from the distributor in a first direction by a mirror surface. The distributor may include a rotationally driven mirror arrangement, the axis of rotation being non-parallel to the mirror surface.

摘要翻译： 光刻设备包括被配置为提供辐射束的照明系统，被配置为支撑图案形成装置的支撑件，衬底台和投影系统。 此外，光刻设备包括用于向照明系统提供EUV辐射的多个EUV源和布置成将来自每个EUV源的EUV辐射转换成中间辐射束的分配器。 辐射的中间束通过镜面从第一方向从分配器引导。 分配器可以包括旋转驱动的反射镜布置，旋转轴线不平行于镜面。

公开(公告)号：US06781673B2

公开(公告)日：2004-08-24

申请号：US09934698

申请日：2001-08-23

申请人： Johannes Hubertus Josephina Moors ,  Vadim Yevgenyevich Banine ,  Martinus Hendrikus Antonius Leenders ,  Henri Gerard Cato Werij ,  Hugo Matthieu Visser ,  Gerrit-Jan Heerens ,  Erik Leonardus Ham ,  Hans Meiling ,  Erik Roelof Loopstra ,  Sjoerd Nicolaas Lambertus Donders

发明人： Johannes Hubertus Josephina Moors ,  Vadim Yevgenyevich Banine ,  Martinus Hendrikus Antonius Leenders ,  Henri Gerard Cato Werij ,  Hugo Matthieu Visser ,  Gerrit-Jan Heerens ,  Erik Leonardus Ham ,  Hans Meiling ,  Erik Roelof Loopstra ,  Sjoerd Nicolaas Lambertus Donders

IPC分类号： G03B2762

CPC分类号： G03F7/70558 ,  G03F7/70741 ,  G03F7/7085 ,  G03F7/70908 ,  G03F7/70916 ,  G03F7/70983

摘要： In a lithographic projection apparatus, an object such as a mask is shielded from stray particles by a particle shield using electromagnetic fields. The fields may be a uniform electric field, a non-uniform electric field or an optical breeze. The particle shield is fixed to the mask holder rather than the mask.

摘要翻译： 在光刻投影装置中，通过使用电磁场的粒子屏蔽物将诸如掩模的物体与杂散颗粒屏蔽。 这些场可以是均匀的电场，不均匀的电场或光学微风。 颗粒屏蔽固定在面罩支架而不是面罩上。

公开(公告)号：US06597431B2

公开(公告)日：2003-07-22

申请号：US09899560

申请日：2001-07-06

申请人： Jozef Petrus Henricus Benschop ,  Oscar Fransiscus Jozephus Noordman ,  Michael Jozefa Mathijs Renkens ,  Erik Roelof Loopstra ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Antonius Johannes Josephus van Dijsseldonk

发明人： Jozef Petrus Henricus Benschop ,  Oscar Fransiscus Jozephus Noordman ,  Michael Jozefa Mathijs Renkens ,  Erik Roelof Loopstra ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Antonius Johannes Josephus van Dijsseldonk

IPC分类号： G03B2772

CPC分类号： G03F7/70483 ,  G03F7/70058 ,  G03F7/70216 ,  G03F7/708

摘要： A lithographic projection apparatus includes a radiation system for supplying a projection beam of radiation having a propagation direction, a support structure for supporting patterning structure, the patterning structure serving to pattern the projection beam according to a desired pattern, a substrate table for holding a substrate and a projection system for projecting the patterned beam onto a target portion of the substrate, wherein the lithographic projection apparatus further includes a sensor for measuring a movement of the projection beam perpendicular to its propagation direction and a controller to control a received dose of the projection beam on a target portion of the substrate in response to an output from the sensor.

摘要翻译： 光刻投影装置包括用于提供具有传播方向的投影射束的辐射系统，用于支撑图案形成结构的支撑结构，用于根据期望图案对投影光束进行图案化的图案形成结构，用于保持基板的基板台 以及用于将图案化的光束投影到基板的目标部分上的投影系统，其中所述光刻投影装置还包括用于测量垂直于其传播方向的投影光束的移动的传感器，以及用于控制投影的接收剂量的控制器 响应于来自传感器的输出，在基板的目标部分上射束。

公开(公告)号：US09395630B2

公开(公告)日：2016-07-19

申请号：US13704222

申请日：2011-03-17

申请人： Andrei Mikhailovich Yakunin ,  Vadim Yevgenyevich Banine ,  Erik Roelof Loopstra ,  Harmen Klaas Van Der Schoot ,  Lucas Henricus Johannes Stevens ,  Maarten Van Kampen

发明人： Andrei Mikhailovich Yakunin ,  Vadim Yevgenyevich Banine ,  Erik Roelof Loopstra ,  Harmen Klaas Van Der Schoot ,  Lucas Henricus Johannes Stevens ,  Maarten Van Kampen

IPC分类号： G03F7/20 ,  B82Y10/00 ,  B82Y40/00 ,  C01B31/04 ,  G02B5/08 ,  G02B5/20 ,  G02B27/00 ,  G03F1/24 ,  G03F1/62 ,  G21K1/06 ,  H01B1/04 ,  H01B1/24 ,  G03B27/54

CPC分类号： G03F1/64 ,  B82Y10/00 ,  B82Y40/00 ,  C01B32/20 ,  G02B5/0816 ,  G02B5/0891 ,  G02B5/204 ,  G02B5/208 ,  G02B27/0006 ,  G03B27/54 ,  G03F1/24 ,  G03F1/62 ,  G03F7/70058 ,  G03F7/702 ,  G03F7/70916 ,  G03F7/70958 ,  G03F7/70983 ,  G21K1/062 ,  G21K2201/061 ,  H01B1/04 ,  H01B1/24

摘要： A lithographic apparatus includes a radiation source configured to produce a radiation beam, and a support configured to support a patterning device. The patterning device is configured to impart the radiation beam with a pattern to form a patterned radiation beam. A chamber is located between the radiation source and patterning device. The chamber contains at least one optical component configured to reflect the radiation beam, and is configured to permit radiation from the radiation source to pass therethrough. A membrane is configured to permit the passage of the radiation beam, and to prevent the passage of contamination particles through the membrane. A particle trapping structure is configured to permit gas to flow along an indirect path from inside the chamber to outside the chamber. The indirect path is configured to substantially prevent the passage of contamination particles from inside the chamber to outside the chamber.

摘要翻译： 光刻设备包括被配置为产生辐射束的辐射源和被配置为支撑图案形成装置的支撑件。 图案形成装置被配置为使辐射束具有图案以形成图案化的辐射束。 腔室位于辐射源和图案形成装置之间。 所述腔室包括被配置为反射辐射束的至少一个光学部件，并且被配置为允许来自辐射源的辐射通过。 膜被配置为允许辐射束的通过，并且防止污染颗粒通过膜的通过。 颗粒捕获结构被配置为允许气体沿着室内的间接路径流动到室外。 间接路径被配置为基本上防止污染颗粒从腔室内部通到室外。

公开(公告)号：US09195153B2

公开(公告)日：2015-11-24

申请号：US13692865

申请日：2012-12-03

申请人： Joeri Lof ,  Joannes Theodoor De Smit ,  Roelof Aeilko Siebrand Ritsema ,  Klaus Simon ,  Theodorus Marinus Modderman ,  Johannes Catharinus Hubertus Mulkens ,  Hendricus Johannes Maria Meijer ,  Erik Roelof Loopstra

发明人： Joeri Lof ,  Joannes Theodoor De Smit ,  Roelof Aeilko Siebrand Ritsema ,  Klaus Simon ,  Theodorus Marinus Modderman ,  Johannes Catharinus Hubertus Mulkens ,  Hendricus Johannes Maria Meijer ,  Erik Roelof Loopstra

IPC分类号： G03B27/52 ,  G03F9/00 ,  G03F7/20

CPC分类号： G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F9/7003 ,  G03F9/7034 ,  G03F9/7088

摘要： A map of the surface of a substrate is generated at a measurement station. The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid. The substrate is then aligned using, for example, a transmission image sensor and, using the previous mapping, the substrate can be accurately exposed. Thus the mapping does not take place in a liquid environment.

公开(公告)号：US09134629B2

公开(公告)日：2015-09-15

申请号：US13203773

申请日：2010-02-25

申请人： Erik Roelof Loopstra ,  Koen Van Ingen Schenau ,  Jan Bernard Plechelmus Van Schoot ,  Christian Wagner ,  Gosse Charles De Vries

发明人： Erik Roelof Loopstra ,  Koen Van Ingen Schenau ,  Jan Bernard Plechelmus Van Schoot ,  Christian Wagner ,  Gosse Charles De Vries

IPC分类号： G03F7/20

CPC分类号： G03F7/70825 ,  G03F7/70075 ,  G03F7/70116

摘要： An illumination system of a lithographic apparatus includes a plurality of reflective elements arranged to receive radiation from a radiation source, the reflective elements being movable between different orientations. In the different orientations, the reflective elements direct radiation towards different locations at a reflective component in a pupil plane of the illumination system, thereby forming different illumination modes. Each reflective element is moveable between a first orientation, which directs radiation towards a first location the pupil plane, and a second orientation, which directs radiation towards a second location in the pupil plane. The first orientation and the second orientation of the reflective element are defined by end stops.

摘要翻译： 光刻设备的照明系统包括被布置成接收来自辐射源的辐射的多个反射元件，所述反射元件可在不同取向之间移动。 在不同的取向中，反射元件将辐射定向到照明系统的光瞳平面中的反射分量处的不同位置，从而形成不同的照明模式。 每个反射元件可以在将辐射引导到瞳孔平面的第一位置的第一取向和朝向瞳孔平面中的第二位置引导辐射的第二取向之间移动。 反射元件的第一方向和第二方向由端点限定。