利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

136 条记录 (耗时 0.03 秒)

    Waveguide type optical device
    62.
    发明申请
    Waveguide type optical device 失效
    波导型光学器件

    公开(公告)号：US20060274991A1

    公开(公告)日：2006-12-07

    申请号：US10565404

    申请日：2005-06-08

    申请人： Kenji Kawano ,  Masaya Nanami ,  Makoto Saito ,  Toru Nakahira ,  Yuji Sato ,  Seiji Uchida

    发明人： Kenji Kawano ,  Masaya Nanami ,  Makoto Saito ,  Toru Nakahira ,  Yuji Sato ,  Seiji Uchida

    IPC分类号： G02B6/12

    CPC分类号： G02B6/4202 ,  G02B6/12004 ,  G02B6/262 ,  G02B6/30 ,  G02F1/2255

    摘要： A waveguide type optical device has an optical waveguide formed on a substrate, functional optical waveguides provided to the optical waveguide, at least one of an optical input end face and an optical output end face for the optical waveguide which are provided to substrate end faces which are ends at longitudinal direction sides of the substrate, and at least one of an input optical waveguide connecting the optical input end face and the functional optical waveguides, and an output optical waveguide connecting the optical output end face and the functional optical waveguides. At least one of the input optical waveguide and the output optical waveguide is formed so as to form angles other than 0 with the functional optical waveguides at the at least one of the optical input end face and the optical output end face, and so as to make angles formed to the substrate end faces at the respective sides different from 90°.

    摘要翻译： 波导型光学器件具有形成在基板上的光波导，提供给光波导的功能光波导，设置在基板端面的光波导的光输入端面和光输出端面中的至少一个， 在基板的纵向方向上端部，并且连接光输入端面和功能光波导的输入光波导中的至少一个以及连接光输出端面和功能光波导的输出光波导。 输入光波导和输出光波导中的至少一个形成为在光输入端面和光输出端面中的至少一个上形成功能光波导以外的θ以外的角度，并且 使得在与90°不同的相应侧面上的基板端面形成角度。

    Method for manufacturing a semiconductor device and apparatus for manufacturing a semiconductor device
    63.
    发明授权
    Method for manufacturing a semiconductor device and apparatus for manufacturing a semiconductor device 失效
    半导体装置的制造方法以及半导体装置的制造装置

    公开(公告)号：US07018932B2

    公开(公告)日：2006-03-28

    申请号：US10377597

    申请日：2003-03-04

    申请人： Shinichi Ito ,  Tatsuhiko Higashiki ,  Katsuya Okumura ,  Kenji Kawano ,  Soichi Inoue

    发明人： Shinichi Ito ,  Tatsuhiko Higashiki ,  Katsuya Okumura ,  Kenji Kawano ,  Soichi Inoue

    IPC分类号： H01L21/027 ,  G03F9/00

    CPC分类号： G03F7/70625 ,  G03F7/70633 ,  G03F7/70641 ,  G03F7/70675 ,  H01J2237/30438

    摘要： A method for manufacturing a semiconductor device including, forming a photosensitive-film on a substrate, carrying the substrate on which the photosensitive-film is formed, to an exposure device provided with a mask in which an on-mask-inspection-mark and an on-mask-device-pattern are formed, selectively exposing the photosensitive-film to light to transfer the on-mask-inspection-mark to the photosensitive-film to form a latent-image of the inspection-mark on the photosensitive-film, heating at least that area of the photosensitive-film in which the latent-image of the inspection-mark is formed, measuring the inspection-mark, changing set-values for the exposure device used for the selective exposure, on the basis of result of the measurement so that exposure conditions conform to the set-values, exposing the photosensitive-film on the basis of the changed set-values to transfer the on-mask-device-pattern to the photosensitive-film to form a latent image of the device-pattern on the photosensitive-film, heating an entire surface of the photosensitive-film, and developing the photosensitive-film.

    摘要翻译： 一种半导体器件的制造方法，其特征在于，在将基板上形成有感光膜的基板上形成感光膜的制造方法，设置在具有掩模检查标记和掩模检查标记的掩模的曝光装置 形成掩模装置图案，选择性地将感光膜曝光以将掩模检查标记转印到感光膜上，以在感光膜上形成检查标记的潜像， 至少加热其中形成有检查标记的潜像的感光膜的面积，测量检查标记，改变用于选择性曝光的曝光装置的设定值，基于 所述测量使得曝光条件符合设定值，基于改变的设定值曝光感光膜以将掩模设备图案转印到感光膜上以形成该设备的潜像 p图案在p 感光膜，加热感光膜的整个表面，并显影感光膜。

    Method of processing a substrate, heating apparatus, and method of forming a pattern
    64.
    发明授权
    Method of processing a substrate, heating apparatus, and method of forming a pattern 失效
    处理基板的方法，加热装置以及形成图案的方法

    公开(公告)号：US07009148B2

    公开(公告)日：2006-03-07

    申请号：US10682419

    申请日：2003-10-10

    申请人： Kenji Kawano ,  Shinichi Ito ,  Eishi Shiobara

    发明人： Kenji Kawano ,  Shinichi Ito ,  Eishi Shiobara

    IPC分类号： F27B5/14

    CPC分类号： H01L21/67115 ,  G03F7/0042 ,  G03F7/0392 ,  G03F7/38 ,  H01L21/0273 ,  H01L21/67109

    摘要： A method of processing a substrate, comprising forming a chemically amplified resist film on a substrate, irradiating energy beams to the chemically amplified resist film to form a latent image therein, carrying out heat treatment with respect to the chemically amplified resist film, heating treatment being carried out in a manner of relatively moving a heating section for heating the chemically amplified resist film and the substrate forming a gas stream flowing reverse to the relatively moving direction of the heating section between the lower surface of the heating section and the chemically amplified resist film.

    摘要翻译： 一种处理衬底的方法，包括在衬底上形成化学放大的抗蚀剂膜，将能量束照射到化学放大的抗蚀剂膜上以在其中形成潜像，对化学放大的抗蚀剂膜进行热处理，加热处理为 以相对移动加热部分的方式进行加热，该加热部分用于加热化学放大的抗蚀剂膜和形成在加热部分的下表面和化学放大型抗蚀剂膜之间形成与加热部分的相对移动方向相反的方向流动的气流 。

    Substrate treatment method, substrate treatment apparatus, and method of manufacturing semiconductor device
    65.
    发明申请
    Substrate treatment method, substrate treatment apparatus, and method of manufacturing semiconductor device 审中-公开
    基板处理方法，基板处理装置以及半导体装置的制造方法

    公开(公告)号：US20050250056A1

    公开(公告)日：2005-11-10

    申请号：US11114043

    申请日：2005-04-26

    申请人： Kenji Kawano ,  Shinichi Ito

    发明人： Kenji Kawano ,  Shinichi Ito

    IPC分类号： G03F7/38 ,  H01L21/027 ,  H01L21/312

    CPC分类号： G03F7/38 ,  H01L21/312

    摘要： According to an aspect of the present invention, there is provided a substrate treatment method comprising forming a chemically amplified resist film on a substrate to be treated, and supplying heat to the chemically amplified resist film to perform a heat treatment, wherein the heat treatment includes creating a first temperature state satisfying TT TB in which TT is a temperature at a surface portion of the chemically amplified resist film, and TB is a temperature at an interface portion of the chemically amplified resist film with the substrate to be treated.

    摘要翻译： 根据本发明的一个方面，提供了一种基板处理方法，包括在待处理的基板上形成化学放大的抗蚀剂膜，并向化学放大的抗蚀剂膜供热以进行热处理，其中热处理包括 产生一个满足T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T T B SUB>其中T T T是化学放大抗蚀剂膜的表面部分处的温度，T B B是化学放大抗蚀剂膜的界面部分处的温度 与待处理的基底。

    Optical modulation device having excellent electric characteristics by effectively restricting heat drift
    67.
    发明授权
    Optical modulation device having excellent electric characteristics by effectively restricting heat drift 失效
    通过有效地限制热漂移具有优异的电特性的光调制装置

    公开(公告)号：US06891982B2

    公开(公告)日：2005-05-10

    申请号：US10333546

    申请日：2002-05-23

    申请人： Kenji Kawano ,  Toru Nakahira ,  Seiji Uchida ,  Masaya Nanami ,  Yuji Sato

    发明人： Kenji Kawano ,  Toru Nakahira ,  Seiji Uchida ,  Masaya Nanami ,  Yuji Sato

    IPC分类号： G02F1/225 ,  G02F1/01 ,  G02F1/035 ,  G02F1/295 ,  G02F1/355

    CPC分类号： G02F1/2255 ,  G02F1/225 ,  G02F2201/126 ,  G02F2203/21

    摘要： An optical waveguide for guided an incident light is formed on a substrate having an electro-optic effect. A first buffer layer is formed to cover an upper surface of the substrate. A conductive film is formed above the first buffer layer. A center electrode and a ground electrode are formed for applying a voltage in order to induce an electric field in the optical waveguide. A second buffer layer is formed between the conductive film and at least one of the center electrode and the ground electrode. The conductive film is formed to be present on at least a part below the ground electrode. A light guided through the optical waveguide is modulated by changing a phase by a voltage applied to the optical waveguide. Thereby, a thermal drift can be effectively restricted so that an optical modulation device having excellent electric characteristics can be realized.

    摘要翻译： 在具有电光效应的基板上形成用于引导入射光的光波导。 形成第一缓冲层以覆盖基板的上表面。 导电膜形成在第一缓冲层上方。 形成中心电极和接地电极以施加电压以便在光波导中引起电场。 在导电膜和至少一个中心电极和接地电极之间形成第二缓冲层。 导电膜形成为存在于接地电极下方的至少一部分上。 通过光波导引导的光被施加到光波导的电压改变相位来调制。 因此，可以有效地限制热漂移，从而可以实现具有优异电特性的光调制装置。

    Optical element, holding structure for optical element, and image pickup apparatus
    70.
    发明授权
    Optical element, holding structure for optical element, and image pickup apparatus 有权
    光学元件，用于光学元件的保持结构和图像拾取装置

    公开(公告)号：US06362921B1

    公开(公告)日：2002-03-26

    申请号：US09414139

    申请日：1999-10-07

    申请人： Seiji Iida ,  Tsukasa Uehara ,  Kenji Kawano

    发明人： Seiji Iida ,  Tsukasa Uehara ,  Kenji Kawano

    IPC分类号： G02B2710

    CPC分类号： G02B17/086 ,  G02B7/02 ,  G02B17/0848 ,  H04N5/2251 ,  H04N5/2253 ,  H04N5/2254

    摘要： In an optical element composed of an entrance refractive surface, an exit refractive surface and a plurality of internal reflective surfaces provided between the entrance refractive surface and the exit refractive surface, a structure is provided for enabling the optical element to turn around a reference axis of the entrance refractive surface. Further, in such an optical element, an diaphragm member is disposed adjacent to the entrance refractive surface and is arranged to vary an aperture diameter thereof according to a movement thereof.

    摘要翻译： 在由入射折射表面，出射折射表面和设置在入射折射表面和出射折射表面之间的多个内部反射表面组成的光学元件中，提供了一种结构，用于使光学元件能够绕着 入口折射面。 此外，在这种光学元件中，隔膜构件设置成与入射折射面相邻，并且被布置成根据其移动来改变其孔径直径。