Communication method and radio network control device in a mobile communication system
    61.
    发明授权
    Communication method and radio network control device in a mobile communication system 失效
    移动通信系统中的通信方法和无线网络控制装置

    公开(公告)号:US08363547B2

    公开(公告)日:2013-01-29

    申请号:US12633544

    申请日:2009-12-08

    IPC分类号: H04L12/26

    摘要: A mobile communication system in which a mobile station copies data and transmits that copied data to a plurality of base stations, each base station sends that copied data to a serving radio network control device (S-RNC) directly or via a drift radio network control device (D-RNC), and the S-RNC selectively combines and outputs the received copied data; wherein a congestion monitoring unit monitors the congestion state of a line between the D-RNC and S-RNC, and when that line is congested, a D-RNC selectively combines the copied data that is inputted from the plurality of base stations and sends the result to that line, and when the line is not congested, the D-RNC sends the copied data that is inputted from the plurality of base stations to the line without performing selective combination.

    摘要翻译: 一种移动通信系统,其中移动台复制数据并将复制的数据发送到多个基站,每个基站将该复制的数据直接或经由漂移无线电网络控制发送到服务无线电网络控制设备(S-RNC) 设备(D-RNC),并且S-RNC选择性地组合并输出接收到的复制数据; 其中拥塞监视单元监视D-RNC与S-RNC之间的线路的拥塞状态,当该线路拥塞时,D-RNC选择性地组合从多个基站输入的复制数据,并发送 导致该行,并且当线路​​不拥塞时,D-RNC将不从多个基站输入的复制数据发送到线路而不执行选择性组合。

    Single crystal material and process for producing the same
    62.
    发明授权
    Single crystal material and process for producing the same 失效
    单晶材料及其制造方法

    公开(公告)号:US08241420B2

    公开(公告)日:2012-08-14

    申请号:US12063490

    申请日:2005-08-11

    申请人: Takeshi Shimada

    发明人: Takeshi Shimada

    IPC分类号: C30B29/22

    摘要: The invention intends to provide a single crystal material that can be used as a dielectric material for use in electronic devices, which has a high Qf value; and a process for producing the same. According to the invention, a single crystal of a composite oxide is obtained from a composition in which a slight amount of SrTiO3 is added to LaAlO3, and the (1-X)LaAlO3—XSrTiO3 single crystal material having the specific composition has such dielectric characteristics for electronic devices that the dielectric constant is 24 or more and the Qf value is 300,000 GHz or more, is considerably improved in the Qf value as a dielectric material, and can be applied to a high-temperature superconducting filter.

    摘要翻译: 本发明旨在提供一种单晶材料,其可用作具有高Qf值的电子器件中的电介质材料; 及其制造方法。 根据本发明,由LaAlO 3中添加少量SrTiO 3的组合物获得复合氧化物的单晶,具有特定组成的(1-X)LaAlO 3-XSrTiO 3单晶材料具有这样的介电特性 对于电介质常数为24以上,Qf值为300000GHz以上的电子器件,作为电介质材料的Qf值显着提高,可以应用于高温超导滤波器。

    Semiconductor ceramic composition and process for producing the same
    65.
    发明授权
    Semiconductor ceramic composition and process for producing the same 有权
    半导体陶瓷组合物及其制造方法

    公开(公告)号:US07993547B2

    公开(公告)日:2011-08-09

    申请号:US12444895

    申请日:2007-10-26

    IPC分类号: H01B1/08 C04B35/46

    摘要: It is intended to provide a semiconductor ceramic composition in which a part of Ba in BaTiO3 is substituted with Bi—Na, which is capable of restraining the evaporation of Bi in the calcination step, is capable of restraining the compositional deviation of Bi—Na thereby suppressing the formation of different phases, is capable of further reducing the resistivity at room temperature, and is capable of restraining the fluctuation of the Curie temperature; and to provide a production process of the same. When a calcined Ba(TiM)O3 powder (M is a semiconductor dopant) and a calcined (BiNa)TiO3 powder are separately prepared and the Ba(TiM)O3 powder is calcined at a relatively high temperature while the (BiNa)TiO3 powder is at a relatively low temperature, both at the most suitable temperatures for them, then the evaporation of Bi may be retarded and the compositional deviation of Bi—Na may be thereby suppressed to inhibit the formation of different phases; and when these calcined powders are mixed, formed and sintered, then a semiconductor ceramic composition which has a low resistivity at room temperature and is capable of restraining the fluctuation of the Curie temperature can be obtained.

    摘要翻译: 旨在提供一种半导体陶瓷组合物,其中BaTiO 3中的Ba的一部分被Bi-Na代替,Bi-Na能够抑制在煅烧步骤中Bi的蒸发,因此能够抑制Bi-Na的组成偏差 抑制不同相的形成,能够进一步降低室温下的电阻率,并且能够抑制居里温度的波动; 并提供相同的生产工艺。 当分别制备煅烧的Ba(TiM)O 3粉末(M是半导体掺杂剂)和煅烧(BiNa)TiO 3粉末时,并且在(BiNa)TiO 3粉末是相对较高的温度下煅烧Ba(TiM)O 3粉末, 在相对较低的温度下,在它们最适合的温度下,则Bi的蒸发可能被延迟,并且可以抑制Bi-Na的组成偏差以抑制不同相的形成; 并且当将这些煅烧粉末混合,形成和烧结时,​​可以获得在室温下具有低电阻率并且能够抑制居里温度波动的半导体陶瓷组合物。

    SINGLE CRYSTAL MATERIAL AND PROCESS FOR PRODUCING THE SAME
    68.
    发明申请
    SINGLE CRYSTAL MATERIAL AND PROCESS FOR PRODUCING THE SAME 失效
    单晶材料及其制造方法

    公开(公告)号:US20090048090A1

    公开(公告)日:2009-02-19

    申请号:US12063490

    申请日:2005-08-11

    申请人: Takeshi Shimada

    发明人: Takeshi Shimada

    IPC分类号: C04B35/47 C30B15/00 C30B13/00

    摘要: The invention intends to provide a single crystal material that can be used as a dielectric material for use in electronic devices, which has a high Qf value; and a process for producing the same. According to the invention, a single crystal of a composite oxide is obtained from a composition in which a slight amount of SrTiO3 is added to LaAlO3, and the (1-X)LaAlO3—XSrTiO3 single crystal material having the specific composition has such dielectric characteristics for electronic devices that the dielectric constant is 24 or more and the Qf value is 300,000 GHz or more, is considerably improved in the Qf value as a dielectric material, and can be applied to a high-temperature superconducting filter.

    摘要翻译: 本发明旨在提供一种单晶材料,其可用作具有高Qf值的电子器件中的电介质材料; 及其制造方法。 根据本发明,由LaAlO 3中添加少量SrTiO 3的组合物获得复合氧化物的单晶,具有特定组成的(1-X)LaAlO 3-XSrTiO 3单晶材料具有这样的介电特性 对于电介质常数为24以上,Qf值为300000GHz以上的电子器件,作为电介质材料的Qf值显着提高,可以应用于高温超导滤波器。

    Plasma processing method and apparatus
    69.
    发明申请
    Plasma processing method and apparatus 失效
    等离子体处理方法和装置

    公开(公告)号:US20070281478A1

    公开(公告)日:2007-12-06

    申请号:US11502416

    申请日:2006-08-11

    IPC分类号: C23F1/00 H01L21/302 C23C16/00

    摘要: Plasma processing of plural substrates is performed in a plasma processing apparatus, which is provided with a plasma processing chamber having an antenna electrode and a lower electrode for placing and retaining the plural substrates in turn within the plasma processing chamber, a gas feeder for feeding processing gas into the processing chamber, a vacuum pump for discharging gas from the processing chamber via a vacuum valve, and a solenoid coil for forming a magnetic field within the processing chamber. At least one of the plural substrates is placed on the lower electrode, and the processing gas is fed into the processing chamber. RF power is fed to the antenna electrode via a matching network to produce a plasma within the processing chamber in which a magnetic field has been formed by the solenoid coil. This placing of at least one substrate and this feeding of the processing gas are then repeated until the plasma processing of all of the plural substrates is completed. An end of seasoning is determined when a parameter including an internal pressure of the processing chamber has become stable to a steady value with plasma processing time.

    摘要翻译: 在具有等离子体处理室的等离子体处理装置中进行多个基板的等离子体处理,该等离子体处理室具有用于在等离子体处理室内依次放置和保持多个基板的天线电极和下部电极,供给处理用气体供给装置 气体进入处理室,用于经由真空阀从处理室排出气体的真空泵和用于在处理室内形成磁场的螺线管线圈。 多个基板中的至少一个被放置在下电极上,并且处理气体被馈送到处理室中。 RF功率经由匹配网络馈送到天线电极,以在处理室内产生等离子体,其中已经由螺线管线圈形成了磁场。 然后重复这种至少一个基板的放置和该处理气体的进料,直至完成所有多个基板的等离子体处理。 当包括处理室的内部压力的参数在具有等离子体处理时间的稳定值变得稳定时,确定调味品的结束。

    Vacuum processing apparatus and vacuum processing method
    70.
    发明申请
    Vacuum processing apparatus and vacuum processing method 审中-公开
    真空加工设备和真空加工方法

    公开(公告)号:US20070023683A1

    公开(公告)日:2007-02-01

    申请号:US11518894

    申请日:2006-09-12

    IPC分类号: G01F23/00

    CPC分类号: H01L21/67207 H01L21/67167

    摘要: A vacuum processing apparatus and method includes a sample taken out from a given cassette placed on a cassette support in atmosphere, the sample is carried into a vacuum processing chamber via a chamber enabling switching between atmosphere and vacuum, the sample is subjected to etching processing in the vacuum processing chamber, and at least one inspection process is carried out in the vacuum either before or after etching of the sample in the vacuum processing chamber. The at least one inspection process in the vacuum is a defect inspection.

    摘要翻译: 真空处理装置和方法包括从大气中放置在盒支架上的给定盒取出的样品,通过能够在大气和真空之间切换的室将样品运送到真空处理室中,对样品进行蚀刻处理 在真空处理室中对样品进行蚀刻之前或之后,在真空中进行至少一次检查处理。 真空中的至少一个检查过程是缺陷检查。