摘要:
Dihydroperoxides of dialkylaromatic hydrocarbons are separated in high yield from an aqueous alkaline solutions of hydroperoxides containing the dihydroperoxides by adding 0.01 to 1 % by weight of a compound having a nitrogen base, such as ammonia and aromatic amines, to the solution, based on the weight of the solution, thereby stabilizing the dihydroperoxides in the solution, and separating the dihydroperoxides therefrom by extraction.
摘要:
Since charging characteristics differ between the outer circumferential portion and the center portion of a sample to be inspected, equivalent inspection sensitivities cannot be obtained in the outer circumferential portion and the center portion of the sample to be inspected. A sample cover is provided in the outer circumferential portion of a sample holder on which the sample to be inspected is placed. Charging characteristics of the sample cover are changed according to charging characteristics of the sample to be inspected. Consequently, uniform charged states can be formed in the outer circumferential portion and the center portion of the sample. Inspection/observation of the outer circumferential portion of the sample can be realized at higher sensitivity than in the past.
摘要:
Since charging characteristics differ between the outer circumferential portion and the center portion of a sample to be inspected, equivalent inspection sensitivities cannot be obtained in the outer circumferential portion and the center portion of the sample to be inspected. A sample cover is provided in the outer circumferential portion of a sample holder on which the sample to be inspected is placed. Charging characteristics of the sample cover are changed according to charging characteristics of the sample to be inspected. Consequently, uniform charged states can be formed in the outer circumferential portion and the center portion of the sample. Inspection/observation of the outer circumferential portion of the sample can be realized at higher sensitivity than in the past.
摘要:
There is provided an abrasive used for polishing a substrate which comprises silica as a main component, for example a rock crystal, a quartz glass for photomask, for CMP of an organic film, Inter Layer Dielectric (ILD) and shallow trench isolation of a semiconductor device, or for polishing a hard disk made of glass.A sol which particles are dispersed in a medium, wherein the particles have a particle size of 0.005 to 1 μm and comprise as a main component crystalline cerium oxide of the cubic system and as an additional component a lanthanum compound, a neodymium compound or a combination thereof, wherein the additional component is contained in X/(Ce+X) molar ratio of 0.001 to 0.5 in which X is lanthanum atoms, neodymium atoms or a combination thereof.The sol is prepared by reacting an aqueous solution which a cerium (III) salt is mixed with a lanthanum (III) salt and/or a neodymium (III) salt, with an alkaline substance to give a suspension in which cerium (III) hydroxide is homogeneously mixed with lanthanum (III) hydroxide and/or neodymium (III) hydroxide, and blowing oxygen or a gas containing oxygen into the suspension.
摘要:
In a refrigeration system, a first non-inverter compressor (2B) backs up one of an inverter compressor (2A) and a second non-inverter compressor (2C) by switching of a third four-way selector valve (3C). The refrigeration system includes: a suction pressure detection section (81) for detecting the suction pressure of the first non-inverter compressor (2B) after the issue of a switching command to the third four-way selector valve (3C); a command holding section (82) for, when the detected pressure of the suction pressure detection section (81) becomes lower than a predetermined value, determining that the third four-way selector valve (3C) has malfunctioned and holding the switching command; and a compressor standby section (83) for, upon the command holding section (82) holding the switching command, stopping the first non-inverter compressor (2B) and putting it into standby for a predetermined time.
摘要:
The present invention provides an abrasive compound suitable for polishing the surface of a glass substrate for an optical disk platter or a magnetic disk platter. More specifically, the present invention provides an abrasive compound for a glass hard disk platter, characterized as comprising a stable slurry having water and, dispersed therein as an abrasive, cerium(IV) oxide particles having an average secondary particle size of 0.1 to 0.5 μm and containing CeO2 in a concentration of 0.2 to 30 wt %. Preferably, the present invention provides the above abrasive compound in which cerium amounts for 95% or more in terms of oxides of the total amount of rare earth elements in the abrasive.
摘要:
A method of manufacturing display panels includes forming a material layer on a substrate, and baking the material layer formed on substrate which is placed on a supporting bed. The supporting bed is formed of a first supporting bed and a second supporting bed placed on the first supporting bed. A difference in thermal expansion coefficient between the second supporting bed and the substrate is smaller than a difference in thermal expansion coefficient between the first supporting bed and the substrate, and the substrate is placed on the second supporting bed such that the substrate is positioned entirely within the perimeter of the second supporting bed during the baking and heating. This structure allows reduction of scratches on a surface of the substrate.
摘要:
A production method of a semiconductor device including: producing a polishing composition containing zirconium oxide sol; and planarizing a substrate having an uneven surface with said polishing composition, wherein the polishing composition containing zirconium oxide is produced by the steps comprising: baking at a temperature ranging from 400 to 1000° C., a zirconium compound having d50 (where d50 represents a particle diameter meaning that the number of particles having this particle diameter or less is 50% of the total number of particles) of zirconium compound particles of 5 to 25 μm and d99 (where d99 represents a particle diameter meaning that the number of particles having this particle diameter or less is 99% of the total number of particles) of zirconium compound particles of 60 μm or less, wherein d50 and d99 are measured by measuring a slurry of the zirconium compound by a laser diffractometry; and wet-grinding a powder of zirconium oxide obtained in the above baking in an aqueous medium until d50 of zirconium oxide particles becomes 80 to 150 nm and d99 of zirconium oxide particles becomes 150 to 500 nm, wherein d50 and d99 are measured by measuring a slurry of the zirconium compound by a laser diffractometry.
摘要:
A refrigeration apparatus (1) is provided with a refrigerant circuit (1E) along which are connected a compressor (2), an outdoor heat exchanger (4), an expansion mechanism, an indoor heat exchanger (41) for providing room air conditioning, and a cooling heat exchanger (45, 51) for providing storage compartment cooling. The refrigerant circuit (1E) includes a discharge side three way switch valve (101) for varying the flow rate of a portion of the refrigerant which is discharged out of the compressor (2) and then distributed to the indoor heat exchanger (41) and the outdoor heat exchanger (4) during a heat recovery operation mode in which the indoor heat exchanger (41) and the outdoor heat exchanger (4) operate as condensers. As a result of such arrangement, even when the amount of heat obtained in the cooling heat exchanger (45, 51) exceeds the amount of heat required in the indoor heat exchanger (41), surplus heat is discharged without excessive decrease in the discharge pressure of the compressor (2).
摘要:
A subcooling unit (200) includes a refrigerant passage (205) connected to liquid side communication pipes (21, 22) of a refrigerating apparatus (10). When a subcooling compressor (221) is operated, subcooling refrigerant circulates in a subcooling refrigerant circuit (220) to perform a refrigeration cycle, thereby cooling refrigerant of the refrigerating apparatus (10) which flows in the refrigerant passage (205). A controller (240) of the subcooling unit (200) receives the detection value of an outside air temperature sensor (231) or a refrigerant temperature sensor (236). The controller (240) controls the operation of the subcooling compressor (221) with the use of only information obtainable within the subcooling unit (200).