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    Method for Producing Ulta-Low-Expansion Glass
    62.
    发明申请
    Method for Producing Ulta-Low-Expansion Glass 审中-公开
    生产乌尔低膨胀玻璃的方法

    公开(公告)号：US20120289393A1

    公开(公告)日：2012-11-15

    申请号：US13575290

    申请日：2011-02-24

    Applicant: Junichi Kushibiki ,  Mototaka Arakawa

    Inventor： Junichi Kushibiki ,  Mototaka Arakawa

    IPC: C03B20/00 ,  C03C3/04

    CPC classification number: C03C3/06 ,  C03B19/14 ,  C03B2201/23 ,  C03B2201/42 ,  C03C2201/23 ,  G01N29/07 ,  G01N29/221 ,  G01N2291/0423

    Abstract: A TiO2—SiO2 glass ingot having a desired TiO2 concentration is fabricated, a sample is cut from the TiO2—SiO2 glass ingot, OH concentration C(OH), TiO2 concentration C(TiO2) and fictive temperature TF of the sample are measured, and zero-CTE temperature T(zero-CTE) is calculated from the measured C(OH), C(TiO2) and TF. A judgment is made as to whether the difference ΔT between the zero-CTE temperature T(zero-CTE) and a target value is within a predetermined range. When the difference ΔT is within the predetermined range, it is judged that the TiO2—SiO2 glass ingot has a desired zero-CTE temperature; when the difference ΔT is not within the range, a production condition for the TiO2—SiO2 glass ingot is corrected on the basis of the difference ΔT.

    Abstract translation: 制备具有所需TiO 2浓度的TiO 2 -SiO 2玻璃锭，从TiO 2 -SiO 2玻璃锭切割样品，测量样品的OH浓度C（OH），TiO 2浓度C（TiO 2）和假想温度TF， 零CTE温度T（零CTE）由测量的C（OH），C（TiO2）和TF计算。 判断零CTE温度T（零CTE）与目标值之间的差Dgr T是否在预定范围内。 当差值Dgr; T在预定范围内时，判断为TiO 2 -SiO 2玻璃锭具有所需的零CTE温度; 当差值Dgr; T不在该范围内时，基于差值Dgr; T来校正TiO 2 -SiO 2玻璃锭的生产条件。

    High purity fused silica with low absolute refractive index
    63.
    发明授权
    High purity fused silica with low absolute refractive index 有权
    具有低绝对折射率的高纯度熔融石英

    公开(公告)号：US08263511B2

    公开(公告)日：2012-09-11

    申请号：US12644563

    申请日：2009-12-22

    Applicant: Carlos Duran ,  Richard Michael Fiacco ,  Kenneth Edward Hrdina ,  Daniel Raymond Sempolinski

    Inventor： Carlos Duran ,  Richard Michael Fiacco ,  Kenneth Edward Hrdina ,  Daniel Raymond Sempolinski

    IPC: C03C3/06 ,  C03B25/00

    CPC classification number: C03B25/02 ,  C03B19/1453 ,  C03B2201/03 ,  C03B2201/04 ,  C03C3/06 ,  C03C2201/22 ,  C03C2201/23

    Abstract: A fused silica glass article having a low absolute refractive index and low concentrations of hydroxyl groups, halogens, and metal having a low absolute refractive index. The glass article contains less than about 10 ppm protium-containing and deuterium-containing hydroxyl groups by weight and less than about 20 ppm halogens by weight. The silica glass article also has an absolute refractive index (ARI) less than or equal to 1.560820. In one embodiment, the ARI of the fused silica article is achieved by lowering the fictive temperature of the fused silica. A method of lowering the fictive temperature is also described.

    Abstract translation: 具有低绝对折射率和低浓度羟基，卤素和具有低绝对折射率的金属的熔融石英玻璃制品。 玻璃制品含有重量少于约10ppm含氘羟基和重量小于约20ppm的卤素。 石英玻璃制品的绝对折射率（ARI）也小于或等于1.560820。 在一个实施方案中，熔融二氧化硅制品的ARI通过降低熔融二氧化硅的假想温度来实现。 还描述了降低虚构温度的方法。

    Silica glass with saturated induced absorption and method of making
    65.
    发明授权
    Silica glass with saturated induced absorption and method of making 有权
    二氧化硅玻璃具有饱和诱导吸收和制备方法

    公开(公告)号：US08176752B2

    公开(公告)日：2012-05-15

    申请号：US12507950

    申请日：2009-07-23

    Applicant: Susan Lee Schiefelbein ,  Charlene Marie Smith

    Inventor： Susan Lee Schiefelbein ,  Charlene Marie Smith

    IPC: C03B19/00 ,  C03C3/06

    CPC classification number: C03C3/06 ,  C03B32/00 ,  C03B2201/21 ,  C03C4/0071 ,  C03C4/0085 ,  C03C23/0025 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/54

    Abstract: A silica glass article, such as a lens in a stepper/scanner system, having saturated induced absorption at wavelengths of less than about 250 nm. Saturated induced absorption is achieved by first removing Si—O defects in the silica glass by forming silicon hydride (SiH) at such defects, and loading the silica glass with hydrogen to react with E′ centers formed by photolysis of SiH in the silica glass article. The silicon hydride is formed by loading the silica glass with molecular hydrogen at temperatures of at least 475° C. After formation of SiH, the silica glass is loaded with additional molecular hydrogen at temperatures of less than 475° C.

    Abstract translation: 石英玻璃制品，例如步进/扫描仪系统中的透镜，在小于约250nm的波长处具有饱和诱导吸收。 通过首先通过在这种缺陷处形成硅氢化物（SiH）来除去二氧化硅玻璃中的Si-O缺陷，并将石英玻璃与氢气一起加载到石英玻璃制品中通过SiH光解产生的E'中心反应而实现饱和诱导吸收 。 氢化硅是通过在至少475℃的温度下加载二氧化硅玻璃与分子氢形成的。在形成SiH之后，二氧化硅玻璃在小于475℃的温度下装载另外的分子氢。

    Fused silica having low OH, OD levels and method of making
    66.
    发明授权
    Fused silica having low OH, OD levels and method of making 有权
    熔融二氧化硅具有低OH，OD水平和制备方法

    公开(公告)号：US08062986B2

    公开(公告)日：2011-11-22

    申请号：US11881599

    申请日：2007-07-27

    Applicant: Rostislav Radievich Khrapko ,  Nicolas LeBlond ,  James Edward Tingley

    Inventor： Rostislav Radievich Khrapko ,  Nicolas LeBlond ,  James Edward Tingley

    IPC: C03C3/06 ,  C03B19/06 ,  C03B19/00

    CPC classification number: C03B19/1453 ,  C03B2201/22 ,  C03C3/06 ,  C03C2201/22 ,  C03C2201/23

    Abstract: A fused silica article having a combined concentration of hydroxyl (OH) and deuteroxyl (OD) concentration of less than 10 parts per million (ppm) and, in one embodiment, less than 1 ppm. The fused silica article is formed by drying a soot blank in a halogen-free atmosphere comprising carbon monoxide. The dried soot blank may optionally be doped to reach target levels of OH and OD concentrations and improve homogeneity within the fused silica article. The dried soot blank is then oxidized and, sintered to form the article. A method of reducing the combined concentration of OH and OD to less than 10 ppm is also described.

    Abstract translation: 具有小于10ppm（ppm）的羟基（OH）和氘氧化（OD）浓度的组合浓度的熔融二氧化硅制品，在一个实施方案中小于1ppm。 熔融二氧化硅制品通过在包含一氧化碳的无卤素气氛中干燥烟炱坯料而形成。 干燥的烟炱坯料可以任选地被掺杂以达到OH和OD浓度的目标水平并且改善熔融二氧化硅制品内的均匀性。 然后将干燥的烟灰坯料氧化并烧结以形成制品。 还描述了将OH和OD的组合浓度降低至小于10ppm的方法。

    Process for producing synthetic quartz glass and synthetic quartz glass for optical member
    70.
    发明授权
    Process for producing synthetic quartz glass and synthetic quartz glass for optical member 失效
    用于制造用于光学构件的合成石英玻璃和合成石英玻璃的方法

    公开(公告)号：US07975507B2

    公开(公告)日：2011-07-12

    申请号：US11833397

    申请日：2007-08-03

    Applicant: Keigo Hino

    Inventor： Keigo Hino

    IPC: C03B19/06 ,  C03B8/04

    CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/04 ,  C03B2201/23 ,  C03C2201/23

    Abstract: The invention provides a process for producing a synthetic quartz glass, comprising: (a) depositing fine quartz glass particles synthesized by flame hydrolysis of a glass-forming material, on a substrate, to form a porous quartz glass base; (b) presintering the porous quartz glass base; (c) heat-treating the presintered porous quartz glass base by holding it under vacuum at a temperature in the range of from 1,100° C. to below the vitrification temperature for a certain time period; and (d) heating the thus heat-treated porous quartz glass base to a temperature not lower than the vitrification temperature to obtain a synthetic quartz glass. According to the process for synthetic quartz glass production of the invention, a synthetic quartz glass having a reduced OH group amount and a uniform OH group concentration can be obtained. From the synthetic quartz glass, an optical member having excellent optical properties can be obtained.

    Abstract translation: 本发明提供了一种生产合成石英玻璃的方法，包括：（a）在基材上沉积通过玻璃形成材料的火焰水解合成的精细石英玻璃颗粒，以形成多孔石英玻璃基底; （b）预烧结多孔石英玻璃基底; （c）通过将预烧结的多孔石英玻璃基板在1100℃至低于玻璃化温度的温度下在真空下进行一段时间的热处理; 和（d）将由此热处理的多孔石英玻璃基底加热至不低于玻璃化温度的温度，以获得合成石英玻璃。 根据本发明的合成石英玻璃的制造方法，可以得到OH基量少且OH基浓度均匀的合成石英玻璃。 可以从合成石英玻璃得到光学特性优异的光学部件。

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