Evaluation method of resist coating
    61.
    发明授权
    Evaluation method of resist coating 失效
    抗蚀剂涂层的评价方法

    公开(公告)号:US5252414A

    公开(公告)日:1993-10-12

    申请号:US747619

    申请日:1991-08-20

    摘要: A method for evaluating a resist coating comprising the steps of: forming a first layer resist pattern including an alignment mark by applying a first resist on a semiconductor substrate and by exposing and developing said first resist, said first layer resist pattern having a ridge portion; irradiating said first layer resist pattern with a deep ultraviolet ray; applying, onto said irradiated first layer resist pattern, a second resist having substantially the same refractive index as said first resist to form a second resist coating; detecting said alignment mark formed in said first layer resist pattern, and relatively positioning a pattern for said second resist and said first layer resist pattern; and determining nonuniformity characteristics of said second resist coating by measuring an overlay accuracy between said first layer resist pattern and said pattern for said second resist. The present invention ensures a quantitative evaluation in a non-contact manner for non-uniformity of a resist coating, and enables a resist coating method to be optimized.

    摘要翻译: 一种抗蚀剂涂层评价方法,其特征在于,包括以下步骤:通过在半导体衬底上施加第一抗蚀剂,通过曝光和显影所述第一抗蚀剂,形成包括对准标记的第一层抗蚀剂图案,所述第一层抗蚀剂图案具有脊部; 用深紫外线照射所述第一层抗蚀剂图案; 在所述照射的第一层抗蚀剂图案上施加具有与所述第一抗蚀剂基本相同的折射率的第二抗蚀剂,以形成第二抗蚀剂涂层; 检测形成在所述第一层抗蚀剂图案中的所述对准标记,并且相对地定位所述第二抗蚀剂和所述第一层抗蚀剂图案的图案; 以及通过测量所述第一层抗蚀剂图案和所述第二抗蚀剂的所述图案之间的覆盖精度来确定所述第二抗蚀剂涂层的不均匀性。 本发明确保以非接触方式对抗蚀剂涂层的不均匀性进行定量评价,并且能够优化抗蚀剂涂布方法。

    Semiconductor IC and method of making the same
    65.
    发明授权
    Semiconductor IC and method of making the same 失效
    半导体IC及其制造方法

    公开(公告)号:US4734345A

    公开(公告)日:1988-03-29

    申请号:US869844

    申请日:1986-05-28

    IPC分类号: G03F7/20 G03H1/04

    摘要: A method and apparatus for making a semiconductor device involves placing a semiconductor wafer in a position where two coherent light beams can interfere thereon. One of the coherent light beams is modulated by a hologram inserted in the path of the beam projected onto a surface of the semiconductor wafer. The other of the coherent light beams is also projected onto the same surface of the semiconductor wafer. The two interfering light beams form a pattern on a photoresist film found on the surface of the semiconductor wafer, which can be developed by photoresist techniques.

    摘要翻译: 用于制造半导体器件的方法和装置包括将半导体晶片放置在两个相干光束可能在其上干涉的位置。 相干光束中的一个被插入在投影到半导体晶片的表面上的光束的路径中的全息图调制。 相干光束中的另一个也投射到半导体晶片的相同表面上。 两个干涉光束在半导体晶片的表面上形成的光致抗蚀剂膜上形成图案,其可通过光致抗蚀剂技术显影。

    Aligning exposure method
    66.
    发明授权
    Aligning exposure method 失效
    调整曝光方式

    公开(公告)号:US4636077A

    公开(公告)日:1987-01-13

    申请号:US599734

    申请日:1984-04-12

    IPC分类号: G03F7/20 G03F9/00 G01B9/02

    摘要: Disclosed in an aligning and exposing method suitable for use in the production of LSIs. Coherent ray beams are applied from two directions to form interference fringe through interference of the coherent rays. A diffraction grid is disposed in the optic paths of the ray beams substantially in parallel with the interference fringe. The ray beams reflected and transmitted by the grid are converged by a lens system and the intensities of the ray beams are measured to detect the relative position between the interference fringe formed by two coherent ray beams and the diffraction grid, thereby to permit a highly accurate alignment of fine semiconductor element. The pitch of the grid on the substrate is selected to be n (n being an integer) times as large as the pitch of the interference fringe, so that the grid for alignment purpose is formed simultaneously with the formation of the LSI pattern by photolithographic technic. With this method, it is possible to attain a high degree of accuracy of alignment, and to conduct the subsequent exposure using the same ray beam source as that used for the alignment.

    摘要翻译: 公开了适用于制造LSI的对准和曝光方法。 从两个方向施加相干射线束,以形成干涉条纹通过相干射线的干涉。 衍射栅格设置在基本上与干涉条纹平行的射线束的光路中。 由栅格反射和透射的光束由透镜系统会聚,并且测量射线束的强度以检测由两个相干射线束和衍射栅格形成的干涉条纹之间的相对位置,从而允许高精度 精细半导体元件的对准。 衬底上的栅格的间距选择为干涉条纹的间距的n(n是整数)倍,使得用于对准目的的栅格与通过光刻技术形成LSI图案同时形成 。 利用该方法,可以获得高精度的对准,并且可以使用与用于对准的相同的光束源进行后续曝光。

    Navigation system
    67.
    发明授权
    Navigation system 失效
    导航系统

    公开(公告)号:US07406380B2

    公开(公告)日:2008-07-29

    申请号:US10960022

    申请日:2004-10-08

    IPC分类号: G01C21/34

    摘要: A navigation system for providing different modes of navigation guidance to drivers is provided. A smart card stores user information. In a main apparatus, a parameter table storage section stores parameters which are used for controlling the outputting of navigation guidance to an entity. A control section acquires at least one parameter from the parameter table storage section based on the user information stored in the smart card, and thereafter generates information necessary for providing navigation guidance for the entity in accordance with the acquired parameter(s). A display section or an audio output section outputs various information generated by the control section.

    摘要翻译: 提供了一种用于向驾驶员提供不同模式的导航指导的导航系统。 智能卡存储用户信息。 在主装置中,参数表存储部存储用于控制向实体输出导航指导的参数。 控制部根据存储在智能卡中的用户信息从参数表存储部中取得至少一个参数,然后根据取得的参数生成为实体提供导航指导所必需的信息。 显示部分或音频输出部分输出由控制部分生成的各种信息。

    Input device
    68.
    发明申请
    Input device 审中-公开
    输入设备

    公开(公告)号:US20070188022A1

    公开(公告)日:2007-08-16

    申请号:US10570467

    申请日:2004-08-31

    IPC分类号: B60L1/00 H02G3/00

    摘要: An input device enables a user to operate an electronic apparatus in an optimum position for the user. For this purpose, the input device of the present invention includes: a display unit in which images are displayed; an input detection unit that is disposed to be movable back and forth in front of the display unit and optically detects an operation position indicated for an operation screen displayed in the display unit; a control unit that outputs a control signal corresponding to the detected operation position; and an electric driving unit that moves the input detection unit back and forth. By changing the position of the input detection unit to an operation position suitable to a driver, the driver can operate the electronic apparatus in an optimum position for the driver.

    摘要翻译: 输入装置使得用户能够操作用户的最佳位置的电子设备。 为此,本发明的输入装置包括:显示单元,其中显示图像; 输入检测单元,被布置成可在显示单元的前面来回移动,并且光学地检测指示用于显示在显示单元中的操作屏幕的操作位置; 控制单元,其输出与检测到的操作位置相对应的控制信号; 以及来回移动输入检测单元的电驱动单元。 通过将输入检测单元的位置改变为适合于驾驶员的操作位置,驾驶员可以将电子设备操作在驾驶员的最佳位置。

    Image processing apparatus
    70.
    发明授权
    Image processing apparatus 失效
    图像处理装置

    公开(公告)号:US06731332B1

    公开(公告)日:2004-05-04

    申请号:US09238611

    申请日:1999-01-28

    IPC分类号: H04N718

    摘要: In an image processing apparatus carried on a vehicle, an image of a scene around the vehicle, which is photographed by an image pick-up, is inputted into a white line failure extractor. Then, outline points of a white line on a road and a guardrail, which is parallel to the white line, are sought. Further, the outline points are detected as a polynomial. Moreover, the image photographed by the image pick-up is also inputted into an intermittent image obtainer. Then, the images from the image pick-up are intermittently obtained at constant periodical intervals, and further the images are compressed using JPEG compression method. Further, in a synthesizer, the feature data from the white line feature extractor and the image data from the intermittent image obtainer are aligned in order of time. Moreover, the image data and feature data, which are aligned in order of time, are conserved within a given constant period by a recorder. Thus, accurate data as to condition of the road can be recorded using a small capacity memory.

    摘要翻译: 在搭载在车辆上的图像处理装置中,由摄像机摄影的车辆周围的场景的图像被输入白线故障提取器。 然后,寻求与白线平行的道路上的白线的轮廓点和护栏。 此外,轮廓点被检测为多项式。 此外,由图像拾取器拍摄的图像也被输入到间歇图像获取器中。 然后,以恒定的周期间隔间歇地获得来自图像拾取器的图像,并且使用JPEG压缩方法进一步压缩图像。 此外,在合成器中,来自白线特征提取器的特征数据和来自间歇图像获取器的图像数据按时间顺序排列。 此外,由时间顺序排列的图像数据和特征数据由记录器在给定的恒定周期内保存。 因此,可以使用小容量存储器记录关于道路状况的准确数据。