公开(公告)号：US08999628B1

公开(公告)日：2015-04-07

申请号：US14299891

申请日：2014-06-09

Applicant: Multibeam Corporation

Inventor： David K. Lam ,  Kevin M. Monahan ,  Theodore A. Prescop ,  Cong Tran

IPC: G03F7/20 ,  H01J37/304 ,  H01J37/317 ,  H01J37/30 ,  G06F17/50

CPC classification number: H01J37/3177 ,  G03F7/2051 ,  G03F7/2059 ,  G06F17/5081 ,  H01J37/30 ,  H01J37/3005 ,  H01J37/304 ,  H01J37/3174 ,  H01J2237/04 ,  H01J2237/049 ,  H01J2237/1501 ,  H01J2237/24592 ,  H01J2237/30416 ,  H01J2237/30472 ,  H01J2237/31761 ,  H01J2237/31774 ,  H01J2237/31798 ,  H01L22/12 ,  H01L22/20

Abstract: The present application discloses methods, systems and devices for using charged particle beam tools to pattern and inspect a substrate. The inventors have discovered that it is highly advantageous to use write and inspection tools that share the same or substantially the same stage and the same or substantially the same designs for respective arrays of multiple charged particle beam columns, and that access the same design layout database to target and pattern or inspect features. By using design-matched charged particle beam tools, correlation of defectivity is preserved between inspection imaging and the design layout database. As a result, image-based defect identification and maskless design correction, of random and systematic errors, can be performed directly in the design layout database, enabling a fast yield ramp.

Abstract translation: 本申请公开了使用带电粒子束工具来图案化和检查衬底的方法，系统和装置。 本发明人已经发现，对于多个带电粒子束列的相应阵列使用共享相同或基本上相同的阶段以及相同或基本上相同的设计是非常有利的，并且访问相同的设计布局数据库 目标和模式或检查功能。 通过使用设计匹配的带电粒子束工具，在检查成像和设计布局数据库之间保留了缺陷度的相关性。 因此，可以在设计布局数据库中直接执行基于图像的缺陷识别和无掩码设计校正（随机和系统错误），从而实现快速生产斜率。

公开(公告)号：US20140333915A1

公开(公告)日：2014-11-13

申请号：US14361145

申请日：2012-11-02

Applicant: ASML Netherlands B.V.

Inventor： Jan Frederik Hoogkamp ,  Bastiaan Stephanus Hendricus Jansen ,  Maurice Willem Jozef Etiënne Wijckmans

IPC: G03F7/20 ,  H01J37/32

CPC classification number: G03F7/70033 ,  G03F7/70141 ,  G03F7/70175 ,  G03F7/7085 ,  H01J37/32339 ,  H01J2237/04 ,  H01J2237/327 ,  H05G2/005 ,  H05G2/008

Abstract: A radiation source (SO) suitable for providing a beam of radiation to an illuminator of a lithographic apparatus. The radiation source comprises a nozzle (128) configured to direct a stream of fuel droplets along a trajectory (140) towards a plasma formation location (212). The radiation source is configured to receive a first amount of radiation (205) such that, in use, the first amount of radiation is incident on a fuel droplet at the plasma formation location. The first amount of radiation transfers energy to the fuel droplet to generate a radiation generating plasma that emits a second amount of radiation (132). The radiation source further comprises an alignment detector having a first sensor arrangement (122) and a second sensor arrangement (134). The first sensor arrangement is configured to measure a property of a third amount of radiation (205a) that is indicative of a focus position of the first amount of radiation. The second sensor arrangement is configured to measure a property of a fourth amount of radiation (138), the fourth amount of radiation being a portion of the first amount of radiation that is reflected by the fuel droplet upon which the first amount of radiation is incident.

Abstract translation: 适合于向光刻设备的照明器提供辐射束的辐射源（SO）。 辐射源包括被配置为沿着轨迹（140）引导燃料液滴流朝向等离子体形成位置（212）的喷嘴（128）。 辐射源被配置为接收第一量的辐射（205），使得在使用中，第一量的辐射入射在等离子体形成位置处的燃料液滴上。 第一量的辐射将能量传递到燃料液滴以产生发射第二量的辐射的辐射产生等离子体（132）。 辐射源还包括具有第一传感器装置（122）和第二传感器装置（134）的对准检测器。 第一传感器装置被配置为测量指示第一辐射量的焦点位置的第三量的辐射（205a）的性质。 第二传感器装置被配置成测量第四量的辐射（138）的性质，第四辐射量是被第一辐射量入射的燃料液滴反射的第一辐射量的一部分 。

公开(公告)号：US20140261173A1

公开(公告)日：2014-09-18

申请号：US14217064

申请日：2014-03-17

Applicant: GLENN LANE FAMILY LIMITED LIABILITY LIMITED PARTNERSHIP

Inventor： GLENN E. LANE

IPC: H01J37/08 ,  H01J37/317

CPC classification number: H01J37/3007 ,  C23C14/48 ,  C23C14/54 ,  H01J37/08 ,  H01J37/09 ,  H01J37/3171 ,  H01J49/062 ,  H01J49/26 ,  H01J2237/0213 ,  H01J2237/04 ,  H01J2237/0455 ,  H01J2237/152 ,  H01J2237/31701 ,  H01L21/265

Abstract: Embodiments of the invention relate to a mass resolving aperture that may be used in an ion implantation system that selectively exclude ions species based on charge to mass ratio (and/or mass to charge ratio) that are not desired for implantation, in an ion beam assembly. Embodiments of the invention relate to a mass resolving aperture that is segmented, adjustable, and/or presents a curved surface to the oncoming ion species that will strike the aperture. Embodiments of the invention also relate to the filtering of a flow of charged particles through a closed plasma channel (“CPC”) superconductor, or boson energy transmission system.

Abstract translation: 本发明的实施例涉及可用于离子注入系统中的质量分辨孔径，该离子注入系统在离子束中基于质量比（和/或质量与电荷比）不理想地选择性地排除离子种类 部件。 本发明的实施例涉及一种质量分辨孔径，该质量分辨孔径被分段，可调节和/或呈现出将撞击孔的迎面而来的离子物质的曲面。 本发明的实施例还涉及通过封闭等离子体通道（“CPC”）超导体或玻色子能量传输系统对带电粒子的流过滤。

公开(公告)号：US20120037802A1

公开(公告)日：2012-02-16

申请号：US12854008

申请日：2010-08-10

Applicant: Eric Kneedler

Inventor： Eric Kneedler

IPC: H01J37/147 ,  H01J37/26

CPC classification number: H01J37/244 ,  H01J37/28 ,  H01J2237/04 ,  H01J2237/04756 ,  H01J2237/0535

Abstract: A charged particle beam system for imaging and processing targets is disclosed, comprising a charged particle column, a secondary particle detector, and a secondary particle detection grid assembly between the target and detector. In one embodiment, the grid assembly comprises a multiplicity of grids, each with a separate bias voltage, wherein the electric field between the target and the grids may be adjusted using the grid voltages to optimize the spatial distribution of secondary particles reaching the detector. Since detector lifetime is determined by the total dose accumulated at the area on the detector receiving the largest dose, detector lifetime can be increased by making the dose into the detector more spatially uniform. A single resistive grid assembly with a radial voltage gradient may replace the separate grids. A multiplicity of deflector electrodes may be located between the target and grid to enhance shaping of the electric field.

Abstract translation: 公开了一种用于成像和处理目标的带电粒子束系统，包括带电粒子柱，二次粒子检测器和靶和检测器之间的二次粒子检测栅组件。 在一个实施例中，电网组件包括多个栅格，每个具有单独的偏置电压，其中可以使用电网电压来调整目标和栅极之间的电场，以优化到达检测器的次级颗粒的空间分布。 由于检测器寿命由在接收最大剂量的检测器上的区域累积的总剂量确定，所以可以通过使检测器的剂量在空间上更均匀地增加检测器寿命。 具有径向电压梯度的单个电阻栅组件可以替代单独的栅极。 多个偏转器电极可以位于靶和栅格之间以增强电场的形状。

公开(公告)号：US20090095894A1

公开(公告)日：2009-04-16

申请号：US11872576

申请日：2007-10-15

Applicant: Bon Woong Koo ,  Frank Sinclair

Inventor： Bon Woong Koo ,  Frank Sinclair

IPC: H05H3/02

CPC classification number: H01J37/026 ,  H01J37/3171 ,  H01J2237/0042 ,  H01J2237/04 ,  H01J2237/05

Abstract: Techniques for commensurate cusp-field for effective ion beam neutralization are disclosed. In one particular exemplary embodiment, the techniques may be realized as a charged particle injection system comprising a beamguide configured to transport an ion beam through a dipole field. The charged particle injection system may also comprise a first array of magnets and a second array of magnets configured to generate a multi-cusp magnetic field, positioned along at least a portion of an ion beam path, the first array of magnets being on a first side of the ion beam path and the second array of magnets being on a second side of the ion beam path. The charged particle injection system may further comprise a charged particle source having one or more apertures configured to inject charged particles into the ion beam path. The charged particle injection system may furthermore align the one or more apertures with at least one of the first array of magnets and the second array of magnets to align the injected charged particles from the charged particle source with one or more magnetic regions for an effective charged particle diffusion into the ion beam path.

Abstract translation: 公开了用于有效离子束中和的相应尖点的技术。 在一个特定的示例性实施例中，技术可以被实现为带电粒子注入系统，其包括配置成将离子束传送通过偶极子场的波导。 带电粒子注入系统还可以包括第一磁体阵列和配置成产生沿离子束路径的至少一部分定位的多尖点磁场的第二磁体阵列，第一磁体阵列位于第一 离子束路径的一侧和第二磁体阵列位于离子束路径的第二侧上。 带电粒子注入系统还可以包括具有一个或多个孔的带电粒子源，其被配置为将带电粒子注入到离子束路径中。 带电粒子注入系统还可以将一个或多个孔与第一磁体阵列和第二磁体阵列中的至少一个对准，以将来自带电粒子源的注入的带电粒子与一个或多个磁性区域对准，用于有效带电 粒子扩散入离子束路径。

公开(公告)号：US6069356A

公开(公告)日：2000-05-30

申请号：US357149

申请日：1999-07-19

Applicant: Hideo Todokoro ,  Makoto Ezumi

Inventor： Hideo Todokoro ,  Makoto Ezumi

IPC: H01J37/244 ,  H01J37/256 ,  H01J37/28 ,  H01J37/285

CPC classification number: H01J37/244 ,  H01J37/145 ,  H01J37/268 ,  H01J37/28 ,  H01J2237/04 ,  H01J2237/04756 ,  H01J2237/2449

Abstract: A scanning microscope is provided for producing a scan image at high spatial resolution and in a low acceleration voltage area. An acceleration tube is located in an electron beam path of an objective lens for applying a post-acceleration voltage of the primary electron beam. The application of an overlapping voltage onto a sample allows a retarding electric field against the primary electron beam to be formed between the acceleration tube and the sample. The secondary electrons generated from the sample and the secondary signals such as reflected electrons are extracted into the acceleration tube through the effect of an electric field (retarding electric field) immediately before the sample. The signals are detected by secondary signal detectors located upwardly than the acceleration tube.

Abstract translation: 提供扫描显微镜用于以高空间分辨率和低加速度电压区域产生扫描图像。 加速管位于用于施加一次电子束的后加速电压的物镜的电子束路径中。 在样品上施加重叠电压允许在加速管和样品之间形成抵抗一次电子束的延迟电场。 从样品产生的二次电子和诸如反射电子的次级信号通过紧邻样品之前的电场（延迟电场）的作用被提取到加速管中。 信号由位于加速管上方的辅助信号检测器检测。