FINFET SPLIT GATE NON-VOLATILE MEMORY CELLS WITH ENHANCED FLOATING GATE TO FLOATING GATE CAPACITIVE COUPLING

    公开(公告)号:US20210305264A1

    公开(公告)日:2021-09-30

    申请号:US17069563

    申请日:2020-10-13

    Abstract: Memory cells formed on upwardly extending fins of a semiconductor substrate, each including source and drain regions with a channel region therebetween, a floating gate extending along the channel region and wrapping around the fin, a word line gate extending along the channel region and wrapping around the fin, a control gate over the floating gate, and an erase gate over the source region. The control gates are a continuous conductive strip of material. First and second fins are spaced apart by a first distance. Third and fourth fins are spaced apart by a second distance. The second and third fins are spaced apart by a third distance greater than the first and second distances. The continuous strip includes a portion disposed between the second and third fins, but no portion of the continuous strip is disposed between the first and second fins nor between the third and fourth fins.

Patent Agency Ranking