Charged particle beam apparatus and method for stably obtaining charged particle beam image
    62.
    发明授权
    Charged particle beam apparatus and method for stably obtaining charged particle beam image 失效
    带电粒子束装置和稳定获得带电粒子束图像的方法

    公开(公告)号:US08536540B2

    公开(公告)日:2013-09-17

    申请号:US13381953

    申请日:2010-05-14

    IPC分类号: H01J37/26

    摘要: Since charging characteristics differ between the outer circumferential portion and the center portion of a sample to be inspected, equivalent inspection sensitivities cannot be obtained in the outer circumferential portion and the center portion of the sample to be inspected. A sample cover is provided in the outer circumferential portion of a sample holder on which the sample to be inspected is placed. Charging characteristics of the sample cover are changed according to charging characteristics of the sample to be inspected. Consequently, uniform charged states can be formed in the outer circumferential portion and the center portion of the sample. Inspection/observation of the outer circumferential portion of the sample can be realized at higher sensitivity than in the past.

    摘要翻译: 由于待检查样品的外周部分和中心部分的充电特性不同,所以待检样品的外周部分和中心部分不能获得相同的检查灵敏度。 在待检测样品放置的样品架的外周部设置有样品盖。 样品盖的充电特性根据待检样品的充电特性而改变。 因此,可以在样品的外周部分和中心部分形成均匀的带电状态。 可以以比以往更高的灵敏度实现样品的外周部的检查/观察。

    CHARGED PARTICLE BEAM APPARATUS AND METHOD FOR STABLY OBTAINING CHARGED PARTICLE BEAM IMAGE
    63.
    发明申请
    CHARGED PARTICLE BEAM APPARATUS AND METHOD FOR STABLY OBTAINING CHARGED PARTICLE BEAM IMAGE 失效
    充电颗粒光束装置和用于稳定获取的粒子束图像的方法

    公开(公告)号:US20120126118A1

    公开(公告)日:2012-05-24

    申请号:US13381953

    申请日:2010-05-14

    IPC分类号: H01J37/26 H01J37/20

    摘要: Since charging characteristics differ between the outer circumferential portion and the center portion of a sample to be inspected, equivalent inspection sensitivities cannot be obtained in the outer circumferential portion and the center portion of the sample to be inspected. A sample cover is provided in the outer circumferential portion of a sample holder on which the sample to be inspected is placed. Charging characteristics of the sample cover are changed according to charging characteristics of the sample to be inspected. Consequently, uniform charged states can be formed in the outer circumferential portion and the center portion of the sample. Inspection/observation of the outer circumferential portion of the sample can be realized at higher sensitivity than in the past.

    摘要翻译: 由于待检查样品的外周部分和中心部分的充电特性不同,所以待检样品的外周部分和中心部分不能获得相同的检查灵敏度。 在待检测样品放置的样品架的外周部设置有样品盖。 样品盖的充电特性根据待检样品的充电特性而改变。 因此,可以在样品的外周部分和中心部分形成均匀的带电状态。 可以以比以往更高的灵敏度实现样品的外周部的检查/观察。

    Cerium oxide sol and abrasive
    64.
    发明授权
    Cerium oxide sol and abrasive 失效
    氧化铈溶胶和磨料

    公开(公告)号:US07887714B2

    公开(公告)日:2011-02-15

    申请号:US10015675

    申请日:2001-12-17

    IPC分类号: C09K13/00

    摘要: There is provided an abrasive used for polishing a substrate which comprises silica as a main component, for example a rock crystal, a quartz glass for photomask, for CMP of an organic film, Inter Layer Dielectric (ILD) and shallow trench isolation of a semiconductor device, or for polishing a hard disk made of glass.A sol which particles are dispersed in a medium, wherein the particles have a particle size of 0.005 to 1 μm and comprise as a main component crystalline cerium oxide of the cubic system and as an additional component a lanthanum compound, a neodymium compound or a combination thereof, wherein the additional component is contained in X/(Ce+X) molar ratio of 0.001 to 0.5 in which X is lanthanum atoms, neodymium atoms or a combination thereof.The sol is prepared by reacting an aqueous solution which a cerium (III) salt is mixed with a lanthanum (III) salt and/or a neodymium (III) salt, with an alkaline substance to give a suspension in which cerium (III) hydroxide is homogeneously mixed with lanthanum (III) hydroxide and/or neodymium (III) hydroxide, and blowing oxygen or a gas containing oxygen into the suspension.

    摘要翻译: 提供了用于抛光基底的磨料,其包括二氧化硅作为主要成分,例如岩石晶体,用于光掩模的石英玻璃,用于有机膜的CMP,层间介电(ILD)和半导体的浅沟槽隔离 装置或用于抛光由玻璃制成的硬盘。 一种溶胶,其中颗粒分散在介质中,其中颗粒的粒度为0.005至1μm,并且包含作为立方体系的结晶二氧化铈的主要组分,并且作为附加组分的镧化合物,钕化合物或组合 其中所述附加成分以X =(Ce + X)摩尔比为0.001〜0.5,X为镧原子,钕原子或其组合。 通过使铈(III)盐与镧(III)盐和/或钕(III)盐混合的水溶液与碱性物质反应制备溶胶,得到悬浮液,其中氢氧化铈(III) 与氢氧化镧(III)和/或氢氧化钕(III)均匀混合,并将氧气或含有氧的气体吹入悬浮液中。

    Refrigeration system
    65.
    发明授权
    Refrigeration system 失效
    制冷系统

    公开(公告)号:US07765817B2

    公开(公告)日:2010-08-03

    申请号:US11631859

    申请日:2005-11-21

    IPC分类号: F25B49/00

    摘要: In a refrigeration system, a first non-inverter compressor (2B) backs up one of an inverter compressor (2A) and a second non-inverter compressor (2C) by switching of a third four-way selector valve (3C). The refrigeration system includes: a suction pressure detection section (81) for detecting the suction pressure of the first non-inverter compressor (2B) after the issue of a switching command to the third four-way selector valve (3C); a command holding section (82) for, when the detected pressure of the suction pressure detection section (81) becomes lower than a predetermined value, determining that the third four-way selector valve (3C) has malfunctioned and holding the switching command; and a compressor standby section (83) for, upon the command holding section (82) holding the switching command, stopping the first non-inverter compressor (2B) and putting it into standby for a predetermined time.

    摘要翻译: 在制冷系统中,通过切换第三四通换向阀(3C),第一非变频压缩机(2B)备用逆变器压缩机(2A)和第二非变频压缩机(2C)中的一个。 该制冷系统包括:在向第三四通换向阀(3C)发出切换指令之后,检测第一非变换器压缩机(2B)的吸入压力的吸入压力检测部(81) 指示保持部(82),当所述吸入压力检测部(81)的检测压力变得低于预定值时,确定所述第三四通换向阀(3C)发生故障并保持所述切换命令; 和压缩机待机部分(83),用于在保持切换命令的命令保持部分(82)上停止第一非逆变器压缩机(2B)并将其置于预定时间待机状态。

    Abrasive compound for glass hard disk platter
    66.
    发明授权
    Abrasive compound for glass hard disk platter 有权
    玻璃硬盘拼盘

    公开(公告)号:US07578862B2

    公开(公告)日:2009-08-25

    申请号:US10678093

    申请日:2003-10-06

    IPC分类号: C09K3/14 C03C19/00 B24B37/00

    摘要: The present invention provides an abrasive compound suitable for polishing the surface of a glass substrate for an optical disk platter or a magnetic disk platter. More specifically, the present invention provides an abrasive compound for a glass hard disk platter, characterized as comprising a stable slurry having water and, dispersed therein as an abrasive, cerium(IV) oxide particles having an average secondary particle size of 0.1 to 0.5 μm and containing CeO2 in a concentration of 0.2 to 30 wt %. Preferably, the present invention provides the above abrasive compound in which cerium amounts for 95% or more in terms of oxides of the total amount of rare earth elements in the abrasive.

    摘要翻译: 本发明提供一种适用于抛光用于光盘盘或磁盘盘的玻璃基板的表面的磨料化合物。 更具体地说,本发明提供了一种用于玻璃硬盘盘的磨料化合物,其特征在于包括一种具有水的稳定的浆料,并在其中分散为研磨剂,其平均二次粒径为0.1-0.5μm的氧化铈(IV)颗粒 并含有浓度为0.2〜30重量%的CeO 2。 优选地,本发明提供了上述磨料化合物,其中铈以磨料中稀土元素总量的氧化物计为95%以上。

    Method of manufacturing display panel, and supporting bed for substrate of the display panel
    67.
    发明授权
    Method of manufacturing display panel, and supporting bed for substrate of the display panel 失效
    显示面板的制造方法以及显示面板的基板的支撑床

    公开(公告)号:US07534155B2

    公开(公告)日:2009-05-19

    申请号:US10589819

    申请日:2006-01-11

    IPC分类号: H01J9/00

    CPC分类号: H01J9/241

    摘要: A method of manufacturing display panels includes forming a material layer on a substrate, and baking the material layer formed on substrate which is placed on a supporting bed. The supporting bed is formed of a first supporting bed and a second supporting bed placed on the first supporting bed. A difference in thermal expansion coefficient between the second supporting bed and the substrate is smaller than a difference in thermal expansion coefficient between the first supporting bed and the substrate, and the substrate is placed on the second supporting bed such that the substrate is positioned entirely within the perimeter of the second supporting bed during the baking and heating. This structure allows reduction of scratches on a surface of the substrate.

    摘要翻译: 制造显示面板的方法包括在基板上形成材料层,并烘焙形成在放置在支撑床上的基板上的材料层。 支撑床由放置在第一支撑床上的第一支撑床和第二支撑床形成。 第二支撑床和基板之间的热膨胀系数的差异小于第一支撑床和基板之间的热膨胀系数差,并且将基板放置在第二支撑床上,使得基板完全位于 在烘烤和加热期间第二支撑床的周边。 这种结构允许减少基板表面上的划痕。

    Production method of polishing composition
    68.
    发明申请
    Production method of polishing composition 失效
    抛光组合物的生产方法

    公开(公告)号:US20090042393A1

    公开(公告)日:2009-02-12

    申请号:US12285498

    申请日:2008-10-07

    IPC分类号: H01L21/306

    摘要: A production method of a semiconductor device including: producing a polishing composition containing zirconium oxide sol; and planarizing a substrate having an uneven surface with said polishing composition, wherein the polishing composition containing zirconium oxide is produced by the steps comprising: baking at a temperature ranging from 400 to 1000° C., a zirconium compound having d50 (where d50 represents a particle diameter meaning that the number of particles having this particle diameter or less is 50% of the total number of particles) of zirconium compound particles of 5 to 25 μm and d99 (where d99 represents a particle diameter meaning that the number of particles having this particle diameter or less is 99% of the total number of particles) of zirconium compound particles of 60 μm or less, wherein d50 and d99 are measured by measuring a slurry of the zirconium compound by a laser diffractometry; and wet-grinding a powder of zirconium oxide obtained in the above baking in an aqueous medium until d50 of zirconium oxide particles becomes 80 to 150 nm and d99 of zirconium oxide particles becomes 150 to 500 nm, wherein d50 and d99 are measured by measuring a slurry of the zirconium compound by a laser diffractometry.

    摘要翻译: 一种半导体器件的制造方法,包括:制造含有氧化锆溶胶的研磨用组合物; 并且用所述抛光组合物平坦化具有不平坦表面的衬底,其中所述包含氧化锆的抛光组合物通过以下步骤制备,所述步骤包括:在400至1000℃的温度下焙烧具有d50的锆化合物(其中d50表示 粒径为5〜25μm的锆化合物粒子和d99(d99表示具有该粒子的粒子的粒子数)的粒子总数的50%) 粒径为99%以下的锆化合物粒子为60μm以下,其中d50和d99通过激光衍射法测定锆化合物的浆料来测量; 在水性介质中湿式研磨上述焙烧得到的氧化锆粉末,直到氧化锆粒子的d50为80〜150nm,氧化锆粒子的d99为150〜500nm,其中d50和d99为 锆化合物的浆料通过激光衍射法。

    Refrigerartion apparatus
    69.
    发明申请
    Refrigerartion apparatus 失效
    制冷装置

    公开(公告)号:US20090007589A1

    公开(公告)日:2009-01-08

    申请号:US11659121

    申请日:2005-08-01

    IPC分类号: F25B1/00 F25B39/02 F25B41/04

    CPC分类号: F25B13/00 F25B2313/0231

    摘要: A refrigeration apparatus (1) is provided with a refrigerant circuit (1E) along which are connected a compressor (2), an outdoor heat exchanger (4), an expansion mechanism, an indoor heat exchanger (41) for providing room air conditioning, and a cooling heat exchanger (45, 51) for providing storage compartment cooling. The refrigerant circuit (1E) includes a discharge side three way switch valve (101) for varying the flow rate of a portion of the refrigerant which is discharged out of the compressor (2) and then distributed to the indoor heat exchanger (41) and the outdoor heat exchanger (4) during a heat recovery operation mode in which the indoor heat exchanger (41) and the outdoor heat exchanger (4) operate as condensers. As a result of such arrangement, even when the amount of heat obtained in the cooling heat exchanger (45, 51) exceeds the amount of heat required in the indoor heat exchanger (41), surplus heat is discharged without excessive decrease in the discharge pressure of the compressor (2).

    摘要翻译: 制冷装置(1)具备:制冷剂回路(1E),连接有压缩机(2),室外热交换器(4),膨胀机构,室内空调用的室内热交换器(41) 以及用于提供储藏室冷却的冷却热交换器(45,51)。 制冷剂回路(1E)包括排出侧三通切换阀(101),用于改变从压缩机(2)排出的一部分制冷剂的流量,然后分配到室内热交换器(41)和 在室内热交换器(41)和室外热交换器(4)作为冷凝器运转的热回收运转模式中的室外热交换器(4)。 作为这种结构的结果,即使在冷却热交换器(45,51)中获得的热量超过室内热交换器(41)所需的热量的情况下,也可以排出多余的热量而不会使排出压力过度降低 的压缩机(2)。

    Subcooling Apparatus
    70.
    发明申请
    Subcooling Apparatus 审中-公开
    过冷却装置

    公开(公告)号:US20080229769A1

    公开(公告)日:2008-09-25

    申请号:US10571940

    申请日:2005-06-09

    IPC分类号: F25B1/00

    摘要: A subcooling unit (200) includes a refrigerant passage (205) connected to liquid side communication pipes (21, 22) of a refrigerating apparatus (10). When a subcooling compressor (221) is operated, subcooling refrigerant circulates in a subcooling refrigerant circuit (220) to perform a refrigeration cycle, thereby cooling refrigerant of the refrigerating apparatus (10) which flows in the refrigerant passage (205). A controller (240) of the subcooling unit (200) receives the detection value of an outside air temperature sensor (231) or a refrigerant temperature sensor (236). The controller (240) controls the operation of the subcooling compressor (221) with the use of only information obtainable within the subcooling unit (200).

    摘要翻译: 过冷却单元(200)包括与制冷装置(10)的液体侧连通管(21,22)连接的制冷剂通路(205)。 当过冷却压缩机221运转时,过冷却制冷剂在过冷却制冷剂回路220中循环,进行制冷循环,从而冷却在制冷剂通路205流动的制冷装置10的制冷剂。 过冷却单元(200)的控制器(240)接收外部空气温度传感器(231)或制冷剂温度传感器(236)的检测值。 控制器(240)仅使用在过冷却单元(200)内可获得的信息来控制过冷却压缩机(221)的操作。