公开(公告)号：US20090269387A1

公开(公告)日：2009-10-29

申请号：US12432833

申请日：2009-04-30

Applicant: Yuval Zubery ,  Arie Goldlust ,  Thomas Bayer ,  Eran Nir

Inventor： Yuval Zubery ,  Arie Goldlust ,  Thomas Bayer ,  Eran Nir

IPC: A61F2/00 ,  A61K35/00 ,  A61K35/32 ,  A61K35/30 ,  A61P19/00

CPC classification number: A61L27/56 ,  A61L27/48 ,  C08L89/06

Abstract: Collagen based matrices cross-linked by a reducing sugar(s) are used for preparing composite matrices, implants and scaffolds. The composite matrices may have at least two layers including reducing sugar cross-linked collagen matrices of different densities. The composite matrices may be used in bone regeneration and/or augmentation applications. Scaffolds including glycated and/or reducing sugar cross-linked collagen exhibit improved support for cell proliferation and/or growth and/or differentiation. The denser collagen matrix of the composite matrices may have a dual effect initially functioning as a cell barrier and later functioning as an ossification supporting layer. The composite matrices, implants and scaffolds may be prepared using different collagen types and collagen mixtures and by cross-linking the collagen(s) using a reducing sugar or a mixture of reducing sugars. The composite matrices, implants and scaffolds may include additives and/or living cells.

公开(公告)号：US20090023949A1

公开(公告)日：2009-01-22

申请号：US12218197

申请日：2008-07-10

Applicant: Thomas Bayer ,  Ben-Zion Dolitzky ,  Revital Lifshitz-Liron ,  Inna Perutski ,  Michael Pinchasov

Inventor： Thomas Bayer ,  Ben-Zion Dolitzky ,  Revital Lifshitz-Liron ,  Inna Perutski ,  Michael Pinchasov

IPC: C07F9/38

CPC classification number: C07F9/3873

Abstract: Amorphous ibandronic acid is provided with methods for its preparation. The methods include dissolution of ibandronic acid in a solvent such as acetonitrile, DMSO, methanol, or water, and spray drying.

Abstract translation: 非晶伊班膦酸具有其制备方法。 所述方法包括将伊班膦酸溶解在溶剂如乙腈，DMSO，甲醇或水中，并喷雾干燥。

公开(公告)号：US20070053987A1

公开(公告)日：2007-03-08

申请号：US11513345

申请日：2006-08-31

Applicant: Thomas Bayer ,  Arie Goldlust

Inventor： Thomas Bayer ,  Arie Goldlust

IPC: A61K48/00 ,  A61K38/22 ,  A61K38/18 ,  A61K38/14 ,  C07H5/06 ,  C08B37/00 ,  A61K9/14

CPC classification number: A61K38/39 ,  A61K9/146 ,  A61K47/61 ,  A61L27/20 ,  C07H5/06 ,  C08B37/003 ,  C08B37/0063 ,  C08B37/0072 ,  C08B37/0075 ,  C08B37/0081 ,  C08H1/00 ,  C08H1/06

Abstract: Methods for preparing cross-linked polysaccharide matrices by cross-linking one or more amino group containing polysaccharides or amino-functionalized polysaccharides with reducing sugars and/or reducing sugar derivatives. The resulting matrices may include polysaccharide matrices and composite cross-linked matrices including polysaccharides cross-linked with proteins and/or polypeptides. Additives and/or cells may also be included in or embedded within the matrices. Various different solvent systems and reducing sugar cross-linkers for performing the cross-linking are described. The resulting matrices exhibit various different physical, chemical and biological properties.

Abstract translation: 通过用还原糖和/或还原糖衍生物交联一个或多个含氨基的多糖或氨基官能化多糖来制备交联多糖基质的方法。 所得到的基质可以包括多糖基质和包含与蛋白质和/或多肽交联的多糖的复合交联基质。 添加剂和/或细胞也可以包括在基质中或嵌入在基质中。 描述了用于进行交联的各种不同的溶剂体系和还原糖交联剂。 所得到的基质表现出各种不同的物理，化学和生物学特性。

公开(公告)号：US20060035745A1

公开(公告)日：2006-02-16

申请号：US10519667

申请日：2003-05-15

Applicant: Manfred Wittenstein ,  Thomas Bayer

Inventor： Manfred Wittenstein ,  Thomas Bayer

IPC: F16H57/08

CPC classification number: F16H57/033 ,  F16H1/46 ,  F16H57/08 ,  F16H2057/0335

Abstract: A system which is used to produce gearboxes and consists of various components (M, AM, A1, A2, A3, Han, Hab, AE). A SP kinematics or TP kinematics gearbox can be produced by mounting a different assembly of the component (Han) and the components (Hab) and (A2).

Abstract translation: 一种用于制造齿轮箱并由各种组件（M，A M 1，A 1，A 2，A 2）组成的系统， H 3，H B，H A，A B）。 SP运动学或TP运动学齿轮箱可以通过安装组件（H SUB）和组件（H SUB）和（A 2）的不同组件来生产 ）。

公开(公告)号：US06942785B2

公开(公告)日：2005-09-13

申请号：US10639427

申请日：2003-08-13

Applicant: Thomas Bayer ,  Klaus-Dieter Fiebelkorn ,  Axel Gerlt ,  Joerg Hassel ,  Richard Mateman ,  Arno Steckenborn ,  Jeroen Wissink

Inventor： Thomas Bayer ,  Klaus-Dieter Fiebelkorn ,  Axel Gerlt ,  Joerg Hassel ,  Richard Mateman ,  Arno Steckenborn ,  Jeroen Wissink

IPC: B01F13/00 ,  B01F13/10 ,  B01J19/00 ,  B01L9/00 ,  G01N35/00 ,  G05B19/05 ,  B01D17/12

CPC classification number: B01L9/527 ,  B01F13/0059 ,  B01F13/1013 ,  B01F13/1016 ,  B01F15/00935 ,  B01J19/0093 ,  B01J2219/0081 ,  B01L2200/027 ,  G01N2035/00326 ,  G05B19/05 ,  G05B2219/15074 ,  G05B2219/25012 ,  Y10T137/5196 ,  Y10T137/5283 ,  Y10T137/8225

Abstract: A system for automated treatment of fluids having interchangeable process modules (39, 40, 41, 42, 43), which are arranged next to each other, and which are respectively provided with a control unit and a fluid unit. The fluid unit is controlled by the control unit in order to carry out a module-specific process function during the treatment of the fluids. The control units are interconnected via a data bus (48), which is common to the process modules (39, 40, 41, 42, 43), and the fluid units are interconnected by a fluid bus (49) that has several channels. A fluid bus section is provided for at least one part of the channels inside each process module (e.g., 42). This section has fluid bus interfaces (52) at the ends thereof. A connection unit (51) is configured to be mounted between the respectively adjacent fluid bus interfaces (52) of two successive process modules (e.g., 41, 42) in at least two different mounting positions. The connection unit (51) connects channel sections that terminate at the adjacent fluid bus interfaces (52) of both process modules (41, 42) in a series of different configurations.

Abstract translation: 一种用于自动处理流体的系统，具有彼此相邻布置的可互换的处理模块（39,40,41,42,43），并且分别设置有控制单元和流体单元。 流体单元由控制单元控制，以便在流体处理期间执行模块特定的过程功能。 所述控制单元经由数据总线（48）互连，所述数据总线对于所述过程模块（39,40,41,42,43）是共同的，并且所述流体单元通过具有多个通道的流体总线（49）互连。 为每个处理模块（例如42）内的通道的至少一部分提供流体总线部分。 本节在其末端具有流体总线接口（52）。 连接单元（51）构造成安装在两个连续的过程模块（例如，41,42）的相邻的流体总线接口（52）之间的至少两个不同的安装位置。 连接单元（51）以一系列不同的配置连接在两个处理模块（41,42）的相邻的流体总线接口（52）处终止的通道部分。

公开(公告)号：US6091124A

公开(公告)日：2000-07-18

申请号：US876167

申请日：1997-06-13

Applicant: Thomas Bayer ,  Johann Greschner ,  Helga Weiss

Inventor： Thomas Bayer ,  Johann Greschner ,  Helga Weiss

IPC: G01B7/30 ,  G01L1/14 ,  G01N37/00 ,  G01Q60/16 ,  G01Q60/38 ,  G01Q70/10 ,  G01Q70/14 ,  G01H23/00

CPC classification number: G01Q60/16 ,  B82Y35/00 ,  G01Q60/38 ,  G01Q70/10 ,  G01Q70/14 ,  Y10S977/878

Abstract: The invention pertains to a micromechanical sensor for AFM/STM profilometry which consists of a beam with a point for interaction with a test surface to be sampled on one end and a fixing block on the other end. The point consists of a basically conical shank with a countersunk point at the end of the shank. The micromechanical sensor has excellent mechanical rigidity and is particularly suited to the measurement of extremely deep and narrow structures with positive side flank angles.

Abstract translation: 本发明涉及用于AFM / STM轮廓测量的微机械传感器，其由具有与待测样品在一端被取样的测试表面相互作用的点和另一端的固定块组成的光束组成。 该点包括在柄端部具有埋头点的基本上圆锥形的柄。 微机械传感器具有优异的机械刚度，特别适用于具有正侧面角的极深和窄结构的测量。

公开(公告)号：US5716156A

公开(公告)日：1998-02-10

申请号：US765516

申请日：1996-12-30

Applicant: Thomas Bayer ,  Werner Hofmann

Inventor： Thomas Bayer ,  Werner Hofmann

IPC: F16D1/06 ,  F16D1/072 ,  F16B11/00

CPC classification number: F16D1/072 ,  Y10T403/4949 ,  Y10T403/4966 ,  Y10T403/7035

Abstract: In a shaft fixture in which a toothed and especially knurled region (B) of a shaft (2) is pressed into a drilling (3) in a seat (4) to form a positive fit with great centric precision via two separate centering sections (A, C), the solidity of the fixture is to be increased in that the shaft has a toothed region (D) outside the section to be introduced into a securing drilling. This toothed region may in particular be a pinion (1) which is pressed via a shaped shaft (2) with a hurled region (B) into a seat drilling (3) to provide a positive fit. To this end the end sections of the gaps between the teeth in the pinion region (D) can terminate in the adjacent shaft region (C) so that the diameter of the shaft may be made larger in relation to that of the pinion than if the sections did not so terminate.

Abstract translation: PCT No.PCT / DE96 / 00440 Sec。 371日期1996年12月30日第 102（e）日期1996年12月30日PCT 1996年3月8日PCT公布。 出版物WO96 / 35885 日期1996年11月14日在轴固定装置中，其中将轴（2）的带齿且特别滚花的区域（B）压入座（4）中的钻孔（3）中以形成具有高精度中心精度的正配合 两个单独的定心部分（A，C），要增加固定装置的坚固性，因为轴具有在引导到固定钻孔中的部分之外的齿形区域（D）。 这个齿形区域可以特别地是经由具有倾倒区域（B）的成形轴（2）压入座椅钻孔（3）中以提供正配合的小齿轮（1）。 为此，小齿轮区域（D）中的齿之间的间隙的端部部分可以在相邻的轴区域（C）中终止，使得轴的直径可以相对于小齿轮的直径大于如果 部分没有这样终止。

公开(公告)号：US5282924A

公开(公告)日：1994-02-01

申请号：US034639

申请日：1993-03-22

Applicant: Thomas Bayer ,  Johann Greschner

Inventor： Thomas Bayer ,  Johann Greschner

IPC: G01Q70/10 ,  B44C1/22 ,  B81C1/00 ,  C03C15/00 ,  C23F4/00 ,  G01B7/34 ,  G01B21/30 ,  G01Q60/04 ,  G01Q60/08 ,  G01Q60/16 ,  G01Q60/38 ,  G01Q70/16 ,  H01J9/14 ,  H01J37/00 ,  H01J37/28 ,  H01L21/306 ,  C03C25/06

CPC classification number: G01Q60/38 ,  B82Y35/00 ,  G01Q60/04 ,  G01Q60/08 ,  G01Q60/16 ,  Y10S977/878

Abstract: A method for producing micromechanical sensors for the AFM/STM/MFM profilometry is described in which a multiple step mask of cantilever beam and tip is transferred step by step into the wafer substrate by reactive ion etching. A particular highly anisotropic etching step is used for etching and shaping of the tip. This process step uses an Ar/C12 ambient at a pressure of about 100 .sup.6 bar and a self bias voltage of about 300 V DC. The ratio of pressure to self bias voltage determines the concave shape of the tip side-walls. This etching step is followed by a thermal oxidation step. The oxidation is carried out for a time until the oxidation fronts at the thinnest point of the tip shaft touch each other. A stripping process with buffered hydrofluoric acid gently removes the thermally grown oxide. The oxidation process allows--via oxidation time--a modification of tip height and angle in an extremely controllable manner. To prevent sticking of the tip to the structure to be profiled the ratio of tip diameter to tip height should be about 1:10. Should this ratio be exceeded the tip has to be arranged on a pedestal. The structure, comprising a cantilever beam and a tip on pedestal, can be produced with the same but slightly modified process of the invention.

Abstract translation: 描述了用于AFM / STM / MFM轮廓测量法的微机械传感器的制造方法，其中悬臂梁和尖端的多步骤掩模通过反应离子蚀刻逐步转移到晶片衬底中。 特别是高度各向异性的蚀刻步骤用于尖端的蚀刻和成型。 该工艺步骤在约100 6bar的压力和约300V DC的自偏压下使用Ar / C12环境。 压力与自偏压的比率决定了顶端侧壁的凹形。 该蚀刻步骤之后是热氧化步骤。 氧化进行一段时间，直到尖端轴的最薄点处的氧化前沿相互接触。 用缓冲氢氟酸的汽提过程轻轻地除去热生长的氧化物。 氧化过程允许通过氧化时间 - 以极其可控的方式改变尖端高度和角度。 为了防止尖端粘附到待成型的结构上，尖端直径与尖端高度的比率应为约1:10。 如果超过该比率，则必须将尖端布置在基座上。 包括悬臂梁和基座上的尖端的结构可以用本发明的相同但略微改进的方法制造。

公开(公告)号：US5242541A

公开(公告)日：1993-09-07

申请号：US568451

申请日：1990-08-16

Applicant: Thomas Bayer ,  Johann Greschner ,  Yves Martin ,  Helga Weiss ,  Hemantha K. Wickramasinghe ,  Olaf Wolter

Inventor： Thomas Bayer ,  Johann Greschner ,  Yves Martin ,  Helga Weiss ,  Hemantha K. Wickramasinghe ,  Olaf Wolter

IPC: G01B7/34 ,  G01B21/30 ,  G01N27/00 ,  G01Q10/04 ,  G01Q60/04 ,  G01Q60/16 ,  G01Q60/38 ,  G01Q70/10 ,  H01J37/28 ,  H01L21/00 ,  H01L21/66

CPC classification number: G01Q60/38 ,  B82Y35/00 ,  G01Q60/04 ,  G01Q60/16 ,  G01Q70/10 ,  Y10S977/878

Abstract: A method is described for producing ultrafine silicon tips for the AFM/STM profilometry comprising:1. providing a silicon substrate and applying a silicon dioxide layer thereto;2. producing a mask in said silicon dioxide layer by photolithography and wet or dry etching;3. producing a tip shaft by transferring the mask pattern, produced in step 2, by reactive ion etching into the silicon substrate;4. thinning the shaft and forming a base by isotropic wet etching; and5. removing the mask by etching.The resulting tip shaft with a rectangular end may be pointed by argon ion milling.In a second embodiment there is an anisotropic wet etching step, prior to step 5, through the intact silicon dioxide mask, producing a negative profile of the shaft immediately below the mask. After this etching step the mask is removed by etching.

Abstract translation: 描述了一种用于生产用于AFM / STM轮廓测量法的超细硅尖端的方法，包括：1.提供硅衬底并向其施加二氧化硅层; 2.通过光刻和湿法或干蚀刻在所述二氧化硅层中产生掩模; 3.通过将在步骤2中产生的掩模图案通过反应离子蚀刻转移到硅衬底中来生产尖端轴; 4.通过各向同性湿法蚀刻使轴变薄并形成基座; 和5.通过蚀刻去除掩模。 所产生的具有矩形端部的尖端轴可以通过氩离子铣削来尖。 在第二实施例中，在步骤5之前，通过完整的二氧化硅掩模存在各向异性湿法蚀刻步骤，从而产生正好在掩模下面的轴的负轮廓。 在该蚀刻步骤之后，通过蚀刻除去掩模。

公开(公告)号：US5162133A

公开(公告)日：1992-11-10

申请号：US631138

申请日：1990-12-20

Applicant: Johann W. Bartha ,  Thomas Bayer ,  Johann Greschner ,  Georg Kraus ,  Olaf Wolter

Inventor： Johann W. Bartha ,  Thomas Bayer ,  Johann Greschner ,  Georg Kraus ,  Olaf Wolter

IPC: C01B31/36 ,  C23C16/32 ,  C23C16/50 ,  C23C16/52 ,  G01Q30/12

CPC classification number: C23C16/325

Abstract: The present invention relates to a process for fabricating silicon carbide films and membranes with a predetermined stress via control of the deposition parameters which comprises the following steps:a) introducing a gas mixture of silane (SiH.sub.4)/helium and ethylene at flow rates of about 1000 sccm/min. and about 10 sccm/min. into a reaction chamber;b) reacting the silane and ethylene at a temperature >400.degree. C., and in a total pressure range of about 26.6 to 266 Pa, at an RF power

Abstract translation: 本发明涉及通过控制沉积参数来制造具有预定应力的碳化硅膜和膜的方法，其包括以下步骤：a）以大约流速引入硅烷（SiH4）/氦和乙烯的气体混合物 1000 sccm / min。 和约10sccm / min。 进入反应室; b）在温度> 400℃，总压力范围约26.6至266Pa，在13.56MHz的RF功率<100W下使硅烷和乙烯反应，所述硅烷和乙烯之间的反应开始 并通过辉光放电增强。 在优选的实施方案中，本征薄膜应力是拉伸，硅烷和乙烯在约500℃的温度下，总压力范围超过106.4Pa，在13.56MHz的RF功率为75W下反应 。 拉伸应力膜可以涂覆有金属吸收层，在吸收层中产生期望的掩模图案，并且从湿蚀刻的背面去除基底。 所得的X射线掩模具有光滑的表面，优异的尺寸稳定性和X射线辐射的透明度。