公开(公告)号：US20090190116A1

公开(公告)日：2009-07-30

申请号：US12408577

申请日：2009-03-20

申请人： Markus Schwab ,  Aksel Goehnermeier ,  Toralf Gruner ,  Tammo Uitterdijk

发明人： Markus Schwab ,  Aksel Goehnermeier ,  Toralf Gruner ,  Tammo Uitterdijk

IPC分类号： G03B27/42 ,  G03B27/54

CPC分类号： G03B27/42 ,  G03F7/70258

摘要： A lithographic method of manufacturing a miniaturized device using a projection exposure system involves illuminating the object plane of an imaging optics of the projection exposure system with measuring light; detecting, for each of a plurality of locations on an image plane of the imaging optics, an angular distribution of an intensity of the measuring light traversing the image plane at the respective location; adjusting a telecentricity of the projection exposure system based on a selected patterning structure to be imaged and on the plurality of the detected angular distributions; disposing the selected pattern structure to be imaged in a region of the object plane of the imaging optics; disposing a substrate carrying a resist in a region of the image plane of the imaging optics and exposing the resist with imaging light using the projection exposure system with the adjusted telecentricity; and developing the exposed resist and processing the substrate with the developed resist.

摘要翻译： 使用投影曝光系统制造小型化装置的光刻方法包括用测量光照射投影曝光系统的成像光学元件的物平面; 针对所述摄像光学元件的像平面上的多个位置中的每一个检测在相应位置处穿过所述图像平面的测量光的角度分布; 基于要成像的所选择的图案化结构和所述多个所检测的角度分布来调整所述投影曝光系统的远心度; 将要成像的所选择的图案结构设置在成像光学器件的物平面的区域中; 在所述成像光学元件的像面的区域中设置携带抗蚀剂的基板，并且利用所述投影曝光系统以调节的远心度将成像光曝光; 并显影出曝光的抗蚀剂并用显影的抗蚀剂处理衬底。

公开(公告)号：US20090021714A1

公开(公告)日：2009-01-22

申请号：US12173595

申请日：2008-07-15

申请人： Hans-Juergen Mann ,  Daniel Kraehmer ,  Aurelian Dodoc ,  Toralf Gruner

发明人： Hans-Juergen Mann ,  Daniel Kraehmer ,  Aurelian Dodoc ,  Toralf Gruner

IPC分类号： G03B27/54

CPC分类号： G03F7/70941 ,  G02B5/005 ,  G02B17/0657 ,  G03F7/70233 ,  G03F7/7025

摘要： The disclosure relates to an optical projection arrangement that can be used to image a reticle onto a substrate. The projection arrangement includes reflective elements, by which a ray path is defined. A combination stop is in a pupil of the ray path. The combination stop has a first opening (aperture opening) for use as an aperture stop. The combination stop also has a second opening for allowing passage of a ray bundle of the ray path, such that the combination stop acts as a combined aperture stop and stray light stop. In addition, the disclosure relates to a corresponding combination stop for optical arrangements, as well as related systems, components and methods.

摘要翻译： 本公开涉及一种可用于将掩模版成像到基底上的光学投影装置。 投影装置包括反射元件，通过该反射元件定义光线路径。 光束路径中的光瞳组合停止。 组合止动件具有用作孔径光阑的第一开口（孔口）。 组合挡块还具有用于允许射线路径的射线束通过的第二开口，使得组合挡块用作组合孔径光阑和杂散光挡块。 此外，本公开涉及用于光学布置的相应组合停止，以及相关系统，部件和方法。

公开(公告)号：US20080316444A1

公开(公告)日：2008-12-25

申请号：US12171394

申请日：2008-07-11

申请人： Franz Sorg ,  Peter Deufel ,  Toralf Gruner

发明人： Franz Sorg ,  Peter Deufel ,  Toralf Gruner

IPC分类号： G03B27/68

CPC分类号： G03F7/70308 ,  G03F7/70825 ,  G03F7/70933

摘要： The disclosure relates to a microlithography projection exposure system having optical corrective elements configured to modify the imaging characteristics, as well as related systems and components.

摘要翻译： 本公开涉及具有被配置为修改成像特性以及相关系统和组件的光学校正元件的微光刻投影曝光系统。

公开(公告)号：US20080212060A1

公开(公告)日：2008-09-04

申请号：US12065451

申请日：2006-09-02

申请人： Joern Greif-Wuestenbecker ,  Beate Boehme ,  Ulrich Stroessner ,  Michael Totzeck ,  Vladimir Kamenov ,  Olaf Dittmann ,  Daniel Kraehmer ,  Toralf Gruner ,  Bernd Geh

发明人： Joern Greif-Wuestenbecker ,  Beate Boehme ,  Ulrich Stroessner ,  Michael Totzeck ,  Vladimir Kamenov ,  Olaf Dittmann ,  Daniel Kraehmer ,  Toralf Gruner ,  Bernd Geh

IPC分类号： G03B27/54

CPC分类号： G03F7/70666 ,  G03F7/70308

摘要： A method for determining intensity distribution in the focal plane of a projection exposure arrangement, in which a large aperture imaging system is emulated and a light from a sample is represented on a local resolution detector by an emulation imaging system. A device for carrying out the method and emulated devices are also described. The invention makes it possible to improve a reproduction quality since the system apodisation is taken into consideration. The inventive method consists in includes determining the integrated amplitude distribution in an output pupil, combining the integrated amplitude distribution with a predetermined apodization correction and calculating a corrected apodization image according to the modified amplitude distribution.

摘要翻译： 一种用于确定投影曝光装置的焦平面中的强度分布的方法，其中大面积成像系统被仿真并且来自样品的光由仿真成像系统在局部分辨率检测器上表示。 还描述了用于执行该方法和仿真装置的装置。 由于考虑到系统变迹，本发明使得可以提高再现质量。 本发明的方法包括确定输出光瞳中的积分幅度分布，将积分幅度分布与预定的变迹校正相结合，并根据修改的幅度分布来计算校正的变迹图像。

公开(公告)号：US07239450B2

公开(公告)日：2007-07-03

申请号：US11181694

申请日：2005-07-14

申请人： Vladimir Kamenov ,  Daniel Kraehmer ,  Michael Totzeck ,  Toralf Gruner ,  Aurelian Dodoc

发明人： Vladimir Kamenov ,  Daniel Kraehmer ,  Michael Totzeck ,  Toralf Gruner ,  Aurelian Dodoc

IPC分类号： G02B3/00

CPC分类号： G03F7/70891 ,  G02B1/02 ,  G02B1/08 ,  G02B17/0812 ,  G02B17/0892 ,  G03F7/70966

摘要： A method of determining materials of lenses contained in an optical system of a projection exposure apparatus is described. First, for each lens of a plurality of the lenses, a susceptibility factor KLT/LH is determined. This factor is a measure of the susceptibility of the respective lens to deteriorations caused by at least one of lifetime effects and lens heating effects. Then a birefringent fluoride crystal is selected as a material for each lens for which the susceptibility factor KLT/LH is above a predetermined threshold. Theses lenses are assigned to a first set of lenses. For these lenses, measures are determined for reducing adverse effects caused by birefringence inherent to the fluoride crystals.

摘要翻译： 描述了确定投影曝光装置的光学系统中所包含的透镜的材料的方法。 首先，对于多个透镜的每个透镜，确定敏感度因子K LT / LH 。 该因子是由寿命效应和透镜加热效果中的至少一种引起的各透镜对恶化的敏感性的量度。 然后选择双折射氟化物晶体作为敏感度因子K LT / LH <>高于预定阈值的每个透镜的材料。 这些镜头被分配到第一组透镜。 对于这些透镜，确定了减少由氟化物晶体固有的双折射引起的不利影响的措施。

公开(公告)号：US20060215272A1

公开(公告)日：2006-09-28

申请号：US11443077

申请日：2006-05-31

申请人： Toralf Gruner ,  Hans-Jurgen Mann

发明人： Toralf Gruner ,  Hans-Jurgen Mann

IPC分类号： G02B3/00

CPC分类号： G02B27/286 ,  G02B13/14 ,  G02B17/08 ,  G02B17/0892 ,  G03F7/70191 ,  G03F7/70225 ,  G03F7/70566

摘要： An objective in a microlithographic projection exposure apparatus has a first optical element that has polarization dependent properties causing intensity fluctuations in an image plane of the objective. These fluctuations may be produced by a second optical element that is arranged downstream of the first optical element. A gray filter disposed in the beam path reduces the intensity fluctuations.

摘要翻译： 微光刻投影曝光装置中的目的是具有第一光学元件，该第一光学元件具有导致物镜的图像平面中的强度波动的偏振相关特性。 这些波动可以由布置在第一光学元件的下游的第二光学元件产生。 布置在光束路径中的灰色滤光器减小了强度波动。

公开(公告)号：US20060146427A1

公开(公告)日：2006-07-06

申请号：US11361345

申请日：2006-02-24

申请人： Birgit Kurz ,  Toralf Gruner ,  Alexander Kohl

发明人： Birgit Kurz ,  Toralf Gruner ,  Alexander Kohl

IPC分类号： G02B7/02

CPC分类号： G03F7/70591 ,  G02B5/3083 ,  G03F7/70258 ,  G03F7/70566 ,  G03F7/70966 ,  Y10S359/90

摘要： A method for improving imaging properties of two or more optical elements comprises the step of determining for at least one of the two optical elements a polarisation-dependent perturbation. In a further step a polarisation-independent perturbation is determined for at least one of the two optical elements. Then a target position for the at least one movable optical element is calculated such that, in the target position, the total perturbation of the at least two optical elements which is made up of the polarisation-dependent perturbations and polarisation-independent perturbations of the two optical elements, is minimized. Finally the at least one movable optical element is moved the to the calculated target position.

摘要翻译： 一种用于改善两个或多个光学元件的成像特性的方法包括确定两个光学元件中的至少一个偏振相关扰动的步骤。 在另一步骤中，确定两个光学元件中的至少一个的偏振无关扰动。 然后，计算出至少一个可移动光学元件的目标位置，使得在目标位置中，由偏振相关扰动和两极偏振无关的扰动构成的至少两个光学元件的总扰动 光学元件被最小化。 最后，将至少一个可移动光学元件移动到计算出的目标位置。

公开(公告)号：US20060132917A1

公开(公告)日：2006-06-22

申请号：US11274152

申请日：2005-11-16

申请人： Christoph Zaczek ,  Thomas Muelders ,  Toralf Gruner

发明人： Christoph Zaczek ,  Thomas Muelders ,  Toralf Gruner

IPC分类号： G02B27/28

CPC分类号： G03F7/70958 ,  G02B27/0012 ,  G02B27/283 ,  G03F7/705

摘要： In a method for making an optical system for imaging a radiation distribution from an input surface of the optical system into an output surface of the optical system, the optical system has a multiplicity of optical components which determine an imaging quality of the optical system, which are arranged along an optical axis of the optical system and comprise at least one optical component which has a substrate with a substrate surface which is provided for carrying an interference layer system having a layer construction that determines the optical properties of the optical component covered with the interference layer system. The method includes: predefining an optimization target for at least one imaging quality parameter that represents the imaging quality of the system; determining the imaging quality of the optical system while taking account of the layer construction of the interference layer system; and varying the layer construction for approximating the imaging quality parameter to the optimization target. In accordance with the method, the determination of the optimum layer construction is coupled directly with an assessment and of the imaging quality of the total system including the interference layer system to be optimized.

摘要翻译： 在制造用于将从光学系统的输入表面的辐射分布成像到光学系统的输出表面的光学系统的方法中，光学系统具有多个光学部件，其确定光学系统的成像质量， 沿着光学系统的光轴布置并且包括至少一个光学部件，该光学部件具有衬底，该衬底具有衬底表面，衬底表面被提供用于承载具有层结构的干涉层系统，所述层结构决定了被覆盖的光学部件的光学特性 干涉层系统。 该方法包括：为表示系统的成像质量的至少一个成像质量参数预定义优化目标; 在考虑到干涉层系统的层结构的同时确定光学系统的成像质量; 并且改变用于将成像质量参数近似到优化目标的层结构。 根据该方法，最佳层结构的确定直接与包括要优化的干涉层系统的总体系统的评估和成像质量相耦合。

公开(公告)号：US20060077371A1

公开(公告)日：2006-04-13

申请号：US11220643

申请日：2005-09-08

申请人： Ulrich Wegmann ,  Vladimir Kamenov ,  Thomas Muelders ,  Toralf Gruner

发明人： Ulrich Wegmann ,  Vladimir Kamenov ,  Thomas Muelders ,  Toralf Gruner

IPC分类号： G03B27/54

CPC分类号： G03F7/706 ,  G03F7/701 ,  G03F7/70566 ,  G03F7/70591

摘要： In a method for improving the imaging properties of a projection objective of a microlithographic projection exposure apparatus, an appropriate illumination angle distribution adapted to a mask (24; 224) to be projected is selected. Then locations (40a, 40b; 60a, 60b; 80a, 80b, 80c) in an exit pupil of the projection objective (20), which are illuminated under these conditions by projection light during a projection of the mask, are determined. For at least one image point, an actual value of an imaging quantity, e.g. a wavefront profile or a polarization state, is determined that influences the imaging properties of the projection objective. Finally, corrective measures are calculated such that the actual value of the imaging quantity approximates a desired value at these locations. In this last step, however, deviations of the actual value from the desired value are taken into account exclusively at said locations illuminated in the exit pupil.

摘要翻译： 在用于改善微光刻投影曝光装置的投影物镜的成像特性的方法中，选择适于投影的掩模（24; 224）的适当照明角度分布。 然后在投影物镜（20）的出射光瞳处的位置（40a，40b; 60a，60b; 80a，80b，80c）处， 面具，确定。 对于至少一个图像点，成像量的实际值，例如， 确定影响投影物镜的成像特性的波前轮廓或偏振状态。 最后，计算校正措施，使得成像量的实际值在这些位置处接近期望值。 然而，在最后一步中，实际值与期望值的偏差仅在出口光瞳上照亮的所述位置被考虑。

公开(公告)号：US07027237B2

公开(公告)日：2006-04-11

申请号：US11185066

申请日：2005-07-20

申请人： Birgit Mecking ,  Toralf Gruner ,  Alexander Kohl

发明人： Birgit Mecking ,  Toralf Gruner ,  Alexander Kohl

IPC分类号： G02B7/02

CPC分类号： G03F7/70591 ,  G02B5/3083 ,  G03F7/70258 ,  G03F7/70566 ,  G03F7/70966 ,  Y10S359/90

摘要： A method for improving imaging properties of two or more optical elements comprises the step of determining for at least one of the two optical elements a polarization-dependent perturbation. In a further step a polarization-independent perturbation is determined for at least one of the two optical elements. Then a target position for the at least one movable optical element is calculated such that, in the target position, the total perturbation of the at least two optical elements which is made up of the polarization-dependent perturbations and polarization-independent perturbations of the two optical elements, is minimized. Finally the at least one movable optical element is moved the to the calculated target position.

摘要翻译： 一种用于改善两个或多个光学元件的成像特性的方法包括确定两个光学元件中的至少一个偏振相关扰动的步骤。 在另一步骤中，确定两个光学元件中的至少一个的偏振无关扰动。 然后，计算出至少一个可移动光学元件的目标位置，使得在目标位置中，由偏振相关扰动和两极偏振无关的扰动构成的至少两个光学元件的总扰动 光学元件被最小化。 最后，将至少一个可移动光学元件移动到计算出的目标位置。