公开(公告)号：US20050019709A1

公开(公告)日：2005-01-27

申请号：US10797664

申请日：2004-03-11

Applicant: Pieter Van Groos ,  Jan Hoogkamp ,  Josephus Vugts ,  Robert Livesey ,  Johannes Franssen ,  Albert Klomp ,  Johannes Petrus Vermeulen ,  Erik Loopstra

Inventor： Pieter Van Groos ,  Jan Hoogkamp ,  Josephus Vugts ,  Robert Livesey ,  Johannes Franssen ,  Albert Klomp ,  Johannes Petrus Vermeulen ,  Erik Loopstra

IPC: H01L21/677 ,  G03F7/20 ,  H01L21/027 ,  H01L21/683 ,  G03F9/00

CPC classification number: G03F7/70975 ,  G03F7/7075 ,  G03F7/70858 ,  G03F7/70991

Abstract: A method of and apparatus for maintaining a machine part arranged in an interior space of a machine, where the interior space is kept at a first pressure and is separated from an environment having a second pressure via a load lock. The method includes transporting a machine part via the load lock out of the interior space and transporting via the load lock into the interior space one of the maintained machine part and a separate replacement machine part.

Abstract translation: 一种用于保持设置在机器的内部空间中的机器部件的方法和设备，其中内部空间保持在第一压力并且经由负载锁定与具有第二压力的环境分离。 该方法包括通过装载锁将机器部件运送出内部空间，并通过装载锁将其运送到维护的机器部件之一的内部空间和单独的替换机器部件中。

公开(公告)号：US20050007569A1

公开(公告)日：2005-01-13

申请号：US10844575

申请日：2004-05-13

Applicant: Bob Streefkerk ,  Levinus Bakker ,  Johannes Baselmans ,  Hendrikus Cox ,  Antonius Theodorus Derksen ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Joeri Lof ,  Erik Loopstra ,  Jeroen Johannes Mertens ,  Frits Van Der Meulen ,  Johannes Mulkens ,  Gerardus Van Nunen ,  Klaus Simon ,  Bernardus Slaghekke ,  Alexander Straaijer ,  Jan-Gerard Van Der Toorn ,  Martijn Houkes

Inventor： Bob Streefkerk ,  Levinus Bakker ,  Johannes Baselmans ,  Hendrikus Cox ,  Antonius Theodorus Derksen ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Joeri Lof ,  Erik Loopstra ,  Jeroen Johannes Mertens ,  Frits Van Der Meulen ,  Johannes Mulkens ,  Gerardus Van Nunen ,  Klaus Simon ,  Bernardus Slaghekke ,  Alexander Straaijer ,  Jan-Gerard Van Der Toorn ,  Martijn Houkes

IPC: G03F7/20 ,  H01L21/027 ,  G03B27/52

CPC classification number: G03F7/70341 ,  G03F7/70425 ,  G03F7/70525 ,  G03F7/709

Abstract: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.

Abstract translation: 在光刻设备中，将投影系统下的基板表面的局部区域浸入液体中。 可以使用致动器来改变衬底表面上方的液体供应系统的高度。 控制系统使用前馈或反馈控制输入基板的表面高度，以将液体供应系统保持在基板表面上方的预定高度。

公开(公告)号：US20180275526A1

公开(公告)日：2018-09-27

申请号：US15899527

申请日：2018-02-20

Applicant: Yim-Bun Patrick Kwan ,  Erik Loopstra

Inventor： Yim-Bun Patrick Kwan ,  Erik Loopstra

IPC: G03F7/20 ,  G02B5/00 ,  G02B13/14

CPC classification number: G03F7/70258 ,  G02B5/005 ,  G02B13/143 ,  G03F7/70808 ,  G03F7/70825 ,  G03F7/70833 ,  G03F7/709

Abstract: An optical apparatus includes an interchange mechanism and an optical assembly of an illumination system or a projection objective. At least one of the plurality of optical elements of the optical assembly is selected from among a plurality of ones selectable from the interchange mechanism which facilitates exchange of one for another in the beam path. To reduce transmission of vibration from the interchange mechanism to the optical assembly, the interchange mechanism is mounted on a structure which is substantially dynamically decoupled from the housing, and a selected selectable optical element is located at an operating position at which it is separate from the interchange mechanism.

公开(公告)号：US20130077064A1

公开(公告)日：2013-03-28

申请号：US13561502

申请日：2012-07-30

Applicant: Dirk Heinrich Ehm ,  Maarten van Kampen ,  Stefan-Wolfgang Schmidt ,  Vadim Yevgenyevich Banine ,  Erik Loopstra

Inventor： Dirk Heinrich Ehm ,  Maarten van Kampen ,  Stefan-Wolfgang Schmidt ,  Vadim Yevgenyevich Banine ,  Erik Loopstra

IPC: G03F7/20

CPC classification number: G03F7/70891 ,  G01J1/58 ,  G02B5/0891 ,  G03F7/70316 ,  G03F7/70558 ,  G03F7/7085 ,  G03F7/70958

Abstract: An arrangement for use in a projection exposure tool (100) for microlithography comprises a reflective optical element (10; 110) and a radiation detector (30; 32; 130). The reflective optical element (10; 110) comprises a carrier element (12) guaranteeing the mechanical strength of the optical element (10; 110) and a reflective coating (18) disposed on the carrier element (12) for reflecting a use radiation (20a). The carrier element (12) is made of a material which upon interaction with the use radiation (20a) emits a secondary radiation (24) the wavelength of which differs from the wavelength of the use radiation (20a), and the radiation detector (30; 32; 130) is configured to detect the secondary radiation (24).

Abstract translation: 用于微光刻的投影曝光工具（100）中的布置包括反射光学元件（10; 110）和辐射检测器（30; 32; 130）。 反射光学元件（10; 110）包括保证光学元件（10; 110）的机械强度的载体元件（12）和设置在载体元件（12）上的反射涂层（18），用于反射使用辐射 20a）。 载体元件（12）由与使用辐射（20a）相互作用发射其波长与使用辐射（20a）的波长不同的次级辐射（24）和辐射检测器（30）的材料制成 ; 32; 130）被配置为检测所述次级辐射（24）。

公开(公告)号：US20080074681A1

公开(公告)日：2008-03-27

申请号：US11902786

申请日：2007-09-25

Applicant: Erik Loopstra ,  Leon Levasier ,  Rene Oesterholt

Inventor： Erik Loopstra ,  Leon Levasier ,  Rene Oesterholt

IPC: G01B11/14 ,  G01B11/00

CPC classification number: G03F7/70775 ,  G03F7/70458 ,  G03F7/70516 ,  G03F9/7011 ,  G03F9/7019

Abstract: A measurement system configured to measure a position of an object in a lithographic apparatus, includes at least three position detectors configured to detect the position of the object, the at least three position detectors each including a single or multi-dimensional optical encoder to provide at least six position values, the optical encoders being coupled to the object at different locations within a three dimensional coordinate system, wherein at least one position value is provided for each dimension of the three dimensional coordinate system, and wherein the measurement system is configured to calculate the position of the object within the three dimensional coordinate system from a subset of at least three of the six position values and to calculate an orientation of the object with respect to the three dimensional coordinate system from another subset of at least three of the six position values.

Abstract translation: 被配置为测量光刻设备中的物体的位置的测量系统包括配置成检测物体的位置的至少三个位置检测器，所述至少三个位置检测器包括单个或多维光学编码器以提供在 至少六个位置值，所述光学编码器在三维坐标系内的不同位置处耦合到所述对象，其中为所述三维坐标系的每个维度提供至少一个位置值，并且其中所述测量系统被配置为计算 从六个位置值中的至少三个的子集的三维坐标系中的对象的位置，并且从六个位置中的至少三个的另一子集计算相对于三维坐标系的对象的取向 价值观。

公开(公告)号：US20070263197A1

公开(公告)日：2007-11-15

申请号：US11430196

申请日：2006-05-09

Applicant: Bernardus Antonius Luttikhuis ,  Henrikus Cox ,  Erik Loopstra ,  Engelbertus Antonius Van Der Pasch ,  Harmen Van Der Schoot

Inventor： Bernardus Antonius Luttikhuis ,  Henrikus Cox ,  Erik Loopstra ,  Engelbertus Antonius Van Der Pasch ,  Harmen Van Der Schoot

IPC: G03B27/52

CPC classification number: G03B27/53 ,  G03F7/70733 ,  G03F7/70775

Abstract: A displacement measurement system, in particular for measuring the displacement of a substrate table in a lithographic apparatus relative to a reference frame is presented. The displacement measure system includes a plurality of displacement sensors mounted to the substrate table and a target associated with each displacement sensor mounted to the reference frame.

Abstract translation: 提出了一种位移测量系统，特别是用于测量光刻设备中的衬底台相对于参考系的位移。 位移测量系统包括安装到衬底台的多个位移传感器和与安装到参考框架的每个位移传感器相关联的目标。

公开(公告)号：US20070258061A1

公开(公告)日：2007-11-08

申请号：US11785548

申请日：2007-04-18

Applicant: Santiago Puerto ,  Erik Loopstra ,  Andrew Massar ,  Duane Kish ,  Abdullah Alikhan ,  Woodrow Olson ,  Jonathan Feroce

Inventor： Santiago Puerto ,  Erik Loopstra ,  Andrew Massar ,  Duane Kish ,  Abdullah Alikhan ,  Woodrow Olson ,  Jonathan Feroce

IPC: G03B27/42

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  G03F1/24 ,  G03F1/62 ,  G03F1/64 ,  G03F1/66 ,  G03F7/70741 ,  G03F7/70983 ,  G03F9/7011 ,  H01L21/67353 ,  H01L21/67359 ,  Y10S414/135

Abstract: Systems and methods to protect a mask from being contaminated by airborne particles are described. The systems and methods include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or box that can be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover can be moved during an exposure process during which a pattern on the reticle can be formed on a wafer.

Abstract translation: 描述了保护面罩免受空气传播颗粒污染的系统和方法。 这些系统和方法包括提供固定在两部分覆盖物中的掩模版。 两部分盖子包括一个可拆卸的保护装置，用于保护光罩免受污染。 盖可以保持在可以用于将盖通过光刻系统从大气部分输送到真空部分的盒或盒中。 在真空部分中，可移动的盖可以在曝光过程中移动，在曝光过程期间可以在晶片上形成掩模版上的图案。

公开(公告)号：US20070256471A1

公开(公告)日：2007-11-08

申请号：US11822633

申请日：2007-07-09

Applicant: Erik Loopstra ,  Leon Levasier ,  Rene Oesterholt

Inventor： Erik Loopstra ,  Leon Levasier ,  Rene Oesterholt

IPC: G01B21/00 ,  G01P21/00

CPC classification number: G03F7/70775 ,  G03F7/70458 ,  G03F7/70516 ,  G03F9/7011 ,  G03F9/7019

Abstract: Lithographic apparatus includes a substrate table and a motion control system for controlling a movement of the substrate table. The motion control system includes at least 3 position detectors constructed for detecting a position of the substrate table. For measuring a position and orientation of the substrate table, each position detector comprises an optical encoder of a single dimensional or multi dimensional type, the optical encoders being arranged for providing together at least 6 position values, at least one position value being provided for each of the 3 dimensions. 3 or more of the at least 3 optical encoders being connected to the substrate table at different locations in the 3 dimensional coordinate system. The motion control system is arranged to calculate the position of the substrate table in the 3 dimensional coordinate system from a subset of at least 3 of the 6 position values and to calculate an orientation of the substrate table with respect to the coordinate system from another subset of at least 3 of the 6 position values. Further, a method for calibrating the position detectors is described.

Abstract translation: 光刻设备包括用于控制衬底台的移动的衬底台和运动控制系统。 运动控制系统包括构造用于检测衬底台的位置的至少3个位置检测器。 为了测量衬底台的位置和取向，每个位置检测器包括一维或多维类型的光学编码器，光学编码器被布置为一起提供至少6个位置值，为每个位置值提供至少一个位置值 的三维。 所述至少3个光学编码器中的3个或更多个在所述三维坐标系中的不同位置连接到所述基板台。 运动控制系统被布置为从6个位置值中的至少3个的子集计算三维坐标系中的衬底台的位置，并且从另一个子集计算相对于坐标系的衬底台的取向 至少6个位置值中的3个。 此外，描述了用于校准位置检测器的方法。

公开(公告)号：US20070223007A1

公开(公告)日：2007-09-27

申请号：US11384834

申请日：2006-03-21

Applicant: Renatus Klaver ,  Erik Loopstra ,  Engelbertus Fransiscus Van Der Pasch

Inventor： Renatus Klaver ,  Erik Loopstra ,  Engelbertus Fransiscus Van Der Pasch

IPC: G01B11/02

CPC classification number: G01D5/38 ,  G03F7/70775

Abstract: A displacement measurement system configured to provide measurement of the relative displacement of two components in six degrees of freedom with improved consistency and without requiring excessive space.

Abstract translation: 一种位移测量系统，被配置为提供六个自由度中的两个部件的相对位移的测量，具有改进的一致性并且不需要过多的空间。

公开(公告)号：US20070201012A1

公开(公告)日：2007-08-30

申请号：US11529587

申请日：2006-09-29

Applicant: Erik Loopstra ,  Johannes Mulkens

Inventor： Erik Loopstra ,  Johannes Mulkens

IPC: G03F7/20 ,  G03B27/42

CPC classification number: G03F7/70866 ,  G03F7/7015 ,  G03F7/70341 ,  Y10S430/162

Abstract: A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.

Abstract translation: 公开了一种与位于投影系统和基板之间的浸没液体一起使用的光刻投影装置。 公开了几种方法和机构来保护投影系统，衬底台和液体限制系统的组件。 这些包括在投影系统的最终元件上提供保护涂层，以及在部件上游提供一个或多个牺牲体。 还公开了CaF 2 2的双组分最终光学元件。