公开(公告)号：US20120170403A1

公开(公告)日：2012-07-05

申请号：US13341209

申请日：2011-12-30

Applicant: Alfred LI ,  Chris C. LEE ,  Cesar CHAN ,  Ronald E. SCHENCK ,  Waixin David SONG ,  Curtis B. LORING ,  James R. WITTBOLD ,  William J. RAGO ,  Christopher Robert NELSON

Inventor： Alfred LI ,  Chris C. LEE ,  Cesar CHAN ,  Ronald E. SCHENCK ,  Waixin David SONG ,  Curtis B. LORING ,  James R. WITTBOLD ,  William J. RAGO ,  Christopher Robert NELSON

IPC: B01F15/02 ,  E03B1/00

CPC classification number: B28B19/0092 ,  B05C5/0225 ,  B05C5/0245 ,  B05C5/0254 ,  B05C5/0262 ,  Y10T137/0318 ,  Y10T137/87571

Abstract: A slurry distribution system can include a feed conduit and a distribution conduit in fluid communication therewith. The feed conduit can include a first feed inlet and a second feed inlet disposed in spaced relationship thereto. The distribution conduit can extend generally along a longitudinal axis and include an entry portion and a distribution outlet in fluid communication therewith. The entry portion is in fluid communication with the first and second feed inlets of the feed conduit. The distribution outlet extends a predetermined distance along a transverse axis, which is substantially perpendicular to the longitudinal axis. The slurry distribution system can be placed in fluid communication with a gypsum slurry mixer adapted to agitate water and calcined gypsum to form an aqueous calcined gypsum slurry.

Abstract translation: 浆料分配系统可以包括进料管道和与其流体连通的分配管道。 进料导管可以包括以间隔开的关系设置的第一进料入口和第二进料入口。 分配管道可以大致沿着纵向轴线延伸并且包括与其流体连通的进入部分和分配出口。 入口部分与进料管道的第一和第二进料口流体连通。 分配出口沿着基本上垂直于纵向轴线的横向轴线延伸预定距离。 浆料分配系统可以与适于搅拌水和煅烧石膏的石膏浆料混合器流体连通，以形成水性煅烧石膏浆料。

公开(公告)号：US08197900B2

公开(公告)日：2012-06-12

申请号：US12414308

申请日：2009-03-30

Applicant: Yasuo Shinohara ,  Koichiro Watanabe

Inventor： Yasuo Shinohara ,  Koichiro Watanabe

IPC: B05D3/12 ,  C23C16/52 ,  B05C11/02 ,  B05C11/00

CPC classification number: B05C11/025 ,  B05B12/004 ,  B05C5/0245

Abstract: There is provided a coating method for forming a coat having a less unevenness in its thickness on a sheet-like substrate. In the method in which a coating liquid is continuously supplied from a supply head to a surface of a continuously traveling sheet-like substrate to form a coat while controlling its thickness by a coating bar disposed above the sheet-like substrate, the coating liquid of which amount corresponds to an amount required for forming a predetermined coat thickness is continuously and constantly supplied to the surface of the sheet-like substrate, and the coating bar is moved up and down on the basis of increase and decrease in an amount of a holdup of the coating liquid which is formed just near the coating bar, so that the coat is formed.

Abstract translation: 提供一种在片状基材上形成厚度不均匀性较差的涂层的涂布方法。 在将涂布液从供给头连续供给到连续行进的片状基材的表面以形成涂层同时通过设置在片状基材上方的涂布条来控制涂层的方法中，涂布液 将与形成规定的涂布厚度所需的量对应的量连续恒定地供给到片状基材的表面，并且涂布条基于保持量的增加和减少而上下移动 形成在涂布棒附近的涂布液，从而形成涂层。

公开(公告)号：US07030039B2

公开(公告)日：2006-04-18

申请号：US09895787

申请日：2001-06-30

Applicant: Emir Gurer ,  Tom Zhong ,  John Lewellen ,  Edward C. Lee ,  Robert P. Mandal ,  James C. Grambow ,  Ted C. Bettes ,  Donald R. Sauer ,  Edmond R. Ward ,  Jung-Hoon Chun ,  Sangjun Han

Inventor： Emir Gurer ,  Tom Zhong ,  John Lewellen ,  Edward C. Lee ,  Robert P. Mandal ,  James C. Grambow ,  Ted C. Bettes ,  Donald R. Sauer ,  Edmond R. Ward ,  Jung-Hoon Chun ,  Sangjun Han

IPC: H01L21/312

CPC classification number: H01L21/6715 ,  B05C5/0208 ,  B05C5/0245 ,  B05C5/0254 ,  B05D1/005 ,  B05D1/265 ,  B05D3/0486 ,  G03F7/162

Abstract: A method of and an apparatus for coating a substrate with a polymer solution to produce a film of uniform thickness, includes mounting the substrate inside an enclosed housing and passing a control gas, which may be a solvent vapor-bearing gas into the housing through an inlet. The polymer solution is deposited onto the surface of the substrate in the housing and the substrate is then spun. The control gas and any solvent vapor and particulate contaminants suspended in the control gas are exhausted from the housing through an outlet and the solvent vapor concentration is controlled by controlling the temperature of the housing and the solvent from which the solvent vapor-bearing gas is produced. Instead the concentration can be controlled by mixing gases having different solvent concentrations. The humidity of the gas may also be controlled.

公开(公告)号：US07018943B2

公开(公告)日：2006-03-28

申请号：US09895786

申请日：2001-06-30

Applicant: Gurer Emir ,  Tom Zhong ,  John Lewellen ,  Edward C. Lee ,  Robert P. Mandal ,  James C. Grambow ,  Ted C. Bettes ,  Donald R. Sauer ,  Edmond R. Ward

Inventor： Gurer Emir ,  Tom Zhong ,  John Lewellen ,  Edward C. Lee ,  Robert P. Mandal ,  James C. Grambow ,  Ted C. Bettes ,  Donald R. Sauer ,  Edmond R. Ward

IPC: H01L21/31

CPC classification number: H01L21/6715 ,  B05C5/0208 ,  B05C5/0245 ,  B05C5/0254 ,  B05D1/005 ,  B05D1/265 ,  B05D3/0486 ,  G03F7/162

Abstract: A method of and an apparatus for coating a substrate with a polymer solution to produce a film of uniform thickness, includes mounting the substrate inside an enclosed housing and passing a control gas, which may be a solvent vapor-bearing gas into the housing through an inlet. The polymer solution is deposited onto the surface of the substrate in the housing and the substrate is then spun. The control gas and any solvent vapor and particulate contaminants suspended in the control gas are exhausted from the housing through an outlet and the solvent vapor concentration is controlled by controlling the temperature of the housing and the solvent from which the solvent vapor-bearing gas is produced. Instead the concentration can be controlled by mixing gases having different solvent concentrations. The humidity of the gas may also be controlled.

公开(公告)号：US20060049065A1

公开(公告)日：2006-03-09

申请号：US10505530

申请日：2003-02-19

Applicant: Pierre Chevalier ,  Simone Chevalier ,  Gilbert Veniard ,  Patrick Chevalier

Inventor： Pierre Chevalier ,  Simone Chevalier ,  Gilbert Veniard ,  Patrick Chevalier

IPC: B05D5/10 ,  B32B38/10 ,  B31B1/62 ,  B32B37/00 ,  B05D3/12

CPC classification number: B31B50/00 ,  B05C5/004 ,  B05C5/0245 ,  B31B50/622 ,  Y10T156/1007 ,  Y10T156/1052 ,  Y10T156/12 ,  Y10T156/1374 ,  Y10T156/1722 ,  Y10T156/1724 ,  Y10T156/1727

Abstract: The invention relates to a method of producing a product comprising a support having a long-acting adhesive and a protective tape disposed thereon, so that said adhesive can be used at a later time. The inventive method is characterised in that it consists in: determining a reference plane (P) which is close to the location of the adhesive deposit and which is either below the plane containing the lower face of the support or above the plane containing the upper face of said support; establishing the distance (D) separating the reference plane (P) and the level (N) at which the adhesive (2) is delivered, which is close to the plane containing the application face of the support; delivering the long-acting adhesive (2); delivering a protective tape (20) which is disposed on top of the adhesive (2) either simultaneously using a prefabricated transfer tape or separately; moving the support in relation to the deposit station; exerting a transverse force on the support such that one of the faces thereof is applied continuously against the reference plane (P); and exerting a pressure, counter to the transverse force, on the protective tape (20) and the adhesive (2).

Abstract translation: 本发明涉及一种制造产品的方法，其包括具有长效粘合剂和设置在其上的保护带的支撑体，使得所述粘合剂可以在以后使用。 本发明的方法的特征在于：确定参考平面（P），该参考平面（P）接近粘合剂沉积物的位置，并且其在包含支撑体的下表面的平面的下方或包含上表面的平面之上 的支持; 建立分离参考平面（P）和粘合剂（2）被输送的水平（N）的距离（D），其接近包含支撑体的施用面的平面; 输送长效胶（2）; 输送保护胶带（20），其同时使用预制转印带或分开设置在粘合剂（2）的顶部; 移动与存款站有关的支持; 在支撑件上施加横向力使其一个表面连续地施加在参考平面（P）上; 并在保护带（20）和粘合剂（2）上施加与横向力相反的压力。

公开(公告)号：US20050011440A1

公开(公告)日：2005-01-20

申请号：US10621493

申请日：2003-07-17

Applicant: Richard Moss ,  Donald School

Inventor： Richard Moss ,  Donald School

IPC: B05C5/02 ,  B05C3/02 ,  B05C3/12

CPC classification number: B05C5/0245

Abstract: An adhesive applicator for a core-making machine is provided with an applicator plate for applying adhesive to a web. The applicator plate has upstream and downstream faces and a bottom surface which extends from the upstream face beyond the downstream face. The bottom surface is adapted to spread adhesive on a moving web below the bottom surface. The bottom surface forms a narrow wedge-shaped portion with an upper surface which extends away from the downstream face.

Abstract translation: 用于制芯机的粘合剂涂布器设置有用于将粘合剂施加到网上的涂布板。 施用板具有上游侧和下游侧面以及从上游侧向下游侧延伸的底面。 底表面适于将粘合剂铺展在底面下方的移动纤维网上。 底表面形成一窄的楔形部分，其上表面远离下游表面延伸。

公开(公告)号：US20040083952A1

公开(公告)日：2004-05-06

申请号：US10694333

申请日：2003-10-27

Applicant: Metso Paper, Inc.

Inventor： Leo Kurkinen ,  Vilho Nissinen ,  Mika Vahakuopus ,  Risto Vaatanen

IPC: B05C001/00

CPC classification number: B05B13/0207 ,  B05C5/0245 ,  B05C9/04

Abstract: A coating station, which in intended for coating a web with a coating material, includes a load-bearing and cross-directional frame extending substantially across the entire width of the web. The coating station also includes applicator elements supported to the frame. The frame is arranged by at least one cross component formed out of sheet metal into a box-type structure, the cross component extending substantially across the entire width of the web. The cross component is attached to the end components by its end parts.

Abstract translation: 用于涂覆带有涂料的卷材的涂布站包括基本上跨过幅材的整个宽度延伸的承载和横向框架。 涂布站还包括支撑在框架上的涂抹器元件。 框架通过由金属板形成的至少一个交叉部件布置成盒型结构，该横向部件基本上延伸穿过幅材的整个宽度。 交叉部件通过其端部部件附接到端部部件。

公开(公告)号：US20030118741A1

公开(公告)日：2003-06-26

申请号：US10364545

申请日：2003-02-11

Inventor： Gregory M. Gibson ,  Carl W. Newquist ,  John E. Hawes ,  Rene Soliz ,  Samer Mahmoud Kabbani ,  Scott A. Snodgrass ,  Altaf A. Poonawala ,  Darwin R. Frerking ,  Zi-Qin Wang ,  Ocie T. Snodgrass ,  Eric E. Anderson

IPC: B05D001/02

CPC classification number: B05C13/00 ,  B05C5/0245 ,  B05C5/0254 ,  B05C11/1013 ,  B05C11/1015

Abstract: The invention pertains to a coating apparatus and method in which most of the relative movement between a dispensing head and the substrate to be coated is provided by the coating head. The moving head configuration reduces the system footprint and diminishes leveling problems. A powered shuttle mechanism carries a dispensing head above a substrate to be coated while riding on a bearing located underneath the chuck holding the substrate thereby providing rigidity and reducing the system footprint. Chuck support is designed to accommodate anticipated vertical sag in the dispensing head by supporting the chuck at points along its periphery thereby permitting the chuck to sag in conjunction with the dispensing head. The shuttle mechanism is equipped with means for automatically adjusting the height of the dispensing head with respect to substrate to compensate for substrate placement error, substrate dimensional variation, and mechanical drift in the mechanical machine parts. Coating consistency is enhanced using such height adjustment. A part of the apparatus containing the fluid delivery equipment and in communication with the dispensing head may be placed on a cart and removably attached to the rest of the apparatus. There is a utility station comprising equipment for cleaning and priming the dispensing head which may be located on the removable cart. A pump in addition to main remote pumping means may be integrally mounted on the dispensing head to more precisely control fluid flow to the dispensing head. The chuck may be configured to be micro deformable so as to maintain the surface of a substrate upon it at a constant height. Fluid may be dispensed along openings of selected lengths along the length of the dispensing head using die lips attached to the dispensing head or by cutting a plurality of slots in a single dispensing head.

Abstract translation: 本发明涉及一种涂布装置和方法，其中分配头与要涂覆的基底之间的大部分相对运动由涂覆头提供。 移动头配置减少了系统占用空间并减少了调平问题。 动力穿梭机构在被涂覆的基底上方运送分配头，同时骑在位于夹持基底的卡盘下方的轴承上，从而提供刚性并减少系统占地面积。 卡盘支撑件设计成通过在其周边的点处支撑卡盘来适应分配头部中的预期垂直松弛，从而允许卡盘与分配头一起下垂。 穿梭机构配备有用于自动调节分配头相对于基底的高度以补偿机械机器部件中的基板放置误差，基板尺寸变化和机械漂移的装置。 使用这种高度调节可提高涂层的一致性。 包含流体输送设备并与分配头连通的装置的一部分可以放置在推车上并且可移除地附接到装置的其余部分上。 有一个实用工作站，包括用于清洁和启动分配头的设备，该分配头可以位于可移动的推车上。 除了主远程泵送装置之外的泵可以一体地安装在分配头上，以更精确地控制流到分配头的流体。 卡盘可以被配置为可微变形的，以便将基板的表面保持在恒定的高度。 可以使用附接到分配头的模唇或通过在单个分配头中切割多个狭槽沿着分配头的长度沿着选定长度的开口分配流体。

公开(公告)号：US20030056335A1

公开(公告)日：2003-03-27

申请号：US10270887

申请日：2002-10-14

Inventor： Kazuhiko Kurihara ,  Yoichi Mazawa ,  Yoshiro Morino

IPC: D01G025/00

CPC classification number: D01D5/0985 ,  B05B7/0861 ,  B05C5/0245 ,  D04H3/04 ,  D04H3/05

Abstract: The present invention relates to an apparatus for producing a transversely aligned web having filaments aligned in the transverse direction, comprising conveyor running in one direction, spinning nozzle disposed above the conveyor, an annular primary airflow nozzle, and at least one pair of secondary airflow nozzles disposed on the upstream side and the downstream side of the running direction of the conveyor.

Abstract translation: 本发明涉及一种用于制造横向排列的纤维网的装置，其具有沿横向排列的长丝，包括沿一个方向运行的输送机，设置在输送机上方的纺丝喷嘴，环形主气流喷嘴和至少一对二次气流喷嘴 设置在输送机的行进方向的上游侧和下游侧。

公开(公告)号：US20010001746A1

公开(公告)日：2001-05-24

申请号：US09745611

申请日：2000-12-20

Inventor： Jung-Hoon Chun ,  James Derksen ,  Sangjun Han

IPC: H01L021/312 ,  B05D003/12 ,  G03F007/004

CPC classification number: H01L21/6715 ,  B05C5/0245 ,  B05C11/08 ,  B05D1/002 ,  B05D1/005 ,  B05D1/265 ,  G03F7/16 ,  G03F7/162

Abstract: An improved method and apparatus for coating semiconductor substrates with organic photoresist polymers by extruding a ribbon of photoresist in a spiral pattern which covers the entire top surface of the wafer. The invention provides a more uniform photoresist layer and is much more efficient than are current methods in the use of expensive photoresist solutions. A wafer is mounted on a chuck, aligned horizontally and oriented upward. An extrusion head is positioned adjacent to the outer edge of the wafer and above the top surface of the wafer with an extrusion slot aligned radially with respect to the wafer. The wafer is rotated and the extrusion head moved radially toward the center of the wafer while photoresist is extruded out the extrusion slot. The rotation rate of the wafer and the radial speed of the extrusion head are controlled so that the tangential velocity of the extrusion head with respect to the rotating wafer is a constant.