公开(公告)号：US20090029047A1

公开(公告)日：2009-01-29

申请号：US11909160

申请日：2006-03-22

申请人： Naoki Yoshii ,  Koumei Matsuzawa ,  Yasuhiko Kojima

发明人： Naoki Yoshii ,  Koumei Matsuzawa ,  Yasuhiko Kojima

IPC分类号： C23C16/00

CPC分类号： H01L21/28556 ,  C23C16/0281 ,  C23C16/18 ,  H01L21/76838 ,  H01L21/76841

摘要： Disclosed is a film-forming method characterized by comprising a step for forming a primary Cu film on a substrate by using a divalent Cu source material, and another step for forming a secondary Cu film on the primary Cu film by using a monovalent Cu source material.

摘要翻译： 公开了一种成膜方法，其特征在于包括通过使用二价Cu源材料在基板上形成初级Cu膜的步骤，以及通过使用一价Cu源材料在初级Cu膜上形成二次Cu膜的另一步骤 。

公开(公告)号：US20080020934A1

公开(公告)日：2008-01-24

申请号：US11859490

申请日：2007-09-21

申请人： Naoki YOSHII ,  Koumei Matsuzawa ,  Yasuhiko Kojima

发明人： Naoki YOSHII ,  Koumei Matsuzawa ,  Yasuhiko Kojima

IPC分类号： H01L39/24

CPC分类号： H01L21/76846 ,  C23C16/0209 ,  C23C16/0281 ,  C23C16/18 ,  H01L21/28556 ,  H01L21/76838 ,  H01L21/76864

摘要： There is provided a substrate treatment method performed on a substrate before forming a Cu film on a surface of a base material of the substrate. In the substrate treatment method, a substrate on which a Cu film is to be formed is prepared; and a specific treatment is performed on the substrate so that a crystalline orientation of the surface of the base material of the substrate has a small lattice mismatch with the Cu film.

摘要翻译： 在基板的基材的表面上形成Cu膜之前，在基板上进行基板处理方法。 在基板处理方法中，准备要形成Cu膜的基板; 对基板进行特定的处理，使得基板的基材表面的结晶取向与Cu膜的晶格失配小。

公开(公告)号：US20070074739A1

公开(公告)日：2007-04-05

申请号：US11603196

申请日：2006-11-22

申请人： Yasuhiko Kojima ,  Yasuhiro Oshima

发明人： Yasuhiko Kojima ,  Yasuhiro Oshima

IPC分类号： C23G1/02 ,  B08B9/00 ,  C23G1/00 ,  B08B7/00 ,  C23C16/00

CPC分类号： C23C16/4405

摘要： In a state of the inside of a treatment chamber of treatment equipment being evacuated, therein a cleaning gas containing trifluoroacetic acid (TFA) as a cleaning agent is supplied. Metal such as copper used in the formation of an interconnection or an electrode and stuck on an inner wall surface of the treatment chamber, when coming into contact with the cleaning agent (TFA) in the cleaning gas, without forming an oxide or a metallic salt, is directly complexed. The complex is sublimed due to the evacuation and is exhausted outside the treatment chamber. Accordingly, at less labor and low cost, the cleaning can be efficiently implemented.

摘要翻译： 在处理设备的处理室的内部被抽真空的状态下，提供含有作为清洁剂的三氟乙酸（TFA）的清洁气体。 当形成互连或电极并且在与清洁气体中的清洁剂（TFA）接触时粘附在处理室的内壁表面上的金属，例如铜，而不形成氧化物或金属盐 ，直接复合。 复合体由于排空而升华，并在处理室外排出。 因此，以较少的劳动力和低成本，可以有效地实施清洁。

公开(公告)号：US20060154383A1

公开(公告)日：2006-07-13

申请号：US10526019

申请日：2003-08-15

申请人： Hiroshi Kannan ,  Tadahiro Ishizaka ,  Yasuhiko Kojima ,  Yasuhiro Oshima ,  Takashi Shigeoka

发明人： Hiroshi Kannan ,  Tadahiro Ishizaka ,  Yasuhiko Kojima ,  Yasuhiro Oshima ,  Takashi Shigeoka

IPC分类号： H01L21/00 ,  C23C16/00

CPC分类号： H01L21/28562 ,  C23C16/34 ,  C23C16/45557

摘要： In a processing apparatus, a process gas including a source gas (TiCl4, NH3) and an inert gas (N2) is supplied into a process chamber (2). A pressure meter (6) detects a pressure in the process chamber (2) so as to control an amount of flow of the process gas supplied to the process chamber (2) based on a result of the detection. A source gas is purged by the inert gas. By maintaining the amount of flow of the source gas constant and controlling the amount of flow of the inert gas, an amount of flow the entire process gas is controlled so as to maintain a pressure in the process chamber (2) constant. Since a time spent on evacuation of the source gas is reduced, a time for switching the source gas is reduced. Additionally, a temperature of a surface of a substrate during processing can be maintained constant.

摘要翻译： 在处理装置中，提供包括源气体（TiCl 4，NH 3）和惰性气体（N 2）的工艺气体 进入处理室（2）。 压力计（6）检测处理室（2）中的压力，以便根据检测结果控制供给处理室（2）的处理气体的流量。 源气体被惰性气体吹扫。 通过保持源气体的流量恒定并控制惰性气体的流量，控制整个处理气体的流量，以保持处理室（2）中的压力恒定。 由于减少了用于排出源气体的时间，因此减少了源气体的切换时间。 此外，可以保持处理期间的基板表面的温度恒定。

公开(公告)号：US07052655B2

公开(公告)日：2006-05-30

申请号：US10222779

申请日：2002-08-19

申请人： Tadashi Fukunaka ,  Kenji Yoshimoto ,  Kenji Sakai ,  Yasuhiko Kojima

发明人： Tadashi Fukunaka ,  Kenji Yoshimoto ,  Kenji Sakai ,  Yasuhiko Kojima

IPC分类号： B01J8/04 ,  C07C273/00

CPC分类号： C07C273/04 ,  B01D5/0012 ,  B01J10/002 ,  B01J19/006 ,  B01J2219/00076 ,  B01J2219/00103 ,  B01J2219/00117 ,  B01J2219/00777 ,  B01J2219/185 ,  B01J2219/1943

摘要： Urea is prepared by reacting ammonia and carbon dioxide in an apparatus comprising a vertical condensation and synthesis column and a stripper, to provide a urea synthesis solution comprising urea, unreacted ammonia, unreacted carbon dioxide and water. The urea synthesis solution is transferred from the top of the vertical condensation and synthesis column to the top of a stripper. Carbon dioxide is introduced into the bottom of the stripper and contacted with the urea synthesis solution, thereby separating the unreacted ammonia and the unreacted carbon dioxide from the urea, and providing a mixed gas comprising ammonia, carbon dioxide and water. The mixed gas is transferred into the bottom of the vertical condensation and synthesis column, where it is reacted with liquid ammonia injected into the bottom and a middle of the vertical condensation and synthesis column. The mixed gas and liquid ammonia are condensed and react to form urea. Uncondensed gases are absorbed in an absorbing medium, which is subsequently recycled to the bottom of the vertical condensation and synthesis column.

公开(公告)号：US20060073086A1

公开(公告)日：2006-04-06

申请号：US11240460

申请日：2005-10-03

申请人： Kenji Sakai ,  Yasuhiko Kojima

发明人： Kenji Sakai ,  Yasuhiko Kojima

IPC分类号： B01J8/00

CPC分类号： B01J19/02 ,  B01J19/0013 ,  B01J19/0053 ,  B01J19/2425 ,  B01J2219/00092 ,  B01J2219/00256 ,  B01J2219/0286 ,  F28D7/06 ,  F28F9/0219 ,  F28F9/0229 ,  F28F9/18 ,  F28F19/06 ,  F28F2275/20

摘要： A reactor including a reactor vessel and heat exchange tubes provided in the reactor vessel. The reactor vessel includes a tubesheet and is configured to receive a reaction fluid. The tubesheet has a first plate member configured to contact the reaction fluid and a second plate member configured to not contact the reaction fluid. Heat exchange tubes are provided in the reactor vessel and fixed to the first plate member. The heat exchange tubes are configured to receive a heat exchange medium. At least a portion of the first plate member configured to contact the reaction fluid is made of a metal that has a high corrosion-resistance against the reaction liquid, and the second plate member is made of a metal that has a low corrosion-resistance against the reaction liquid. The second plate member is detachably fixed to a remainder of the reactor vessel.

摘要翻译： 包括反应器容器和设置在反应器容器中的热交换管的反应器。 反应器容器包括管板，并且构造成容纳反应流体。 管板具有构造成接触反应流体的第一板构件和构造成不接触反应流体的第二板构件。 热交换管设置在反应器容器中并固定到第一板构件。 热交换管被构造成接收热交换介质。 构成为接触反应流体的第一板状构件的至少一部分由对反应液具有高耐腐蚀性的金属制成，第二板构件由耐腐蚀性低的金属制成 反应液体。 第二板构件可拆卸地固定到反应器容器的其余部分。

公开(公告)号：US20060027167A1

公开(公告)日：2006-02-09

申请号：US11232943

申请日：2005-09-23

申请人： Tadahiro Ishizaka ,  Naoki Yoshii ,  Kohei Kawamura ,  Yukio Fukuda ,  Takashi Shigeoka ,  Yasuhiko Kojima ,  Yasuhiro Oshima ,  Junichi Arami ,  Atsushi Gomi

发明人： Tadahiro Ishizaka ,  Naoki Yoshii ,  Kohei Kawamura ,  Yukio Fukuda ,  Takashi Shigeoka ,  Yasuhiko Kojima ,  Yasuhiro Oshima ,  Junichi Arami ,  Atsushi Gomi

IPC分类号： C23C16/00

CPC分类号： C23C16/45542 ,  C23C16/34 ,  C23C16/452 ,  C23C16/45561 ,  Y10T137/86558 ,  Y10T137/86566 ,  Y10T137/86638 ,  Y10T137/86726 ,  Y10T137/86743 ,  Y10T137/86751 ,  Y10T137/86871

摘要： A processing apparatus is disclosed which is capable of switching supplies of a raw material gas and a reducing gas alternately, while continuously forming a plasma of the reducing gas. An excitation device (12) excites a reducing gas supplied thereinto, and the excited reducing gas is supplied into a process chamber (2). A switching mechanism (20) is arranged between the excitation device (12) and the process chamber (2), and a bypass line (22) is connected to the switching mechanism (20). The switching mechanism (20) switches the flow of the excited reducing gas from the excitation device (12) between the process chamber (2) and the bypass line (22).

摘要翻译： 公开了能够在连续地形成还原气体的等离子体的同时交替地切换原料气体和还原气体的供给的处理装置。 励磁装置（12）激发供给到其中的还原气体，并将被激发的还原气体供给到处理室（2）。 在励磁装置（12）和处理室（2）之间设置有切换机构（20），旁通管路（22）与切换机构（20）连接。 切换机构（20）切换来自处理室（2）和旁通管线（22）之间的激发装置（12）的被激发的还原气体的流动。

公开(公告)号：US20050241761A1

公开(公告)日：2005-11-03

申请号：US10525797

申请日：2003-08-28

申请人： Hiroshi Kannan ,  Tadahiro Ishizaka ,  Yasuhiko Kojima ,  Yasuhiro Oshima ,  Takashi Shigeoka

发明人： Hiroshi Kannan ,  Tadahiro Ishizaka ,  Yasuhiko Kojima ,  Yasuhiro Oshima ,  Takashi Shigeoka

IPC分类号： C23C16/44 ,  C23C16/52 ,  H01L21/00 ,  H01L21/205 ,  H01L21/66 ,  B08B7/04 ,  C23F1/00

CPC分类号： C23C16/4412 ,  C23C16/4405 ,  C23C16/52 ,  H01L21/67028 ,  H01L21/67253 ,  H01L22/26

摘要： A substrate processing unit comprises a processing vessel for receiving a substrate, a cleaning gas supply system for supplying cleaning gas to the processing vessel so as to clean the interior of the processing vessel, an exhauster for exhausting the processing vessel, an operating state detector for detecting the operating state of the exhauster, and an end point detector for detecting the end point of the cleaning on the basis of the detection result from the operating state detector.

摘要翻译： 基板处理单元包括用于接收基板的处理容器，用于向处理容器提供清洁气体以清洁处理容器内部的清洁气体供应系统，用于排出处理容器的排气器，用于排出处理容器的操作状态检测器 检测排气器的运行状态，以及终点检测器，用于根据来自运行状态检测器的检测结果来检测清洗的终点。

公开(公告)号：US06824947B2

公开(公告)日：2004-11-30

申请号：US10370385

申请日：2003-02-19

申请人： Yasuhiro Ishizuka ,  Yasuhiko Kojima

发明人： Yasuhiro Ishizuka ,  Yasuhiko Kojima

IPC分类号： G03F7021

CPC分类号： C08L61/14 ,  C08L61/34 ,  G03F7/0212 ,  G03F7/0217 ,  G03F7/0233 ,  G03F7/032 ,  G03F7/0382 ,  G03F7/0392

摘要： Photosensitive compositions comprising a phenol resin having a urea bond in the main chain, planographic printing plate precursors containing the photosensitive compositions, and methods for preparing planographic printing plates using the planographic printing plate precursors are disclosed. Planographic printing plates that exhibit good durability, good exposure visual image property, and good solvent resistance; particularly superior resistance to washing oil used in UV ink printing; and superior baking property are produced.

摘要翻译： 公开了包含在主链中具有尿素键的酚醛树脂的光敏组合物，含有感光性组合物的平版印刷版原版和使用平版印刷版原版制备平版印刷版的方法。 显示良好的耐久性，良好的曝光视觉图像性能和良好的耐溶剂性的平版印刷版; 特别优异的抗紫外线油墨印刷中使用的洗涤油; 并且产生优良的烘烤性能。

公开(公告)号：US06503685B1

公开(公告)日：2003-01-07

申请号：US09711082

申请日：2000-11-14

申请人： Shinji Shimizu ,  Yasuyuki Watanabe ,  Yasuhiko Kojima ,  Koji Oe ,  Nansei Tasiro

发明人： Shinji Shimizu ,  Yasuyuki Watanabe ,  Yasuhiko Kojima ,  Koji Oe ,  Nansei Tasiro

IPC分类号： G03C173

CPC分类号： G03F7/202 ,  B41C1/1025 ,  B41C2210/02 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/262 ,  B41M5/26 ,  B41M5/368 ,  C08J3/07 ,  C08J3/12

摘要： A heat-sensitive composition is disclosed which includes a substance which absorbs light and generates heat, an anionic self water-dispersible resin particle having an acid value of 10 to 300 and an average particle diameter of 0.005 to 15 &mgr;m, and a fluorine base surfactant. An original plate for a lithographic printing plate is disclosed which includes an ordinary negative- or positive-type PS plate having coated thereon the heat-sensitive composition. The original plate is image-wise exposed with high energy density light based on digital image information from a computer, subjected to first development with an aqueous alkali solution, flood exposure with active light, a second development with a developer for a negative or a positive, and post-treatment to obtain a printing plate.

摘要翻译： 公开了一种热敏性组合物，其包含吸收光并产生热的物质，酸值为10〜300，平均粒径为0.005〜15μm的阴离子型自分散水性树脂粒子，氟基表面活性剂 。 公开了一种用于平版印刷版的原版，其包括在其上涂覆有热敏组合物的普通负型或正型PS板。 基于来自计算机的数字图像信息，用碱性水溶液进行第一次显影，用活性光进行暴露曝光，用显影剂进行负面或阳性的第二次显影，将原始平板以高能量密度的光图像曝光 ，并进行后处理以获得印版。