公开(公告)号：US07965380B2

公开(公告)日：2011-06-21

申请号：US11703823

申请日：2007-02-08

申请人： Arno Jan Bleeker ,  Kars Zeger Troost

发明人： Arno Jan Bleeker ,  Kars Zeger Troost

IPC分类号： G03B27/72 ,  G03B27/42 ,  G03B27/54

CPC分类号： G03F7/70516 ,  G03F7/70291 ,  G03F7/70425

摘要： Lithographic apparatus using an array of individually controllable elements in which a fraction of the intensity of the beam of radiation patterned by the array of individually controllable elements is diverted to an image sensor for verifying the quality of the image generated.

摘要翻译： 使用独立可控元件的阵列的平版印刷设备，其中通过单独可控元件的阵列图案化的辐射束的强度的一部分被转移到图像传感器，以验证所生成的图像的质量。

公开(公告)号：US20110007314A1

公开(公告)日：2011-01-13

申请号：US12805852

申请日：2010-08-20

申请人： Arie Jeffrey Maria Den Boef ,  Arno Jan Bleeker ,  Youri Johannes Laurentius Maria Van Dommelen ,  Mircea Dusa ,  Antoine Gaston Marie Kiers ,  Paul Frank Luehrmann ,  Henricus Petrus Maria Pellemans ,  Maurits Van der Schaar ,  Cedric Desire Grouwstra ,  Markus Gerardus Martinus Van Kraaij

发明人： Arie Jeffrey Maria Den Boef ,  Arno Jan Bleeker ,  Youri Johannes Laurentius Maria Van Dommelen ,  Mircea Dusa ,  Antoine Gaston Marie Kiers ,  Paul Frank Luehrmann ,  Henricus Petrus Maria Pellemans ,  Maurits Van der Schaar ,  Cedric Desire Grouwstra ,  Markus Gerardus Martinus Van Kraaij

IPC分类号： G01J3/28

CPC分类号： G01N21/8806 ,  G03F7/70341 ,  G03F7/70633 ,  G03F7/7065 ,  G03F9/7034

摘要： An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.

公开(公告)号：US07859647B2

公开(公告)日：2010-12-28

申请号：US12020947

申请日：2008-01-28

申请人： Arno Jan Bleeker ,  Johannes Jacobus Matheus Baselmans ,  Marce Mathijs Theodore Marie Dierichs ,  Stanislav Smirnov ,  Christian Wagner ,  Lev Ryzhikov ,  Kars Zeger Troost

发明人： Arno Jan Bleeker ,  Johannes Jacobus Matheus Baselmans ,  Marce Mathijs Theodore Marie Dierichs ,  Stanislav Smirnov ,  Christian Wagner ,  Lev Ryzhikov ,  Kars Zeger Troost

IPC分类号： G03B27/54 ,  G03B27/42

CPC分类号： G03F7/702 ,  G03F7/70291

摘要： A system and method are used to direct a radiation beam to illuminate non-perpendicularly a patterning array of individually controllable elements used for patterning the radiation beam. The individually controllable elements can change a telecentricity of the radiation beam. Projection of the radiation beam onto the individually controllable elements can be by a concave mirror or use a folding mirror placed in an object field of the individually controllable elements. Alternatively, the individually controllable elements can change the optical axis of the radiation beam.

摘要翻译： 系统和方法用于引导辐射束非垂直地照射用于图案化辐射束的单独可控元件的构图阵列。 可单独控制的元件可以改变辐射束的远心性。 将辐射束投射到可独立控制的元件上可以通过凹面镜或使用放置在单独可控元件的物场中的折叠镜。 或者，独立可控元件可以改变辐射束的光轴。

公开(公告)号：US20090040492A1

公开(公告)日：2009-02-12

申请号：US11889065

申请日：2007-08-08

申请人： Vladimir Vitalevich Ivanov ,  Vadim Yevgenyevich Banine ,  Arno Jan Bleeker ,  Konstantin Nikolaevich Koshelev ,  Pavel Stanislavovich Antsiferov ,  Vladimir Mihailovitch Krivtsun ,  Dmitriy Victorovich Lopaev

发明人： Vladimir Vitalevich Ivanov ,  Vadim Yevgenyevich Banine ,  Arno Jan Bleeker ,  Konstantin Nikolaevich Koshelev ,  Pavel Stanislavovich Antsiferov ,  Vladimir Mihailovitch Krivtsun ,  Dmitriy Victorovich Lopaev

IPC分类号： G03B27/54 ,  H01J17/26

CPC分类号： H05G2/003 ,  B82Y10/00 ,  G03F7/70033 ,  H05G2/005

摘要： A source configured to generate radiation for a lithographic apparatus is disclosed. The source includes an anode, and a cathode. The cathode and the anode are configured to create a discharge in a fuel in a discharge space between the anode and the cathode so as to generate a plasma, the cathode and the anode positioned relative to each other so that, in use, current lines extending between the anode and the cathode are substantially curved so as to create a force that substantially radially compresses the plasma only in a region proximate an upper surface of the cathode or of the anode.

摘要翻译： 公开了一种被配置为产生用于光刻设备的辐射的源。 源包括阳极和阴极。 阴极和阳极被配置为在阳极和阴极之间的放电空间中的燃料中产生放电，以便产生等离子体，阴极和阳极相对于彼此定位，使得在使用中，电流线延伸 在阳极和阴极之间基本上是弯曲的，从而产生基本上径向压缩等离子体的力，仅在接近阴极或阳极的上表面的区域中。

公开(公告)号：US20090033889A1

公开(公告)日：2009-02-05

申请号：US11882081

申请日：2007-07-30

申请人： Arno Jan Bleeker ,  Aschwin Lodewijk Hendricus Johannes Van Meer

发明人： Arno Jan Bleeker ,  Aschwin Lodewijk Hendricus Johannes Van Meer

IPC分类号： G03B27/52

CPC分类号： G03F7/70925 ,  G03F7/70866 ,  G03F7/70916

摘要： A lithographic apparatus includes an illumination system configured to condition a beam of radiation; a pattern support configured to hold a patterning device, the patterning device configured to pattern the beam of radiation to form a patterned beam of radiation; a substrate holder configured to hold a substrate, the substrate holder including a support surface in contact with the substrate; a projection system configured to project the patterned beam of radiation onto the substrate; and a cleaning system including a cleaning unit, the cleaning unit constructed and arranged to generate radicals on the support surface of the substrate holder to remove contamination therefrom.

摘要翻译： 光刻设备包括被配置为调节辐射束的照明系统; 配置为保持图案形成装置的图案支撑件，所述图案形成装置被配置成对辐射束进行图案化以形成图案化的辐射束; 衬底保持器，其构造成保持衬底，所述衬底保持器包括与所述衬底接触的支撑表面; 投影系统，被配置为将所述图案化的辐射束投射到所述基板上; 以及包括清洁单元的清洁系统，所述清洁单元构造和布置成在所述基板保持器的所述支撑表面上产生自由基以从其中除去污染物。

公开(公告)号：US20080309899A1

公开(公告)日：2008-12-18

申请号：US11763275

申请日：2007-06-14

申请人： Johannes Jacobus Matheus Baselmans ,  Arno Jan Bleeker

发明人： Johannes Jacobus Matheus Baselmans ,  Arno Jan Bleeker

IPC分类号： G03B27/68

CPC分类号： G03F7/70291 ,  G03F7/706

摘要： Systems and methods are provided for measuring aberration in a lithographic apparatus. A radiation beam is modulated using an array of individually controllable elements, and the modulated beam is projected using a projection system. A pattern is provided on the array of individually controllable elements to modulate the radiation beam, and the pattern comprises a repeating structure that is formed from a plurality of features that are dimensioned such that first order diffraction of the radiation beam substantially fills the pupil of the projection system. A sensor detects the projected radiation and measures interference in the radiation projected by the projection system. Aberration in the detected radiation beam is then measured.

摘要翻译： 提供了用于测量光刻设备中的像差的系统和方法。 使用单独可控元件的阵列来调制辐射束，并且使用投影系统投影调制束。 在单独可控元件的阵列上提供图案以调制辐射束，并且图案包括由多个特征形成的重复结构，其尺寸使得辐射束的一阶衍射基本上填充了辐射束的瞳孔 投影系统 传感器检测投射的辐射并测量由投影系统投射的辐射的干扰。 然后测量检测到的辐射束中的畸变。

公开(公告)号：US07440078B2

公开(公告)日：2008-10-21

申请号：US11311640

申请日：2005-12-20

申请人： Arno Jan Bleeker ,  Kars Zeger Troost

发明人： Arno Jan Bleeker ,  Kars Zeger Troost

IPC分类号： G03B27/42

CPC分类号： G03F7/7045 ,  G03F7/70291 ,  G03F7/70341 ,  G03F7/70408 ,  G03F7/70466

摘要： A lithographic system combining an interference exposure unit and a lithography unit. The lithography unit can comprise an array of individually controllable elements. The lithography system can be arranged such that a pitch of the lines exposed by the interference exposure unit is an integer multiple of a size of an exposure area of the lithography unit corresponding to a single individually controllable element.

摘要翻译： 组合干涉曝光单元和光刻单元的光刻系统。 光刻单元可以包括单独可控元件的阵列。 光刻系统可以布置成使得由干涉曝光单元曝光的线的间距是与单个可单独控制的元件对应的光刻单元的曝光区域的尺寸的整数倍。

公开(公告)号：US07428040B2

公开(公告)日：2008-09-23

申请号：US11717174

申请日：2007-03-13

申请人： Cheng-Qun Gui ,  Arno Jan Bleeker ,  Pieter Willem Herman De Jager ,  Joost Sytsma

发明人： Cheng-Qun Gui ,  Arno Jan Bleeker ,  Pieter Willem Herman De Jager ,  Joost Sytsma

IPC分类号： G03B27/54

CPC分类号： G03F7/70208 ,  G03F7/70275 ,  G03F7/70283 ,  G03F7/70291

摘要： Provided is a radiation distribution system for distributing the radiation from an illumination system to two or more patterning means, each for patterning beams of radiation, which are subsequently projected onto a substrate.

摘要翻译： 提供了一种用于将照明系统的辐射分配到两个或更多个图案形成装置的辐射分布系统，每个图案装置用于图形化的辐射束，随后将其投射到基板上。

公开(公告)号：US20080158538A1

公开(公告)日：2008-07-03

申请号：US11645812

申请日：2006-12-27

申请人： Michiel Puyt ,  Arno Jan Bleeker ,  Johannes Hendrikus Gertrudis Franssen ,  Rene Theodorus Petrus Compen ,  Johannes Theodorus Guillielmus Maria Van De Ven ,  Egbert Dirk Stam ,  Rudolf Hartmut Fischer ,  Edwin Robert Martin Gelinck

发明人： Michiel Puyt ,  Arno Jan Bleeker ,  Johannes Hendrikus Gertrudis Franssen ,  Rene Theodorus Petrus Compen ,  Johannes Theodorus Guillielmus Maria Van De Ven ,  Egbert Dirk Stam ,  Rudolf Hartmut Fischer ,  Edwin Robert Martin Gelinck

IPC分类号： G03B27/58

CPC分类号： G03F7/707 ,  G03F7/70708 ,  H01L21/6875 ,  H01L21/68757

摘要： A lithographic apparatus includes an illumination system constructed and arranged to condition a radiation beam, and a support constructed and arranged to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The apparatus also includes a substrate table constructed and arranged to hold a substrate, and a projection system constructed and arranged to project the patterned radiation beam onto a target portion of the substrate. The substrate table includes a chuck having a plurality of protrusions constructed and arranged to support corresponding parts of a bottom surface of a wafer. The top surface of at least one of the protrusions includes a plurality of elements that define a reduced contact area between the substrate and the top surface of the protrusion.

摘要翻译： 光刻设备包括构造和布置成调节辐射束的照明系统，以及构造和布置成支撑图案形成装置的支撑件。 图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束。 所述装置还包括被构造和布置成保持基板的基板台，以及构造和布置成将图案化的辐射束投影到基板的目标部分上的投影系统。 衬底台包括具有多个突出部的卡盘，所述多个突起被构造和布置成支撑晶片底面的对应部分。 至少一个突起的顶表面包括多个元件，其限定了基板和突起的顶表面之间的减小的接触面积。

公开(公告)号：US20080151212A1

公开(公告)日：2008-06-26

申请号：US11643952

申请日：2006-12-22

申请人： Arno Jan Bleeker ,  Dominicus Jacobus Petrus Adrianus Franken ,  Johannes Hendrikus Gertrudis Franssen ,  Johannes Theodorus Guillielmus Maria Van De Ven ,  Michiel Puyt ,  Teun Peterus Adrianus De Wilt

发明人： Arno Jan Bleeker ,  Dominicus Jacobus Petrus Adrianus Franken ,  Johannes Hendrikus Gertrudis Franssen ,  Johannes Theodorus Guillielmus Maria Van De Ven ,  Michiel Puyt ,  Teun Peterus Adrianus De Wilt

IPC分类号： G03B27/32 ,  G03B27/58

CPC分类号： G03F7/707 ,  H01L21/683

摘要： A lithographic apparatus includes an illumination system constructed and arranged to condition a radiation beam, and a support constructed and arranged to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The apparatus also includes a substrate table constructed and arranged to hold a substrate, and a projection system constructed and arranged to project the patterned radiation beam onto a target portion of the substrate. The substrate table includes a plurality of projections constructed and arranged to support corresponding parts of a bottom section of the substrate, and an actuator constructed and arranged to excite a shockwave in the substrate.

摘要翻译： 光刻设备包括构造和布置成调节辐射束的照明系统，以及构造和布置成支撑图案形成装置的支撑件。 图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束。 所述装置还包括被构造和布置成保持基板的基板台，以及构造和布置成将图案化的辐射束投影到基板的目标部分上的投影系统。 衬底台包括多个突起，其被构造和布置成支撑衬底的底部的对应部分，以及构造和布置成激发衬底中的冲击波的致动器。